METHOD OF DESIGNING LAYOUT OF INTEGRATED CIRCUIT AND METHOD OF MANUFACTURING INTEGRATED CIRCUIT
    2.
    发明申请
    METHOD OF DESIGNING LAYOUT OF INTEGRATED CIRCUIT AND METHOD OF MANUFACTURING INTEGRATED CIRCUIT 有权
    集成电路布局的设计方法和制造集成电路的方法

    公开(公告)号:US20160055286A1

    公开(公告)日:2016-02-25

    申请号:US14820983

    申请日:2015-08-07

    Abstract: A method of designing a layout of an integrated chip (IC) includes designing a first layout by place and route a plurality of standard cells that define the IC, and generating a second layout by modifying the first layout during a mask data preparation process related to the first layout, wherein the second layout is generated by connecting first and second patterns from among first layer patterns that correspond to a first layer of the first layout, such that the number of masks necessary for forming the first layer patterns is reduced.

    Abstract translation: 设计集成芯片(IC)的布局的方法包括通过放置和布线定义IC的多个标准单元来设计第一布局,以及通过在与...相关的掩模数据准备处理过程中修改第一布局来生成第二布局 第一布局,其中通过连接与第一布局的第一层相对应的第一层图案中的第一和第二图案来生成第二布局,使得形成第一层图案所需的掩模的数量减少。

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