公开(公告)号：USRE49602E1

公开(公告)日：2023-08-08

申请号：US16896953

申请日：2020-09-02

Applicant: ASML NETHERLANDS B.V.

Inventor： Pieter Kruit ,  Erwin Slot ,  Tijs Frans Teepen ,  Marco Jan-Jaco Wieland ,  Stijn Willem Herman Karel Steenbrink

IPC: H01J3/00 ,  H01J37/317 ,  B82Y10/00 ,  B82Y40/00 ,  H01J37/304

CPC classification number: H01J37/3177 ,  B82Y10/00 ,  B82Y40/00 ,  H01J37/3045 ,  H01J2237/2443 ,  H01J2237/2446 ,  H01J2237/30433 ,  H01J2237/31757

Abstract: Lithography system, sensor and method for measuring properties of a massive amount of charged particle beams of a charged particle beam system, in particular a direct write lithography system, in which



the charged particle beams are converted into light beams by using a converter element,
using an array of light sensitive detectors such as diodes, CCD or CMOS devices, located in line with said converter element, for detecting said light beams,
electronically reading out resulting signals from said detectors after exposure thereof by said light beams,
utilizing said signals for determining values for one or more beam properties, thereby using an automated electronic calculator, and
electronically adapting the charged particle system so as to correct for out of specification range values for all or a number of said charged particle beams, each for one or more properties, based on said calculated property values.

公开(公告)号：US10728923B2

公开(公告)日：2020-07-28

申请号：US16511219

申请日：2019-07-15

Applicant: Samsung Electronics Co., Ltd.

Inventor： Yingyang Li ,  Chengjun Sun

IPC: H01J3/00 ,  H04W72/12 ,  H04W56/00 ,  H04L5/14 ,  H04W74/08

Abstract: The present disclosure is to provide a method of configuring timing of uplink (UL) transmission, comprising, receiving, by a user equipment (UE), configuration information on carrier aggregation (CA) of at least one frequency division duplex (FDD) cell and at least one time division duplex (TDD) cell; and adjusting, by the UE, starting timing of a UL subframe in a cell participating in the CA.

公开(公告)号：US09293315B2

公开(公告)日：2016-03-22

申请号：US14746753

申请日：2015-06-22

Applicant: Thermo Fisher Scientific (Bremen) GmbH

Inventor： Alexander Alekseevich Makarov

IPC: B01D59/44 ,  H01J49/00 ,  H01J49/26 ,  H01J3/00 ,  H01J49/10 ,  H01J49/06 ,  H01J49/42 ,  H01J49/04 ,  H01J49/40 ,  G01N27/62

CPC classification number: H01J49/10 ,  G01N27/622 ,  H01J49/0027 ,  H01J49/0031 ,  H01J49/0481 ,  H01J49/06 ,  H01J49/063 ,  H01J49/401 ,  H01J49/4215 ,  H01J49/423 ,  H01J49/425 ,  H01J49/426 ,  H01J49/427 ,  H01J49/4295

Abstract: An ion spectrometer is provided, comprising: an ion source, arranged to generate ions continuously with a first range of mass to charge ratios; and an ion trap, arranged to receive ions from the ion source along an axis, and to eject ions with a second range of mass to charge ratios orthogonally to that axis, the second range of mass to charge ratios being narrower than the first range of mass to charge ratios. In some embodiments, ions generated by the ion source continuously flow into the ion trap. Additionally or alternatively, ion optics receive ions ejected from the ion trap and cool the ions without substantial fragmentation. An ion analyzer receives ions ejected from the ion trap or ion optics and separates the ions in accordance with at least one characteristic of the ions.

公开(公告)号：US08022363B2

公开(公告)日：2011-09-20

申请号：US12595393

申请日：2008-03-28

Applicant: Shinichi Iwamoto ,  Kei Kodera ,  Sadanori Sekiya

Inventor： Shinichi Iwamoto ,  Kei Kodera ,  Sadanori Sekiya

IPC: H01J49/42 ,  H01J3/00

CPC classification number: H01J49/424 ,  H01J49/164 ,  H01J49/4295

Abstract: While applying a square wave voltage to the ion electrode (21) so that ions already captured in the ion trap (20) do not disperse, the frequency of the square wave voltage is temporarily increased at the timing when the ions generated in response to the short time irradiation of a laser light reach the ion inlet (25). This decreases the Mathieu parameter qz, and the potential well becomes shallow, which makes it easy for ions to enter the ion trap (20). Although the ions that have been already captured become more likely to disperse, the frequency of the square wave voltage is decreased before they deviate from the stable orbit. Thus, the dispersion of the ions can also be avoided. Accordingly, while the number of captured ions is not decreased, new ions are further added, and thereby the amount of ions can be increased. By performing a mass separation and detection after that, the signal intensity in one mass analysis can be increased. Thereby, the number of repetition of the mass analysis for summing up the mass profiles can be decreased, and the signal intensity can be increased while decreasing the measuring time.

Abstract translation: 当向离子电极（21）施加方波电压时，已经捕获在离子阱（20）中的离子不分散，在响应于该离子阱产生的离子的时刻，方波电压的频率暂时增加 激光的短时间照射到达离子入口（25）。 这降低了Mathieu参数qz，势阱变浅，这使离子容易进入离子阱（20）。 虽然已经被捕获的离子更容易分散，但是在它们偏离稳定轨道之前，方波电压的频率被降低。 因此，也可以避免离子的分散。 因此，虽然捕获离子的数量没有减少，但是进一步添加新离子，从而可以提高离子的量。 通过进行质量分离和检测，可以提高一次质量分析中的信号强度。 因此，可以减少用于求出质量曲线的质量分析的重复次数，并且可以在减少测量时间的同时增加信号强度。

公开(公告)号：US20110149260A1

公开(公告)日：2011-06-23

申请号：US12644591

申请日：2009-12-22

Applicant: Francis Goodwin

Inventor： Francis Goodwin

IPC: G03B27/54 ,  H01J3/00

CPC classification number: G03F7/70575

Abstract: A band pass filter includes a first electrode, a second electrode, and a plasma generated by the first and second electrode. The plasma is confined to a region of space through which electromagnetic waves having a frequency above an intrinsic plasma frequency are transmitted, and electromagnetic waves having a frequency below the intrinsic plasma frequency are reflected. The band pass filter may be implemented in a photo lithography tool between a source module and an exposure module. The plasma of the band pass filter may be adapted to reduce IR radiation (or other out of band radiation) exposure to the exposure module by reflecting IR radiation back to the radiation source. In an extreme ultraviolet photo lithography tool, the plasma of the band pass filter may be adapted to transmit EUV radiation.

Abstract translation: 带通滤波器包括第一电极，第二电极和由第一和第二电极产生的等离子体。 等离子体被限制在具有高于固有等离子体频率的频率的电磁波的空间区域，并且具有低于固有等离子体频率的频率的电磁波被反射。 带通滤波器可以在源模块和曝光模块之间的光刻工具中实现。 带通滤波器的等离子体可以适于通过将IR辐射反射回辐射源来减少暴露于曝光模块的IR辐射（或其它带外辐射）。 在极紫外光刻工具中，带通滤波器的等离子体可适于传输EUV辐射。

公开(公告)号：US20110057566A1

公开(公告)日：2011-03-10

申请号：US12812270

申请日：2009-01-08

Applicant: Maxime Makarov

Inventor： Maxime Makarov

IPC: H01J3/00

CPC classification number: H01J3/021 ,  H01J33/00 ,  H01S3/0959 ,  H01S3/09707

Abstract: The invention relates to a pumped electron source (1) that comprises an ionisation chamber (4), an acceleration chamber (2) with an electrode (3) for extracting and accelerating primary ions and forming a secondary-electron beam, characterised in that said pumped electron source (1) comprises a power supply (11) adapted for applying to said electrode (3) a positive voltage for urging a primary plasma (17) outside the acceleration chamber (2), and a negative voltage pulse for extracting and accelerating the primary ions and forming a secondary-electron beam.

Abstract translation: 本发明涉及一种泵浦电子源（1），其包括电离室（4），具有用于提取和加速初级离子并形成二次电子束的电极（3）的加速室（2），其特征在于所述 抽吸电子源（1）包括适于向所述电极（3）施加用于促使加速室（2）外部的初级等离子体（17）的正电压的电源（11）和用于提取和加速的负电压脉冲 初级离子并形成二次电子束。

公开(公告)号：US20110057565A1

公开(公告)日：2011-03-10

申请号：US12812245

申请日：2009-01-08

Applicant: Maxime Makarov

Inventor： Maxime Makarov

IPC: H01J3/00

CPC classification number: H01J3/021 ,  H01J33/00

Abstract: The power supply device (14) for an ion-bombardment-induced secondary-emission electron source in a low-pressure chamber comprises a control input, two high-voltage outputs, a means for generating a plurality of positive pulses on a high-voltage output, and a means for generating a negative pulse on the other high-voltage output after at least some of the positive pulses.

Abstract translation: 用于低压室中的离子轰击诱发二次发射电子源的供电装置（14）包括控制输入端，两个高电压输出端，用于在高压电路上产生多个正脉冲的装置 输出，以及用于在至少一些正脉冲之后在另一高压输出上产生负脉冲的装置。

公开(公告)号：US07820992B2

公开(公告)日：2010-10-26

申请号：US12179900

申请日：2008-07-25

Applicant: Katsuhiko Yoshida

Inventor： Katsuhiko Yoshida

IPC: G02B5/00 ,  G21K1/00 ,  H01J1/52 ,  H01J3/00 ,  H01J5/18 ,  H01J29/46

CPC classification number: G21K1/04 ,  G21K1/043

Abstract: A neutron chopper according to the present invention includes a housing which internally forms a sealed space, the housing having window portions through which neutrons pass, a fixed shaft which is fixed inside the housing, a rotor which is rotatably supported by the fixed shaft, the rotor provided with a blocking portion which can block neutrons passing through the housing, and a motor which is provided inside the housing for rotating the rotor of the neutron chopper, where a stator of the motor is fixed to the fixed shaft, and a rotor of the motor receives a rotating force from the stator around the fixed shaft, and is fixed to the rotor of the neutron chopper. The neutron chopper is formed with small size, and neutron guides are easily disposed closely, consequently vacuum leak is hardly occurred in the neutron chopper.

Abstract translation: 根据本发明的中子切碎机包括内部形成密封空间的壳体，所述壳体具有中子通过的窗口部分，固定在壳体内部的固定轴，由固定轴可旋转地支撑的转子， 转子，其设置有阻挡穿过壳体的中子的阻挡部分;以及电动机，其设置在壳体内部，用于使中子切断器的转子旋转，其中电动机的定子固定到固定轴;转子， 电机从定子绕固定轴接收旋转力，并固定在中子切碎机的转子上。 中子斩波器形成为小尺寸，并且中子引导件容易紧密地设置，因此在中子斩波器中几乎不发生真空泄漏。

公开(公告)号：US20100181479A1

公开(公告)日：2010-07-22

申请号：US12459078

申请日：2009-06-25

Applicant: Rainer Knippelmeyer ,  Oliver Kienzle ,  Thomas Kemen ,  Heiko Mueller ,  Stephan Uhlemann ,  Maximilian Haider ,  Antonio Casares

Inventor： Rainer Knippelmeyer ,  Oliver Kienzle ,  Thomas Kemen ,  Heiko Mueller ,  Stephan Uhlemann ,  Maximilian Haider ,  Antonio Casares

IPC: H01J3/00 ,  H01J37/02 ,  H01J37/26 ,  H01J37/30

CPC classification number: H01J37/04 ,  B82Y10/00 ,  B82Y40/00 ,  H01J37/09 ,  H01J37/10 ,  H01J37/14 ,  H01J37/153 ,  H01J37/28 ,  H01J37/3007 ,  H01J37/3177 ,  H01J2237/0435 ,  H01J2237/0453 ,  H01J2237/047 ,  H01J2237/04735 ,  H01J2237/04756 ,  H01J2237/06 ,  H01J2237/14 ,  H01J2237/2817 ,  H01J2237/31774

Abstract: A particle-optical arrangement comprises a charged-particle source for generating a beam of charged particles; a multi-aperture plate arranged in a beam path of the beam of charged particles, wherein the multi-aperture plate has a plurality of apertures formed therein in a predetermined first array pattern, wherein a plurality of charged-particle beamlets is formed from the beam of charged particles downstream of the multi-aperture plate, and wherein a plurality of beam spots is formed in an image plane of the apparatus by the plurality of beamlets, the plurality of beam spots being arranged in a second array pattern; and a particle-optical to element for manipulating the beam of charged particles and/or the plurality of beamlets; wherein the first array pattern has a first pattern regularity in a first direction, and the second array pattern has a second pattern regularity in a second direction electron-optically corresponding to the first direction, and wherein the second regularity is higher than the first regularity.

Abstract translation: 粒子光学装置包括用于产生带电粒子束的带电粒子源; 布置在带电粒子束的光束路径中的多孔板，其中多孔板具有以预定的第一阵列图案形成在其中的多个孔，其中多个带电粒子子束由束形成 在多孔板下游的带电粒子，并且其中通过所述多个子束在所述装置的图像平面中形成多个束斑，所述多个束斑以第二阵列图案布置; 以及用于操纵带电粒子束和/或多个子束的粒子光学元件; 其中所述第一阵列图案在第一方向上具有第一图案规则性，并且所述第二阵列图案在与所述第一方向对应的电子 - 光学上的第二方向上具有第二图案规则性，并且其中所述第二规则性高于所述第一规则性。

公开(公告)号：US07728315B2

公开(公告)日：2010-06-01

申请号：US11868658

申请日：2007-10-08

Applicant: Tewfik J. Bichay

Inventor： Tewfik J. Bichay

IPC: G02B5/00 ,  G21K1/00 ,  H01J1/52 ,  H01J3/00 ,  H01J5/18 ,  H01J29/46 ,  G21C11/00 ,  G21F3/02

CPC classification number: G21F7/00 ,  A61N2005/1094 ,  G21Y2002/201 ,  G21Y2002/301 ,  G21Y2002/501 ,  G21Y2004/30

Abstract: A radiation attenuation corridor couples a radiation therapy room and a control room. The radiation attenuation corridor is made of a material that substantially absorbs ionizing radiation and substantially blocks the transmission of the ionizing radiation. Specific wall portions at the entrance of the corridor are covered with borated polyethylene (BPE). Specific wall portions diverge from an axis defined by the corridor by from about 10 degrees to about 45 degrees. The corridor thus leads out of the room and angles laterally across the wall of the therapy room, before angling again and opening to a safe room. The added angles in the radiation corridor increase the distance of radiation travel, and make the path more indirect, thereby increasing the contact of the radiation emissions with the radiation shielding and further attenuating the radiation.

Abstract translation: 辐射衰减走廊耦合放射治疗室和控制室。 辐射衰减走廊由基本上吸收电离辐射并且基本上阻挡电离辐射的透射的材料制成。 在走廊入口处的特定壁部分用硼酸化聚乙烯（BPE）覆盖。 具体的壁部分从走廊限定的轴线偏离约10度至约45度。 因此，走廊从房间转过来，并横向穿过治疗室的墙壁，然后再次前进并开放到安全的房间。 辐射走廊中增加的角度增加了辐射行进的距离，并使路径更间接，从而增加辐射辐射与辐射屏蔽的接触，并进一步衰减辐射。