SEMICONDUCTOR DEVICES
    9.
    发明申请
    SEMICONDUCTOR DEVICES 审中-公开
    半导体器件

    公开(公告)号:US20140048873A1

    公开(公告)日:2014-02-20

    申请号:US14057094

    申请日:2013-10-18

    IPC分类号: H01L29/78

    摘要: A semiconductor device includes a semiconductor pattern on a substrate, gate structures on sidewalls of the semiconductor pattern, the gate structures being spaced apart from one another, insulating interlayers among the gate structures, wherein an uppermost insulating interlayer is lower than an upper face of the semiconductor pattern, a common source line contacting the substrate and protruding above the uppermost insulating interlayer, an etch stop layer pattern on the semiconductor pattern and on the common source line wherein the common source line protrudes above the uppermost insulating interlayer, an additional insulating interlayer on the uppermost insulating interlayer, and contact plugs extending through the additional insulating interlayer so as to make contact with the semiconductor pattern and the common source line, respectively.

    摘要翻译: 半导体器件包括衬底上的半导体图案,半导体图案的侧壁上的栅极结构,栅极结构彼此间隔开,栅极结构之间的绝缘夹层,其中最上层的绝缘中间层低于栅极结构的上表面 半导体图案,与基板接触并突出在最上层绝缘夹层之上的公共源极线,在半导体图案上的公共源极线上的共同源极线上的蚀刻停止层图案,其中共同源极线突出在最上面的绝缘中间层之上,在 最上层的绝缘中间层和延伸穿过附加绝缘夹层的接触插塞分别与半导体图案和公共源极线接触。