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公开(公告)号：US09696640B2
公开(公告)日：2017-07-04
申请号：US14399870
申请日：2013-05-02
Applicant: ASML Netherlands B.V.
CPC classification number: G03F7/70858 , G03F7/70758
Abstract: A lithographic apparatus including a first body including a heat source, a second body and a heater device is presented. The second body has a facing surface facing the first body via a gap between the first and second bodies. The heat source is for providing a heat flux to the second body via the gap. The heater device is attached to the facing surface. The heater device is configured to provide a further heat flux to the second body.
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2.发明授权Methods of providing patterned epitaxy templates for self-assemblable block copolymers for use in device lithography 有权提供用于自组装嵌段共聚物的图案化外延模板用于器件光刻的方法公开(公告)号：US09513553B2
公开(公告)日：2016-12-06
申请号：US14387186
申请日：2013-03-19
Applicant: ASML Netherlands B.V.
Inventor： Sander Frederik Wuister , Vadim Yevgenyevich Banine , Jozef Maria Finders , Roelof Koole , Emiel Peeters , Harmeet Singh
CPC classification number: G03F7/26 , B05D1/32 , B05D3/107 , B82Y10/00 , B82Y40/00 , G03F7/0002 , G03F7/20 , G03F7/2022
Abstract: A method is disclosed to form a patterned epitaxy template, on a substrate, to direct self-assembly of block copolymer for device lithography. A resist layer on a substrate is selectively exposed with actinic (e.g. UV or DUV) radiation by photolithography to provide exposed portions in a regular lattice pattern of touching or overlapping shapes arranged to leave unexposed resist portions between the shapes. Exposed or unexposed resist is removed with remaining resist portions providing the basis for a patterned epitaxy template for the orientation of the self-assemblable block copolymer as a hexagonal or square array. The method allows for simple, direct UV lithography to form patterned epitaxy templates with sub-resolution features.
Abstract translation: 公开了一种在衬底上形成图案化外延模板以引导用于器件光刻的嵌段共聚物的自组装的方法。 基板上的抗蚀剂层通过光刻法选择性地用光化（例如UV或DUV）曝光，以提供布置成在形状之间留下未曝光的抗蚀剂部分的接触或重叠形状的规则格子图案的暴露部分。 用剩余的抗蚀剂部分除去曝光或未曝光的抗蚀剂，为用于可自组装嵌段共聚物取向的图案化外延模板提供六边形或正方形阵列的基础。 该方法允许简单的直接UV光刻形成具有亚分辨率特征的图案化外延模板。
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3.发明申请公开(公告)号：US20150234297A1
公开(公告)日：2015-08-20
申请号：US14428287
申请日：2013-08-26
Applicant: ASML Netherlands B.V.
Inventor： Johannes Antonius Gerardus Akkermans , Bas Pieter Lemmen , Sjoerd Martijn Huiberts , Joeri Lof , Petrus Theodorus Rutgers , Sven Antoin Johan Hol , Harmeet Singh , Peter Michel Silvester Maria Heijmans
CPC classification number: G03F7/70725 , G03F7/22 , G03F7/70758 , H01F7/081 , H01F7/1646 , H02K11/20 , H02K41/025 , H02K41/03 , H02K41/033 , H02P6/16 , H02P25/034 , H02P25/06 , H02P25/08 , H02P25/092
Abstract: A reluctance actuator assembly comprising a reluctance actuator, a flux sensor to measure a magnetic flux in a gap of the reluctance actuator, and a flux amplifier to drive an actuator coil of the reluctance actuator based on a flux set point and the flux measured by the flux sensor. A method comprising providing to the flux amplifier a flux setpoint, the flux setpoint comprising a time constant component and a sinusoidally varying component at an excitation frequency, measuring a force generated by the reluctance actuator in response to the flux setpoint, and calibrating the reluctance actuator assembly from the measured force.
Abstract translation: 一种磁阻致动器组件，包括磁阻致动器，用于测量磁阻致动器的间隙中的磁通量的磁通传感器，以及基于磁通量设定点和磁通量测量的磁通量来驱动磁阻致动器的致动器线圈的磁通放大器 通量传感器 一种方法，包括向所述通量放大器提供磁通设定点，所述通量设定点包括在激励频率处的时间常数分量和正弦变化分量，以响应于所述通量设定点测量由所述磁阻致动器产生的力，以及校准所述磁阻致动器 从测量力组装。
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公开(公告)号：US20150098067A1
公开(公告)日：2015-04-09
申请号：US14399870
申请日：2013-05-02
Applicant: ASML Netherlands B.V.
IPC: G03F7/20
CPC classification number: G03F7/70858 , G03F7/70758
Abstract: A lithographic apparatus including a first body including a heat source, a second body and a heater device is presented. The second body has a facing surface facing the first body via a gap between the first and second bodies. The heat source is for providing a heat flux to the second body via the gap. The heater device is attached to the facing surface. The heater device is configured to provide a further heat flux to the second body.
Abstract translation: 提供了一种包括包括热源，第二主体和加热器装置的第一主体的光刻设备。 第二主体经由第一和第二主体之间的间隙具有面向第一主体的面对表面。 热源用于经由间隙向第二体提供热通量。 加热器装置连接到相对表面。 加热器装置被配置为向第二主体提供另外的热通量。
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公开(公告)号：US09470969B2
公开(公告)日：2016-10-18
申请号：US13686186
申请日：2012-11-27
Applicant: ASML Netherlands B.V.
IPC: G03B27/58 , H01L21/683 , G03F7/20
CPC classification number: G03B27/58 , G03F7/2051 , G03F7/707 , G03F7/70708 , H01L21/683
Abstract: A support for an object, e.g., a semiconductor substrate, includes a main body having a surface configured and arranged to have a plurality of projections. Each of the projections has an associated electrostatic actuator for displacing a free end of the associated projection relative to the main body at least in a direction in a plane parallel to a main surface of the object.
Abstract translation: 对象（例如半导体衬底）的支撑件包括主体，该主体具有被配置和布置成具有多个突起的表面。 每个突起具有相关联的静电致动器，用于至少沿平行于物体的主表面的平面中的方向相对于主体移动相关联的突起的自由端。
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Patent Agency Ranking
6.发明授权Methods of providing patterned templates for self-assemblable block copolymers for use in device lithography 有权提供用于装置光刻的自组装嵌段共聚物的图案化模板的方法公开(公告)号：US09229324B2
公开(公告)日：2016-01-05
申请号：US14385047
申请日：2013-03-06
Applicant: ASML Netherlands B.V.
Inventor： Harmeet Singh , Vadim Yevgenyevich Banine , Jozef Maria Finders , Sander Frederik Wuister , Roelof Koole , Emiel Peeters
IPC: G03F7/16 , G03F7/038 , G03F7/00 , G03F7/20 , B82Y10/00 , B82Y40/00 , G03F7/30 , G03F7/40 , H01L21/027
CPC classification number: G03F7/162 , B82Y10/00 , B82Y40/00 , G03F7/0002 , G03F7/038 , G03F7/165 , G03F7/2022 , G03F7/2024 , G03F7/30 , G03F7/40 , H01L21/027
Abstract: A method is disclosed to form a patterned template on a substrate, to direct orientation of a self-assemblable block copolymer. The method involves providing a resist layer of a positive tone resist on the substrate and overexposing the resist with actinic (e.g. UV) radiation by photolithography to expose a continuous region of the resist layer with a sub-resolution unexposed resist portion at the interface between the resist and the substrate. The resist portion remaining at the interface, after removal of the exposed region, provides a basis for a chemical epitaxy template. The method may allow for simple, direct photolithography to form a patterned chemical epitaxy template and optionally include an accurately co-aligned graphoepitaxy feature and/or a substrate alignment feature.
Abstract translation: 公开了一种在基底上形成图案化模板以引导自组装嵌段共聚物取向的方法。 该方法包括在衬底上提供正色调抗蚀剂的抗蚀剂层，并通过光刻法用光化（例如UV）辐射过度曝光抗蚀剂，以在抗蚀剂层的连接区域之间的界面处暴露抗蚀剂层的亚分辨率未曝光抗蚀剂部分 抗蚀剂和基材。 在除去暴露区域之后残留在界面处的抗蚀剂部分为化学外延模板提供了基础。 该方法可以允许简单的直接光刻以形成图案化的化学外延模板，并且可选地包括精确地共同对准的图案电子特征和/或衬底对准特征。
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7.发明授权Lithographic apparatus comprising a support for holding an object, and a support for use therein 有权光刻设备包括用于保持物体的支撑件和用于其中的支撑件公开(公告)号：US09195150B2
公开(公告)日：2015-11-24
申请号：US14377141
申请日：2013-02-04
Applicant: ASML Netherlands B.V.
Inventor： Theodorus Petrus Maria Cadee , Vadim Yevgenyevich Banine , Koen Jacobus Johannes Maria Zaal , Ramin Badie , Harmeet Singh
IPC: G03B27/58 , G03F7/20 , H01L21/687
CPC classification number: G03F7/70725 , G03F7/70708 , G03F7/70733 , H01L21/6875
Abstract: A lithographic apparatus has a support that is provided with burls for holding an object. The support has been fabricated with a lithographic manufacturing method, e.g., a MEMS-technology, so as to create burls whose orientations or positions are individually electrically controllable.
Abstract translation: 光刻设备具有一个支撑件，该支撑件设置有用于保持物体的毛刺。 已经利用诸如MEMS技术的光刻制造方法来制造支撑件，以便产生其取向或位置可单独地电可控制的孔。
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8.发明申请METHODS OF PROVIDING PATTERNED TEMPLATES FOR SELF-ASSEMBLABLE BLOCK COPOLYMERS FOR USE IN DEVICE LITHOGRAPHY 有权提供用于自组装块式共聚物的图案模式的方法用于器件平台的使用公开(公告)号：US20150034594A1
公开(公告)日：2015-02-05
申请号：US14385047
申请日：2013-03-06
Applicant: ASML NETHERLANDS B.V.
Inventor： Harmeet Singh , Vadim Yevgenyevich Banine , Jozef Maria Finders , Sander Frederik Wuister , Roelof Koole , Emiel Peeters
CPC classification number: G03F7/162 , B82Y10/00 , B82Y40/00 , G03F7/0002 , G03F7/038 , G03F7/165 , G03F7/2022 , G03F7/2024 , G03F7/30 , G03F7/40 , H01L21/027
Abstract: A method is disclosed to form a patterned template on a substrate, to direct orientation of a self-assemblable block copolymer. The method involves providing a resist layer of a positive tone resist on the substrate and overexposing the resist with actinic (e.g. UV) radiation by photolithography to expose a continuous region of the resist layer with a sub-resolution unexposed resist portion at the interface between the resist and the substrate. The resist portion remaining at the interface, after removal of the exposed region, provides a basis for a chemical epitaxy template. The method may allow for simple, direct photolithography to form a patterned chemical epitaxy template and optionally include an accurately co-aligned graphoepitaxy feature and/or a substrate alignment feature.
Abstract translation: 公开了一种在基底上形成图案化模板以引导自组装嵌段共聚物的取向的方法。 该方法包括在衬底上提供正色调抗蚀剂的抗蚀剂层，并通过光刻法用光化（例如UV）辐射过度曝光抗蚀剂，以在抗蚀剂层的连接区域之间的界面处暴露抗蚀剂层的亚分辨率未曝光抗蚀剂部分 抗蚀剂和基材。 在除去暴露区域之后残留在界面处的抗蚀剂部分为化学外延模板提供了基础。 该方法可以允许简单的直接光刻以形成图案化的化学外延模板，并且可选地包括精确地共同对准的图案电子特征和/或衬底对准特征。
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9.发明申请Lithographic Apparatus Comprising a Support for Holding an Object, and a Support for Use therein 有权平版印刷设备包括用于保持物体的支撑件及其中使用的支撑件公开(公告)号：US20150002832A1
公开(公告)日：2015-01-01
申请号：US14377141
申请日：2013-02-04
Applicant: ASML Netherlands B.V.
Inventor： Theodorus Petrus Maria Cadee , Vadim Yevgenyevich Banine , Koen Jacobus Johannes Maria Zaal , Ramin Badie , Harmeet Singh
IPC: G03F7/20
CPC classification number: G03F7/70725 , G03F7/70708 , G03F7/70733 , H01L21/6875
Abstract: A lithographic apparatus has a support that is provided with burls for holding an object. The support has been fabricated with a lithographic manufacturing method, e.g., a MEMS-technology, so as to create burls whose orientations or positions are individually electrically controllable.
Abstract translation: 光刻设备具有一个支撑件，该支撑件设置有用于保持物体的毛刺。 已经利用诸如MEMS技术的光刻制造方法来制造支撑件，以便产生其取向或位置可单独地电可控制的孔。
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公开(公告)号：US10372045B2
公开(公告)日：2019-08-06
申请号：US14428287
申请日：2013-08-26
Applicant: ASML Netherlands B.V.
Inventor： Johannes Antonius Gerardus Akkermans , Bas Pieter Lemmen , Sjoerd Martijn Huiberts , Joeri Lof , Petrus Theodorus Rutgers , Sven Antoin Johan Hol , Harmeet Singh , Peter Michel Silvester Maria Heijmans
IPC: G03F7/20 , H01F7/08 , H01F7/16 , H02P25/08 , H02P6/16 , H02P25/06 , H02K41/025 , H02P25/034 , G03F7/22 , H02K11/00 , H02K41/03
Abstract: A reluctance actuator assembly comprising a reluctance actuator, a flux sensor to measure a magnetic flux in a gap of the reluctance actuator, and a flux amplifier to drive an actuator coil of the reluctance actuator based on a flux set point and the flux measured by the flux sensor. A method comprising providing to the flux amplifier a flux setpoint, the flux setpoint comprising a time constant component and a sinusoidally varying component at an excitation frequency, measuring a force generated by the reluctance actuator in response to the flux setpoint, and calibrating the reluctance actuator assembly from the measured force.
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