公开(公告)号：US08895160B2

公开(公告)日：2014-11-25

申请号：US12680367

申请日：2008-09-29

Applicant: Ragnhild Mihic ,  Peter Mihic

Inventor： Ragnhild Mihic ,  Peter Mihic

IPC: B32B9/04 ,  B32B15/04 ,  C01C3/00 ,  C01B31/30 ,  B23Q11/00 ,  B25D17/00 ,  C23C14/06 ,  B23B27/00 ,  B23B29/04 ,  B23B31/00 ,  C23C14/00 ,  C23C16/34 ,  C23C28/02 ,  C23C28/00

CPC classification number: C23C14/0658 ,  B23B27/002 ,  B23B27/007 ,  B23B29/043 ,  B23B31/005 ,  B23B2226/18 ,  B23B2228/10 ,  C23C14/0057 ,  C23C16/347 ,  C23C28/023 ,  C23C28/322 ,  C23C28/34 ,  C23C28/345 ,  C23C28/347 ,  C23C28/42 ,  Y10S428/9088 ,  Y10T407/1906 ,  Y10T407/22 ,  Y10T408/76 ,  Y10T409/304312 ,  Y10T428/12535 ,  Y10T428/12576 ,  Y10T428/249921 ,  Y10T428/26 ,  Y10T428/2982 ,  Y10T428/31678

Abstract: The present invention provides an appliance for chip removal applications comprising a vibration-damping material wherein the vibration-damping material is a material arranged by nano-dimensional cluster form. The present invention additionally provides a method for manufacturing said appliance. The present invention provides also an appliance obtainable by said method. Additionally the present invention provides an article or work piece for use in an appliance for chip removal applications. Also a computer program is provided for controlling the above method.

Abstract translation: 本发明提供了一种用于除屑应用的器具，其包括减震材料，其中所述减震材料是通过纳米尺寸簇形式布置的材料。 本发明另外提供了一种用于制造所述器具的方法。 本发明还提供可通过所述方法获得的器具。 另外，本发明提供了一种用于在用于芯片去除应用的设备中的物品或工件。 还提供了一种用于控制上述方法的计算机程序。

公开(公告)号：US20030035905A1

公开(公告)日：2003-02-20

申请号：US09931529

申请日：2001-08-16

Applicant: Richter Precision, Inc.

Inventor： Val L. Lieberman ,  J. Hans Richter ,  Yasuo Yamazaki

IPC: B32B018/00 ,  C23C016/00

CPC classification number: C23C16/347 ,  C23C14/0021 ,  C23C14/025 ,  C23C14/0658 ,  C23C16/0281 ,  Y10T428/2495 ,  Y10T428/30

Abstract: The disclosure is for a film coating which yields increased life for optical media molds and the method and apparatus for making such a film. The film is a carbon nitride layer of 0.5 to 5.0 microns thickness with 2% to 45% nitrogen coated on an underlayer. One method of making the carbon nitride film is by the use of a pulsed carbon arc to generate a carbon plasma while injecting nitrogen into the vacuum chamber in which the arc is created. Another method is to generate a radio frequency plasma in a vacuum chamber into which acetylene and nitrogen gas are injected. The carbon nitride is formed by the combination of nitrogen with the carbon from the acetylene.

公开(公告)号：US5840435A

公开(公告)日：1998-11-24

申请号：US477194

申请日：1995-06-07

Applicant: Charles M. Lieber ,  Z. John Zhang ,  Chunming Niu

Inventor： Charles M. Lieber ,  Z. John Zhang ,  Chunming Niu

IPC: C01B21/06 ,  C23C14/00 ,  C23C14/06 ,  C23C14/28 ,  B32B9/00

CPC classification number: C23C14/28 ,  C01B21/0605 ,  C23C14/0021 ,  C23C14/0658 ,  Y10T428/265 ,  Y10T428/31678

Abstract: A nitride material comprises C.sub.2 N. A method of forming a covalent carbon material includes forming an atomic nitrogen source, forming an elemental reagent source and combining the atomic nitrogen, elemental reagent to form the covalent carbon material and annealing the covalent carbon material. The elemental reagent is reactive with the atomic nitrogen of the atomic nitrogen source to form the covalent carbon material. Annealing the covalent carbon material produces the C.sub.2 N. In one embodiment, essentially all carbon nitride chemical bonds are single or double bonds.

Abstract translation: 氮化物材料包括C2N。 形成共价碳材料的方法包括形成原子氮源，形成元素试剂源并组合原子氮元素试剂以形成共价碳材料并退火共价碳材料。 元素试剂与原子氮源的原子氮反应形成共价碳材料。 退火共价碳材料产生C2N。 在一个实施方案中，基本上所有的碳氮化物化学键都是单键或双键。

公开(公告)号：US5232570A

公开(公告)日：1993-08-03

申请号：US723431

申请日：1991-06-28

Applicant: William G. Haines ,  Chongwon Byun ,  Earl Johns ,  Quock Ng ,  Durga Ravipati ,  Robert M. Raymond ,  Gary C. Rauch

Inventor： William G. Haines ,  Chongwon Byun ,  Earl Johns ,  Quock Ng ,  Durga Ravipati ,  Robert M. Raymond ,  Gary C. Rauch

IPC: C23C14/06 ,  G11B5/72 ,  G11B5/84

CPC classification number: G11B5/8408 ,  C23C14/0658 ,  G11B5/72

Abstract: A hard protective material and method for forming the medium having the formula C.sub.x N.sub.y. The medium may be formed as a protective film on a magnetic recording disk in a sputtering apparatus such as a magnetron apparatus. The amount of nitrogen in the film may be affected by controlling the collisions of the sputtered material between the target and deposition substrate by controlling the bombardment of the substrate by electrons. The films exhibit properties indicative of a textured morphology on a nanoscale which enhances the retention of lubricant overcoats.

Abstract translation: 用于形成具有式C x N y的介质的硬保护材料和方法。 介质可以在诸如磁控管装置的溅射装置中在磁记录盘上形成为保护膜。 通过通过电子控制衬底的轰击来控制溅射材料在靶和沉积衬底之间的碰撞可能影响膜中的氮的量。 该膜表现出纳米尺度上的纹理形态的性质，其增强润滑剂外涂层的保留性。

公开(公告)号：US20130104461A1

公开(公告)日：2013-05-02

申请号：US13621633

申请日：2012-09-17

Applicant: PICODEON LTD OY ,  CARBODEON LTD OY

Inventor： Vesa MYLLYMÄKI ,  Jukka HÄYRYNEN ,  Mika KAUPPINEN

IPC: C09D7/12

CPC classification number: C09D7/63 ,  C23C14/06 ,  C23C14/0658 ,  C23C14/28 ,  H01L23/291 ,  H01L2924/0002 ,  H01L2924/00

Abstract: A coating material is used for coating a substrate by means of laser ablation. The coating material contains graphitic carbon nitride and a dopant in order to alter the properties of the coating produced as compared to a coating of pure carbon nitride.

Abstract translation: 涂层材料用于通过激光烧蚀涂覆基底。 与纯碳氮化物涂层相比，涂层材料含有石墨碳氮化物和掺杂剂，以改变所生产的涂层的性能。

公开(公告)号：US20120171474A1

公开(公告)日：2012-07-05

申请号：US13166318

申请日：2011-06-22

Applicant: HSIN-PEI CHANG ,  WEN-RONG CHEN ,  HUANN-WU CHIANG ,  CHENG-SHI CHEN ,  CONG LI

Inventor： HSIN-PEI CHANG ,  WEN-RONG CHEN ,  HUANN-WU CHIANG ,  CHENG-SHI CHEN ,  CONG LI

IPC: B32B3/00 ,  C23C14/06 ,  C23C14/35 ,  B32B17/06 ,  B32B15/04

CPC classification number: C23C14/022 ,  C23C14/0057 ,  C23C14/0658 ,  C23C14/345 ,  C23C14/35 ,  Y10T428/265 ,  Y10T428/31678

Abstract: A coated article is provided. The coated article includes a substrate, a hydrophobic layer formed on the substrate. The hydrophobic layer includes a first layer portion formed on the substrate and a second layer portion formed on the first layer portion, the first layer portion is a CNy layer, the second layer portion is a CNxFz layer, wherein 1≦y≦3, 1≦x≦3, 1≦z≦4. The water contact angle of the hydrophobic layer is more than 110°. The hydrophobic layer has a good chemical stability, high-temperature resistance and a good abrasion resistance, which effectively extends the use time of the coated article. A method for making the coated article is also described there.

Abstract translation: 提供涂层制品。 涂覆制品包括基材，形成在基材上的疏水层。 疏水层包括形成在基板上的第一层部分和形成在第一层部分上的第二层部分，第一层部分是CNy层，第二层部分是CNxFz层，其中1＆nlE; y＆nlE; 3,1＆ ; x＆nlE; 3，1＆nlE; z＆nlE; 4。 疏水层的水接触角大于110°。 疏水层具有良好的化学稳定性，耐高温性和良好的耐磨性，有效延长了涂层制品的使用时间。 还描述了制造涂覆制品的方法。

公开(公告)号：US20120082800A1

公开(公告)日：2012-04-05

申请号：US13216555

申请日：2011-08-24

Applicant: Masatoshi SAKURAI ,  Kaori Kimura ,  Yoshiyuki Kamata ,  Takeshi Iwasaki

Inventor： Masatoshi SAKURAI ,  Kaori Kimura ,  Yoshiyuki Kamata ,  Takeshi Iwasaki

IPC: C23C14/04

CPC classification number: C23C14/0605 ,  C23C14/0635 ,  C23C14/0658 ,  C23C14/5893 ,  G11B5/855

Abstract: According to one embodiment, there is provided a method for manufacturing a magnetic recording medium, the method including: depositing a magnetic recording layer on a substrate; forming a mask on a region of the magnetic recording layer corresponding to a recording area; irradiating another region of the magnetic recording layer where the mask is not formed with an ion beam using a C-containing gas as a source gas to deactivate the another region and to thereby form a non-recording area; and forming a protective film over an entire surface of the substrate.

Abstract translation: 根据一个实施例，提供了一种用于制造磁记录介质的方法，所述方法包括：在基板上沉积磁记录层; 在对应于记录区域的磁记录层的区域上形成掩模; 使用含C气体作为源气体照射没有形成掩模的磁记录层的另一个区域，使离子束使其另一区域失活，从而形成非记录区域; 以及在所述基板的整个表面上形成保护膜。

公开(公告)号：US20080311345A1

公开(公告)日：2008-12-18

申请号：US12280641

申请日：2007-02-23

Applicant: Jari Ruuttu ,  Reijo Lappalainen ,  Vesa Myllymaki ,  Lasse Pulli ,  Juha Makitalo

Inventor： Jari Ruuttu ,  Reijo Lappalainen ,  Vesa Myllymaki ,  Lasse Pulli ,  Juha Makitalo

IPC: B32B3/24 ,  C23C14/30 ,  B32B5/00

CPC classification number: B23K26/0821 ,  A61B17/86 ,  A61B2017/00836 ,  A61F2/30767 ,  A61F2/3094 ,  A61F2/34 ,  A61F2/38 ,  A61F2002/30929 ,  A61F2002/3097 ,  A61F2002/3611 ,  A61F2310/00395 ,  A61F2310/00574 ,  A61F2310/00598 ,  A61F2310/0073 ,  A61F2310/00856 ,  A61L27/30 ,  B23K26/0624 ,  B23K26/32 ,  B23K26/324 ,  B23K26/34 ,  B23K2103/05 ,  B23K2103/08 ,  B23K2103/14 ,  B23K2103/18 ,  B23K2103/26 ,  B23K2103/42 ,  B23K2103/50 ,  B23K2103/52 ,  C23C14/0036 ,  C23C14/0611 ,  C23C14/0658 ,  C23C14/083 ,  C23C14/16 ,  C23C14/28 ,  Y10T428/24331 ,  Y10T428/26 ,  Y10T428/265

Abstract: The invention relates in general level to a method for coating various products including large surface areas with carbon nitride material. The invention also relates to carbon nitride coated products manufactured by the method. The coating is carried out by employing ultra short pulsed laser deposition wherein pulsed laser beam is scanned with a rotating optical scanner including at least one mirror for reflecting the laser beam. The invention has several both industrially and qualitatively advantageous effects such as high coating production rate, excellent coating properties and overall low manufacturing costs.

Abstract translation: 本发明一般涉及用氮化碳材料涂覆包括大表面积的各种产品的方法。 本发明还涉及通过该方法制造的氮化碳涂覆产品。 通过使用超短脉冲激光沉积来进行涂层，其中脉冲激光束用包括至少一个用于反射激光束的反射镜的旋转光学扫描仪扫描。 本发明具有工业上和质量上有利的效果，例如高涂层生产速率，优异的涂层性能和整体低的制造成本。

公开(公告)号：US06969447B2

公开(公告)日：2005-11-29

申请号：US10756556

申请日：2004-01-12

Applicant: Daryl J. Pocker ,  Jan-Ulrich Thiele ,  Bond-Yen Ting ,  Richard Longstreth White ,  Bing K. Yen

Inventor： Daryl J. Pocker ,  Jan-Ulrich Thiele ,  Bond-Yen Ting ,  Richard Longstreth White ,  Bing K. Yen

IPC: C23C14/06 ,  C23C14/34 ,  G11B5/012 ,  G11B5/72 ,  G11B5/82 ,  G11B5/84 ,  H01F41/32 ,  B05D1/18

CPC classification number: C23C14/345 ,  C23C14/0658 ,  G11B5/012 ,  G11B5/72 ,  G11B5/82 ,  G11B5/8408 ,  H01F41/32

Abstract: A method for sputtering a thin film protective layer with improved durability is disclosed. The method reduces kinetic energy of the ions of the overcoat material during the initial period of deposition to form a buffering interface which reduces the interpenetration of the atoms of the protective layer into the underlying film. In the method of the invention the sputtering of the overcoat preferably begins with zero (or very low) voltage applied to the underlying film resulting in minimal ion implantation in the underlying film. The “high energy” phase of the process begins with increases in the magnitude of the negative bias voltage applied to the underlying film. The higher energy imparted to ions in the plasma result in a denser and harder film being formed over the initial buffer layer. The protective layer preferably comprises carbon and nitrogen.

Abstract translation: 公开了一种用于溅射具有改善的耐久性的薄膜保护层的方法。 该方法在初始沉积期间降低外涂层材料的离子的动能，形成缓冲界面，从而减少保护层原子相互渗透到下面的膜中。 在本发明的方法中，外涂层的溅射优选以施加到下面的膜的零（或非常低的）电压开始，导致在底层膜中的最小离子注入。 该过程的“高能”阶段从施加到底层薄膜的负偏置电压的大小的增加开始。 在等离子体中赋予离子的较高能量导致在初始缓冲层上形成更致密和更硬的膜。 保护层优选包含碳和氮。

公开(公告)号：US20050249870A1

公开(公告)日：2005-11-10

申请号：US11103653

申请日：2005-04-11

Applicant: Yasuyuki Kawada

Inventor： Yasuyuki Kawada

IPC: G11B5/667 ,  B05D5/12 ,  C23C14/06 ,  C23C14/14 ,  C23C14/18 ,  C23C14/58 ,  G11B5/64 ,  G11B5/66 ,  G11B5/673 ,  G11B5/73 ,  G11B5/738 ,  G11B5/84 ,  G11B5/851

CPC classification number: C23C14/185 ,  C23C14/0658 ,  C23C14/5853 ,  G11B5/65 ,  G11B5/656 ,  G11B5/66 ,  G11B5/667 ,  G11B5/7325 ,  G11B5/8404 ,  G11B5/851

Abstract: A method for producing a magnetic recording medium in which the noise of the magnetic recording medium is reduced and the thermal stability of the recorded magnetization is improved, while enabling easy writing to be carried out by a recording head, is disclosed. The magnetic recording medium of the present invention includes an underlayer having an hcp crystal structure and a magnetic layer produced by a multilayer lamination of Co/Pt or the like. The deposition rate of the underlayer is equal to or lower than 0.7 nm/second. The magnetic layer contains added silicon oxide at 1 to 10 mol %. The present method includes a step for subjecting the surface of the underlayer to Ar gas mixed with oxygen of a mass/flow rate ratio of 1% to 10% under a gas pressure of 0.1 to 10 Pa for 1 to 10 second(s). The magnetic recording medium may include an orientation control layer and a soft magnetic backing layer. Ku, Ku1, and Ku2 are controlled to provide both of thermal stability and easy writing.

Abstract translation: 公开了一种制造磁记录介质的方法，其中磁记录介质的噪声减小并且记录磁化的热稳定性得到改善，同时能够通过记录头进行容易的写入。 本发明的磁记录介质包括具有hcp晶体结构的底层和通过Co / Pt等的多层层叠产生的磁性层。 底层的沉积速度等于或低于0.7nm /秒。 磁性层含有1〜10摩尔％的加成氧化硅。 本方法包括在气体压力为0.1〜10Pa下1〜10秒的质量/流量比为1％〜10％的下层的与Ar混合的Ar气体的表面进行1〜10秒的步骤。 磁记录介质可以包括取向控制层和软磁背衬层。 Ku，Ku＆lt; 1＆gt;和Ku＆amp; 2＆lt; 2＆gt;被控制以提供热稳定性和容易书写。