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1.发明申请公开(公告)号：US20220082927A1
公开(公告)日：2022-03-17
申请号：US17397554
申请日：2021-08-09
Applicant: Gigaphoton Inc.
Inventor： Yusuke HOSHINO , Yukio WATANABE , Toshihiro NISHISAKA , Atsushi UEDA , Koichiro KOGE , Takayuki OSANAI , Gouta NIIMI
Abstract: An extreme ultraviolet light generation apparatus may include a chamber, a first partition wall covering a plasma generation region in the chamber and having a first opening, an EUV light concentrating mirror located in a first space inside the chamber and outside the first partition wall and configured to concentrate extreme ultraviolet light generated in the plasma generation region and having passed through the first opening, a first gas supply port formed at the chamber and configured to supply gas to the first space, and a gas exhaust port formed in the first partition wall and configured to exhaust gas in a second space inside the first partition wall to outside of both the first partition wall and the chamber.
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公开(公告)号：US20210103118A1
公开(公告)日：2021-04-08
申请号：US17003284
申请日：2020-08-26
Applicant: Gigaphoton Inc.
Inventor： Hiroshi SOMEYA , Yukio WATANABE
Abstract: An optical apparatus may include a housing having an opened front face, an optical unit freely movable into and out of an internal space of the housing through the front face, and a positioning portion disposed on a back side of the optical unit in the internal space. A base plate of the optical unit may include first and second convex portions disposed on a base end face of the base plate. The second convex portion may be disposed at a position different from the first convex portion in a width direction of the base plate. The positioning portion may include a V block having a V groove shape at a part contacting the first convex portion, and a flat block having a flat surface shape at a part contacting the second convex portion. The optical unit may be positioned in the internal space through the contact.
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公开(公告)号：US20160187787A1
公开(公告)日：2016-06-30
申请号：US15064019
申请日：2016-03-08
Applicant: Gigaphoton Inc.
Inventor： Toshihiro NISHISAKA , Yukio WATANABE , Osamu WAKABAYASHI , Kouji KAKIZAKI , Michio SHINOZAKI
IPC: G03F7/20
CPC classification number: G03F7/70033 , G03F7/70975 , H05G2/00 , H05G2/003 , H05G2/008
Abstract: An EUV light source apparatus by which detachment of a chamber or a part of the chamber, movement to a maintenance area, and highly accurate placement relative to projection optics can be performed easily for maintenance of the EUV light source apparatus. The EUV light source apparatus is an apparatus for generating plasma by applying a laser beam to a target material within a chamber and entering EUV light radiated from the plasma into projection optics of exposure equipment, and includes a positioning mechanism for positioning the chamber or a maintenance unit of the chamber in a predetermined location where an optical axis of the collected extreme ultraviolet light and an optical axis of the projection optics of the exposure equipment are aligned, and a movement mechanism for moving the chamber or the maintenance unit of the chamber between the predetermined location and a maintenance area.
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公开(公告)号：US20130277452A1
公开(公告)日：2013-10-24
申请号：US13925727
申请日：2013-06-24
Applicant: GIGAPHOTON INC.
Inventor： Takayuki YABU , Kouji KAKIZAKI , Yukio WATANABE , Osamu WAKABAYASHI
IPC: G03F7/20
CPC classification number: G03F7/70033 , H05G2/005 , H05G2/006 , H05G2/008
Abstract: A chamber apparatus used with a laser apparatus may include: a chamber provided with at least one inlet for introducing thereinto a laser beam outputted from the laser apparatus; a target supply unit provided to the chamber for supplying a target material to a predetermined region in the chamber; a recovery control unit for instructing the target supply unit to execute recovery operation if a predetermined condition is met; a recovery unit for executing the recovery operation in response to the instruction from the recovery control unit; and a position measuring unit for measuring a position of the target material supplied from the target supply unit into the chamber.
Abstract translation: 与激光装置一起使用的室装置可以包括：设置有至少一个入口的室，用于将从激光装置输出的激光束引入其中; 目标供给单元，其设置在所述室中，用于将目标材料供应到所述室中的预定区域; 恢复控制单元，用于在满足预定条件时指示目标供应单元执行恢复操作; 恢复单元，用于响应于来自恢复控制单元的指令执行恢复操作; 以及位置测量单元，用于测量从目标供应单元供应到室中的目标材料的位置。
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公开(公告)号：US20130206863A1
公开(公告)日：2013-08-15
申请号：US13675790
申请日：2012-11-13
Applicant: GIGAPHOTON INC.
Inventor： Takayuki YABU , Yukio WATANABE , Toshihiro NISHISAKA , Hiroshi SOMEYA , Osamu WAKABAYASHI
IPC: B05B17/06
CPC classification number: B05B17/0607 , B05B12/082
Abstract: A target supply device includes a target supply device body including a nozzle having a through-hole through which a target material is discharged, a piezoelectric member having first and second surfaces and connected to the target supply device body at the first surface, the piezoelectric member being configured such that a distance between the first and second surfaces changes in according with an externally supplied electric signal, an elastic member having first and second ends and connected to the second surface of the piezoelectric member at the first end, the elastic member being configured such that a distance between the first and second ends extends or contract in accordance with an externally applied force, and a regulating member configured to regulate a distance between the second end of the elastic member and the target supply device body.
Abstract translation: 目标供给装置包括目标供给装置主体，具有喷嘴，喷嘴具有目标材料排出的通孔，具有第一表面和第二表面并在第一表面连接到目标供给装置主体的压电部件，压电部件 被构造为使得第一和第二表面之间的距离根据外部供应的电信号而变化，弹性构件具有第一端和第二端并且在第一端处连接到压电构件的第二表面，弹性构件被构造成 使得第一和第二端之间的距离根据外部施加的力而延伸或收缩;以及调节构件，其构造成调节弹性构件的第二端和目标供给装置主体之间的距离。
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Patent Agency Ranking
公开(公告)号：US20160192469A1
公开(公告)日：2016-06-30
申请号：US14984458
申请日：2015-12-30
Applicant: GIGAPHOTON INC.
Inventor： Yukio WATANABE , Miwa IGARASHI , Masato MORIYA , Hiroaki NAKARAI
IPC: H05G2/00
CPC classification number: H05G2/008 , G03F7/70033 , H05G2/003
Abstract: An apparatus for generating extreme ultraviolet light may include: a chamber having an opening through which a laser beam is introduced into the chamber; a reference member on which the chamber is mounted; a target supply unit for supplying a target material to be irradiated by the laser beam to a predetermined region inside the chamber; a laser beam focusing optical system for focusing the laser beam in the predetermined region inside the chamber to turn the target material into plasma; and a collector mirror for collecting the extreme ultraviolet light emitted from the plasma.
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公开(公告)号：US20160315439A1
公开(公告)日：2016-10-27
申请号：US15201769
申请日：2016-07-05
Applicant: Gigaphoton Inc.
Inventor： Toru SUZUKI , Yukio WATANABE , Miwa IGARASHI , Osamu WAKABAYASHI
CPC classification number: H01S3/0071 , G02B7/1815 , G02B7/182 , G02B26/06 , G02B27/144 , H01S3/005 , H01S3/1003 , H01S3/2232 , H01S3/2316 , H05G2/003 , H05G2/008
Abstract: A mirror device may include: an optical element configured to reflect part of a laser beam and transmit the other part of the laser beam therethrough; and a holder in surface contact with the optical element to hold the optical element. A flatness of a contact surface of the holder in contact with the optical element may be equal to or smaller than a flatness of the optical element.
Abstract translation: 反射镜装置可以包括：光学元件，被配置为反射激光束的一部分并且透射激光束的另一部分; 以及与光学元件表面接触以保持光学元件的保持器。 与光学元件接触的保持器的接触表面的平坦度可以等于或小于光学元件的平坦度。
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公开(公告)号：US20130294470A1
公开(公告)日：2013-11-07
申请号：US13936819
申请日：2013-07-08
Applicant: GIGAPHOTON INC.
Inventor： Yukio WATANABE , Hideyuki HAYASHI , Kouji KAKIZAKI , Michio SHINOZAKI , Hideo HOSHINO
CPC classification number: H01S3/0407 , F25B2400/06 , F25D17/02 , H01S3/03 , H01S3/041 , H01S3/22
Abstract: A temperature controller for a gas laser which controls temperatures of a plurality of temperature-controlled apparatuses including a first temperature-controlled portion requiring a high-precision temperature-control and a second temperature-controlled portion requiring a low-precision temperature-control as compared with the first temperature-controlled portion and allowing a temperature-control with a low or high temperature as compared with the first temperature-controlled portion, comprises a first temperature control portion generating a cooling agent or a heating agent for adjusting a temperature of each first temperature-controlled portion, a second temperature control portion generating a cooling agent or a heating agent for adjusting a temperature of each second temperature-controlled portion, a first piping system connecting the first temperature control portion and each first temperature-controlled portion in parallel, and a second piping system connecting the second temperature control portion and each second temperature-controlled portion in parallel.
Abstract translation: 一种用于气体激光器的温度控制器，其控制多个温度控制装置的温度，包括需要高精度温度控制的第一温度控制部分和需要低精度温度控制的第二温度控制部分 与第一温度控制部分相比，第一温度控制部分与低温或高温的温度控制相比，包括产生冷却剂的第一温度控制部分或用于调节每个第一温度控制部分的温度的加热剂 温度控制部分，产生冷却剂的第二温度控制部分或用于调节每个第二温度控制部分的温度的加热剂，将第一温度控制部分和第一温度控制部分并联连接的第一管道系统， 以及连接第二回火的第二管道系统 所述控制部分和每个第二温度控制部分并联。
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公开(公告)号：US20130294469A1
公开(公告)日：2013-11-07
申请号：US13936734
申请日：2013-07-08
Applicant: Gigaphoton Inc.
Inventor： Yukio WATANABE , Hideyuki HAYASHI , Kouji KAKIZAKI , Michio SHINOZAKI , Hideo HOSHINO
CPC classification number: H01S3/0407 , F25B2400/06 , F25D17/02 , H01S3/03 , H01S3/041 , H01S3/22
Abstract: A temperature controller for a gas laser which controls temperatures of a plurality of temperature-controlled apparatuses including a first temperature-controlled portion requiring a high-precision temperature-control and a second temperature-controlled portion requiring a low-precision temperature-control as compared with the first temperature-controlled portion and allowing a temperature-control with a low or high temperature as compared with the first temperature-controlled portion, comprises a first temperature control portion generating a cooling agent or a heating agent for adjusting a temperature of each first temperature-controlled portion, a second temperature control portion generating a cooling agent or a heating agent for adjusting a temperature of each second temperature-controlled portion, a first piping system connecting the first temperature control portion and each first temperature-controlled portion in parallel, and a second piping system connecting the second temperature control portion and each second temperature-controlled portion in parallel.
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公开(公告)号：US20180341077A1
公开(公告)日：2018-11-29
申请号：US16055243
申请日：2018-08-06
Applicant: Gigaphoton Inc.
Inventor： Yukio WATANABE , Hiroshi SOMEYA , Yuki KAWASHIMA , Yuto TANAKA
CPC classification number: G02B6/4296 , G03F7/70033 , G03F7/70991 , H05G2/008
Abstract: An optical unit and an optical path tube are easily connected. A structure of connection between a side surface (1a) of the optical unit and the optical path tube includes: an extensible tube (72) constituting at least a part of the optical path tube, the extensible tube being extensible in a tube axis direction; a flange (26) attached to one end of the optical path tube; a flange receiving part (20) provided on the optical unit, the flange receiving part (20) receiving a front surface (26a) of the flange (26), the front surface (26a) of the flange (26) being an end surface on an open side; and a biasing part (23, 72) configured to bias at least a part of the optical path tube in a direction in which the extensible tube (72) extends.
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