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公开(公告)号：US20210364927A1
公开(公告)日：2021-11-25
申请号：US17228000
申请日：2021-04-12
Applicant: Gigaphoton Inc.
Inventor： Tsukasa HORI , Yutaka SHIRAISHI , Toshihiro NISHISAKA , Hiroshi SOMEYA , Yukio WATANABE
Abstract: A target supply device may include a first container configured to contain a target substance, a second container configured to contain the target substance supplied from the first container, a first valve disposed between the first container and the second container, a first pipe connected to the second container and configured to supply pressurized gas to the second container, a third container configured to contain the target substance supplied from the second container, a second valve disposed between the second container and the third container, a second pipe connected to the third container and configured to supply pressurized gas to the third container, and a nozzle configured to output the target substance supplied from the third container.
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公开(公告)号：US20180160518A1
公开(公告)日：2018-06-07
申请号：US15888111
申请日：2018-02-05
Applicant: Gigaphoton Inc.
Inventor： Yutaka SHIRAISHI , Toshihiro NISHISAKA , Toshiyuki HIRASHITA , Takuya ISHII
IPC: H05G2/00
Abstract: A target storage device may include a tank configured to store a target that generates extreme ultraviolet light when being irradiated with laser light, a heater connected with the tank and configured to heat the tank, and a radiation member disposed to cover at least a part of the tank connected with the heater and configured to reflect heat radiation from the tank and the heater toward the tank.
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公开(公告)号：US20210029811A1
公开(公告)日：2021-01-28
申请号：US16894504
申请日：2020-06-05
Applicant: Gigaphoton Inc.
Inventor： Kouichiro KOUGE , Yusuke HOSHINO , Toshihiro NISHISAKA , Takashi OKADA
Abstract: An EUV chamber apparatus includes: a chamber; a target generation unit configured to output a target toward a predetermined region inside the chamber; a gas nozzle through which gas is supplied into the chamber; and a shroud including a first flow path through which a first cooling medium circulates and surrounding at least part of the trajectory of the target inside the chamber.
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公开(公告)号：US20190271914A1
公开(公告)日：2019-09-05
申请号：US16379363
申请日：2019-04-09
Applicant: Gigaphoton Inc.
Inventor： Toshihiro NISHISAKA
IPC: G03F7/20
Abstract: A target generation device replacement trolley includes: A. a linear movement mechanism configured to hold a target generation device configured to output a target material and linearly move the target generation device in a direction in which the target material is output; and B. a positioning portion configured to position the linear movement mechanism relative to a mounting part of a chamber on which the target generation device is mounted. The target generation device replacement trolley further includes C. a drive unit configured to drive the linear movement mechanism. The target generation device replacement trolley further includes D. a mount configured to hold the linear movement mechanism. The positioning portion is provided to the mount.
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公开(公告)号：US20190008026A1
公开(公告)日：2019-01-03
申请号：US16126829
申请日：2018-09-10
Applicant: Gigaphoton Inc.
Inventor： Toshiyuki HIRASHITA , Toshihiro NISHISAKA
IPC: H05G2/00
CPC classification number: H05G2/006 , G03F7/70033 , H05G2/005 , H05G2/008
Abstract: A tank may include: a tank main body having a space and an opening; a lid body covering the opening and a peripheral portion of the opening; a bolt for fixing the tank main body and the lid body in the peripheral portion; a first support portion arranged to surround the opening in a region on a side of the opening with respect to the bolt to support the lid body; a second support portion arranged to surround the opening in a region on the opening side with respect to the first support portion and having a height lower than a height of the first support portion; and a sealing member arranged to surround the opening in the region on the opening side with respect to the first support portion.
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Patent Agency Ranking
公开(公告)号：US20170238407A1
公开(公告)日：2017-08-17
申请号：US15583001
申请日：2017-05-01
Applicant: Gigaphoton Inc.
Inventor： Shinji NAGAI , Georg SOUMAGNE , Toshihiro NISHISAKA
IPC: H05G2/00
CPC classification number: H05G2/008 , G03F7/70033 , G03F7/70175 , G03F7/70916
Abstract: An extreme ultraviolet light generation device may include a chamber in which extreme ultraviolet light is generated from plasma, the plasma generated by irradiation of a target supplied in a plasma generation region inside of the chamber with laser light; a condenser mirror collecting the extreme ultraviolet light and guiding it to outside of the chamber; a first etching gas supply unit blowing an etching gas to a reflective surface of the condenser mirror and the plasma generation region; a magnet forming a magnetic field in the chamber; a port that intersects a central axis of the magnetic field and that takes in suspended substances generated in the chamber; and an ejection path that is in communication with the port and that ejects the suspended substances taken from the port to the outside of the chamber.
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公开(公告)号：US20150245457A1
公开(公告)日：2015-08-27
申请号：US14707990
申请日：2015-05-08
Applicant: GIGAPHOTON INC.
Inventor： Toshihiro NISHISAKA , Yukio WATANABE , Osamu WAKABAYASHI , Kouji KAKIZAKI , Michio SHINOZAKI
CPC classification number: G03F7/70033 , G03F7/70975 , H05G2/00 , H05G2/003 , H05G2/008
Abstract: An EUV light source apparatus by which detachment of a chamber or a part of the chamber, movement to a maintenance area, and highly accurate placement relative to projection optics can be performed easily for maintenance of the EUV light source apparatus. The EUV light source apparatus is an apparatus for generating plasma by applying a laser beam to a target material within a chamber and entering EUV light radiated from the plasma into projection optics of exposure equipment, and includes a positioning mechanism for positioning the chamber or a maintenance unit of the chamber in a predetermined location where an optical axis of the collected extreme ultraviolet light and an optical axis of the projection optics of the exposure equipment are aligned, and a movement mechanism for moving the chamber or the maintenance unit of the chamber between the predetermined location and a maintenance area.
Abstract translation: EUV光源装置能够容易地进行EUV光源装置的维护，EUV光源装置能够容易地进行腔室或腔室的一部分的移动，到维护区域的移动以及相对于投影光学元件的高精度放置。 EUV光源装置是通过将激光束施加到室内的目标材料并且将从等离子体辐射的EUV光输入到曝光设备的投影光学器件中来产生等离子体的装置，并且包括用于定位腔室或维护的定位机构 在所述收集的极紫外光的光轴和所述曝光设备的投影光学元件的光轴对准的预定位置处的所述室的单元，以及用于将所述室或所述室的维护单元移动到所述室 预定位置和维护区域。
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公开(公告)号：US20140001369A1
公开(公告)日：2014-01-02
申请号：US13958112
申请日：2013-08-02
Applicant: Gigaphoton Inc.
Inventor： Toshihiro NISHISAKA , Yukio WATANABE , Tamotsu ABE , Osamu WAKABAYASHI
IPC: H05G2/00
CPC classification number: H05G2/008 , G03B27/54 , G03F7/70033 , G03F7/70175 , G03F7/70916 , H05G2/003
Abstract: A chamber apparatus used with an external apparatus having an obscuration region may include: a chamber in which extreme ultraviolet light is generated; a collector mirror provided in the chamber for collecting the extreme ultraviolet light; a support for securing the collector mirror to the chamber; and an output port provided to the chamber for allowing the extreme ultraviolet light collected by the collector mirror to be introduced therethrough into the external apparatus.
Abstract translation: 与具有遮蔽区域的外部设备一起使用的室设备可以包括：产生极紫外光的室; 设置在室中的用于收集极紫外光的收集器反射镜; 用于将收集器镜固定到腔室的支撑件; 以及设置到室的输出端口，用于允许由集光镜收集的极紫外光通过其引入外部设备。
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公开(公告)号：US20190289705A1
公开(公告)日：2019-09-19
申请号：US16429331
申请日：2019-06-03
Applicant: Gigaphoton Inc.
Inventor： Takanobu ISHIHARA , Toshihiro NISHISAKA , Yutaka SHIRAISHI
Abstract: An extreme ultraviolet light generation apparatus includes: a chamber; a target supply unit that supplies a droplet of a target substance to a plasma generation region in the chamber; a first pipe at least partly covering a trajectory of the droplet and having a first opened end part as an upstream end part and a second opened end part as a downstream end part in a trajectory direction; a second pipe at least partly covering the first pipe with a gap between the second pipe and the first pipe, and having a third end part, opened and extending downstream of the second end part of the first pipe in the trajectory direction, as a downstream end part in the trajectory direction; and a gas supply unit that supplies gas flowing through the gap and causes the gas to flow in the trajectory direction out of a gas exit.
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公开(公告)号：US20190155163A1
公开(公告)日：2019-05-23
申请号：US16261329
申请日：2019-01-29
Applicant: Gigaphoton Inc.
Inventor： Yutaka SHIRAISHI , Toshihiro NISHISAKA
CPC classification number: G03F7/70033 , G03F7/20 , H05G2/00 , H05G2/008
Abstract: A target generation device according to one aspect of the present disclosure includes a tank for containing a target substance, a heater provided at the tank, a nozzle communicating with the inside of the tank, a lid having a gas inlet port communicating with the inside of the tank, and a plurality of shielding plates that are disposed inside the tank and suppress entry of the target substance to the gas inlet port. Each of the shielding plates includes at least one non-shielding region for allowing the gas to pass through. The non-shielding regions of at least two of the shielding plates are arranged at positions in which one of the non-shielding regions of the at least two of the shielding plates is not seen into the other of the non-shielding regions of the at least two of the shielding plates.
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