公开(公告)号：US20190353521A1

公开(公告)日：2019-11-21

申请号：US16525641

申请日：2019-07-30

Applicant: ASML NETHERLANDS B.V.

Inventor： Vadim Yevgenyevich Banine ,  Gerrit Jacobus Hendrik Brussaard ,  Willem Jakobus Cornelis Koppert ,  Otger Jan Luiten ,  Han-Kwang Nienhuys ,  Job Beckers ,  Ruud Martinus Van Der Horst

IPC: G01J1/58 ,  H01S3/09 ,  G01T1/20 ,  G03F7/20 ,  G01J1/42 ,  H01S3/13

Abstract: A radiation sensor apparatus for determining a position and/or power of a radiation beam, the radiation sensor apparatus including a chamber to contain a gas, one or more sensors, and a processor. The chamber has a first opening and a second opening such that a radiation beam can enter the chamber through the first opening, propagate through the chamber generally along an axis, and exit the chamber through the second opening. Each of the one or more sensors is arranged to receive and detect radiation emitted from a region of the chamber around the axis. The processor is operable to use the radiation detected by the one or more sensors to determine a position and/or power of the radiation beam.

公开(公告)号：US10422691B2

公开(公告)日：2019-09-24

申请号：US15549133

申请日：2016-02-02

Applicant: ASML NETHERLANDS B.V.

Inventor： Vadim Yevgenyevich Banine ,  Willem Jakobus Cornelis Koppert ,  Han-Kwang Nienhuys ,  Ruud Martinus Van Der Horst

IPC: G03F7/30 ,  G01J1/58 ,  G01J1/42 ,  H01S3/13 ,  G03F7/20 ,  G01T1/20 ,  H01S3/09

Abstract: A radiation sensor apparatus for determining a position and/or power of a radiation beam, the radiation sensor apparatus including a chamber to contain a gas, one or more sensors, and a processor. The chamber has a first opening and a second opening such that a radiation beam can enter the chamber through the first opening, propagate through the chamber generally along an axis, and exit the chamber through the second opening. Each of the one or more sensors is arranged to receive and detect radiation emitted from a region of the chamber around the axis. The processor is operable to use the radiation detected by the one or more sensors to determine a position and/or power of the radiation beam.

公开(公告)号：US10900829B2

公开(公告)日：2021-01-26

申请号：US16525641

申请日：2019-07-30

Applicant: ASML NETHERLANDS B.V.

Inventor： Vadim Yevgenyevich Banine ,  Gerrit Jacobus Hendrik Brussaard ,  Willem Jakobus Cornelis Koppert ,  Otger Jan Luiten ,  Han-Kwang Nienhuys ,  Job Beckers ,  Ruud Martinus Van Der Horst

IPC: G01J1/58 ,  G01J1/42 ,  H01S3/13 ,  G03F7/20 ,  H01S3/09 ,  G01T1/20

Abstract: A radiation sensor apparatus for determining a position and/or power of a radiation beam, the radiation sensor apparatus including a chamber to contain a gas, one or more sensors, and a processor. The chamber has a first opening and a second opening such that a radiation beam can enter the chamber through the first opening, propagate through the chamber generally along an axis, and exit the chamber through the second opening. Each of the one or more sensors is arranged to receive and detect radiation emitted from a region of the chamber around the axis. The processor is operable to use the radiation detected by the one or more sensors to determine a position and/or power of the radiation beam.

公开(公告)号：US10185230B2

公开(公告)日：2019-01-22

申请号：US15562729

申请日：2016-03-10

Applicant: ASML Netherlands B.V.

Inventor： Willem Jakobus Cornelis Koppert

IPC: G03F7/09 ,  G03F7/20 ,  G01R1/07 ,  H01S3/09 ,  H01S3/00

Abstract: A measurement apparatus for measuring at least one property of an electron bunch or other group of charged particles travelling through a cavity (310), comprises a plurality of electrodes (302-308) arranged around the cavity, a plurality of optical sensors (322-328), wherein the plurality of electrodes are configured to provide signals to the optical sensors thereby to modulate at least one optical property of the optical sensors. The apparatus further comprises at least one laser source (330) for providing a laser beam comprising a series of laser pulses to the plurality of optical sensors to obtain measurements representative of said at least one optical property of the optical sensors, and a processing resource (320) configured to process at least a first measurement signal from a first one of the optical sensors and a second measurement signal from a second one of the optical sensors, thereby to determine at least one property of the electron bunch or other group of charged particles, wherein the at least one property comprises charge and/or lateral position.