公开(公告)号：US20090257040A1

公开(公告)日：2009-10-15

申请号：US12470092

申请日：2009-05-21

申请人： Udo Dinger

发明人： Udo Dinger

IPC分类号： G03B27/54 ,  F21V7/00

CPC分类号： G03B27/54 ,  G02B27/0905 ,  G02B27/0983 ,  G03F7/7005 ,  G03F7/702 ,  G03F7/70391

摘要： The disclosure relates to an illumination system, such as an illumination system for use in microlithography. The illumination system can include an optical element with multiple primary light sources. The illumination system can illuminate a field in a field plane having a field contour. The illumination system can be configured so that each primary light source illuminates an area in the field plane that is smaller than a size of an area encircled by the field contour.

摘要翻译： 本公开涉及照明系统，例如用于微光刻的照明系统。 照明系统可以包括具有多个主要光源的光学元件。 照明系统可以照射具有场轮廓的场平面中的场。 照明系统可以被配置为使得每个主光源照亮场平面中的小于由场轮廓包围的区域的尺寸的区域。

公开(公告)号：US07473912B2

公开(公告)日：2009-01-06

申请号：US11558441

申请日：2006-11-09

申请人： Xiao (Charles) Yang

发明人： Xiao (Charles) Yang

IPC分类号： A61N5/00 ,  G21K5/10 ,  G21K5/00

CPC分类号： G03F7/203 ,  B82Y10/00 ,  B82Y40/00 ,  G03F7/70383 ,  G03F7/70391 ,  H01J37/3174 ,  H01J2237/20228 ,  H01J2237/20235

摘要： According to a specific embodiment of the present invention, a mask-less lithography method and apparatus is provided. The apparatus includes an integrated write head on a slider with an air bearing that creates a lift force that allows that write head to fly over a spinning wafer substrate in nanometer distance without physical contact. The short distance between the write head and substrate prevents the light from diffracting. As a result, micro and nanometer structures can be patterned without being limited by light diffraction in conventional lithography methods.

摘要翻译： 根据本发明的具体实施例，提供了一种无掩模光刻方法和装置。 该装置包括具有空气轴承的滑块上的集成写头，其产生提升力，该提升力允许写头在纳米距离上飞过旋转晶片衬底而没有物理接触。 写头和基板之间的短距离防止光线衍射。 结果，微型和纳米结构可以被图案化，而不受传统光刻方法中的光衍射的限制。

公开(公告)号：US20090002669A1

公开(公告)日：2009-01-01

申请号：US12163645

申请日：2008-06-27

申请人： Rong Liu ,  Evan Palmer

发明人： Rong Liu ,  Evan Palmer

IPC分类号： G03B27/32 ,  G03B27/54

CPC分类号： G03F7/70391 ,  G03F7/7005

摘要： An exposure apparatus for use in optical lithography can include a holder and a plurality of UV-LED modules carried by the holder and disposed in an array. A respective plurality of collimating lenses can be disposed in an array corresponding to the array of UV-LED modules. The plurality of UV-LED modules and the respective plurality of collimating lenses can provide a respective plurality of distinct beams of UV light. The plurality of collimating lenses may be spaced from the plurality of UV-LED modules and spaced from the exposure plane and have an optical configuration providing a composite beam of UV light formed from the plurality of distinct beams of UV light in which each beam inside the periphery of the array overlaps each adjacent beam by at least 70% at the exposure plane. A method for directing light onto an exposure plane in an optical lithography procedure is provided.

摘要翻译： 用于光学光刻的曝光装置可以包括保持器和由保持器携带并且以阵列布置的多个UV-LED模块。 可以将相应的多个准直透镜设置成与UV-LED模块的阵列对应的阵列。 多个UV-LED模块和相应的多个准直透镜可以提供相应的多个不同的UV光束。 多个准直透镜可以与多个UV-LED模块间隔开并且与曝光平面间隔开并且具有提供由多个不同的UV光束形成的UV光的复合光束的光学配置，其中， 阵列的周边在曝光平面上与每个相邻的光束重叠至少70％。 提供了一种在光学光刻过程中将光引导到曝光平面上的方法。

公开(公告)号：US20080204692A1

公开(公告)日：2008-08-28

申请号：US12054991

申请日：2008-03-25

申请人： Toralf Gruner ,  Bernd Geh

发明人： Toralf Gruner ,  Bernd Geh

IPC分类号： G03B27/72 ,  G03B27/54

CPC分类号： G03F7/70441 ,  G03F7/70083 ,  G03F7/70141 ,  G03F7/70391 ,  G03F7/70566 ,  G03F7/70941

摘要： A method for producing microstructured components in a microlithographic projection exposure apparatus is disclosed. The method includes imaging a pattern of structures into an image plane of a projection objective. The dose distribution of projection light in the image plane can be influenced so that the image of a structure is at least essentially independent of the topography of structures which lie inside a region surrounding the structure.

摘要翻译： 公开了一种在微光刻投影曝光装置中制造微结构元件的方法。 该方法包括将结构图案成像到投影物镜的像平面中。 可以影响投影光在图像平面中的剂量分布，使得结构的图像至少基本上独立于位于围绕结构的区域内的结构的形貌。

公开(公告)号：US20080112609A1

公开(公告)日：2008-05-15

申请号：US11933490

申请日：2007-11-01

申请人： Masao INOUE

发明人： Masao INOUE

IPC分类号： G06K9/62

CPC分类号： G03F7/70391 ,  G03F9/7046 ,  G03F9/7076 ,  G03F9/7088

摘要： A substrate to be processed by a patterning device has a group of a plurality of alignment marks formed within a predetermined area as an alignment area, each of the plurality of alignment marks being an information recording code that records its own location relative to a reference position on the substrate. In alignment of the substrate, an image of such an alignment area that includes a group of the plurality of alignment marks is captured. Thus, even if the area of image capturing is reduced with increasing image magnification, at least one of the plurality of alignment marks can be included in the image. One of the alignment marks whose images are included in this image is defined as a target mark, and the position of the substrate is derived based on the target mark in the image. Thus, the position of the substrate can be detected by a single image capturing operation.

摘要翻译： 由图案形成装置处理的基板具有形成在预定区域内的多个对准标记的一组作为对准区域，多个对准标记中的每一个是信息记录代码，其相对于参考位置记录其自己的位置 在基板上。 在基板的对准中，捕获包括一组多个对准标记的这种对准区域的图像。 因此，即使图像拍摄的区域随着图像放大率的增加而减小，多个对准标记中的至少一个可以包括在图像中。 将图像包括在该图像中的对准标记中的一个被定义为目标标记，并且基于图像中的目标标记导出基板的位置。 因此，可以通过单次图像捕获操作来检测基板的位置。

公开(公告)号：US20080038396A1

公开(公告)日：2008-02-14

申请号：US11796709

申请日：2007-04-26

申请人： Hendrik John ,  Volker Schillen ,  Ali El-Siblani

发明人： Hendrik John ,  Volker Schillen ,  Ali El-Siblani

IPC分类号： B29C35/08

CPC分类号： G03F7/2022 ,  B29C64/129 ,  B33Y10/00 ,  B33Y50/02 ,  G03F7/0037 ,  G03F7/70391

摘要： Device for producing a three-dimensional object by solidification of a material solidifiable under the action of electromagnetic radiation by means of energy input via an imaging unit comprising a predetermined number of discrete imaging elements (pixels), said device comprising a computer unit, an IC and/or a software implementation respectively with the ability of adjusting and/or controlling the energy input via a specific gray value and/or color value in a voxel matrix.

摘要翻译： 一种用于通过借助于能量输入通过电磁辐射可凝固的材料固化的三维物体的装置，所述成像单元包括预定数量的离散成像元件（像素），所述装置包括计算机单元，IC 和/或分别具有通过体素矩阵中的特定灰度值和/或颜色值来调整和/或控制能量输入的能力的软件实现。

公开(公告)号：US20050259327A9

公开(公告)日：2005-11-24

申请号：US10666330

申请日：2003-09-19

申请人： Arthur Olszak ,  Michael Descour

发明人： Arthur Olszak ,  Michael Descour

IPC分类号： G02B3/00 ,  G03F7/20 ,  G02B27/10

CPC分类号： G02B3/0056 ,  G02B3/0062 ,  G02B21/002 ,  G02B21/367 ,  G03F7/7005 ,  G03F7/70275 ,  G03F7/70291 ,  G03F7/70391

摘要： A multi-axis projection imaging system. Such a system includes a plurality of objectives defining respective object fields of view and corresponding image fields of view. An object is adapted for controllably illuminating the object fields of view with light that varies spatially in one or more selected characteristics, for creating respective images within the image fields of view.

摘要翻译： 多轴投影成像系统。 这样的系统包括限定相应的对象视场和对应的图像视场的多个目标。 物体适于用在一个或多个所选特征中空间变化的光来可控地照亮物体视野，以在图像视场内创建各自的图像。

公开(公告)号：US20040037487A1

公开(公告)日：2004-02-26

申请号：US10456965

申请日：2003-06-09

申请人： FUJI PHOTO FILM CO., LTD.

发明人： Daisuke Nakaya ,  Takeshi Fujii ,  Yoji Okazaki ,  Kazuhiko Nagano ,  Hiromi Ishikawa

IPC分类号： G02B006/12

CPC分类号： G03F7/7005 ,  G02B6/136 ,  G02B6/138 ,  G02B2006/12104 ,  G03F7/70291 ,  G03F7/70391

摘要： An optical wiring substrate fabrication method capable of simple formation, by maskless exposure, of an inclined face shape at an end portion of a core layer structuring an optical waveguide. Using an exposure apparatus, image exposure is carried out with a light beam which is modulated by a spatial modulation element in accordance with image information. A predetermined area of a photosensitive material (a photoresist), which is coated on the core layer which is a material of the optical wiring substrate, is exposed by a light beam (UV) and patterned to form an etching mask. A region corresponding to the inclined face, which is to be formed at the end portion of the core layer, is exposed and patterned by the light beam, exposure amounts of which are controlled in accordance with the inclined form of the inclined face, such that an end portion of the etching mask has an inclined face structure. When the core layer is worked by etching using this etching mask, working of the core layer at the end portion of the core layer progresses in proportion to film thickness of the etching mask, and the inclined face is formed.

摘要翻译： 一种光学布线基板的制造方法，其能够通过无掩模地曝光在构成光波导的芯层的端部处形成倾斜的表面形状。 使用曝光装置，利用由空间调制元件根据图像信息调制的光束进行图像曝光。 通过光束（UV）对作为光布线基板的材料的芯层上涂布的感光材料（光致抗蚀剂）的预定区域进行曝光并图案化以形成蚀刻掩模。 对应于要形成在芯层的端部的倾斜面的区域通过光束曝光和图案化，其曝光量根据倾斜面的倾斜形式被控制，使得 蚀刻掩模的端部具有倾斜面结构。 当通过使用该蚀刻掩模的蚀刻加工芯层时，芯层的端部的芯层的加工与蚀刻掩模的膜厚度成比例地进行，并且形成倾斜面。

公开(公告)号：US20040026229A1

公开(公告)日：2004-02-12

申请号：US10168214

申请日：2002-06-19

发明人： Heinz Eipel ,  Markus Beier

IPC分类号： G01N033/53

CPC分类号： G03F7/70391 ,  B01J19/0046 ,  B01J2219/00317 ,  B01J2219/00436 ,  B01J2219/00529 ,  B01J2219/00585 ,  B01J2219/0059 ,  B01J2219/00608 ,  B01J2219/00626 ,  B01J2219/00689 ,  B01J2219/00695 ,  B01J2219/00711 ,  B01J2219/0072 ,  B01J2219/00722 ,  B82Y30/00 ,  C40B40/06 ,  C40B60/14

摘要： The invention relates to a process and a device for the light-controlled synthesis of biopolymers on surfaces. In this process, patterns of individual sequences (20) are produced by the imaging of an arrangement (1) of electrically individually controllable light diodes (2) onto the surfaces.

摘要翻译： 本发明涉及用于光表面上的生物聚合物的轻质合成的方法和装置。 在该过程中，通过将电独立控制的光二极管（2）的布置（1）成像到表面上来产生单独序列（20）的图案。

公开(公告)号：US20030084422A1

公开(公告)日：2003-05-01

申请号：US09682911

申请日：2001-10-31

发明人： Kin Foong Chan

IPC分类号： G06F019/00

CPC分类号： B82Y10/00 ,  G03F7/70166 ,  G03F7/70291 ,  G03F7/70391

摘要： A system and method for non-synchronously projecting light in an imaging system is provided. A pixel panel may be selectively controlled to direct light onto or away from a subject. A light source, such as a laser diode, projects light pulses at the pixel panel. The pulses are not synchronized with the pixel panel, so the light may strike the pixel panel at any time when the pixel panel is operable to direct light towards the subject. The pulses may be constant or variable in energy or duration, depending on the desired results.

摘要翻译： 提供了一种用于在成像系统中非同步投影光的系统和方法。 可以选择性地控制像素面板以将光引导到或远离对象。 诸如激光二极管的光源在像素面板处投射光脉冲。 脉冲不与像素面板同步，因此，当像素面板可操作以将光引导到被摄体时，光可以在任何时候撞击像素面板。 取决于所需的结果，脉冲可以是恒定的或能量或持续时间可变的。