公开(公告)号：US20210029811A1

公开(公告)日：2021-01-28

申请号：US16894504

申请日：2020-06-05

Applicant: Gigaphoton Inc.

Inventor： Kouichiro KOUGE ,  Yusuke HOSHINO ,  Toshihiro NISHISAKA ,  Takashi OKADA

IPC: H05G2/00 ,  G03F7/20

Abstract: An EUV chamber apparatus includes: a chamber; a target generation unit configured to output a target toward a predetermined region inside the chamber; a gas nozzle through which gas is supplied into the chamber; and a shroud including a first flow path through which a first cooling medium circulates and surrounding at least part of the trajectory of the target inside the chamber.

公开(公告)号：US20230126340A1

公开(公告)日：2023-04-27

申请号：US17823049

申请日：2022-08-29

Applicant: Gigaphoton Inc.

Inventor： Yoshiyuki HONDA ,  Hirokazu HOSODA ,  Kouichiro KOUGE

IPC: H05G2/00

Abstract: An extreme ultraviolet light generation method includes a target supply step of outputting a droplet target into a chamber, a prepulse laser light irradiation step of irradiating the droplet target with prepulse laser light to generate a diffusion target, and a main pulse laser light irradiation step of irradiating the diffusion target with main pulse laser light to generate extreme ultraviolet light. Here, the main pulse laser light includes first main pulse laser light and second main pulse laser light, and in the main pulse laser light irradiation step, the diffusion target is irradiated with the first main pulse laser light having higher energy density at a central portion than at an outer peripheral portion and the second main pulse laser light having higher energy density at the outer peripheral portion than at the central portion.

公开(公告)号：US20190293488A1

公开(公告)日：2019-09-26

申请号：US16435693

申请日：2019-06-10

Applicant: Gigaphoton Inc.

Inventor： Kouichiro KOUGE ,  Tatsuya YANAGIDA

IPC: G01J1/42 ,  G03F7/20 ,  G01J3/44 ,  G01J3/02 ,  H05G2/00

Abstract: A Thomson scattering measurement system according to the present disclosure includes: a transfer optical system provided on an optical path of a slit light beam group generated by division through a slit array and configured to transfer the slit light beam group to a plurality of transfer image groups separated from each other; and a second slit provided on an optical path of light from the transfer image groups and configured to selectively allow light from a plurality of transfer images positioned on a straight line extending in a direction corresponding to a first direction to pass through the second slit, the transfer images corresponding to slit light beams at positions different from each other in a second direction in the slit light beam group among transfer images included in the transfer image groups.