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    GAS LASER APPARATUS
    1.
    发明申请
    GAS LASER APPARATUS 审中-公开

    公开(公告)号：US20190074655A1

    公开(公告)日：2019-03-07

    申请号：US16178382

    申请日：2018-11-01

    Applicant: Gigaphoton Inc.

    Inventor： Natsushi SUZUKI ,  Osamu WAKABAYASHI ,  Hiroaki TSUSHIMA ,  Masanori YASHIRO

    IPC: H01S3/036 ,  B01D53/04 ,  H01S3/104 ,  H01S3/225 ,  B01D53/34 ,  B01D53/82 ,  B01D53/86 ,  B01D53/68

    Abstract: A gas laser apparatus may include: a laser chamber connected through a first control valve to a first laser gas supply source that supplies a first laser gas containing a halogen gas and connected through a second control valve to a second laser gas supply source that supplies a second laser gas having a lower halogen gas concentration than the first laser gas; a purification column that removes at least a part of the halogen gas and a halogen compound from at least a part of a gas exhausted from the laser chamber; a booster pump, connected through a third control valve to the laser chamber, which raises a pressure of a gas having passed through the purification column to a gas pressure that is higher than an operating gas pressure of the laser chamber; and a controller that calculates, on a basis of a first amount of a gas supplied from the booster pump through the third control valve to the laser chamber, a second amount of the first laser gas that is to be supplied to the laser chamber and controls the first control valve on a basis of a result of the calculation of the second amount.

    GAS LASER APPARATUS
    2.
    发明申请
    GAS LASER APPARATUS 有权
    气体激光装置

    公开(公告)号：US20160248215A1

    公开(公告)日：2016-08-25

    申请号：US15145016

    申请日：2016-05-03

    Applicant: Gigaphoton Inc.

    Inventor： Natsushi SUZUKI ,  Osamu WAKABAYASHI ,  Hiroaki TSUSHIMA ,  Masanori YASHIRO

    IPC: H01S3/036 ,  H01S3/225 ,  B01D53/04 ,  H01S3/104

    CPC classification number: H01S3/036 ,  B01D53/0446 ,  B01D53/346 ,  B01D53/685 ,  B01D53/82 ,  B01D53/86 ,  B01D2251/404 ,  B01D2251/602 ,  B01D2253/108 ,  B01D2255/20753 ,  B01D2255/20761 ,  B01D2257/2027 ,  B01D2258/0216 ,  B01D2259/40003 ,  H01S3/104 ,  H01S3/225

    Abstract: A gas laser apparatus may include: a laser chamber connected through a first control valve to a first laser gas supply source that supplies a first laser gas containing a halogen gas and connected through a second control valve to a second laser gas supply source that supplies a second laser gas having a lower halogen gas concentration than the first laser gas; a purification column that removes at least a part of the halogen gas and a halogen compound from at least a part of a gas exhausted from the laser chamber; a booster pump, connected through a third control valve to the laser chamber, which raises a pressure of a gas having passed through the purification column to a gas pressure that is higher than an operating gas pressure of the laser chamber; and a controller that calculates, on a basis of a first amount of a gas supplied from the booster pump through the third control valve to the laser chamber, a second amount of the first laser gas that is to be supplied to the laser chamber and controls the first control valve on a basis of a result of the calculation of the second amount.

    Abstract translation: 气体激光装置可以包括：激光室，其通过第一控制阀连接到第一激光气体供应源，第一激光气体供应源提供含有卤素气体的第一激光气体，并通过第二控制阀连接到第二激光气体供应源， 具有比第一激光气体低的卤素气体浓度的第二激光气体; 净化塔，其从至少一部分从激光室排出的气体中除去至少一部分卤素气体和卤素化合物; 增压泵，其通过第三控制阀连接到激光室，其将通过净化塔的气体的压力升高到高于激光室的工作气体压力的气体压力; 以及控制器，其基于从所述增压泵通过所述第三控制阀向所述激光室供给的第一量的气体计算第二量的所述第一激光气体，所述第一激光气体将被供给到所述激光室并控制 基于计算第二量的结果的第一控制阀。

    LASER GAS REGENERATION SYSTEM AND LASER SYSTEM
    3.
    发明申请
    LASER GAS REGENERATION SYSTEM AND LASER SYSTEM 审中-公开

    公开(公告)号：US20190237928A1

    公开(公告)日：2019-08-01

    申请号：US16375591

    申请日：2019-04-04

    Applicant: Gigaphoton Inc.

    Inventor： Masanori YASHIRO ,  Hiroaki TSUSHIMA ,  Osamu WAKABAYASHI

    IPC: H01S3/036 ,  H01S3/097 ,  H01S3/225 ,  H01S3/104 ,  C01B7/20

    CPC classification number: H01S3/036 ,  C01B7/20 ,  H01S3/03 ,  H01S3/09705 ,  H01S3/104 ,  H01S3/2258

    Abstract: A laser gas regeneration system for an excimer laser includes a first pipe capable of supplying a laser chamber with a first laser gas, a second pipe capable of supplying the laser chamber with a second laser gas having a halogen gas concentration higher than that of the first laser gas, a third pipe allowing a gas exhausted from the laser chamber to pass therethrough, a gas refiner that refines the gas having passed through the third pipe, a branch that causes the refined gas to divide and flow into a fourth pipe and a fifth pipe, a first regenerated gas supplier that supplies the first pipe with a gas having divided and flowed into the fourth pipe, and a second regenerated gas supplier that adds a halogen gas to a gas having divided and flowed into the fifth pipe and supplies the second pipe with the halogen-added gas.

    GAS LASER APPARATUS
    5.
    发明申请
    GAS LASER APPARATUS 审中-公开

    公开(公告)号：US20190081450A1

    公开(公告)日：2019-03-14

    申请号：US16178363

    申请日：2018-11-01

    Applicant: Gigaphoton Inc.

    Inventor： Natsushi SUZUKI ,  Osamu WAKABAYASHI ,  Hiroaki TSUSHIMA ,  Masanori YASHIRO

    IPC: H01S3/036 ,  B01D53/04 ,  H01S3/104 ,  H01S3/225 ,  B01D53/34 ,  B01D53/82 ,  B01D53/86 ,  B01D53/68

    Abstract: A gas laser apparatus may include: a laser chamber connected through a first control valve to a first laser gas supply source that supplies a first laser gas containing a halogen gas and connected through a second control valve to a second laser gas supply source that supplies a second laser gas having a lower halogen gas concentration than the first laser gas; a purification column that removes at least a part of the halogen gas and a halogen compound from at least a part of a gas exhausted from the laser chamber; a booster pump, connected through a third control valve to the laser chamber, which raises a pressure of a gas having passed through the purification column to a gas pressure that is higher than an operating gas pressure of the laser chamber; and a controller that calculates, on a basis of a first amount of a gas supplied from the booster pump through the third control valve to the laser chamber, a second amount of the first laser gas that is to be supplied to the laser chamber and controls the first control valve on a basis of a result of the calculation of the second amount.

    GAS LASER APPARATUS
    6.
    发明申请
    GAS LASER APPARATUS 审中-公开

    公开(公告)号：US20190081449A1

    公开(公告)日：2019-03-14

    申请号：US16178351

    申请日：2018-11-01

    Applicant: Gigaphoton Inc.

    Inventor： Natsushi SUZUKI ,  Osamu WAKABAYASHI ,  Hiroaki TSUSHIMA ,  Masanori YASHIRO

    IPC: H01S3/036 ,  B01D53/04 ,  H01S3/104 ,  H01S3/225 ,  B01D53/34 ,  B01D53/82 ,  B01D53/86 ,  B01D53/68

    Abstract: A gas laser apparatus may include: a laser chamber connected through a first control valve to a first laser gas supply source that supplies a first laser gas containing a halogen gas and connected through a second control valve to a second laser gas supply source that supplies a second laser gas having a lower halogen gas concentration than the first laser gas; a purification column that removes at least a part of the halogen gas and a halogen compound from at least a part of a gas exhausted from the laser chamber; a booster pump, connected through a third control valve to the laser chamber, which raises a pressure of a gas having passed through the purification column to a gas pressure that is higher than an operating gas pressure of the laser chamber; and a controller that calculates, on a basis of a first amount of a gas supplied from the booster pump through the third control valve to the laser chamber, a second amount of the first laser gas that is to be supplied to the laser chamber and controls the first control valve on a basis of a result of the calculation of the second amount.

    GAS LASER APPARATUS
    8.
    发明申请
    GAS LASER APPARATUS 审中-公开

    公开(公告)号：US20200244029A1

    公开(公告)日：2020-07-30

    申请号：US16853489

    申请日：2020-04-20

    Applicant: Gigaphoton Inc.

    Inventor： Natsushi SUZUKI ,  Osamu WAKABAYASHI ,  Hiroaki TSUSHIMA ,  Masanori YASHIRO

    IPC: H01S3/036 ,  H01S3/104 ,  H01S3/225 ,  B01D53/34 ,  B01D53/82 ,  H01S3/23 ,  B01D53/04 ,  B01D53/68 ,  B01D53/86

    Abstract: A gas laser apparatus may include: a laser chamber connected through a first control valve to a first laser gas supply source that supplies a first laser gas containing a halogen gas; a purification column that removes at least a part of the halogen gas and a halogen compound from at least a part of a gas exhausted from the laser chamber; a booster pump; and a controller that calculates, on a basis of a first amount of a gas supplied from the booster pump to the laser chamber, a second amount of the first laser gas that is to be supplied to the laser chamber and controls the first control valve on a basis of a result of the calculation of the second amount.

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