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1.发明授权公开(公告)号：US10090951B2
公开(公告)日：2018-10-02
申请号：US15623127
申请日：2017-06-14
Applicant: Samsung Electronics Co., Ltd.
Inventor： Sung-Oh Hwang , Eun-Jung Kim , Joon-Goo Park
Abstract: A method and apparatus for transmitting a notification about broadcasting services in a broadcasting system are provided. A method of a network entity includes detecting a notification event about a broadcasting service, the notification event including a change of a service guide of the broadcasting service; generating a notification message about the notification event; determining which channel is used for a transmission of the notification message; and transmitting the notification message to a terminal or a group of terminals over the determined channel. The channel used for the transmission of the notification message is determined based on whether the notification message is transmitted over a broadcast channel of a broadcast network or over an interaction channel of an interaction network. The service guide is generated based on service guide related information provided by a service provider of the broadcasting service.
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2.发明申请METHOD OF FORMING ACTIVE PATTERNS, ACTIVE PATTERN ARRAY, AND METHOD OF MANUFACTURING A SEMICONDUCTOR DEVICE 有权形成活动图案的方法，活性图案阵列和制造半导体器件的方法公开(公告)号：US20170025420A1
公开(公告)日：2017-01-26
申请号：US15015651
申请日：2016-02-04
Applicant: Samsung Electronics Co., Ltd.
Inventor： Tae-Jin Park , Chan-sic Yoon , Ki-Seok Lee , Hyeon-Ok Jung , Dae-Ik Kim , Bong-Soo Kim , Yong-Kwan Kim , Eun-Jung Kim , Se-Myeong Jang , Min-su Choi , Sung-Hee Han , Yoo-Sang Hwang
IPC: H01L27/108 , H01L21/308
CPC classification number: H01L27/10894 , H01L27/10852 , H01L27/10855 , H01L27/10876 , H01L27/10885
Abstract: In a method of forming active patterns, first patterns are formed in a first direction on a cell region of a substrate, and a second pattern is formed on a peripheral circuit region of the substrate. The first pattern extends in a third direction crossing the first direction. First masks are formed in the first direction on the first patterns, and a second mask is formed on the second pattern. The first mask extends in a fourth direction crossing the third direction. Third masks are formed between the first masks extending in the fourth direction. The first and second patterns are etched using the first to third masks to form third and fourth patterns. Upper portions of the substrate are etched using the third and fourth patterns to form first and second active patterns in the cell and peripheral circuit regions.
Abstract translation: 在形成有源图案的方法中，在基板的单元区域上沿第一方向形成第一图案，并且在基板的外围电路区域上形成第二图案。 第一图案沿与第一方向交叉的第三方向延伸。 第一掩模在第一图案上沿第一方向形成，第二掩模形成在第二图案上。 第一掩模沿与第三方向交叉的第四方向延伸。 第三掩模形成在沿第四方向延伸的第一掩模之间。 使用第一至第三掩模蚀刻第一和第二图案以形成第三和第四图案。 使用第三和第四图案蚀刻衬底的上部，以在单元和外围电路区域中形成第一和第二有源图案。
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公开(公告)号：US09209949B2
公开(公告)日：2015-12-08
申请号：US14186409
申请日：2014-02-21
Applicant: Samsung Electronics Co., Ltd.
Inventor： Neung-Hyung Lee , Eun-Jung Kim , Sung-Oh Kwon
CPC classification number: H04L5/003 , H04L1/1812 , H04L1/1864 , H04L1/1874 , H04L1/1896 , H04W72/1221 , H04W72/1284
Abstract: A method and apparatus for uplink scheduling in a communication system are provided. The method includes determining whether a User Equipment (UE) is included in an uplink scheduling list, a buffer length of the UE is estimated, if the UE is included in the uplink scheduling list, it is determined whether a Buffer State Report (BSR) indicating the buffer length of the UE has been received from the UE, if the estimated buffer length is 0, and the UE is transitioned to a non-zero BSR reception state and maintained in the uplink scheduling list, if the BSR has not been received from the UE. The non-zero BSR reception state is a state in which a zero BSR indicating the buffer length of the UE is 0 has not been received.
Abstract translation: 提供了一种用于通信系统中的上行链路调度的方法和装置。 该方法包括：确定用户设备（UE）是否包括在上行链路调度列表中，如果UE被包括在上行链路调度列表中，则UE估计缓冲区长度，确定缓冲状态报告（BSR） 指示UE已经从UE接收到缓冲区长度，如果估计的缓冲器长度为0，并且UE转换到非零BSR接收状态并且在上行链路调度列表中维护，则如果尚未接收到BSR 来自UE。 非零BSR接收状态是没有接收到指示UE的缓冲器长度的零BSR为0的状态。
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4.发明申请QOS SWITCHING METHOD AND APPARATUS FOR QOS IN A WIRELESS COMMUNICATION SYSTEM 审中-公开QOS切换方法和无线通信系统中的QOS设备公开(公告)号：US20150189540A1
公开(公告)日：2015-07-02
申请号：US14584731
申请日：2014-12-29
Applicant: Samsung Electronics Co., Ltd.
Inventor： Dae-Kwon JUNG , Hee-Won Kang , Eun-Jung Kim , Myung-Kwang Byun , Jeong-Ho Lee , Eun-Ho Choi
CPC classification number: H04W28/0268 , H04L47/215 , H04L47/2458 , H04L47/283 , H04L47/76 , H04L47/805 , H04W28/24 , H04W72/087
Abstract: Quality of Service (QoS) switching method and apparatus in a mobile communication system are provided. The method includes determining, based on a total resource usage for providing a plurality of QoSs, the QoS switching relating to level adjustment of the plurality of QoSs corresponding to one of downgrade, upgrade, and grade maintenance, and adjusting levels of the plurality of QoSs according to the determined QoS switching.
Abstract translation: 提供了移动通信系统中的服务质量（QoS）切换方法和装置。 该方法包括基于用于提供多个QoS的总资源使用来确定与降级，升级和级别维护之一相对应的多个QoS的电平调整相关的QoS切换，以及调整多个QoS的水平 根据确定的QoS切换。
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5.发明申请公开(公告)号：US20170288797A1
公开(公告)日：2017-10-05
申请号：US15623127
申请日：2017-06-14
Applicant: Samsung Electronics Co., Ltd.
Inventor： Sung-Oh HWANG , Eun-Jung Kim , Joon-Goo Park
Abstract: A method and apparatus for transmitting a notification about broadcasting services in a broadcasting system are provided. A method of a network entity includes detecting a notification event about a broadcasting service, the notification event including a change of a service guide of the broadcasting service; generating a notification message about the notification event; determining which channel is used for a transmission of the notification message; and transmitting the notification message to a terminal or a group of terminals over the determined channel. The channel used for the transmission of the notification message is determined based on whether the notification message is transmitted over a broadcast channel of a broadcast network or over an interaction channel of an interaction network. The service guide is generated based on service guide related information provided by a service provider of the broadcasting service.
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Patent Agency Ranking
公开(公告)号：US09755998B2
公开(公告)日：2017-09-05
申请号：US14507420
申请日：2014-10-06
Applicant: Samsung Electronics Co., Ltd.
Inventor： Wook-Hyun Jeong , Eun-Jung Kim
CPC classification number: H04L51/04 , G06Q10/107 , H04L51/28 , H04L67/2857
Abstract: An E-mail apparatus and method are provided. The e-mail apparatus includes a memory that stores display names and e-mail addresses corresponding to the display names, and a controller that extracts an e-mail address from a received e-mail message, retrieves from the memory a display name corresponding to the extracted e-mail address, modifies the display name of the received e-mail message to the retrieved display name, and outputs the modified display name.
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公开(公告)号：US09634012B2
公开(公告)日：2017-04-25
申请号：US15015651
申请日：2016-02-04
Applicant: Samsung Electronics Co., Ltd.
Inventor： Tae-Jin Park , Chan-sic Yoon , Ki-Seok Lee , Hyeon-Ok Jung , Dae-Ik Kim , Bong-Soo Kim , Yong-Kwan Kim , Eun-Jung Kim , Se-Myeong Jang , Min-su Choi , Sung-Hee Han , Yoo-Sang Hwang
IPC: H01L21/311 , H01L27/108 , H01L21/308
CPC classification number: H01L27/10894 , H01L27/10852 , H01L27/10855 , H01L27/10876 , H01L27/10885
Abstract: In a method of forming active patterns, first patterns are formed in a first direction on a cell region of a substrate, and a second pattern is formed on a peripheral circuit region of the substrate. The first pattern extends in a third direction crossing the first direction. First masks are formed in the first direction on the first patterns, and a second mask is formed on the second pattern. The first mask extends in a fourth direction crossing the third direction. Third masks are formed between the first masks extending in the fourth direction. The first and second patterns are etched using the first to third masks to form third and fourth patterns. Upper portions of the substrate are etched using the third and fourth patterns to form first and second active patterns in the cell and peripheral circuit regions.
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公开(公告)号：US10334472B2
公开(公告)日：2019-06-25
申请号：US14584731
申请日：2014-12-29
Applicant: Samsung Electronics Co., Ltd.
Inventor： Dae-Kwon Jung , Hee-Won Kang , Eun-Jung Kim , Myung-Kwang Byun , Jeong-Ho Lee , Eun-Ho Choi
IPC: H04W28/02 , H04W72/08 , H04W28/24 , H04L12/819 , H04L12/833 , H04L12/917 , H04L12/927 , H04L12/841
Abstract: Quality of Service (QoS) switching method and apparatus in a mobile communication system are provided. The method includes determining, based on a total resource usage for providing a plurality of QoSs, the QoS switching relating to level adjustment of the plurality of QoSs corresponding to one of downgrade, upgrade, and grade maintenance, and adjusting levels of the plurality of QoSs according to the determined QoS switching.
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公开(公告)号：US10665498B2
公开(公告)日：2020-05-26
申请号：US15196273
申请日：2016-06-29
Applicant: SAMSUNG ELECTRONICS CO., LTD.
Inventor： Eun-Jung Kim , Bong-Soo Kim , Yong-Kwan Kim , Sung-Hee Han , Yoo-Sang Hwang
IPC: H01L23/48 , H01L23/52 , H01L29/40 , H01L21/768 , H01L23/528 , H01L23/522 , H01L23/532 , H01L27/108
Abstract: A semiconductor device, including an active region defined in a semiconductor substrate; a first contact plug on the semiconductor substrate, the first contact plug being connected to the active region; a bit line on the semiconductor substrate, the bit line being adjacent to the first contact plug; a first air gap spacer between the first contact plug and the bit line; a landing pad on the first contact plug; a blocking insulating layer on the bit line; and an air gap capping layer on the first air gap spacer, the air gap capping layer vertically overlapping the first air gap spacer, the air gap capping layer being between the blocking insulating layer and the landing pad, an upper surface of the blocking insulating layer being at a height equal to or higher than an upper surface of the landing pad.
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10.发明授权公开(公告)号：US09960039B2
公开(公告)日：2018-05-01
申请号：US15291780
申请日：2016-10-12
Applicant: SAMSUNG ELECTRONICS CO., LTD.
Inventor： Dae-Ik Kim , Eun-Jung Kim , Yoo-Sang Hwang , Bong-Soo Kim , Je-Min Park
IPC: H01L21/302 , H01L21/033 , H01L21/311 , H01L21/768 , H01L21/308 , H01L21/3213
CPC classification number: H01L21/0337 , H01L21/0332 , H01L21/0338 , H01L21/3086 , H01L21/31144 , H01L21/32139 , H01L21/76816
Abstract: A method of forming a pattern includes forming a first level pattern layer on a feature layer on a substrate. The first level pattern layer includes a plurality of first line patterns and a plurality of first space burying patterns. The first line patterns extend parallel to one another in a first direction and the first space burying patterns extend parallel to one another in the first direction with first line patterns alternately disposed with first space burying patterns A portion of the plurality of first space burying patterns may be removed to form a second direction pattern space extending intermittently or continuously in the first level pattern layer. A second burying layer filling the second direction pattern space may be formed to form a network structure pattern. The feature layer may be etched with the network structure pattern as an etch mask to form a pattern of holes.
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