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公开(公告)号：CN104254909B
公开(公告)日：2017-03-01
申请号：CN201380021910.1
申请日：2013-04-24
CPC classification number: H01L24/83 , B23K37/0426 , H01L24/05 , H01L24/29 , H01L24/75 , H01L24/97 , H01L2224/04026 , H01L2224/05082 , H01L2224/05155 , H01L2224/05166 , H01L2224/05639 , H01L2224/2732 , H01L2224/291 , H01L2224/29118 , H01L2224/29144 , H01L2224/75101 , H01L2224/75305 , H01L2224/7531 , H01L2224/75314 , H01L2224/75315 , H01L2224/75317 , H01L2224/7532 , H01L2224/75756 , H01L2224/7598 , H01L2224/75981 , H01L2224/83022 , H01L2224/83048 , H01L2224/83075 , H01L2224/83101 , H01L2224/832 , H01L2224/83211 , H01L2224/83444 , H01L2224/83447 , H01L2224/83801 , H01L2224/83815 , H01L2224/97 , H01L2924/01322 , H01L2924/014 , H01L2924/10253 , H01L2924/10254 , H01L2924/10272 , H01L2924/1033 , H01L2924/1037 , H01L2924/1067 , H01L2924/12032 , H01L2924/12036 , H01L2924/13062 , H01L2924/13091 , H01L2924/15724 , H01L2924/15747 , H01L2924/15787 , H01L2924/3656 , H05K3/34 , H05K3/3431 , H05K13/0465 , H05K2203/0195 , H05K2203/0278 , H01L2924/00 , H01L2924/0542 , H01L2924/0103 , H01L2924/00014 , H01L2924/01042 , H01L2924/01032 , H01L2924/01014 , H01L2924/01013 , H01L2224/05655 , H01L2224/83 , H01L2924/00012
Abstract: 本发明的隔热负荷夹具(11)在电路基板(13)的耐热温度～100℃以下的范围内具有熔点或固相线温度的焊料材料(14)，在该状态的半导体芯片(13)的上部设置热绝缘体(17)，在热绝缘体(17)的上部配置金属锤(16)，在使焊料材料(14)熔解而固化的期间，对半导体芯片(13)施加负荷。(12)和半导体芯片(13)之间夹着在半导体芯片
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公开(公告)号：CN104798185A
公开(公告)日：2015-07-22
申请号：CN201380059808.0
申请日：2013-11-13
IPC: H01L21/52
CPC classification number: H01L23/49513 , H01L21/4853 , H01L23/3735 , H01L23/4827 , H01L23/488 , H01L23/492 , H01L23/49548 , H01L23/49562 , H01L23/49582 , H01L24/03 , H01L24/05 , H01L24/29 , H01L24/32 , H01L24/75 , H01L24/83 , H01L2224/0345 , H01L2224/04026 , H01L2224/05082 , H01L2224/05155 , H01L2224/05166 , H01L2224/05639 , H01L2224/2732 , H01L2224/291 , H01L2224/29144 , H01L2224/32059 , H01L2224/3207 , H01L2224/32225 , H01L2224/32245 , H01L2224/32505 , H01L2224/7501 , H01L2224/75102 , H01L2224/75251 , H01L2224/75756 , H01L2224/83011 , H01L2224/83022 , H01L2224/83048 , H01L2224/83075 , H01L2224/8309 , H01L2224/83101 , H01L2224/8321 , H01L2224/83385 , H01L2224/83439 , H01L2224/83444 , H01L2224/83447 , H01L2224/83455 , H01L2224/83457 , H01L2224/83815 , H01L2924/01322 , H01L2924/12042 , H01L2924/15747 , H01L2924/15787 , H01L2924/35121 , H01L2924/3651 , H01L2924/01032 , H01L2924/01014 , H01L2924/0105 , H01L2924/014 , H01L2924/00014 , H01L2924/01027 , H01L2924/01015 , H01L2924/00012 , H01L2924/00
Abstract: 本发明的半导体装置在半导体元件(1)和以Cu为主要原料的Cu基板(2)之间夹持有Au系钎料层(3)，且在Cu基板(2)和Au系钎料层(3)之间配设有具有以在俯视时成为规定形状的方式构图的微细槽(24)的致密金属膜(23)，分别在Cu基板(2)、Au系钎料层(3)及致密金属膜(23)的微细槽(24)埋设有以Cu和Au为主要元素的微小亚铃截面构造体(4)。
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公开(公告)号：CN104254909A
公开(公告)日：2014-12-31
申请号：CN201380021910.1
申请日：2013-04-24
CPC classification number: H01L24/83 , B23K37/0426 , H01L24/05 , H01L24/29 , H01L24/75 , H01L24/97 , H01L2224/04026 , H01L2224/05082 , H01L2224/05155 , H01L2224/05166 , H01L2224/05639 , H01L2224/2732 , H01L2224/291 , H01L2224/29118 , H01L2224/29144 , H01L2224/75101 , H01L2224/75305 , H01L2224/7531 , H01L2224/75314 , H01L2224/75315 , H01L2224/75317 , H01L2224/7532 , H01L2224/75756 , H01L2224/7598 , H01L2224/75981 , H01L2224/83022 , H01L2224/83048 , H01L2224/83075 , H01L2224/83101 , H01L2224/832 , H01L2224/83211 , H01L2224/83444 , H01L2224/83447 , H01L2224/83801 , H01L2224/83815 , H01L2224/97 , H01L2924/01322 , H01L2924/014 , H01L2924/10253 , H01L2924/10254 , H01L2924/10272 , H01L2924/1033 , H01L2924/1037 , H01L2924/1067 , H01L2924/12032 , H01L2924/12036 , H01L2924/13062 , H01L2924/13091 , H01L2924/15724 , H01L2924/15747 , H01L2924/15787 , H01L2924/3656 , H05K3/34 , H05K3/3431 , H05K13/0465 , H05K2203/0195 , H05K2203/0278 , H01L2924/00 , H01L2924/0542 , H01L2924/0103 , H01L2924/00014 , H01L2924/01042 , H01L2924/01032 , H01L2924/01014 , H01L2924/01013 , H01L2224/05655 , H01L2224/83 , H01L2924/00012 , H01L24/95
Abstract: 本发明的隔热负荷夹具(11)在电路基板(12)和半导体芯片(13)之间夹着在半导体芯片(13)的耐热温度～100℃以下的范围内具有熔点或固相线温度的焊料材料(14)，在该状态的半导体芯片(13)的上部设置热绝缘体(17)，在热绝缘体(17)的上部配置金属锤(16)，在使焊料材料(14)熔解而固化的期间，对半导体芯片(13)施加负荷。
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公开(公告)号：CN101266929A
公开(公告)日：2008-09-17
申请号：CN200810084721.X
申请日：2008-03-14
Applicant: 日产自动车株式会社
Inventor： 谷本智
IPC: H01L21/336 , H01L21/443 , H01L21/473
CPC classification number: H01L29/7802 , H01L21/0485 , H01L21/049 , H01L29/41766 , H01L29/45 , H01L29/6606 , H01L29/66068 , H01L29/7395 , H01L29/94
Abstract: 本发明涉及一种碳化硅半导体装置的制造方法。本发明公开了一种具有高可靠性和更长的针对栅极氧化膜的TDDB的寿命的MOS型SiC半导体装置。该半导体装置包括MOS(金属氧化物半导体)结构，MOS结构具有碳化硅(SiC)衬底、多晶硅栅电极、插入在SiC衬底与多晶硅栅电极之间的且通过热氧化SiC衬底的表面所形成的栅极氧化膜、以及与SiC衬底电接触的欧姆触点。该半导体装置还包括通过氧化多晶硅栅电极的表面所形成的多晶硅热氧化膜。栅极氧化膜的厚度为20nm或更薄，优选为15nm或更薄。
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