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公开(公告)号：US20100221489A1
公开(公告)日：2010-09-02
申请号：US12280631
申请日：2007-02-23
Applicant: Reijo Lappalainen , Vesa Myllymäki , Lasse Pulli , Jari Ruuttu , Juha Mäkitalo
Inventor： Reijo Lappalainen , Vesa Myllymäki , Lasse Pulli , Jari Ruuttu , Juha Mäkitalo
CPC classification number: C23C14/28 , B23K26/0821 , C23C14/20 , Y10T428/24355 , Y10T428/25 , Y10T428/256 , Y10T428/264 , Y10T428/265 , Y10T428/266 , Y10T428/273 , Y10T428/31678
Abstract: The invention relates in general level to a method for coating glass products including large surface areas. The invention also relates to coated glass products manufactured by the method. The coating is carried out by employing ultra short pulsed laser deposition wherein pulsed laser beam is scanned with a rotating optical scanner including at least one mirror for reflecting the laser beam. The invention has several both industrially and qualitatively advantageous effects such as high coating production rate, excellent coating properties and overall low manufacturing costs.
Abstract translation: 本发明一般涉及包括大表面积的玻璃制品的涂覆方法。 本发明还涉及通过该方法制造的涂覆玻璃制品。 通过使用超短脉冲激光沉积来进行涂层，其中脉冲激光束用包括至少一个用于反射激光束的反射镜的旋转光学扫描仪扫描。 本发明具有工业上和质量上有利的效果，例如高涂层生产速率，优异的涂层性能和整体低的制造成本。
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2.发明申请Method for Producing High-Quality Surfaces and a Product Having a High-Quality Surface 审中-公开生产高质量表面的方法和具有高质量表面的产品公开(公告)号：US20090169871A1
公开(公告)日：2009-07-02
申请号：US12224316
申请日：2007-02-23
Applicant: Reijo Lappalainen , Vesa Myllymaki , Lasse Pulli , Juha Makitalo
Inventor： Reijo Lappalainen , Vesa Myllymaki , Lasse Pulli , Juha Makitalo
IPC: C23C14/28
CPC classification number: C23C14/28 , C23C14/0611 , C23C14/081 , C23C14/083 , C23C14/087 , C23C14/12 , C23C14/20 , Y10T428/26
Abstract: The invention relates to a laser ablation method for coating an object with one or more surfaces, so that the object to be coated, i.e. the substrate, is coated by ablating the target, so that the uniformity of the surface deposited on the object to be coated is ±100 nm. The surface of the coated object is advantageously free of micron size particles, and it is typically a nano technological surface where the size of separate particles is ±25 nm at most. The object also relates to products made by said method.
Abstract translation: 本发明涉及一种用于涂覆具有一个或多个表面的物体的激光烧蚀方法，使得待涂覆的物体（即，基底）通过烧蚀靶被涂覆，使得沉积在物体上的表面的均匀性为 涂层为±100nm。 涂覆物体的表面有利地不含微米尺寸的颗粒，并且通常是纳米技术表面，其中单独颗粒的尺寸最多为±25nm。 该目的还涉及由所述方法制成的产品。
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公开(公告)号：US20090166343A1
公开(公告)日：2009-07-02
申请号：US12224306
申请日：2007-02-23
Applicant: Reijo Lappalainen , Vesa Myllymaki , Lasse Pulli , Juha Makitalo
Inventor： Reijo Lappalainen , Vesa Myllymaki , Lasse Pulli , Juha Makitalo
IPC: B23K26/36
CPC classification number: B23K26/12 , B23K26/1224 , B23K26/123 , B23K26/361 , C23C14/0611 , C23C14/081 , C23C14/083 , C23C14/086 , C23C14/087 , C23C14/28
Abstract: The invention relates to a laser ablation coating method, where the laser ablation is carried out in a space with 10−3 atmospheres at most. A low vacuum level enables an advantageous industrial production of surfaces without remarkably weakening the quality features of the deposited surfaces. The invention also relates to a method for producing nano particles, so that target material is ablated by pulse laser for generating nano particles in a space with 10−3 atmospheres at most.
Abstract translation: 本发明涉及一种激光烧蚀涂层方法，其中激光烧蚀最多在10 -3个大气压的空间内进行。 低真空度能够有利于工业生产表面，而不会显着削弱沉积表面的质量特征。 本发明还涉及一种生产纳米颗粒的方法，使得目标材料被脉冲激光烧蚀，以在最多具有10 -3个大气压的空间中产生纳米颗粒。
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公开(公告)号：US20090136739A1
公开(公告)日：2009-05-28
申请号：US12280636
申请日：2007-02-23
Applicant: Jari Ruuttu , Reijo Lappalainen , Vesa Myllymaki , Lasse Pulli , Juha Makitalo
Inventor： Jari Ruuttu , Reijo Lappalainen , Vesa Myllymaki , Lasse Pulli , Juha Makitalo
CPC classification number: C23C14/28 , B23K26/0821 , C23C14/20 , Y10T428/24355 , Y10T428/25 , Y10T428/256 , Y10T428/264 , Y10T428/265 , Y10T428/266 , Y10T428/273 , Y10T428/31678
Abstract: The invention relates in general level to a method for coating plastic products including large surface areas. The invention also relates to coated plastic products manufactured by the method. The coating is carried out by employing ultra short pulsed laser deposition wherein pulsed laser beam is scanned with a rotating optical scanner including at least one mirror for reflecting the laser beam. The invention has several both industrially and qualitatively advantageous effects such as low production temperatures accomplishing the coating of plastic products, high coating production rate, excellent coating properties and overall low manufacturing costs.
Abstract translation: 本发明一般涉及用于涂覆包括大表面积的塑料制品的方法。 本发明还涉及通过该方法制造的涂覆塑料制品。 通过使用超短脉冲激光沉积来进行涂层，其中脉冲激光束用包括至少一个用于反射激光束的反射镜的旋转光学扫描仪扫描。 本发明具有工业上和质量上有利的效果，例如低的生产温度完成了塑料制品的涂层，高涂层生产率，优异的涂层性能和整体的低制造成本。
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公开(公告)号：US20080311345A1
公开(公告)日：2008-12-18
申请号：US12280641
申请日：2007-02-23
Applicant: Jari Ruuttu , Reijo Lappalainen , Vesa Myllymaki , Lasse Pulli , Juha Makitalo
Inventor： Jari Ruuttu , Reijo Lappalainen , Vesa Myllymaki , Lasse Pulli , Juha Makitalo
CPC classification number: B23K26/0821 , A61B17/86 , A61B2017/00836 , A61F2/30767 , A61F2/3094 , A61F2/34 , A61F2/38 , A61F2002/30929 , A61F2002/3097 , A61F2002/3611 , A61F2310/00395 , A61F2310/00574 , A61F2310/00598 , A61F2310/0073 , A61F2310/00856 , A61L27/30 , B23K26/0624 , B23K26/32 , B23K26/324 , B23K26/34 , B23K2103/05 , B23K2103/08 , B23K2103/14 , B23K2103/18 , B23K2103/26 , B23K2103/42 , B23K2103/50 , B23K2103/52 , C23C14/0036 , C23C14/0611 , C23C14/0658 , C23C14/083 , C23C14/16 , C23C14/28 , Y10T428/24331 , Y10T428/26 , Y10T428/265
Abstract: The invention relates in general level to a method for coating various products including large surface areas with carbon nitride material. The invention also relates to carbon nitride coated products manufactured by the method. The coating is carried out by employing ultra short pulsed laser deposition wherein pulsed laser beam is scanned with a rotating optical scanner including at least one mirror for reflecting the laser beam. The invention has several both industrially and qualitatively advantageous effects such as high coating production rate, excellent coating properties and overall low manufacturing costs.
Abstract translation: 本发明一般涉及用氮化碳材料涂覆包括大表面积的各种产品的方法。 本发明还涉及通过该方法制造的氮化碳涂覆产品。 通过使用超短脉冲激光沉积来进行涂层，其中脉冲激光束用包括至少一个用于反射激光束的反射镜的旋转光学扫描仪扫描。 本发明具有工业上和质量上有利的效果，例如高涂层生产速率，优异的涂层性能和整体低的制造成本。
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Patent Agency Ranking
公开(公告)号：US08486073B2
公开(公告)日：2013-07-16
申请号：US12280609
申请日：2007-02-23
Applicant: Reijo Lappalainen , Vesa Myllymäki , Lasse Pulli , Jari Ruuttu , Juha Mäkitalo
Inventor： Reijo Lappalainen , Vesa Myllymäki , Lasse Pulli , Jari Ruuttu , Juha Mäkitalo
CPC classification number: B23K26/0821 , A61B17/86 , A61B2017/00836 , A61F2/30767 , A61F2/3094 , A61F2/34 , A61F2/38 , A61F2002/30929 , A61F2002/3097 , A61F2002/3611 , A61F2310/00395 , A61F2310/00574 , A61F2310/00598 , A61F2310/0073 , A61F2310/00856 , A61L27/30 , B23K26/0624 , B23K26/32 , B23K26/324 , B23K26/34 , B23K2103/05 , B23K2103/08 , B23K2103/14 , B23K2103/18 , B23K2103/26 , B23K2103/42 , B23K2103/50 , B23K2103/52 , C23C14/0036 , C23C14/0611 , C23C14/0658 , C23C14/083 , C23C14/16 , C23C14/28 , Y10T428/24331 , Y10T428/26 , Y10T428/265
Abstract: The invention relates in general level to a method for coating articulating surfaces of medical products. The invention also relates to coated medical products manufactured by the method. The coating is carried out by employing ultra short pulsed laser deposition wherein pulsed laser beam is preferably scanned with a rotating optical scanner including at least one mirror for reflecting the laser beam. The invention has several both industrially and qualitatively advantageous effects such as high coating production rate, excellent coating properties and overall low manufacturing costs.
Abstract translation: 本发明一般涉及用于涂覆医疗产品的关节表面的方法。 本发明还涉及通过该方法制造的涂覆医疗产品。 涂层通过采用超短脉冲激光沉积进行，其中脉冲激光束优选用包括用于反射激光束的至少一个反射镜的旋转光学扫描仪进行扫描。 本发明具有工业上和质量上有利的效果，例如高涂层生产速率，优异的涂层性能和整体低的制造成本。
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公开(公告)号：US20090012523A1
公开(公告)日：2009-01-08
申请号：US12280609
申请日：2007-02-23
Applicant: Jari Ruuttu , Reijo Lappalainen , Vesa Myllymaki , Lasse Pulli , Juha Makitalo
Inventor： Jari Ruuttu , Reijo Lappalainen , Vesa Myllymaki , Lasse Pulli , Juha Makitalo
CPC classification number: B23K26/0821 , A61B17/86 , A61B2017/00836 , A61F2/30767 , A61F2/3094 , A61F2/34 , A61F2/38 , A61F2002/30929 , A61F2002/3097 , A61F2002/3611 , A61F2310/00395 , A61F2310/00574 , A61F2310/00598 , A61F2310/0073 , A61F2310/00856 , A61L27/30 , B23K26/0624 , B23K26/32 , B23K26/324 , B23K26/34 , B23K2103/05 , B23K2103/08 , B23K2103/14 , B23K2103/18 , B23K2103/26 , B23K2103/42 , B23K2103/50 , B23K2103/52 , C23C14/0036 , C23C14/0611 , C23C14/0658 , C23C14/083 , C23C14/16 , C23C14/28 , Y10T428/24331 , Y10T428/26 , Y10T428/265
Abstract: The invention relates in general level to a method for coating articulating surfaces of medical products. The invention also relates to coated medical products manufactured by the method. The coating is carried out by employing ultra short pulsed laser deposition wherein pulsed laser beam is preferably scanned with a rotating optical scanner including at least one mirror for reflecting the laser beam. The invention has several both industrially and qualitatively advantageous effects such as high coating production rate, excellent coating properties and overall low manufacturing costs.
Abstract translation: 本发明一般涉及用于涂覆医疗产品的关节表面的方法。 本发明还涉及通过该方法制造的涂覆医疗产品。 涂层通过采用超短脉冲激光沉积进行，其中脉冲激光束优选用包括用于反射激光束的至少一个反射镜的旋转光学扫描仪进行扫描。 本发明具有工业上和质量上有利的效果，例如高涂层生产速率，优异的涂层性能和整体低的制造成本。
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公开(公告)号：US08828506B2
公开(公告)日：2014-09-09
申请号：US12522991
申请日：2008-02-22
Applicant: Jari Ruuttu , Vesa Myllymäki , Reijo Lappalainen , Lasse Pulli , Juha Mäkitalo , Sampo Ylätalo
Inventor： Jari Ruuttu , Vesa Myllymäki , Reijo Lappalainen , Lasse Pulli , Juha Mäkitalo , Sampo Ylätalo
IPC: C23C14/30 , B23K26/08 , H01J37/32 , B23K26/067 , C23C14/28
CPC classification number: B23K26/0821 , B23K26/067 , B23K26/0673 , B23K26/082 , C23C14/28 , H01J37/32339
Abstract: The invention relates in general level to radiation transference techniques as applied for utilization of material handling. The invention relates to a radiation source arrangement comprising a path of radiation transference, or an improved path of radiation transference, which path comprises a scanner or an improved scanner. The invention also concerns a target material suitable for vaporization and/or ablation. The invention concerns an improved scanner. The invention concerns also to a vacuum vaporization/ablation arrangement that has a radiation source arrangement according to invention. The invention concerns also a target material unit, to be used in coating and/or manufacturing target material.
Abstract translation: 本发明一般涉及用于材料处理利用的辐射转移技术。 本发明涉及一种辐射源装置，其包括辐射传播路径或改进的辐射传播路径，该路径包括扫描器或改进的扫描仪。 本发明还涉及适于蒸发和/或消融的靶材料。 本发明涉及一种改进的扫描仪。 本发明还涉及具有根据本发明的辐射源装置的真空蒸发/消融装置。 本发明还涉及用于涂覆和/或制造目标材料的靶材料单元。
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9.发明授权公开(公告)号：US08741749B2
公开(公告)日：2014-06-03
申请号：US12280657
申请日：2007-02-23
Applicant: Reijo Lappalainen , Vesa Myllymäki , Lasse Pulli , Jari Ruuttu , Juha Mäkitalo
Inventor： Reijo Lappalainen , Vesa Myllymäki , Lasse Pulli , Jari Ruuttu , Juha Mäkitalo
IPC: H01L29/06
CPC classification number: C23C14/28 , B23K26/0821 , C23C14/20 , Y10T428/24355 , Y10T428/25 , Y10T428/256 , Y10T428/264 , Y10T428/265 , Y10T428/266 , Y10T428/273 , Y10T428/31678
Abstract: The present invention relates generally to semiconductors, material layers within semiconductors, a production method of semiconductors, and a manufacturing arrangement for producing semiconductors. A semiconductor according to the invention includes at least one layer with a surface, produced by laser ablation, wherein the uniform surface area to be produced includes at least an area 0.2 dm2 and the layer has been produced by employing ultra short pulsed laser deposition wherein pulsed laser beam is scanned with a rotating optical scanner including at least one mirror for reflecting the laser beam.
Abstract translation: 本发明一般涉及半导体，半导体内的材料层，半导体的制造方法以及半导体的制造装置。 根据本发明的半导体包括至少一个具有表面的层，通过激光烧蚀产生，其中待生产的均匀表面积包括至少0.2dm 2的面积，并且该层已经通过采用超短脉冲激光沉积制造，其中脉冲 用包括至少一个用于反射激光束的反射镜的旋转光学扫描仪扫描激光束。
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公开(公告)号：US20100181706A1
公开(公告)日：2010-07-22
申请号：US11988663
申请日：2006-07-13
Applicant: Jari Ruuttu , Reijo Lappalainen , Vesa Myllymäeki , Lasse Pulli , Juha Mäkitalo
Inventor： Jari Ruuttu , Reijo Lappalainen , Vesa Myllymäeki , Lasse Pulli , Juha Mäkitalo
IPC: C23C14/00 , G02B26/10 , G02B26/12 , B23K26/02 , C23C14/58 , C23C14/56 , C23C14/22 , C23C24/00 , B29C67/00 , B29C41/00
CPC classification number: G02B26/123 , B23K26/0604 , B23K26/0608 , B23K26/0624 , B23K26/082 , B23K26/0821 , B23K26/32 , B23K26/324 , B23K26/34 , B23K26/40 , B23K2101/34 , B23K2103/16 , B23K2103/30 , B23K2103/42 , B23K2103/50 , B23K2103/52 , G02B5/09 , G02B26/121 , H01L2924/0002 , H01L2924/00
Abstract: The invention relates in general level to radiation transference techniques as applied for utilisation of material handling. The invention relates to a radiation source arrangement comprising a path of radiation transference, or an improved path of radiation transference, which path comprises a turbine scanner or an improved turbine scanner. The invention also concerns a target material suitable for vaporization and/or ablation. The invention concerns an improved turbine scanner. The invention concerns also to a vacuum vaporization/ablation arrangement that has a radiation source arrangement according to invention. The invention concerns also a target material unit, to be used in coating and/or manufacturing target material.
Abstract translation: 本发明一般涉及用于材料处理利用的辐射转移技术。 本发明涉及一种辐射源装置，其包括辐射传播路径或改进的辐射传播路径，该路径包括涡轮机扫描仪或改进的涡轮扫描仪。 本发明还涉及适于蒸发和/或消融的靶材料。 本发明涉及改进的涡轮机扫描器。 本发明还涉及具有根据本发明的辐射源装置的真空蒸发/消融装置。 本发明还涉及用于涂覆和/或制造目标材料的靶材料单元。
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