Invention Grant
- Patent Title: Membranes for use within a lithographic apparatus and a lithographic apparatus comprising such a membrane
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Application No.: US15320749Application Date: 2015-07-02
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Publication No.: US10228615B2Publication Date: 2019-03-12
- Inventor: Andrey Alexandrovich Nikipelov , Vadim Yevgenyevich Banine , Jozef Petrus Henricus Benschop , Arjen Boogaard , Florian Didier Albin Dhalluin , Alexey Sergeevich Kuznetsov , Mária Péter , Luigi Scaccabarozzi , Willem Joan Van Der Zande , Pieter-Jan Van Zwol , Andrei Mikhailovich Yakunin
- Applicant: ASML Netherlands B.V.
- Applicant Address: NL Veldhoven
- Assignee: ASML Netherlands B.V.
- Current Assignee: ASML Netherlands B.V.
- Current Assignee Address: NL Veldhoven
- Agency: Pillsbury Winthrop Shaw Pittman LLP
- Priority: EP14175835 20140704; EP15169657 20150528
- International Application: PCT/EP2015/065080 WO 20150702
- International Announcement: WO2016/001351 WO 20160107
- Main IPC: G03F1/24
- IPC: G03F1/24 ; G03F1/38 ; G03F1/62 ; G06F7/20 ; G02B5/20 ; G03F7/20 ; G02B5/18

Abstract:
A membrane transmissive to EUV radiation, which may be used as a pellicle or spectral filter in a lithographic apparatus. The membrane includes one or more high doped regions wherein the membrane is doped with a dopant concentration greater than 1017 cm−3, and one or more regions with low (or no) doping. The membrane may have a main substrate having low doping and one or more additional layers, wherein the high doped regions are comprised within some or all of the additional layers.
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