公开(公告)号：US20190074654A1

公开(公告)日：2019-03-07

申请号：US16178374

申请日：2018-11-01

Applicant: Gigaphoton Inc.

Inventor： Natsushi SUZUKI ,  Osamu WAKABAYASHI ,  Hiroaki TSUSHIMA ,  Masanori YASHIRO

IPC: H01S3/036 ,  B01D53/04 ,  H01S3/104 ,  H01S3/225 ,  B01D53/34 ,  B01D53/82 ,  B01D53/86 ,  B01D53/68

Abstract: A gas laser apparatus may include: a laser chamber connected through a first control valve to a first laser gas supply source that supplies a first laser gas containing a halogen gas and connected through a second control valve to a second laser gas supply source that supplies a second laser gas having a lower halogen gas concentration than the first laser gas; a purification column that removes at least a part of the halogen gas and a halogen compound from at least a part of a gas exhausted from the laser chamber; a booster pump, connected through a third control valve to the laser chamber, which raises a pressure of a gas having passed through the purification column to a gas pressure that is higher than an operating gas pressure of the laser chamber; and a controller that calculates, on a basis of a first amount of a gas supplied from the booster pump through the third control valve to the laser chamber, a second amount of the first laser gas that is to be supplied to the laser chamber and controls the first control valve on a basis of a result of the calculation of the second amount.

公开(公告)号：US20190037677A1

公开(公告)日：2019-01-31

申请号：US16137312

申请日：2018-09-20

Applicant: Gigaphoton Inc.

Inventor： Tsukasa HORI ,  Kouji KAKIZAKI ,  Tatsuya YANAGIDA ,  Osamu WAKABAYASHI ,  Hakaru MIZOGUCHI

IPC: H05G2/00 ,  H01S3/00 ,  H01S3/23 ,  H01S3/223 ,  H01S3/16 ,  H01S3/11 ,  H01S3/104 ,  H01S3/09 ,  H01S3/102

Abstract: A system includes a chamber, a laser beam apparatus configured to generate a laser beam to be introduced into the chamber, a laser controller for the laser beam apparatus to control at least a beam intensity and an output timing of the laser beam, and a target supply unit configured to supply a target material into the chamber, the target material being irradiated with the laser beam for generating extreme ultraviolet light.

公开(公告)号：US20190020167A1

公开(公告)日：2019-01-17

申请号：US16020595

申请日：2018-06-27

Applicant: Gigaphoton Inc.

Inventor： Natsushi SUZUKI ,  Osamu WAKABAYASHI ,  Hiroaki TSUSHIMA ,  Masanori YASHIRO

IPC: H01S3/036 ,  B01D53/04 ,  B01D53/68 ,  B01D53/86 ,  B01D53/82 ,  B01D53/34 ,  H01S3/225 ,  H01S3/104

Abstract: A gas laser apparatus may include: a laser chamber connected through a first control valve to a first laser gas supply source that supplies a first laser gas containing a halogen gas and connected through a second control valve to a second laser gas supply source that supplies a second laser gas having a lower halogen gas concentration than the first laser gas; a purification column that removes at least a part of the halogen gas and a halogen compound from at least a part of a gas exhausted from the laser chamber; a booster pump, connected through a third control valve to the laser chamber, which raises a pressure of a gas having passed through the purification column to a gas pressure that is higher than an operating gas pressure of the laser chamber; and a controller that calculates, on a basis of a first amount of a gas supplied from the booster pump through the third control valve to the laser chamber, a second amount of the first laser gas that is to be supplied to the laser chamber and controls the first control valve on a basis of a result of the calculation of the second amount.

公开(公告)号：US20180350622A1

公开(公告)日：2018-12-06

申请号：US16055325

申请日：2018-08-06

Applicant: KYUSHU UNIVERSITY, NATIONAL UNIVERSITY CORPORATION ,  GIGAPHOTON INC.

Inventor： Hiroshi IKENOUE ,  Tomoyuki OHKUBO ,  Osamu WAKABAYASHI

IPC: H01L21/324 ,  H01L21/268 ,  B23K26/064 ,  H01L21/263 ,  B23K26/06 ,  H01L21/02

CPC classification number: H01L21/20 ,  H01L21/268

Abstract: A laser annealing device includes: a CW laser device configured to emit continuous wave laser light caused by continuous oscillation to preheat the amorphous silicon; a pulse laser device configured to emit the pulse laser light toward the preheated amorphous silicon; an optical system configured to guide the continuous wave laser light and the pulse laser light to the amorphous silicon; and a control unit configured to control an irradiation energy density of the continuous wave laser light so as to preheat the amorphous silicon to have a predetermined target temperature less than a melting point thereof, and configured to control at least one of a fluence and a number of pulses of the pulse laser light so as to crystallize the preheated amorphous silicon.

公开(公告)号：US20180241170A1

公开(公告)日：2018-08-23

申请号：US15953835

申请日：2018-04-16

Applicant: Gigaphoton Inc.

Inventor： Natsushi SUZUKI ,  Masanori YASHIRO ,  Osamu WAKABAYASHI

IPC: H01S3/036 ,  H01S3/134

CPC classification number: H01S3/036 ,  H01S3/134 ,  H01S3/2251 ,  H01S3/2256

Abstract: A laser gas purifying system to purify laser gas emitted from a laser apparatus and return purified gas to the laser apparatus may include a first pipe configured to pass the laser gas emitted from the laser apparatus, a purifying apparatus connected to the first pipe and configured to purify the laser gas emitted from the laser apparatus, a second pipe connected to the purifying apparatus and configured to return the purified gas purified by the purifying apparatus to the laser apparatus, and an exhausting device provided in at least one of the first pipe, the purifying apparatus, and the second pipe.

公开(公告)号：US20180110116A1

公开(公告)日：2018-04-19

申请号：US15832476

申请日：2017-12-05

Applicant: Gigaphoton Inc.

Inventor： Tsukasa HORI ,  Kouji KAKIZAKI ,  Tatsuya YANAGIDA ,  Osamu WAKABAYASHI ,  Hakaru MIZOGUCHI

IPC: H05G2/00 ,  H01S3/00 ,  H01S3/23 ,  H01S3/223 ,  H01S3/16 ,  H01S3/11 ,  H01S3/104 ,  H01S3/09 ,  H01S3/102

CPC classification number: H05G2/008 ,  H01S3/005 ,  H01S3/0071 ,  H01S3/09 ,  H01S3/102 ,  H01S3/104 ,  H01S3/1106 ,  H01S3/1611 ,  H01S3/1643 ,  H01S3/1673 ,  H01S3/2232 ,  H01S3/2308 ,  H01S3/2366 ,  H01S3/2391 ,  H05G2/003 ,  H05G2/005

Abstract: A system includes a chamber, a laser beam apparatus configured to generate a laser beam to be introduced into the chamber, a laser controller for the laser beam apparatus to control at least a beam intensity and an output timing of the laser beam, and a target supply unit configured to supply a target material into the chamber, the target material being irradiated with the laser beam for generating extreme ultraviolet light.

公开(公告)号：US20180102622A1

公开(公告)日：2018-04-12

申请号：US15836878

申请日：2017-12-10

Applicant: Gigaphoton Inc.

Inventor： Kouji KAKIZAKI ,  Akira SUWA ,  Osamu WAKABAYASHI ,  Hiroshi UMEDA

IPC: H01S3/097 ,  H01S3/23 ,  H01S3/038 ,  H01S3/10 ,  H01S3/13 ,  H01S3/134 ,  H01S3/225

CPC classification number: H01S3/2308 ,  H01S3/005 ,  H01S3/09702 ,  H01S3/0971 ,  H01S3/10007 ,  H01S3/10015 ,  H01S3/10038 ,  H01S3/10069 ,  H01S3/104 ,  H01S3/134 ,  H01S3/2222 ,  H01S3/225 ,  H01S3/2316

Abstract: The excimer laser device receives data on a target value of pulse energy from an external device and outputs a pulse laser beam. The excimer laser device includes a master oscillator, at least one power amplifier including a chamber provided in an optical path of the pulse laser beam outputted from the master oscillator, a pair of electrodes provided in the chamber, and an electric power source configured to apply voltage to the pair of electrodes, and a controller configured to control the electric power source of one power amplifier of the at least one power amplifier to stop applying the voltage to the pair of electrodes based on the target value of the pulse energy.

公开(公告)号：US20170338620A1

公开(公告)日：2017-11-23

申请号：US15669218

申请日：2017-08-04

Applicant: Gigaphoton Inc.

Inventor： Masaki ARAKAWA ,  Kouji KAKIZAKI ,  Osamu WAKABAYASHI

IPC: H01S3/23 ,  H01S3/097 ,  H01S3/038 ,  H01S3/225 ,  H01S3/034

Abstract: A laser device may include: a master oscillator including a first laser chamber, a first pair of discharge electrodes provided in the first laser chamber, and an optical resonator, the master oscillator being configured to output a laser beam; a first amplifier including a second laser chamber provided in an optical path of the laser beam outputted from the master oscillator and a second pair of discharge electrodes provided in the second laser chamber at a first gap distance, the first amplifier being configured to amplify the laser beam; and a first beam-adjusting optical system provided in an optical path of the laser beam between the master oscillator and the first amplifier, the first beam-adjusting optical system being configured to adjust the laser beam outputted from the master oscillator such that a beam width of the laser beam entering the first amplifier measured in a direction of electric discharge between the second pair of discharge electrodes is substantially equal to the first gap distance between the second pair of discharge electrodes.

公开(公告)号：US20170288361A1

公开(公告)日：2017-10-05

申请号：US15631676

申请日：2017-06-23

Applicant: Gigaphoton Inc.

Inventor： Natsushi SUZUKI ,  Osamu WAKABAYASHI ,  Hiroaki TSUSHIMA ,  Masanori YASHIRO

IPC: H01S3/036 ,  H01S3/225 ,  B01D53/68 ,  B01D53/34 ,  B01D53/82 ,  B01D53/86 ,  H01S3/104 ,  B01D53/04

CPC classification number: H01S3/036 ,  B01D53/0446 ,  B01D53/346 ,  B01D53/685 ,  B01D53/82 ,  B01D53/86 ,  B01D2251/404 ,  B01D2251/602 ,  B01D2253/108 ,  B01D2255/20753 ,  B01D2255/20761 ,  B01D2257/2027 ,  B01D2258/0216 ,  B01D2259/40003 ,  H01S3/104 ,  H01S3/225

Abstract: A gas laser apparatus may include: a laser chamber connected through a first control valve to a first laser gas supply source that supplies a first laser gas containing a halogen gas and connected through a second control valve to a second laser gas supply source that supplies a second laser gas having a lower halogen gas concentration than the first laser gas; a purification column that removes at least a part of the halogen gas and a halogen compound from at least a part of a gas exhausted from the laser chamber; a booster pump, connected through a third control valve to the laser chamber, which raises a pressure of a gas having passed through the purification column to a gas pressure that is higher than an operating gas pressure of the laser chamber; and a controller that calculates, on a basis of a first amount of a gas supplied from the booster pump through the third control valve to the laser chamber, a second amount of the first laser gas that is to be supplied to the laser chamber and controls the first control valve on a basis of a result of the calculation of the second amount.

公开(公告)号：US20170279241A1

公开(公告)日：2017-09-28

申请号：US15616163

申请日：2017-06-07

Applicant: GIGAPHOTON INC.

Inventor： Takashi ONOSE ,  Osamu WAKABAYASHI

IPC: H01S3/091 ,  H01S3/0941 ,  H01S3/094 ,  G02F1/355 ,  H01S3/06 ,  H01S3/16 ,  H01S3/107 ,  G02F1/37 ,  H01S3/067 ,  H01S3/109

CPC classification number: H01S3/0912 ,  G02F1/3534 ,  G02F1/3551 ,  G02F1/37 ,  G02F2001/3507 ,  G02F2001/354 ,  G03F7/70025 ,  H01S3/0071 ,  H01S3/0085 ,  H01S3/0092 ,  H01S3/0602 ,  H01S3/06754 ,  H01S3/094076 ,  H01S3/0941 ,  H01S3/10046 ,  H01S3/10053 ,  H01S3/107 ,  H01S3/109 ,  H01S3/1666 ,  H01S3/2251 ,  H01S3/2366 ,  H01S3/2375 ,  H01S3/2391

Abstract: A solid-state laser system may include first and second solid-state laser units, a wavelength conversion system, an optical shutter, and a controller. The first solid-state laser unit and the second solid-state laser unit may output first pulsed laser light with a first wavelength and second pulsed laser light with a second wavelength, respectively. The controller may perform first control and second control. The first control may cause the first and second pulsed laser light to enter the wavelength conversion system at a substantially coincidental timing, thereby causing the wavelength conversion system to output third pulsed laser light with a third wavelength converted from the first wavelength and the second wavelength, and the second control may prevent the first and second pulsed laser light from entering the wavelength conversion system at the coincidental timing, thereby preventing the wavelength conversion system from outputting the third pulsed laser light.