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公开(公告)号：US20150249312A1
公开(公告)日：2015-09-03
申请号：US14694743
申请日：2015-04-23
Applicant: GIGAPHOTON INC.
Inventor： Hiroaki TSUSHIMA , Hakaru MIZOGUCHI , Junichi FUJIMOTO , Hiroaki NAKARAI , Natsushi SUZUKI
CPC classification number: H01S3/036 , F16C19/06 , F16C32/0402 , F16C32/0406 , F16C33/6696 , F16C2204/02 , F16C2204/10 , F16C2204/52 , F16C2240/40 , F16C2360/46 , H01S3/038 , H01S3/097 , H01S3/0971 , H01S3/104 , H01S3/1055 , H01S3/134 , H01S3/2232 , H01S3/225 , H01S3/2251 , H01S3/2256
Abstract: There is provided a laser chamber housing a pair of discharge electrodes and a gas circulation fun, the laser chamber including: a magnetic bearing configured to support a shaft of the gas circulation fan, with the shaft being in non-contact with the magnetic bearing; and a touchdown bearing configured to operate as a bearing when the magnetic bearing is uncontrollable, the touchdown bearing being provided with solid lubricant configured of one or more of an Au plating layer, a Ni-containing plating layer, and a Cu plating layer.
Abstract translation: 提供了容纳一对放电电极和气体循环功能的激光室，所述激光室包括：支撑所述气体循环风扇的轴的磁性轴承，所述轴与所述磁性轴承不接触; 以及触控轴承，其构造为当所述磁性轴承不受控制时作为轴承进行操作，所述触地轴承设置有由Au镀层，含Ni镀层和Cu镀层中的一种或多种构成的固体润滑剂。
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公开(公告)号：US20200244029A1
公开(公告)日：2020-07-30
申请号：US16853489
申请日：2020-04-20
Applicant: Gigaphoton Inc.
Inventor： Natsushi SUZUKI , Osamu WAKABAYASHI , Hiroaki TSUSHIMA , Masanori YASHIRO
IPC: H01S3/036 , H01S3/104 , H01S3/225 , B01D53/34 , B01D53/82 , H01S3/23 , B01D53/04 , B01D53/68 , B01D53/86
Abstract: A gas laser apparatus may include: a laser chamber connected through a first control valve to a first laser gas supply source that supplies a first laser gas containing a halogen gas; a purification column that removes at least a part of the halogen gas and a halogen compound from at least a part of a gas exhausted from the laser chamber; a booster pump; and a controller that calculates, on a basis of a first amount of a gas supplied from the booster pump to the laser chamber, a second amount of the first laser gas that is to be supplied to the laser chamber and controls the first control valve on a basis of a result of the calculation of the second amount.
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公开(公告)号：US20180191122A1
公开(公告)日：2018-07-05
申请号：US15910689
申请日：2018-03-02
Applicant: Gigaphoton Inc.
Inventor： Natsushi SUZUKI , Masanori YASHIRO , Osamu WAKABAYASHI
CPC classification number: H01S3/036 , B01D53/04 , B01D53/685 , B01D2251/404 , B01D2251/602 , B01D2251/604 , B01D2253/102 , B01D2253/108 , B01D2255/20753 , B01D2255/20761 , B01D2255/50 , B01D2256/18 , B01D2257/102 , B01D2257/104 , B01D2257/11 , B01D2257/2027 , B01D2257/204 , B01D2257/502 , B01D2257/504 , B01D2257/80 , B01D2258/0216 , H01S3/08004 , H01S3/08009 , H01S3/0971 , H01S3/1024 , H01S3/104 , H01S3/134 , H01S3/2207 , H01S3/2232 , H01S3/225 , H01S3/2251 , Y02C10/08
Abstract: A laser gas purifying system is configured to purify emission gas emitted from an ArF excimer laser apparatus using laser gas including xenon gas and to supply the purified gas to the ArF excimer laser apparatus. The laser gas purifying system comprises a xenon trap configured to reduce xenon gas concentration in the emission gas, and a xenon-adding unit configured to add xenon gas to the emission gas passed through the xenon trap.
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公开(公告)号：US20250100076A1
公开(公告)日：2025-03-27
申请号：US18975840
申请日：2024-12-10
Applicant: Gigaphoton Inc.
Inventor： Natsushi SUZUKI
IPC: B23K26/12 , B23K26/70 , B23K101/36
Abstract: A laser apparatus includes a laser chamber connected to a gas circulating system including a merging pipe where exhaust gases exhausted from multiple laser apparatuses merge with each other, and configured to select one of a fresh gas containing xenon and a circulating gas flowing through the merging pipe and supply the multiple laser apparatuses with the selected gas; an exhaust pipe which is connected to and between the laser chamber and the merging pipe, and through which the exhaust gas exhausted from the laser chamber flows toward the merging pipe; a fluorine trap connected to a halfway point of the exhaust pipe and configured to remove fluorine from the exhaust gas; and a xenon adder connected to a halfway point of the exhaust pipe and configured to add an additive gas having a xenon concentration higher than a xenon concentration in the fresh gas to the exhaust gas.
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公开(公告)号：US20190074655A1
公开(公告)日：2019-03-07
申请号：US16178382
申请日：2018-11-01
Applicant: Gigaphoton Inc.
Inventor： Natsushi SUZUKI , Osamu WAKABAYASHI , Hiroaki TSUSHIMA , Masanori YASHIRO
Abstract: A gas laser apparatus may include: a laser chamber connected through a first control valve to a first laser gas supply source that supplies a first laser gas containing a halogen gas and connected through a second control valve to a second laser gas supply source that supplies a second laser gas having a lower halogen gas concentration than the first laser gas; a purification column that removes at least a part of the halogen gas and a halogen compound from at least a part of a gas exhausted from the laser chamber; a booster pump, connected through a third control valve to the laser chamber, which raises a pressure of a gas having passed through the purification column to a gas pressure that is higher than an operating gas pressure of the laser chamber; and a controller that calculates, on a basis of a first amount of a gas supplied from the booster pump through the third control valve to the laser chamber, a second amount of the first laser gas that is to be supplied to the laser chamber and controls the first control valve on a basis of a result of the calculation of the second amount.
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Patent Agency Ranking
公开(公告)号：US20160248215A1
公开(公告)日：2016-08-25
申请号：US15145016
申请日：2016-05-03
Applicant: Gigaphoton Inc.
Inventor： Natsushi SUZUKI , Osamu WAKABAYASHI , Hiroaki TSUSHIMA , Masanori YASHIRO
CPC classification number: H01S3/036 , B01D53/0446 , B01D53/346 , B01D53/685 , B01D53/82 , B01D53/86 , B01D2251/404 , B01D2251/602 , B01D2253/108 , B01D2255/20753 , B01D2255/20761 , B01D2257/2027 , B01D2258/0216 , B01D2259/40003 , H01S3/104 , H01S3/225
Abstract: A gas laser apparatus may include: a laser chamber connected through a first control valve to a first laser gas supply source that supplies a first laser gas containing a halogen gas and connected through a second control valve to a second laser gas supply source that supplies a second laser gas having a lower halogen gas concentration than the first laser gas; a purification column that removes at least a part of the halogen gas and a halogen compound from at least a part of a gas exhausted from the laser chamber; a booster pump, connected through a third control valve to the laser chamber, which raises a pressure of a gas having passed through the purification column to a gas pressure that is higher than an operating gas pressure of the laser chamber; and a controller that calculates, on a basis of a first amount of a gas supplied from the booster pump through the third control valve to the laser chamber, a second amount of the first laser gas that is to be supplied to the laser chamber and controls the first control valve on a basis of a result of the calculation of the second amount.
Abstract translation: 气体激光装置可以包括：激光室，其通过第一控制阀连接到第一激光气体供应源，第一激光气体供应源提供含有卤素气体的第一激光气体，并通过第二控制阀连接到第二激光气体供应源， 具有比第一激光气体低的卤素气体浓度的第二激光气体; 净化塔，其从至少一部分从激光室排出的气体中除去至少一部分卤素气体和卤素化合物; 增压泵，其通过第三控制阀连接到激光室，其将通过净化塔的气体的压力升高到高于激光室的工作气体压力的气体压力; 以及控制器，其基于从所述增压泵通过所述第三控制阀向所述激光室供给的第一量的气体计算第二量的所述第一激光气体，所述第一激光气体将被供给到所述激光室并控制 基于计算第二量的结果的第一控制阀。
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公开(公告)号：US20190081450A1
公开(公告)日：2019-03-14
申请号：US16178363
申请日：2018-11-01
Applicant: Gigaphoton Inc.
Inventor： Natsushi SUZUKI , Osamu WAKABAYASHI , Hiroaki TSUSHIMA , Masanori YASHIRO
Abstract: A gas laser apparatus may include: a laser chamber connected through a first control valve to a first laser gas supply source that supplies a first laser gas containing a halogen gas and connected through a second control valve to a second laser gas supply source that supplies a second laser gas having a lower halogen gas concentration than the first laser gas; a purification column that removes at least a part of the halogen gas and a halogen compound from at least a part of a gas exhausted from the laser chamber; a booster pump, connected through a third control valve to the laser chamber, which raises a pressure of a gas having passed through the purification column to a gas pressure that is higher than an operating gas pressure of the laser chamber; and a controller that calculates, on a basis of a first amount of a gas supplied from the booster pump through the third control valve to the laser chamber, a second amount of the first laser gas that is to be supplied to the laser chamber and controls the first control valve on a basis of a result of the calculation of the second amount.
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公开(公告)号：US20190081449A1
公开(公告)日：2019-03-14
申请号：US16178351
申请日：2018-11-01
Applicant: Gigaphoton Inc.
Inventor： Natsushi SUZUKI , Osamu WAKABAYASHI , Hiroaki TSUSHIMA , Masanori YASHIRO
Abstract: A gas laser apparatus may include: a laser chamber connected through a first control valve to a first laser gas supply source that supplies a first laser gas containing a halogen gas and connected through a second control valve to a second laser gas supply source that supplies a second laser gas having a lower halogen gas concentration than the first laser gas; a purification column that removes at least a part of the halogen gas and a halogen compound from at least a part of a gas exhausted from the laser chamber; a booster pump, connected through a third control valve to the laser chamber, which raises a pressure of a gas having passed through the purification column to a gas pressure that is higher than an operating gas pressure of the laser chamber; and a controller that calculates, on a basis of a first amount of a gas supplied from the booster pump through the third control valve to the laser chamber, a second amount of the first laser gas that is to be supplied to the laser chamber and controls the first control valve on a basis of a result of the calculation of the second amount.
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公开(公告)号：US20160172817A1
公开(公告)日：2016-06-16
申请号：US14956709
申请日：2015-12-02
Applicant: Gigaphoton Inc.
Inventor： Kouji KAKIZAKI , Hiroaki TSUSHIMA , Junichi FUJIMOTO , Natsushi SUZUKI , Hisakazu KATSUUMI
IPC: H01S3/0971 , H01S3/038
CPC classification number: H01S3/09713 , H01S3/0384 , H01S3/08009 , H01S3/0977
Abstract: A preliminary ionization discharge device used in a laser chamber of a laser apparatus using preliminary ionization includes a dielectric pipe; a preliminary ionization inner electrode provided inside the dielectric pipe; and a preliminary ionization outer electrode provided outside the dielectric pipe. The preliminary ionization outer electrode includes: a contact plate part configured to contact the dielectric pipe; and an elastic part configured to exert a force in a direction in which the contact plate part pushes the dielectric pipe.
Abstract translation: 在使用了初步电离的激光装置的激光室中使用的初步电离放电装置包括：电介质管; 设置在电介质管内的初级电离内电极; 以及设置在电介质管外侧的初电离电极。 所述预电离外电极包括：接触板部，被配置为接触所述电介质管; 以及弹性部，其构造成在所述接触板部推压所述电介质管的方向上施加力。
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公开(公告)号：US20190074654A1
公开(公告)日：2019-03-07
申请号：US16178374
申请日：2018-11-01
Applicant: Gigaphoton Inc.
Inventor： Natsushi SUZUKI , Osamu WAKABAYASHI , Hiroaki TSUSHIMA , Masanori YASHIRO
Abstract: A gas laser apparatus may include: a laser chamber connected through a first control valve to a first laser gas supply source that supplies a first laser gas containing a halogen gas and connected through a second control valve to a second laser gas supply source that supplies a second laser gas having a lower halogen gas concentration than the first laser gas; a purification column that removes at least a part of the halogen gas and a halogen compound from at least a part of a gas exhausted from the laser chamber; a booster pump, connected through a third control valve to the laser chamber, which raises a pressure of a gas having passed through the purification column to a gas pressure that is higher than an operating gas pressure of the laser chamber; and a controller that calculates, on a basis of a first amount of a gas supplied from the booster pump through the third control valve to the laser chamber, a second amount of the first laser gas that is to be supplied to the laser chamber and controls the first control valve on a basis of a result of the calculation of the second amount.
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