Reissue Patent
- Patent Title: Lithography system, sensor and measuring method
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Application No.: US16896953Application Date: 2020-09-02
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Publication No.: USRE49602E1Publication Date: 2023-08-08
- Inventor: Pieter Kruit , Erwin Slot , Tijs Frans Teepen , Marco Jan-Jaco Wieland , Stijn Willem Herman Karel Steenbrink
- Applicant: ASML NETHERLANDS B.V.
- Applicant Address: NL Veldhoven
- Assignee: ASML Netherlands B.V.
- Current Assignee: ASML Netherlands B.V.
- Current Assignee Address: NL Veldhoven
- Agency: Finnegan, Henderson, Farabow, Garrett & Dunner, LLP
- The original application number of the division: US13738947 2013.01.10
- Main IPC: H01J3/00
- IPC: H01J3/00 ; H01J37/317 ; B82Y10/00 ; B82Y40/00 ; H01J37/304
Abstract:
Lithography system, sensor and method for measuring properties of a massive amount of charged particle beams of a charged particle beam system, in particular a direct write lithography system, in which
the charged particle beams are converted into light beams by using a converter element,
using an array of light sensitive detectors such as diodes, CCD or CMOS devices, located in line with said converter element, for detecting said light beams,
electronically reading out resulting signals from said detectors after exposure thereof by said light beams,
utilizing said signals for determining values for one or more beam properties, thereby using an automated electronic calculator, and
electronically adapting the charged particle system so as to correct for out of specification range values for all or a number of said charged particle beams, each for one or more properties, based on said calculated property values.
the charged particle beams are converted into light beams by using a converter element,
using an array of light sensitive detectors such as diodes, CCD or CMOS devices, located in line with said converter element, for detecting said light beams,
electronically reading out resulting signals from said detectors after exposure thereof by said light beams,
utilizing said signals for determining values for one or more beam properties, thereby using an automated electronic calculator, and
electronically adapting the charged particle system so as to correct for out of specification range values for all or a number of said charged particle beams, each for one or more properties, based on said calculated property values.
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