公开(公告)号：US20240363304A1

公开(公告)日：2024-10-31

申请号：US18509205

申请日：2023-11-14

Applicant: FEI Company

Inventor： Jaroslav Velcovský ,  Remco T. J. P. Geurts ,  Marek Melichar

IPC: H01J37/10 ,  H01J37/04 ,  H01J37/22 ,  H01J37/305

CPC classification number: H01J37/10 ,  H01J37/045 ,  H01J37/22 ,  H01J37/3053 ,  H01J2237/006

Abstract: Surface contamination and debris deposition associated with laser ablation or ion beam milling is reduced by combining a directed flow to a workpiece with suction at a suitable vacuum pressure. The vacuum pressure is typically selected so that any contaminants or debris have relatively short mean free paths to avoid build-up on distant surfaces in a vacuum chamber. A shutter can be used to shield portions of a charged-particle-beam optical column during processing. Processing at vacuum pressures associated with the relatively short MFPs can be combined with processing at vacuum pressures associated with relatively long MFPs to provide coarse and fine milling or ablation.

公开(公告)号：US20240242933A1

公开(公告)日：2024-07-18

申请号：US18509474

申请日：2023-11-15

Applicant: NuFlare Technology, Inc.

Inventor： Hirofumi MORITA ,  Haruyuki NOMURA

IPC: H01J37/317 ,  H01J37/04 ,  H01J37/141 ,  H01J37/145

CPC classification number: H01J37/3177 ,  H01J37/045 ,  H01J37/141 ,  H01J37/145

Abstract: A multi charged particle beam writing apparatus includes two or more-stage objective lenses each comprised of a magnetic lens, and configured to focus the beam on a substrate, n (n≥3) correction lenses correcting an imaging state of the multi charged particle beam, and an electric field control electrode to which a positive constant voltage with respect to the substrate is applied. The electric field control electrode generates an electric field between the substrate and the electrode. The objective lenses include a first objective lens, and a second objective lens placed most downstream in a travel direction of the beam. m (n≥m≥1) correction lenses of the n correction lenses are magnetic correction lenses placed in a lens magnetic field of the second objective lens. (n−m) correction lenses are placed upstream of the lens magnetic field of the second objective lens in the travel direction.

公开(公告)号：US20240242922A1

公开(公告)日：2024-07-18

申请号：US18493961

申请日：2023-10-25

Applicant: NuFlare Technology, Inc.

Inventor： Hirofumi MORITA ,  Haruyuki NOMURA

IPC: H01J37/153 ,  H01J37/04 ,  H01J37/09 ,  H01J37/145 ,  H01J37/317

CPC classification number: H01J37/153 ,  H01J37/045 ,  H01J37/09 ,  H01J37/145 ,  H01J37/3174 ,  H01J2237/04735 ,  H01J2237/31754 ,  H01J2237/31774

Abstract: In one embodiment, a multi charged particle beam writing apparatus includes two or more-stage objective lenses each comprised of a magnetic lens, and configured to focus the multi charged particle beam on a substrate, which has passed through the limiting aperture member, three or more correction lenses correcting an imaging state of the multi charged particle beam on the substrate, and an electric field control electrode to which a positive constant voltage with respect to the substrate is applied, the electric field control electrode generating an electric field between the substrate and the electric field control electrode. The two or more-stage objective lenses include a first objective lens, and a second objective lens placed most downstream in a travel direction of the multi charged particle beam. The three or more correction lenses are placed upstream of a lens magnetic field of the second objective lens in the travel direction of the multi charged particle beam.

公开(公告)号：US20240242920A1

公开(公告)日：2024-07-18

申请号：US18482093

申请日：2023-10-06

Applicant: NuFlare Technology, Inc.

Inventor： Hirofumi MORITA

IPC: H01J37/145 ,  H01J37/153 ,  H01J37/21 ,  H01J37/317

CPC classification number: H01J37/145 ,  H01J37/153 ,  H01J37/21 ,  H01J37/3177 ,  H01J37/045

Abstract: In one embodiment, a multi charged particle beam writing apparatus includes an acceleration lens comprised of an electrostatic lens including a plurality of electrodes and configured to accelerate a multi charged particle beam, two or more-stage objective lenses each comprised of a magnetic lens, and configured to focus the multi charged particle beam on a substrate, which has passed through a limiting aperture member, and three or more correction lenses including a first correction lens, a second correction lens and a third correction lens, and configured to correct an imaging state of the multi charged particle beam on the substrate. One or no electrostatic correction lens is placed in a magnetic field of each of the two or more-stage objective lenses. The first correction lens is an electrostatic correction lens that also serves as at least one of the plurality of electrodes of the acceleration lens.

公开(公告)号：US20240186100A1

公开(公告)日：2024-06-06

申请号：US18482972

申请日：2023-10-09

Applicant: NuFlare Technology, Inc.

Inventor： Shuji YOSHINO

IPC: H01J37/04 ,  G03F7/20

CPC classification number: H01J37/045 ,  G03F7/2045 ,  G03F7/2059 ,  H01J2237/026 ,  H01J2237/31774

Abstract: In one embodiment, a blanking aperture array system includes a blanking aperture array substrate provided blankers corresponding to each beam of a multi beam, a first radiation shield, and a second radiation shield. A circuit section applying a voltage to the blankers is disposed closer to a peripheral edge than a cell section including the blankers. The first radiation shield includes a first plate covering over the circuit section, disposed on an upper surface of the blanking aperture array substrate, and extending from a peripheral edge of a first opening for passage of the multi beam. The second radiation shield covers under the circuit section, and includes a lower peripheral wall section that hangs down from a lower surface of the blanking aperture array substrate and surrounds the cell section, and a lower plate extending from a peripheral edge of a lower opening for passage of the multi beam.

公开(公告)号：US20240055218A1

公开(公告)日：2024-02-15

申请号：US18259674

申请日：2021-12-09

Applicant: NuFlare Technology, Inc. ,  NuFlare Technology America, Inc.

Inventor： Yasuo SENGOKU ,  Yoshikuni GOSHIMA ,  John William KAY ,  Chising LAI

IPC: H01J37/147 ,  H01J37/30 ,  H01J37/04 ,  H01J37/317

CPC classification number: H01J37/147 ,  H01J37/3007 ,  H01J37/045 ,  H01J37/3174

Abstract: A charged particle beam writing apparatus according to one aspect of the present invention includes an electrode configured to deflect a charged particle beam, an amplifier configured to apply a deflection potential to the electrode, a diagnostic circuit configured to diagnose the amplifier, a switching circuit arranged between an output of the amplifier and the electrode, and configured to switch the output of the amplifier between the electrode and the diagnostic circuit, an electron optical system configured to irradiate a target object with the charged particle beam deflected by being applied with the deflection potential by the amplifier, a column configured to include therein the electrode and the electron optical system, a first coaxial cable configured to connect an output side of the amplifier with the switching circuit, a second coaxial cable configured to connect the electrode with the switching circuit, a third coaxial cable configured to connect the output side of the amplifier with the diagnostic circuit, and a resistance configured to connect, parallelly to the switching circuit, an inner conductor of the first coaxial cable with an inner conductor of the second coaxial cable.

公开(公告)号：US20240013999A1

公开(公告)日：2024-01-11

申请号：US18331502

申请日：2023-06-08

Applicant: NuFlare Technology, Inc.

Inventor： Toshiki KIMURA ,  Hirofumi MORITA ,  Takanao TOUYA ,  Hayato KIMURA ,  Kazuhiro CHIBA

IPC: H01J37/04 ,  H01J37/147 ,  H01J37/304

CPC classification number: H01J37/045 ,  H01J37/147 ,  H01J37/304 ,  H01J2237/0437

Abstract: According to one embodiment of the present invention, a mounting substrate is installed on a multi charged particle beam irradiation apparatus, and a blanking aperture array chip provided with blanking electrodes to perform blanking deflection on beams in a multi charged particle beam is mounted on the mounting substrate. The mounting substrate includes an opening through which the multi charged particle beam passes, a plurality of control circuits that supply a control signal to the blanking electrodes for each of a plurality of areas into which the blanking aperture array chip is divided, and grounds, each of which is provided for a corresponding one of the plurality of control circuits and configured to supply a ground electrical potential to the corresponding control circuit. The grounds corresponding to the control circuits are electrically separated from each other.

公开(公告)号：US11664191B2

公开(公告)日：2023-05-30

申请号：US17643727

申请日：2021-12-10

Applicant: NuFlare Technology, Inc.

Inventor： Taku Yamada ,  Kota Iwasaki

IPC: H01J37/30 ,  H01J37/04

CPC classification number: H01J37/3007 ,  H01J37/045 ,  H01J2237/0435

Abstract: According to one aspect of the present invention, an electron beam irradiation apparatus includes a photoelectric surface configured to receive irradiation of excitation light on a side of a front surface, and generate electron beams from a side of a back surface; a blanking aperture array mechanism provided with passage holes corresponding to the electron beams and configured to perform deflection control on each of the plurality of electron beams passing through the passage holes; and an adjustment mechanism configured to adjust at least one of an orbit of transmitted light that passes through at least one of arrangement objects including the photoelectric surface, the blanking aperture array mechanism, and the limit aperture substrate up to the stage and reaches the stage, among an irradiated excitation light, and an orbit of the electron beams, wherein the arrangement objects shield at least a part of the transmitted light.

公开(公告)号：US20180323034A1

公开(公告)日：2018-11-08

申请号：US15587720

申请日：2017-05-05

Applicant: KLA-Tencor Corporation

Inventor： Alan D. Brodie

IPC: H01J37/04 ,  H01J37/10

CPC classification number: H01J37/045 ,  H01J37/10 ,  H01J2237/0435

Abstract: Performance of a multi-electron-beam system can be improved by reducing Coulomb effects in the illumination path of a multi-beam inspection system. A beam-limiting aperture with multiple holes can be positioned between an electron beam source and a multi-lens array, such as in a field-free region. The beam-limiting aperture is configured to reduce Coulomb interactions between the electron beam source and the multi-lens array. An electron beam system with the beam-limiting aperture can be used in a scanning electron microscope.

公开(公告)号：US20180269034A1

公开(公告)日：2018-09-20

申请号：US15888118

申请日：2018-02-05

Applicant: NuFlare Technology, Inc.

Inventor： Haruyuki NOMURA

IPC: H01J37/317 ,  H01J37/04 ,  H01J37/10 ,  H01J37/09 ,  H01J37/24

CPC classification number: H01J37/3175 ,  H01J37/045 ,  H01J37/09 ,  H01J37/10 ,  H01J37/243 ,  H01J37/3174 ,  H01J2237/043 ,  H01J2237/30433 ,  H01J2237/31776

Abstract: In one embodiment, a charged particle beam writing apparatus includes a current limiting aperture, a blanking deflector switching between beam ON and beam OFF so as to control an irradiation time by deflecting the charged particle beam having passed through the current limiting aperture, a blanking aperture blocking the charged particle beam deflected by the blanking deflector in such a manner that the beam OFF state is entered, and an electron lens disposed between the current limiting aperture and the blanking aperture. A lens value set for the electron lens is substituted into a given function to calculate an offset time. The offset time is added to an irradiation time for writing a pattern to correct the irradiation time. The blanking deflector switches between the beam ON and the beam OFF based on the corrected irradiation time.