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公开(公告)号：US20170238407A1
公开(公告)日：2017-08-17
申请号：US15583001
申请日：2017-05-01
Applicant: Gigaphoton Inc.
Inventor： Shinji NAGAI , Georg SOUMAGNE , Toshihiro NISHISAKA
IPC: H05G2/00
CPC classification number: H05G2/008 , G03F7/70033 , G03F7/70175 , G03F7/70916
Abstract: An extreme ultraviolet light generation device may include a chamber in which extreme ultraviolet light is generated from plasma, the plasma generated by irradiation of a target supplied in a plasma generation region inside of the chamber with laser light; a condenser mirror collecting the extreme ultraviolet light and guiding it to outside of the chamber; a first etching gas supply unit blowing an etching gas to a reflective surface of the condenser mirror and the plasma generation region; a magnet forming a magnetic field in the chamber; a port that intersects a central axis of the magnetic field and that takes in suspended substances generated in the chamber; and an ejection path that is in communication with the port and that ejects the suspended substances taken from the port to the outside of the chamber.
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2.发明申请公开(公告)号：US20240422889A1
公开(公告)日：2024-12-19
申请号：US18654475
申请日：2024-05-03
Applicant: Gigaphoton Inc. , Hiroshima University
Inventor： Takayuki SUZUKI , Atsushi UEDA , Georg SOUMAGNE , Shinichi NAMBA
Abstract: An extreme ultraviolet light generation chamber device includes a chamber including a plasma generation region in which a droplet target irradiated with laser light is turned into plasma and extreme ultraviolet light is generated, a light concentrating mirror arranged in the chamber and concentrating the extreme ultraviolet light, a gas curtain forming device injecting a gas to form a gas curtain intersecting an optical path of the extreme ultraviolet light propagating from the plasma generation region to the light concentrating mirror, an etching gas supply unit supplying an etching gas into the chamber, and a gas exhaust unit exhausting a residual gas in the chamber. Pressure in a second space that is a space on a side toward the light concentrating mirror from the gas curtain is lower than pressure in a first space that is a space on a side toward the plasma generation region from the gas curtain.
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3.发明申请公开(公告)号：US20170127505A1
公开(公告)日：2017-05-04
申请号：US15400116
申请日：2017-01-06
Applicant: Institute for Laser Technology , Gigaphoton Inc.
Inventor： Atsushi SUNAHARA , Georg SOUMAGNE , Yoshifumi UENO , Hideo HOSHINO
IPC: H05G2/00
Abstract: An extreme ultraviolet light generation system may comprise a chamber, a target supply unit configured to supply, to a predetermined region in the chamber, a target having an atomic density of 8.0×1017 atoms/cm3 or higher and 1.3×1018 atoms/cm3 or lower, and a laser apparatus configured to irradiate the predetermined region with a pulse laser beam having an energy density of 10.5 J/cm2 or higher and 52.3 J/cm2 or lower in the predetermined region.
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公开(公告)号：US20200312479A1
公开(公告)日：2020-10-01
申请号：US16820849
申请日：2020-03-17
Applicant: Gigaphoton Inc.
Inventor： Atsushi UEDA , Gota NIIMI , Georg SOUMAGNE
Abstract: An extreme ultraviolet chamber apparatus includes: a chamber; an EUV condensing mirror arranged in the chamber; a first nozzle arranged in an outer peripheral portion of the EUV condensing mirror and configured to feed a gas in a first direction along a reflective surface of the EUV condensing mirror; a second nozzle arranged in the outer peripheral portion of the EUV condensing mirror and configured to feed a gas in a second direction away from the EUV condensing mirror; and an exhaust port arranged in the chamber.
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Patent Agency Ranking
公开(公告)号：US20180103534A1
公开(公告)日：2018-04-12
申请号：US15836877
申请日：2017-12-10
Applicant: Gigaphoton Inc.
Inventor： Takashi SAITO , Yoshifumi UENO , Georg SOUMAGNE
IPC: H05G2/00
Abstract: The extreme ultraviolet light generation device includes a chamber having a first through-hole that allows a pulse laser beam to enter the chamber, a target supply unit held by the chamber and configured to output a target toward a predetermined region in the chamber, a shield member surrounding the predetermined region in the chamber and having a target path that allows the target outputted from the target supply unit to pass toward the predetermined region, and a tubular member surrounding at least a part of an upstream portion of the trajectory of the target outputted from the target supply unit toward the predetermined region, the upstream portion being upstream from the target path of the shield member.
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公开(公告)号：US20170336282A1
公开(公告)日：2017-11-23
申请号：US15672961
申请日：2017-08-09
Applicant: The University of Tokyo , GIGAPHOTON INC.
Inventor： Yohei KOBAYASHI , Hakaru MIZOGUCHI , Junichi FUJIMOTO , Katsunori ISOMOTO , Osamu WAKABAYASHI , Georg SOUMAGNE
CPC classification number: G01M11/005 , G01N21/55 , G01N2201/06113 , G01N2201/0697 , G03F7/70033 , G03F7/70175 , G03F7/70591
Abstract: A spheroidal mirror reflectivity measuring apparatus for extreme ultraviolet light may include an extreme ultraviolet light source, an optical system, and a first photosensor. The extreme ultraviolet light source may be configured to output extreme ultraviolet light to a spheroidal mirror that includes a spheroidal reflection surface. The optical system may be configured to allow the extreme ultraviolet light to travel to the spheroidal reflection surface via a first focal position of the spheroidal mirror. The first photosensor may be provided at a second focal position of the spheroidal mirror, and may be configured to detect the extreme ultraviolet light that has passed through the first focal position and then has been reflected by the spheroidal reflection surface.
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公开(公告)号：US20140021376A1
公开(公告)日：2014-01-23
申请号：US13935233
申请日：2013-07-03
Applicant: GIGAPHOTON INC.
Inventor： Hiroshi KOMORI , Yoshifumi UENO , Georg SOUMAGNE
IPC: G21K5/00
Abstract: An extreme ultra violet light source device of a laser produced plasma type, in which charged particles such as ions emitted from plasma can be efficiently ejected. The extreme ultra violet light source device includes: a target nozzle that supplies a target material; a laser oscillator that applies a laser beam to the target material supplied from the target nozzle to generate plasma; collector optics that collects extreme ultra violet light radiated from the plasma; and a magnetic field forming unit that forms an asymmetric magnetic field in a position where the laser beam is applied to the target material.
Abstract translation: 激光产生等离子体的极紫外光源装置，其中可以有效地喷射从等离子体发射的离子等带电粒子。 极紫外光源装置包括：提供目标材料的目标喷嘴; 激光振荡器，其将激光束施加到从所述目标喷嘴供给的目标材料以产生等离子体; 收集从等离子体辐射的极紫外光的收集器光学元件; 以及在将激光束施加到目标材料的位置形成非对称磁场的磁场形成单元。
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公开(公告)号：US20220141945A1
公开(公告)日：2022-05-05
申请号：US17458148
申请日：2021-08-26
Applicant: Gigaphoton Inc.
Inventor： Gouta NIIMI , Georg SOUMAGNE
Abstract: A tin trap device may include a housing including a gas inlet port into which gas containing tin flows from a chamber device, an internal space which communicates with the gas inlet port, and a gas exhaust port which exhausts the gas while communicating with the internal space; a multiple tube including a plurality of tube members, arranged on a flow path of the gas traveling to the gas exhaust port from the gas inlet port through the internal space, and having a temperature at which the tin deposited from the gas adheres to the tube member; and a gas travel direction changing member configured to change a travel direction of at least fastest gas of the gas traveling from the gas inlet port to the multiple tube.
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公开(公告)号：US20160255707A1
公开(公告)日：2016-09-01
申请号：US15151025
申请日：2016-05-10
Applicant: Gigaphoton Inc.
Inventor： Atsushi UEDA , Takayuki YABU , Osamu WAKABAYASHI , Georg SOUMAGNE , Takashi SAITO
IPC: H05G2/00
Abstract: An extreme ultraviolet light generation apparatus may include: a chamber; a target supply unit configured to output a target toward a predetermined region inside the chamber; a first gas supply unit configured to blow out gas in a first direction toward a trajectory of the target between the target supply unit and the predetermined region; and a focusing optical system configured to concentrate a pulse laser beam to the predetermined region.
Abstract translation: 极紫外光发生装置可以包括：腔室; 目标供给单元，被配置为朝向所述室内的预定区域输出目标; 第一气体供给单元，被配置为沿着朝向目标供给单元和预定区域之间的目标的轨迹的第一方向吹出气体; 以及配置成将脉冲激光束集中到所述预定区域的聚焦光学系统。
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