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1.发明申请公开(公告)号：US20200209444A1
公开(公告)日：2020-07-02
申请号：US16814384
申请日：2020-03-10
Applicant: Gigaphoton Inc.
Inventor： Osamu WAKABAYASHI , Yoshiyuki HONDA
Abstract: A mirror for extreme ultraviolet light includes: a substrate (41); a multilayer film (42) provided on the substrate and configured to reflect extreme ultraviolet light; and a capping layer (53) provided on the multilayer film, and the capping layer includes a first layer (61) containing an oxide of a metal, and a second layer (62) arranged between the first layer and the multilayer film and containing at least one of a boride of the metal and a nitride of the metal.
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公开(公告)号：US20220035249A1
公开(公告)日：2022-02-03
申请号：US17337560
申请日：2021-06-03
Applicant: Gigaphoton Inc.
Inventor： Takanari KOBAYASHI , Hirokazu HOSODA , Yoshiyuki HONDA
IPC: G03F7/20 , H05G2/00 , H01L21/027
Abstract: An extreme ultraviolet light generation system may include a laser system emitting first prepulse laser light, second prepulse laser light, and main pulse laser light in this order; a chamber including at least one window for introducing, into the chamber, the first prepulse laser light, the second prepulse laser light, and the main pulse laser light; a target supply unit supplying a target to a predetermined region in the chamber; and a processor controlling the laser system to irradiate the target with the first prepulse laser light, irradiate the target, having been irradiated with the first prepulse laser light, with the second prepulse laser light having a pulse time width longer than a pulse time width of the main pulse laser light, and irradiate the target, having been irradiated with the second prepulse laser light, with the main pulse laser light temporally separated from the second prepulse laser light.
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3.发明公开公开(公告)号：US20240160107A1
公开(公告)日：2024-05-16
申请号：US18477089
申请日：2023-09-28
Applicant: Gigaphoton Inc.
Inventor： Yoshiyuki HONDA
CPC classification number: G03F7/70033 , G21K1/06 , H05G2/003 , H05G2/008
Abstract: An extreme ultraviolet light generation chamber device includes a chamber generating, at an internal space thereof, extreme ultraviolet light by irradiating a droplet target of tin with laser light to turn the droplet target into plasma; a target supply unit supplying the droplet target into the internal space; an extreme ultraviolet light concentrating mirror arranged in the internal space and including a reflection surface which reflects the extreme ultraviolet light; a first etching gas supply unit supplying an etching gas containing a hydrogen gas to the reflection surface having a flow velocity at the reflection surface variable; a data generation unit generating data reflecting reflectance of the extreme ultraviolet concentrating mirror; and a processor controlling the first etching gas supply unit to decrease the flow velocity when the data indicates that an amount of decrease in the reflectance is equal to or more than a reference value.
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4.发明公开公开(公告)号：US20230292426A1
公开(公告)日：2023-09-14
申请号：US18052129
申请日：2022-11-02
Applicant: Gigaphoton Inc.
Inventor： Yoshiyuki HONDA
CPC classification number: H05G2/008 , H05G2/003 , G21K1/067 , G03F7/70033 , G03F7/70191 , G03F7/70533
Abstract: An extreme ultraviolet light generation apparatus includes a target supply unit configured to output a droplet target into a chamber device, a prepulse laser light irradiation system configured to irradiate the droplet target with prepulse laser light having linear polarization to generate a diffusion target, and a main pulse laser light irradiation system configured to irradiate the diffusion target with main pulse laser light to generate extreme ultraviolet light. Here, a cross section perpendicular to an optical axis of the main pulse laser light when being radiated to the diffusion target having a shape longer in a polarization direction of the prepulse laser light when being radiated to the droplet target than in directions other than the polarization direction.
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公开(公告)号：US20200077501A1
公开(公告)日：2020-03-05
申请号：US16677882
申请日：2019-11-08
Applicant: Gigaphoton Inc.
Inventor： Hiroaki TOMURO , Shinji NAGAI , Yoshiyuki HONDA
Abstract: An extreme ultraviolet light generation apparatus includes: a chamber in which plasma is generated from a target substance at a condensation position of a laser beam; a condenser mirror configured to condense extreme ultraviolet light generated by the plasma; and a magnetic field generation unit configured to generate a magnetic field that converges a charged particle generated by the plasma toward a wall of the chamber, the condenser mirror includes a substrate, a reflective layer, and a protective layer provided on the reflective layer, the protective layer has layer thickness distribution in which a layer thickness of the protective layer from a reflective layer surface changes, and the layer thickness of the protective layer is maximum at a position on a line (CL) on which a plane passing through a magnetic field axis of the magnetic field generation unit and a central axis (CA) of the condenser mirror intersects the reflective layer surface (62F).
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Patent Agency Ranking
公开(公告)号：US20230126340A1
公开(公告)日：2023-04-27
申请号：US17823049
申请日：2022-08-29
Applicant: Gigaphoton Inc.
Inventor： Yoshiyuki HONDA , Hirokazu HOSODA , Kouichiro KOUGE
IPC: H05G2/00
Abstract: An extreme ultraviolet light generation method includes a target supply step of outputting a droplet target into a chamber, a prepulse laser light irradiation step of irradiating the droplet target with prepulse laser light to generate a diffusion target, and a main pulse laser light irradiation step of irradiating the diffusion target with main pulse laser light to generate extreme ultraviolet light. Here, the main pulse laser light includes first main pulse laser light and second main pulse laser light, and in the main pulse laser light irradiation step, the diffusion target is irradiated with the first main pulse laser light having higher energy density at a central portion than at an outer peripheral portion and the second main pulse laser light having higher energy density at the outer peripheral portion than at the central portion.
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7.发明申请公开(公告)号：US20200209759A1
公开(公告)日：2020-07-02
申请号：US16814700
申请日：2020-03-10
Applicant: Gigaphoton Inc.
Inventor： Osamu WAKABAYASHI , Yoshiyuki HONDA
IPC: G03F7/20
Abstract: A mirror for extreme ultraviolet light includes: a substrate; a multilayer film provided on the substrate and configured to reflect extreme ultraviolet light; and a capping layer provided on the multilayer film, and the capping layer includes a photocatalyst layer containing a photocatalyst, a promotor layer arranged between the photocatalyst layer and the multilayer film and containing a metal for supporting a photocatalytic ability of the photocatalyst contained in the photocatalyst layer, and a barrier layer arranged between the promotor layer and the multilayer film and configured to prevent diffusion of the metal into the multilayer film.
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8.发明申请公开(公告)号：US20200209755A1
公开(公告)日：2020-07-02
申请号：US16814584
申请日：2020-03-10
Applicant: Gigaphoton Inc.
Inventor： Yoshiyuki HONDA , Osamu WAKABAYASHI
Abstract: A mirror for extreme ultraviolet light includes: a substrate (41); a multilayer film (42) provided on the substrate and configured to reflect extreme ultraviolet light; and a capping layer (53) provided on the multilayer film, and the capping layer includes a first layer (61) containing a compound of a metal having lower electronegativity than Ti and a non-metal and having a lower density than TiO2, and a second layer (62) arranged between the first layer and the multilayer film and having a higher density than the first layer.
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9.发明申请公开(公告)号：US20250126697A1
公开(公告)日：2025-04-17
申请号：US18882498
申请日：2024-09-11
Applicant: Gigaphoton Inc.
Inventor： Yoshiyuki HONDA , Hirokazu HOSODA , Tomoyoshi TOIDA
Abstract: An extreme ultraviolet light generation apparatus includes a chamber, a target supply unit configured to supply a target into the chamber, a prepulse laser configured to generate a diffusion target having a Gaussian distribution shape convex toward a travel direction of prepulse laser light by irradiating the target with the prepulse laser light, and a main pulse laser configured to generate extreme ultraviolet light by irradiating the diffusion target with main pulse laser light having an intensity distribution of a Gaussian distribution shape.
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10.发明公开公开(公告)号：US20230309211A1
公开(公告)日：2023-09-28
申请号：US18163529
申请日：2023-02-02
Applicant: Gigaphoton Inc.
Inventor： Yoshiyuki HONDA
CPC classification number: H05G2/008 , G03F7/70033 , H05G2/005
Abstract: An extreme ultraviolet light generation apparatus includes a chamber including a plasma generation region; a target supply unit configured to supply a target to the plasma generation region; a laser light concentrating mirror configured to concentrate pulse laser light on the plasma generation region; and an EUV light concentrating mirror having a reflection surface reflecting extreme ultraviolet light radiated from the plasma generation region, and arranged such that the reflection surface falls within an angle range in which ion energy is less than an average value of the ion energy in a spatial distribution of the ion energy of ions diffused from the plasma generation region at positions of a predetermined distance from the plasma generation region.
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