SEMICONDUCTOR DEVICE INCLUDING A MOSFET AND SCHOTTKY JUNCTION
    9.
    发明申请
    SEMICONDUCTOR DEVICE INCLUDING A MOSFET AND SCHOTTKY JUNCTION 有权
    包括MOSFET和肖特基结的半导体器件

    公开(公告)号:US20130214378A1

    公开(公告)日:2013-08-22

    申请号:US13844950

    申请日:2013-03-16

    IPC分类号: H01L29/872

    摘要: A semiconductor device for use in a power supply circuit has first and second MOSFETS. The source-drain path of one of the MOSFETS are coupled to the source-drain path of the other, and a load element is coupled to a connection node of the source-drain paths. The second MOSFET is formed on a semiconductor substrate with a Schottky barrier diode. First gate electrodes of the second MOSFET are formed in trenches in a first region of the semiconductor substrate, while second gate electrodes of the second MOSFET are formed in trenches in a second region of the semiconductor substrate. The first and second gate electrodes are electrically connected together. Portions of the Schottky barrier diode are formed between adjacent ones of the second gate electrodes. A center-to-center spacing between adjacent first gate electrodes is smaller than a center-to-center spacing between adjacent second gate electrodes.

    摘要翻译: 用于电源电路的半导体器件具有第一和第二MOSFET。 MOSFET之一的源极 - 漏极路径耦合到另一个MOSFET的源极 - 漏极路径,并且负载元件耦合到源极 - 漏极路径的连接节点。 第二MOSFET形成在具有肖特基势垒二极管的半导体衬底上。 第二MOSFET的第一栅电极形成在半导体衬底的第一区域中的沟槽中,而第二MOSFET的第二栅电极形成在半导体衬底的第二区域中的沟槽中。 第一和第二栅极电连接在一起。 在相邻的第二栅电极之间形成肖特基势垒二极管的部分。 相邻的第一栅电极之间的中心到中心的间隔小于相邻的第二栅电极之间的中心间距。