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公开(公告)号:US20190252190A1
公开(公告)日:2019-08-15
申请号:US16393609
申请日:2019-04-24
Applicant: Kyushu University , Gigaphoton Inc.
Inventor: Tomoyuki OHKUBO , Hiroshi IKENOUE , Akihiro IKEDA , Tanemasa ASANO , Osamu WAKABAYASHI
IPC: H01L21/04 , H01S3/097 , H01L21/268 , H01S3/00 , H01S3/225
CPC classification number: H01L21/0455 , H01L21/268 , H01S3/005 , H01S3/0057 , H01S3/09702 , H01S3/10038 , H01S3/10046 , H01S3/225
Abstract: The laser doping apparatus may irradiate a predetermined region of a semiconductor material with a pulse laser beam to perform doping. The laser doping apparatus may include: a solution supplying system configured to supply dopant-containing solution to the predetermined region, and a laser system including at least one laser device configured to output the pulse laser beam to be transmitted by the dopant-containing solution, and a time-domain pulse waveform changing apparatus configured to control a time-domain pulse waveform of the pulse laser beam.
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公开(公告)号:US20190157120A1
公开(公告)日:2019-05-23
申请号:US16261338
申请日:2019-01-29
Applicant: Gigaphoton Inc.
Inventor: Satoshi TANAKA , Osamu WAKABAYASHI
IPC: H01L21/67 , B23K26/352 , B23K26/0622
Abstract: A laser device for laser annealing includes: (1) a laser oscillator configured to output pulse laser light; and (2) an optical pulse stretcher (OPS) device disposed on an optical path of the pulse laser light output from the laser oscillator and including at least one OPS configured to stretch a pulse time width of the pulse laser light incident on the OPS. A delay optical path length L(1) of a first OPS having the minimum delay optical path length L among OPSs is in a range of the following expression (A), ΔT75%×c≤L(1)≤ΔT25%×c (A), where ΔTa % is a time full-width of a position at which light intensity represents a value of a % with respect to a peak value in an input waveform of the pulse laser light that is output from the laser oscillator and incident on the OPS device, and c is light speed.
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公开(公告)号:US20190148905A1
公开(公告)日:2019-05-16
申请号:US16232637
申请日:2018-12-26
Applicant: GIGAPHOTON INC.
Inventor: Hiroshi UMEDA , Osamu WAKABAYASHI
IPC: H01S3/097 , H01S3/0975 , H01S3/104
Abstract: A discharge excitation gas laser device includes: first and second discharge electrodes disposed to face each other; a plurality of peaking capacitors connected to the first discharge electrode; a charger; a plurality of pulse power modules, each one of the pulse power modules including a charging capacitor to which a charged voltage is applied from the charger, a pulse compression circuit that pulse-compresses and outputs electrical energy stored in the charging capacitor as an output pulse to a corresponding peaking capacitor, and a switch disposed between the charging capacitor and the pulse compression circuit; a plurality of output pulse sensors, each one of the output pulse sensors detecting an output pulse output by a corresponding pulse power module; and a control unit configured to control, based on a detection result of each of the output pulse sensor, a tinting of a switch signal to be input to a corresponding switch.
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公开(公告)号:US20190141826A1
公开(公告)日:2019-05-09
申请号:US16221699
申请日:2018-12-17
Applicant: Gigaphoton Inc.
Inventor: Tsukasa HORI , Kouji KAKIZAKI , Tatsuya YANAGIDA , Osamu WAKABAYASHI , Hakaru MIZOGUCHI
Abstract: A system includes a chamber, a laser beam apparatus configured to generate a laser beam to be introduced into the chamber, a laser controller for the laser beam apparatus to control at least a beam intensity and an output timing of the laser beam, and a target supply unit configured to supply a target material into the chamber, the target material being irradiated with the laser beam for generating extreme ultraviolet light.
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公开(公告)号:US20190081450A1
公开(公告)日:2019-03-14
申请号:US16178363
申请日:2018-11-01
Applicant: Gigaphoton Inc.
Inventor: Natsushi SUZUKI , Osamu WAKABAYASHI , Hiroaki TSUSHIMA , Masanori YASHIRO
Abstract: A gas laser apparatus may include: a laser chamber connected through a first control valve to a first laser gas supply source that supplies a first laser gas containing a halogen gas and connected through a second control valve to a second laser gas supply source that supplies a second laser gas having a lower halogen gas concentration than the first laser gas; a purification column that removes at least a part of the halogen gas and a halogen compound from at least a part of a gas exhausted from the laser chamber; a booster pump, connected through a third control valve to the laser chamber, which raises a pressure of a gas having passed through the purification column to a gas pressure that is higher than an operating gas pressure of the laser chamber; and a controller that calculates, on a basis of a first amount of a gas supplied from the booster pump through the third control valve to the laser chamber, a second amount of the first laser gas that is to be supplied to the laser chamber and controls the first control valve on a basis of a result of the calculation of the second amount.
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公开(公告)号:US20190081449A1
公开(公告)日:2019-03-14
申请号:US16178351
申请日:2018-11-01
Applicant: Gigaphoton Inc.
Inventor: Natsushi SUZUKI , Osamu WAKABAYASHI , Hiroaki TSUSHIMA , Masanori YASHIRO
Abstract: A gas laser apparatus may include: a laser chamber connected through a first control valve to a first laser gas supply source that supplies a first laser gas containing a halogen gas and connected through a second control valve to a second laser gas supply source that supplies a second laser gas having a lower halogen gas concentration than the first laser gas; a purification column that removes at least a part of the halogen gas and a halogen compound from at least a part of a gas exhausted from the laser chamber; a booster pump, connected through a third control valve to the laser chamber, which raises a pressure of a gas having passed through the purification column to a gas pressure that is higher than an operating gas pressure of the laser chamber; and a controller that calculates, on a basis of a first amount of a gas supplied from the booster pump through the third control valve to the laser chamber, a second amount of the first laser gas that is to be supplied to the laser chamber and controls the first control valve on a basis of a result of the calculation of the second amount.
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公开(公告)号:US20180342397A1
公开(公告)日:2018-11-29
申请号:US16055287
申请日:2018-08-06
Inventor: Hiroshi IKENOUE , Akira SUWA , Osamu WAKABAYASHI
IPC: H01L21/285 , H01S5/06
CPC classification number: H01L21/228 , B23K26/0006 , B23K26/0604 , B23K26/0622 , B23K26/0643 , B23K26/0648 , B23K26/066 , B23K26/0676 , B23K26/0732 , B23K26/0861 , B23K26/1224 , B23K26/354 , B23K2101/34 , B23K2101/40 , B23K2103/172 , B23K2103/18 , B23K2103/54 , H01L21/268
Abstract: A laser doping device includes: a solution supply system configured to supply a solution containing dopant to a doping region; a pulse laser system configured to output pulse laser light including a plurality of pulses, the pulse laser light transmitting through the solution; a first control unit configured to control a number of pulses of the pulse laser light for allowing the doping region to be irradiated, and to control a fluence of the pulse laser light in the doping region; and a second control unit configured to control a flow velocity of the solution so as to move bubbles, from the doping region, occurring in the solution every time of irradiation with the pulse.
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128.
公开(公告)号:US20180314156A1
公开(公告)日:2018-11-01
申请号:US16028240
申请日:2018-07-05
Applicant: Gigaphoton Inc.
Inventor: Akiyoshi SUZUKI , Osamu WAKABAYASHI
Abstract: The present invention allows more freely setting of the polarization direction of illumination light on an illumination surface of an exposure device. A beam transmission system (121) that transmits, to an exposure device (130), a linearly polarized optical beam (L) output from a free electron laser device (10) includes: an optical beam splitting unit (50) configured to split the optical beam (L) into a first optical beam (L1) and a second optical beam (L2); and a first polarization direction rotating unit (51) configured to rotate the linear polarization direction of the first optical beam (L1).
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公开(公告)号:US20180261973A1
公开(公告)日:2018-09-13
申请号:US15973846
申请日:2018-05-08
Applicant: Gigaphoton Inc.
Inventor: Yousuke FUJIMAKI , Hiroaki TSUSHIMA , Hiroyuki IKEDA , Osamu WAKABAYASHI
Abstract: An excimer laser apparatus may include an optical resonator, a chamber including a pair of discharge electrodes, the chamber being provided in the optical resonator and configured to store laser gas, an electric power source configured to receive a trigger signal and apply a pulsed voltage to the pair of discharge electrodes based on the trigger signal, an energy monitor configured to measure pulse energy of a pulse laser beam outputted from the optical resonator, a unit for adjusting partial pressure of halogen gas configured to perform exhausting a part of the laser gas stored in the chamber and supplying laser gas to the chamber, and a controller configured to acquire measurement results of the pulse energy measured by the energy monitor, detect energy depression based on the measurement results of the pulse energy, and control the unit for adjusting partial pressure of halogen gas based on results of detecting the energy depression to adjust the partial pressure of halogen gas in the chamber.
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公开(公告)号:US20180123308A1
公开(公告)日:2018-05-03
申请号:US15858219
申请日:2017-12-29
Applicant: GIGAPHOTON INC.
Inventor: Minoru TANIYAMA , Hakaru MIZOGUCHI , Osamu WAKABAYASHI
IPC: H01S3/038 , H01S3/086 , H01S3/104 , H01S3/134 , H01S3/0971
CPC classification number: H01S3/038 , H01S3/005 , H01S3/0071 , H01S3/0385 , H01S3/0804 , H01S3/08059 , H01S3/086 , H01S3/0971 , H01S3/104 , H01S3/134 , H01S3/136 , H01S3/223 , H01S3/225 , H01S3/2308 , H01S2301/20
Abstract: A laser unit may include a laser chamber including a pair of discharge electrodes that are opposed to each other in a first direction with an electrode gap interposed in between and are configured to provide a discharge width in a second direction, orthogonal to the first direction, smaller than the electrode gap; and an optical resonator including a first optical member and a second optical member that are opposed to each other in a third direction orthogonal to both the first direction and the second direction with the discharge electrodes interposed in between, and configured to amplify laser light generated between the discharge electrodes and output amplified laser light, the optical resonator satisfying the following expression to configure a stable resonator in the second direction: 0
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