Invention Grant
- Patent Title: Methods and apparatus for optical metrology
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Application No.: US15988119Application Date: 2018-05-24
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Publication No.: US10362665B2Publication Date: 2019-07-23
- Inventor: Petrus Wilhelmus Smorenburg , Gerrit Jacobus Hendrik Brussaard , Vadim Yevgenyevich Banine
- Applicant: ASML Netherlands B.V.
- Applicant Address: NL Veldhoven
- Assignee: ASML Netherlands B.V.
- Current Assignee: ASML Netherlands B.V.
- Current Assignee Address: NL Veldhoven
- Agency: Sterne, Kessler, Goldstein & Fox P.L.L.C.
- Priority: EP17176638 20170619; EP17195462 20171009
- Main IPC: H05G2/00
- IPC: H05G2/00 ; G01N21/956 ; G03F7/20 ; G01N21/88

Abstract:
Methods and apparatus for generation of radiation by high harmonic generation, HHG. The apparatus comprises: a chamber for holding a vacuum, the chamber comprising a radiation input, a radiation output and an interaction region at which, in use, a medium is present, the chamber being arranged such that, in use, when driving radiation propagates through the radiation input and is incident upon the medium, the medium emits radiation via HHG, the emitted radiation propagating through the radiation output; and at least one plasma generator at the radiation input and/or the radiation output for generating a plasma volume allowing the driving radiation and emitted radiation, respectively, to propagate through the plasma volume.
Public/Granted literature
- US20180368243A1 Methods and Apparatus for Optical Metrology Public/Granted day:2018-12-20
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