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    Projection exposure apparatus and method
    1.
    发明授权
    Projection exposure apparatus and method 有权
    投影曝光装置及方法

    公开(公告)号：US06362926B1

    公开(公告)日：2002-03-26

    申请号：US09721956

    申请日：2000-11-27

    申请人： Yasuhiro Omura ,  Yutaka Ichihara ,  Tetsuo Takahashi

    发明人： Yasuhiro Omura ,  Yutaka Ichihara ,  Tetsuo Takahashi

    IPC分类号： G02B1700

    CPC分类号： G02B17/0892 ,  G02B13/143 ,  G02B17/08 ,  G03F7/70225 ,  G03F7/70275 ,  G03F7/70808 ,  G03F7/70825 ,  G03F7/70833

    摘要： The present invention relates to a projection exposure apparatus (10) for and method of imaging a reticle (R) having patterned surface onto a substrate (W) in photolithographic processes for manufacturing a variety of devices. The invention further relates to an optical system (C) having a folding member(M1) suited to the projection exposure apparatus, and a method for manufacturing the optical system. The projection exposure apparatus comprises an illumination optical system (IS) and a reticle stage (RS) capable of holding the reticle so the normal line to its patterned surface is in the direction of gravity. The apparatus also includes a substrate stage (WS) capable of holding the substrate with its surface normal parallel to the direction of gravity. The optical system includes a first imaging optical system (A) comprising a concave reflecting mirror and a dioptric optical member arranged along a first optical axis. The first imaging optical system (A) forms an intermediate image of the patterned surface. The optical system also includes a second imaging optical system (B) having a second optical axis, and forms a reduced image of the intermediate image on the substrate. The first folding member is arranged in the optical path from the first imaging optical system to the second imaging optical system. The first and second imaging optical systems and the first and second folding members are positioned so that a reduced image of the pattered surface is formed parallel to the pattern surface of the reticle, and the first and second optical axes are positioned so that they are substantially parallel to the direction of gravity.

    摘要翻译： 本发明涉及一种投影曝光装置（10），该投影曝光装置（10）用于在具有用于制造各种装置的光刻工艺中将具有图案化表面的掩模版（R）成像到基板（W）上。 本发明还涉及一种具有适合于投影曝光装置的折叠构件（M1）的光学系统（C），以及用于制造光学系统的方法。 投影曝光装置包括能够保持标线的照明光学系统（IS）和光罩台（RS），使得其图案化表面的法线在重力方向上。 该装置还包括能够将其表面保持平行于重力方向的基板的基底台（WS）。 光学系统包括第一成像光学系统（A），其包括沿第一光轴布置的凹面反射镜和屈光光学构件。 第一成像光学系统（A）形成图案化表面的中间图像。 光学系统还包括具有第二光轴的第二成像光学系统（B），并且在基板上形成中间图像的缩小图像。 第一折叠构件布置在从第一成像光学系统到第二成像光学系统的光路中。 第一和第二成像光学系统以及第一和第二折叠构件被定位成使得图案化表面的缩小图像平行于标线板的图案表面形成，并且第一和第二光轴被定位成使得它们基本上 平行于重力方向。

    Projection exposure apparatus and method
    2.
    发明授权
    Projection exposure apparatus and method 有权
    投影曝光装置及方法

    公开(公告)号：US06195213B1

    公开(公告)日：2001-02-27

    申请号：US09328198

    申请日：1999-06-08

    申请人： Yasuhiro Omura ,  Tetsuo Takahashi ,  Masatoshi Ikeda ,  Shiwen Li ,  Yutaka Ichihara

    发明人： Yasuhiro Omura ,  Tetsuo Takahashi ,  Masatoshi Ikeda ,  Shiwen Li ,  Yutaka Ichihara

    IPC分类号： G02B1700

    CPC分类号： G02B17/0892 ,  G02B13/143 ,  G02B17/08 ,  G03F7/70225 ,  G03F7/70275 ,  G03F7/70808 ,  G03F7/70825 ,  G03F7/70833

    摘要： The present invention relates to a projection exposure apparatus (10) for and method of imaging a reticle (R) having patterned surface onto a substrate (W) in photolithographic processes for manufacturing a variety of devices. The invention further relates to an optical system (C) having a folding member (M1) suited to the projection exposure apparatus, and a method for manufacturing the optical system. The projection exposure apparatus comprises an illumination optical system (IS) and a reticle stage (RS) capable of holding the reticle so the normal line to its patterned surface is in the direction of gravity. The apparatus also includes a substrate stage (WS) capable of holding the substrate with its surface normal parallel to the direction of gravity. The optical system includes a first imaging optical system (A) comprising a concave reflecting mirror and a dioptric optical member arranged along a first optical axis. The first imaging optical system (A) forms an intermediate image of the patterned surface. The optical system also includes a second imaging optical system (B) having a second optical axis, and forms a reduced image of the intermediate image on the substrate. The first folding member is arranged in the optical path from the first imaging optical system to the second imaging optical system. The first and second imaging optical systems and the first and second folding members are positioned so that a reduced image of the pattered surface is formed parallel to the pattern surface of the reticle, and the first and second optical axes are positioned so that they are substantially parallel to the direction of gravity.

    摘要翻译： 本发明涉及一种投影曝光装置（10），该投影曝光装置（10）用于在具有用于制造各种装置的光刻工艺中将具有图案化表面的掩模版（R）成像到基板（W）上。 本发明还涉及一种具有适合于投影曝光装置的折叠构件（M1）的光学系统（C），以及用于制造光学系统的方法。 投影曝光装置包括能够保持标线的照明光学系统（IS）和光罩台（RS），使得其图案化表面的法线在重力方向上。 该装置还包括能够将其表面保持平行于重力方向的基板的基底台（WS）。 光学系统包括第一成像光学系统（A），其包括沿第一光轴布置的凹面反射镜和屈光光学构件。 第一成像光学系统（A）形成图案化表面的中间图像。 光学系统还包括具有第二光轴的第二成像光学系统（B），并且在基板上形成中间图像的缩小图像。 第一折叠构件布置在从第一成像光学系统到第二成像光学系统的光路中。 第一和第二成像光学系统以及第一和第二折叠构件被定位成使得图案化表面的缩小图像平行于标线板的图案表面形成，并且第一和第二光轴被定位成使得它们基本上 平行于重力方向。

    Exposure apparatus
    4.
    发明授权
    Exposure apparatus 失效
    曝光装置

    公开(公告)号：US5969802A

    公开(公告)日：1999-10-19

    申请号：US88140

    申请日：1998-06-01

    申请人： Tetsuo Takahashi ,  Shigeo Mizoroke ,  Yasuhiro Omura

    发明人： Tetsuo Takahashi ,  Shigeo Mizoroke ,  Yasuhiro Omura

    IPC分类号： G02B17/08 ,  G03F7/20 ,  H01L21/027 ,  H05K3/00 ,  G03B27/54 ,  G03B27/42 ,  G03B9/60

    CPC分类号： G02B17/0892 ,  G02B17/08 ,  G03F7/70225 ,  G03F7/70858

    摘要： An exposure apparatus for transferring a pattern on a mask (M) onto a photosensitive substrate (W) via a projection-optical system can reduce gas fluctuation even if the length of the optical path through gas is relatively long, and even if the diameter of light flux through the gas is relatively large.The projection-optical system satisfies the condition ##EQU1## where .lambda. is a wavelength of exposure light used in the apparatus, .SIGMA.i is a summary of gas sections i in an optical path from the mask to the photosensitive substrate, Li is a length of a gas section i along the optical axis, in m, and Ri is an average of a mask-side diameter and a substrate-side diameter of a light flux in each gas section, the light flux emerging from a maximum image height and advancing within meridional plane, wherein at least one gas section i is filled with helium or neon.

    摘要翻译： 用于通过投影光学系统将掩模（M）上的图案转印到感光基板（W）上的曝光装置即使通过气体的光路的长度相对较长也能够减小气体波动，并且即使直径 通过气体的光通量比较大。 投影光学系统满足λ是装置中使用的曝光光的波长的条件，SIGMA i是从掩模到感光基板的光路中的气体部分i的总结，Li是气体截面的长度 i沿着光轴，以m为单位，Ri是每个气体部分中的光通量的掩模侧直径和基板侧直径的平均值，从最大图像高度出现并在子午面内前进的光通量， 其中至少一个气体部分i填充有氦或氖。

    Projection exposure apparatus and method
    5.
    发明授权
    Projection exposure apparatus and method 失效

    公开(公告)号：US06639732B2

    公开(公告)日：2003-10-28

    申请号：US10310780

    申请日：2002-12-06

    申请人： Yasuhiro Omura ,  Tetsuo Takahashi ,  Masatoshi Ikeda ,  Shiwen Li

    发明人： Yasuhiro Omura ,  Tetsuo Takahashi ,  Masatoshi Ikeda ,  Shiwen Li

    IPC分类号： G02B1700

    CPC分类号： G02B17/0892 ,  G02B13/143 ,  G02B17/08 ,  G03F7/70225 ,  G03F7/70275 ,  G03F7/70808 ,  G03F7/70825 ,  G03F7/70833

    摘要： The present invention relates to a projection exposure apparatus (10) for and method of imaging a reticle (R) having patterned surface onto a substrate (W) in photolithographic processes for manufacturing a variety of devices. The invention further relates to an optical system (C) having a folding member (M1) suited to the projection exposure apparatus, and a method for manufacturing the optical system. The projection exposure apparatus comprises an illumination optical system (IS) and a reticle stage (RS) capable of holding the reticle so the normal line to its patterned surface is in the direction of gravity. The apparatus also includes a substrate stage (WS) capable of holding the substrate with its surface normal parallel to the direction of gravity. The optical system includes a first imaging optical system (A) comprising a concave reflecting mirror and a dioptric optical member arranged along a first optical axis. The first imaging optical system (A) forms an intermediate image of the patterned surface. The optical system also includes a second imaging optical system (B) having a second optical axis, and forms a reduced image of the intermediate image on the substrate. The first folding member is arranged in the optical path from the first imaging optical system to the second imaging optical system. The first and second imaging optical systems and the first and second folding members are positioned so that a reduced image of the pattered surface is formed parallel to the pattern surface of the reticle, and the first and second optical axes are positioned so that they are substantially parallel to the direction of gravity.

    Catadioptric optical system and adjusting method
    6.
    发明授权
    Catadioptric optical system and adjusting method 失效
    反射折射光学系统和调节方法

    公开(公告)号：US5835284A

    公开(公告)日：1998-11-10

    申请号：US882939

    申请日：1997-06-26

    申请人： Tetsuo Takahashi ,  Yasuhiro Omura

    发明人： Tetsuo Takahashi ,  Yasuhiro Omura

    IPC分类号： G02B17/08 ,  G03F7/20 ,  H01L21/027

    CPC分类号： G02B17/0892 ,  G02B17/08 ,  G03F7/70225 ,  G03F7/70275

    摘要： A catadioptric optical system in which a first imaging optical system is constructed of a unidirectional optical apparatus which transmits outgoing light from a first plane in one direction only and a bidirectional optical apparatus for transmitting the light that enters and reflecting the same to form an interim image of the first plane. A light guide guides the light from the interim image to a second imaging optical system through which the interim image is reimaged on a second plane. The unidirectional optical apparatus has an optical axis and at least one lens movable along the optical axis.

    摘要翻译： 一种反折射光学系统，其中第一成像光学系统由仅在一个方向上传输来自第一平面的出射光的单向光学装置和用于透射进入并反射其的光的双向光学装置形成临时图像 的第一架飞机。 光引导件将来自中间图像的光引导到第二成像光学系统，通过该第二成像光学系统在第二平面上再次成像临时图像。 单向光学装置具有光轴和至少一个可沿光轴移动的透镜。

    Catadioptric system for photolithography
    7.
    发明授权
    Catadioptric system for photolithography 失效
    反射折射系统用于光刻

    公开(公告)号：US5835275A

    公开(公告)日：1998-11-10

    申请号：US883748

    申请日：1997-06-27

    申请人： Tetsuo Takahashi ,  Yasuhiro Omura

    发明人： Tetsuo Takahashi ,  Yasuhiro Omura

    IPC分类号： G02B17/08 ,  G03F7/20 ,  H01L21/027 ,  G02B27/14 ,  G02B17/00

    CPC分类号： G02B17/0892 ,  G02B17/08 ,  G03F7/70225 ,  G03F7/7025 ,  G03F7/70275

    摘要： Catadioptric systems are provided, comprising a first imaging system, a plane mirror, and a second imaging system. The first imaging system comprises a single-pass optical system and a double-pass optical system that further comprises a concave mirror and a double-pass lens group. The second imaging system comprises a plane mirror and an aperture. The first imaging system forms an intermediate image of an object; the second imaging system re-images the intermediate image on a substrate. The catadioptric systems satisfy various conditions.

    摘要翻译： 提供反射折射系统，包括第一成像系统，平面镜和第二成像系统。 第一成像系统包括单通光学系统和还包括凹面镜和双透镜组的双通光学系统。 第二成像系统包括平面镜和孔。 第一成像系统形成物体的中间图像; 第二成像系统将衬底上的中间图像重新图像。 反射折射系统满足各种条件。

    Semiconductor device and method for fabricating the same
    9.
    发明授权
    Semiconductor device and method for fabricating the same 有权
    半导体装置及其制造方法

    公开(公告)号：US08994141B2

    公开(公告)日：2015-03-31

    申请号：US12685180

    申请日：2010-01-11

    申请人： Tetsuo Takahashi ,  Takami Otsuki

    发明人： Tetsuo Takahashi ,  Takami Otsuki

    IPC分类号： H01L29/66 ,  H01L29/40 ,  H01L29/739 ,  H01L29/78 ,  H01L29/06

    CPC分类号： H01L29/063 ,  H01L29/0615 ,  H01L29/0638 ,  H01L29/404 ,  H01L29/407 ,  H01L29/66333 ,  H01L29/7395 ,  H01L29/7811

    摘要： A semiconductor includes an N-type impurity region provided in a substrate. A P-type RESURF layer is provided at a top face of the substrate in the N-type impurity region. A P-well has an impurity concentration higher than that of the P-type RESURF layer, and makes contact with the P-type RESURF layer at the top face of the substrate in the N-type impurity region. A first high-voltage-side plate is electrically connected to the N-type impurity region, and a low-voltage-side plate is electrically connected to a P-type impurity region. A lower field plate is capable of generating a lower capacitive coupling with the substrate. An upper field plate is located at a position farther from the substrate than the lower field plate, and is capable of generating an upper capacitive coupling with the lower field plate whose capacitance is greater than the capacitance of the lower capacitive coupling.

    摘要翻译： 半导体包括设置在基板中的N型杂质区。 P型RESURF层设置在N型杂质区的衬底顶面。 P阱的杂质浓度比P型RESURF层高，与N型杂质区的衬底顶面的P型RESURF层接触。 第一高电压侧板与N型杂质区电连接，低压侧板与P型杂质区电连接。 下场板能够产生与衬底的较低的电容耦合。 上场板位于比下场板更远离衬底的位置处，并且能够产生与电容大于低容性耦合的电容的下场板的上电容耦合。

    6,12-dinaphthylchrysene derivative and organic light-emitting device using the derivative
    10.
    发明授权
    6,12-dinaphthylchrysene derivative and organic light-emitting device using the derivative 有权
    6,12-二萘基衍生物和使用该衍生物的有机发光装置

    公开(公告)号：US08790795B2

    公开(公告)日：2014-07-29

    申请号：US13480608

    申请日：2012-05-25

    申请人： Hironobu Iwawaki ,  Hiroki Ohrui ,  Yuko Chishina ,  Masanori Muratsubaki ,  Tetsuo Takahashi

    发明人： Hironobu Iwawaki ,  Hiroki Ohrui ,  Yuko Chishina ,  Masanori Muratsubaki ,  Tetsuo Takahashi

    IPC分类号： H01L51/54 ,  C07D235/18 ,  C07D498/04

    CPC分类号： H01L51/0054 ,  H01L51/0058 ,  H01L51/0072 ,  H01L51/5072 ,  H01L51/5096

    摘要： Provided are an organic compound having high heat stability suitable for use in an organic light-emitting device, and an organic light-emitting device using the organic compound. The organic light-emitting device is an organic light-emitting device, including: an anode; a cathode; and an organic compound layer disposed between the anode and the cathode, in which at least one layer of the organic compound layer has a 6,12-dinaphthylchrysene derivative represented by one of the following general formulae (1) and (2): in the formulae (1) and (2), Z represents a naphthyl group, and Q represents an electron-withdrawing substituent selected from the group consisting of the following general formulae (3) to (5): in the formula (5), R1 represents a hydrogen atom or a methyl group.

    摘要翻译： 提供了适用于有机发光装置的具有高热稳定性的有机化合物和使用该有机化合物的有机发光装置。 有机发光器件是有机发光器件，包括：阳极; 阴极 和设置在阳极和阴极之间的有机化合物层，其中至少一层有机化合物层具有由以下通式（1）和（2）之一表示的6,12-二萘基衍生物：在 式（1）和（2）中，Z表示萘基，Q表示选自下述通式（3）〜（5）的吸电子取代基：式（5）中，R 1表示 氢原子或甲基。