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公开(公告)号：US20210364927A1
公开(公告)日：2021-11-25
申请号：US17228000
申请日：2021-04-12
Applicant: Gigaphoton Inc.
Inventor： Tsukasa HORI , Yutaka SHIRAISHI , Toshihiro NISHISAKA , Hiroshi SOMEYA , Yukio WATANABE
Abstract: A target supply device may include a first container configured to contain a target substance, a second container configured to contain the target substance supplied from the first container, a first valve disposed between the first container and the second container, a first pipe connected to the second container and configured to supply pressurized gas to the second container, a third container configured to contain the target substance supplied from the second container, a second valve disposed between the second container and the third container, a second pipe connected to the third container and configured to supply pressurized gas to the third container, and a nozzle configured to output the target substance supplied from the third container.
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公开(公告)号：US20190116655A1
公开(公告)日：2019-04-18
申请号：US16214435
申请日：2018-12-10
Applicant: Gigaphoton Inc.
Inventor： Tsukasa HORI , Shinji OKAZAKI
Abstract: An extreme UV light generation device may include: a chamber having a plasma generation region at an inside of the chamber, the chamber receiving a target substance externally supplied to the plasma generation region; an outlet port provided on the chamber; a magnetic field generating unit configured to generate a magnetic field to converge cations on the outlet port, the cations being generated from the target substance that has been turned into plasma in the plasma generation region; an electron emission unit configured to emit electrons neutralizing the cations; and an exhaust tube joined to the outlet port and through which a neutralized substance obtained by neutralizing the cations flows.
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公开(公告)号：US20170280543A1
公开(公告)日：2017-09-28
申请号：US15616167
申请日：2017-06-07
Applicant: Gigaphoton Inc.
Inventor： Tsukasa HORI , Yutaka SHIRAISHI , Shinya IKESAKA , Takanobu ISHIHARA , Toshiro UMEKI
IPC: H05G2/00
Abstract: A target supply device according to a first aspect of the present disclosure is configured to supply a metal target in a plasma generation region and may include a tank configured to house the metal target, a filter having been subjected to a dehydration process, the filter being configured to suppress passage of particles in the metal target housed in the tank, and a nozzle provided with a nozzle hole configured to eject the metal target that has passed through the filter.
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公开(公告)号：US20160270199A1
公开(公告)日：2016-09-15
申请号：US15161628
申请日：2016-05-23
Applicant: GIGAPHOTON INC.
Inventor： Fumio IWAMOTO , Takashi SAITO , Tsukasa HORI , Osamu WAKABAYASHI
CPC classification number: H05G2/006 , G03F7/70033 , H05G2/005
Abstract: An aspect of the present disclosure may include a gas lock cover secured to a nozzle holder and provided downstream of a nozzle. The gas lock cover may cover a periphery of an exit of the nozzle and be structured to guide gas supplied from a gas supply unit. The gas lock cover may include a hollow cylindrical part provided downstream of the nozzle and having an exit opening for outputting droplets that are outputted from the nozzle and pass through an internal cavity of the cylindrical part. The gas lock cover may include a channel for transmitting the gas supplied from the gas supply unit, the channel being structured to orient a flow of the transmitted gas so as to flow to the exit opening of the cylindrical part through the internal cavity of the cylindrical part.
Abstract translation: 本公开的一个方面可以包括固定到喷嘴保持器并设置在喷嘴下游的气体锁盖。 气体锁定盖可以覆盖喷嘴的出口的周边，并被构造成引导从气体供应单元供应的气体。 气体锁定盖可以包括设置在喷嘴下游的中空圆柱形部分，并且具有用于输出从喷嘴输出并穿过圆柱形部分的内部空腔的液滴的出口。 气体锁定盖可以包括用于传送从气体供应单元供应的气体的通道，该通道被构造成使透过气体的流动定向，以便通过圆筒形的内部空腔流到圆柱形部分的出口 部分。
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5.发明申请EXTREME ULTRAVIOLET LIGHT GENERATION APPARATUS AND CONTROL METHOD FOR EXTREME ULTRAVIOLET LIGHT GENERATION APPARATUS 有权极光超紫外光发生装置及极光紫外线发光装置的控制方法公开(公告)号：US20160227638A1
公开(公告)日：2016-08-04
申请号：US15096769
申请日：2016-04-12
Applicant: GIGAPHOTON INC.
Inventor： Tsukasa HORI , Fumio IWAMOTO , Hiroshi UMEDA
IPC: H05G2/00
Abstract: In an example of the present invention is an extreme ultraviolet light generation apparatus including: a droplet supply device configured to successively supply droplets; a charging electrode being configured to control charging of droplets supplied from the droplet supply unit; and a target controller configured to control electric polarities of the droplets supplied from the droplet supply unit by controlling potential of the charging electrode in such a way that successive droplets join together to become a target droplet, wherein the droplets controlled in charging by the charging electrode include a plurality of groups each composed of successive droplets, and, in each of the groups, a droplet at one end is charged positively or negatively, a droplet at the other end is uncharged or charged in a polarity being the same as a polarity of an adjacent droplet in a group adjacent to the droplet at the other end.
Abstract translation: 本发明的一个实例是一种极紫外光发生装置，包括：液滴供给装置，被配置为连续供应液滴; 充电电极被配置为控制从液滴供应单元供应的液滴的充电; 以及目标控制器，其被配置为通过控制充电电极的电位来控制从液滴供给单元提供的液滴的电极性，使得连续的液滴接合在一起成为目标液滴，其中通过充电电极控制的液滴 包括多个由连续的液滴组成的组，并且在每个组中，一端的液滴是正或负的，另一端的液滴不带电或充电，极性与极性相同 在另一端与液滴相邻的组中的相邻液滴。
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Patent Agency Ranking
6.发明申请公开(公告)号：US20250038469A1
公开(公告)日：2025-01-30
申请号：US18912020
申请日：2024-10-10
Applicant: Gigaphoton Inc.
Inventor： Tsukasa HORI , Masahide KATO
Abstract: Discharge electrodes to be used in a gas laser device for exciting a laser gas containing fluorine by discharge include a cathode and an anode. The anode is arranged as facing the cathode and includes an electrode base member including a metal, and a coating layer including an insulating material and coating a part of a side surface, parallel to a longitudinal direction, of the electrode base member. The coating layer includes a first portion coating a first region of the side surface and a second portion coating a second region of the side surface, located farther from the cathode than the first region in a discharge direction perpendicular to the longitudinal direction, and being thicker than the first portion.
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7.发明公开公开(公告)号：US20230275386A1
公开(公告)日：2023-08-31
申请号：US18311949
申请日：2023-05-04
Applicant: Gigaphoton Inc.
Inventor： Tsukasa HORI , Yasuaki KIYOTA , Hisakazu KATSUUMI
IPC: H01S3/038
CPC classification number: H01S3/0385 , H01S3/0381 , H01S3/0382 , H01S3/0388 , H01S3/223
Abstract: Discharge electrodes include a cathode and an anode. The anode is disposed to face the cathode in a discharge direction perpendicular to a longitudinal direction of the cathode, and includes an electrode base 1, and a coating layer that covers a portion of a surface of the electrode base. First corners in a cross section perpendicular to the longitudinal direction connect first straight sections formed of first side surfaces that are side surfaces of the electrode base to a first curved section formed of a first discharge surface that is a discharge surface of the electrode base. The first corners are closer to the cathode in the discharge direction than second corners connecting second straight sections formed of second side surfaces that are side surfaces of the coating layer to a second curved section formed of a second discharge surface that is a discharge surface of the coating layer.
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公开(公告)号：US20200033739A1
公开(公告)日：2020-01-30
申请号：US16593274
申请日：2019-10-04
Applicant: Gigaphoton Inc.
Inventor： Tsukasa HORI , Hirokazu HOSODA
Abstract: An extreme ultraviolet light generation device according to an aspect of the present disclosure includes: a chamber in which tin is irradiated with a laser beam to generate extreme ultraviolet light; a hydrogen gas supply path that connects the chamber and a hydrogen-gas output unit of a hydrogen gas supply device as a supply source of hydrogen gas to be supplied into the chamber, receives supply of the hydrogen gas from the hydrogen gas supply device, and supplies, to the chamber, the hydrogen gas supplied from the hydrogen gas supply device; a temperature adjustment unit connected with the hydrogen gas supply path and configured to adjust the temperature of the hydrogen gas to be equal to or lower than 16° C.; and a gas discharge unit connected with the chamber and configured to discharge gas including at least hydrogen gas inside the chamber to outside of the chamber.
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公开(公告)号：US20190237303A1
公开(公告)日：2019-08-01
申请号：US16379539
申请日：2019-04-09
Applicant: Gigaphoton Inc.
Inventor： Fumio IWAMOTO , Yutaka SHIRAISHI , Tsukasa HORI , Osamu WAKABAYASHI
CPC classification number: H01J37/32449 , H05G2/00 , H05G2/005 , H05G2/006 , H05G2/008
Abstract: A target supply device may be provided with a tank configured to contain a metal as a target material, a nozzle having a nozzle hole through which the target material is output from the tank, a filter disposed in a communication portion for conducting the target material from the tank to the nozzle hole, a temperature adjuster configured to change the temperature of the target material in the tank, and a controller controlling the temperature adjuster to change the temperature of the target material in the tank such that oxygen in the target material is precipitated as metal oxide.
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公开(公告)号：US20190075642A1
公开(公告)日：2019-03-07
申请号：US16182799
申请日：2018-11-07
Applicant: GIGAPHOTON INC.
Inventor： Tsukasa HORI
IPC: H05G2/00
Abstract: A chamber device according to one aspect of the present disclosure includes a chamber inside which plasma is generated, a light source, and an incidence window configured to transmit light emitted from the light source to the inside of the chamber. The incidence window includes a first surface facing the outside of the chamber, and a second surface facing the inside of the chamber. At least the second surface is not coated with an anti-reflection film. The second surface is disposed in a state of being inclined at a non-perpendicular angle against an optical axis of the light emitted from the light source.
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