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1.发明授权公开(公告)号：US10670974B2
公开(公告)日：2020-06-02
申请号：US16233707
申请日：2018-12-27
Applicant: ASML Netherlands B.V.
Inventor： Gerrit Jacobus Hendrik Brussaard , Petrus Wilhelmus Smorenburg , Teis Johan Coenen , Niels Geypen , Peter Danny Van Voorst , Sander Bas Roobol
IPC: G03F7/20
Abstract: A metrology apparatus for determining a characteristic of interest of a structure on a substrate, the structure having diffractive properties, the apparatus comprising: focusing optics configured to focus illumination radiation comprising a plurality of wavelengths onto the structure; a first detector configured to detect at least part of the illumination radiation which has been diffracted from the structure; and additional optics configured to produce, on at least a portion of the first detector, a wavelength-dependent spatial distribution of different wavelengths of the illumination radiation which has been diffracted from the structure, wherein the first detector is arranged to detect at least a non-zero diffraction order of the illumination radiation which has been diffracted from the structure.
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公开(公告)号：US20180368243A1
公开(公告)日：2018-12-20
申请号：US15988119
申请日：2018-05-24
Applicant: ASML Netherlands B.V.
Inventor： Petrus Wilhelmus SMORENBURG , Gerrit Jacobus Hendrik Brussaard , Vadim Yevgenyevich Banine
IPC: H05G2/00 , G01N21/956 , G03F7/20 , G01N21/88
CPC classification number: H05G2/008 , G01N21/8806 , G01N21/956 , G01N2021/95676 , G03F7/70616 , G03F7/70625 , G03F7/70633 , G03F7/7065 , H05G2/003 , H05H1/24
Abstract: Methods and apparatus for generation of radiation by high harmonic generation, HHG. The apparatus comprises: a chamber for holding a vacuum, the chamber comprising a radiation input, a radiation output and an interaction region at which, in use, a medium is present, the chamber being arranged such that, in use, when driving radiation propagates through the radiation input and is incident upon the medium, the medium emits radiation via HHG, the emitted radiation propagating through the radiation output; and at least one plasma generator at the radiation input and/or the radiation output for generating a plasma volume allowing the driving radiation and emitted radiation, respectively, to propagate through the plasma volume.
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公开(公告)号：US10468225B2
公开(公告)日：2019-11-05
申请号：US16072385
申请日：2017-02-07
Applicant: ASML Netherlands B.V.
IPC: H01J37/073 , H01S3/09 , H05H7/08
Abstract: An electron source, e.g. for a free electron laser used for EUV lithography comprises: • a cathode (203) configured to be connected to a negative potential (100, 101); • a laser (110) configured to direct pulses of radiation onto the cathode so as to cause the cathode to emit bunches of electrons; • an RF booster (180) connected to an RF source and configured to accelerate the bunches of electrons; and • a timing corrector (303, 313, 400, 401) configured to correct the time of arrival of bunches of electrons at the RF booster relative to the RF voltage provided by the RF source. The timing corrector may comprise a correction electrode (303, 313) surrounding a path of the bunches of electrons from the cathode to the RF booster and a correction voltage source (400, 401) configured to apply a correction voltage to the correction electrode.
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公开(公告)号：US12050392B2
公开(公告)日：2024-07-30
申请号：US18072196
申请日：2022-11-30
Applicant: ASML NETHERLANDS B.V.
CPC classification number: G02F1/365 , G02F1/3528
Abstract: A waveguide including: a first section, the first section configured to generate, by a non-linear optical process, a broadened wavelength spectrum of pulsed radiation provided to an input end of the waveguide; a second section, the second section including an output end of the waveguide, the second section configured to exhibit a larger absolute value of group velocity dispersion than the first section; wherein a length of the second section is configured to reduce a peak intensity of one or more peaks in the broadened wavelength spectrum by at least 20%.
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5.发明授权公开(公告)号：US11347155B2
公开(公告)日：2022-05-31
申请号：US17055410
申请日：2019-04-23
Applicant: ASML Netherlands B.V.
IPC: G03F9/00 , G03F7/20 , G01N21/47 , G02F1/35 , G02F1/01 , G01B11/02 , G01N21/88 , G02B5/00 , H01S3/00 , H05G2/00
Abstract: An illumination source apparatus (500), suitable for use in a metrology apparatus for the characterization of a structure on a substrate, the illumination source apparatus comprising: a high harmonic generation, HHG, medium (502); a pump radiation source (506) operable to emit a beam of pump radiation (508); and adjustable transformation optics (510) configured to adjustably transform the transverse spatial profile of the beam of pump radiation to produce a transformed beam (518) such that relative to the centre axis of the transformed beam, a central region of the transformed beam has substantially zero intensity and an outer region which is radially outwards from the centre axis of the transformed beam has a non-zero intensity, wherein the transformed beam is arranged to excite the HHG medium so as to generate high harmonic radiation (540), wherein the location of said outer region is dependent on an adjustment setting of the adjustable transformation optics.
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Patent Agency Ranking
公开(公告)号：US11223181B2
公开(公告)日：2022-01-11
申请号：US16543964
申请日：2019-08-19
Applicant: ASML Netherlands B.V.
IPC: H01S3/109 , G01N21/956 , G03F7/20 , G02F1/35
Abstract: Methods and corresponding apparatus operable to cause an interaction between a drive radiation beam and a medium for generation of emitted radiation by high harmonic generation, the arrangement comprising: an interaction region positioned at an interaction plane and configured to receive the medium; a beam block positioned upstream of the interaction plane at a beam block plane and configured to partially block the drive radiation beam; a beam shaper positioned upstream of the beam block plane at an object plane and configured to control a spatial distribution of the drive radiation beam; and at least one lens positioned upstream of the interaction plane and downstream of the beam block plane, wherein the lens being positioned such that an image of the spatial distribution of the drive radiation beam is formed at the interaction plane.
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公开(公告)号：US20190353521A1
公开(公告)日：2019-11-21
申请号：US16525641
申请日：2019-07-30
Applicant: ASML NETHERLANDS B.V.
Inventor： Vadim Yevgenyevich Banine , Gerrit Jacobus Hendrik Brussaard , Willem Jakobus Cornelis Koppert , Otger Jan Luiten , Han-Kwang Nienhuys , Job Beckers , Ruud Martinus Van Der Horst
Abstract: A radiation sensor apparatus for determining a position and/or power of a radiation beam, the radiation sensor apparatus including a chamber to contain a gas, one or more sensors, and a processor. The chamber has a first opening and a second opening such that a radiation beam can enter the chamber through the first opening, propagate through the chamber generally along an axis, and exit the chamber through the second opening. Each of the one or more sensors is arranged to receive and detect radiation emitted from a region of the chamber around the axis. The processor is operable to use the radiation detected by the one or more sensors to determine a position and/or power of the radiation beam.
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公开(公告)号：US10362665B2
公开(公告)日：2019-07-23
申请号：US15988119
申请日：2018-05-24
Applicant: ASML Netherlands B.V.
Inventor： Petrus Wilhelmus Smorenburg , Gerrit Jacobus Hendrik Brussaard , Vadim Yevgenyevich Banine
IPC: H05G2/00 , G01N21/956 , G03F7/20 , G01N21/88
Abstract: Methods and apparatus for generation of radiation by high harmonic generation, HHG. The apparatus comprises: a chamber for holding a vacuum, the chamber comprising a radiation input, a radiation output and an interaction region at which, in use, a medium is present, the chamber being arranged such that, in use, when driving radiation propagates through the radiation input and is incident upon the medium, the medium emits radiation via HHG, the emitted radiation propagating through the radiation output; and at least one plasma generator at the radiation input and/or the radiation output for generating a plasma volume allowing the driving radiation and emitted radiation, respectively, to propagate through the plasma volume.
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公开(公告)号：US10900829B2
公开(公告)日：2021-01-26
申请号：US16525641
申请日：2019-07-30
Applicant: ASML NETHERLANDS B.V.
Inventor： Vadim Yevgenyevich Banine , Gerrit Jacobus Hendrik Brussaard , Willem Jakobus Cornelis Koppert , Otger Jan Luiten , Han-Kwang Nienhuys , Job Beckers , Ruud Martinus Van Der Horst
Abstract: A radiation sensor apparatus for determining a position and/or power of a radiation beam, the radiation sensor apparatus including a chamber to contain a gas, one or more sensors, and a processor. The chamber has a first opening and a second opening such that a radiation beam can enter the chamber through the first opening, propagate through the chamber generally along an axis, and exit the chamber through the second opening. Each of the one or more sensors is arranged to receive and detect radiation emitted from a region of the chamber around the axis. The processor is operable to use the radiation detected by the one or more sensors to determine a position and/or power of the radiation beam.
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公开(公告)号：US20200067258A1
公开(公告)日：2020-02-27
申请号：US16543964
申请日：2019-08-19
Applicant: ASML Netherlands B.V.
IPC: H01S3/109 , G03F7/20 , G01N21/956
Abstract: Methods and corresponding apparatus operable to cause an interaction between a drive radiation beam and a medium for generation of emitted radiation by high harmonic generation, the arrangement comprising: an interaction region positioned at an interaction plane and configured to receive the medium; a beam block positioned upstream of the interaction plane at a beam block plane and configured to partially block the drive radiation beam; a beam shaper positioned upstream of the beam block plane at an object plane and configured to control a spatial distribution of the drive radiation beam; and at least one lens positioned upstream of the interaction plane and downstream of the beam block plane, wherein the lens being positioned such that an image of the spatial distribution of the drive radiation beam is formed at the interaction plane.
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