DYNAMICALLY CONTROLLING VOLTAGE FOR ACCESS OPERATIONS TO MAGNETO-RESISTIVE RANDOM ACCESS MEMORY (MRAM) BIT CELLS TO ACCOUNT FOR AMBIENT TEMPERATURE

    公开(公告)号:US20190051341A1

    公开(公告)日:2019-02-14

    申请号:US15676957

    申请日:2017-08-14

    Abstract: Dynamically controlling voltage for access operations to magneto-resistive random access memory (MRAM) bit cells to account for ambient temperature is disclosed. An MRAM bit cell process variation measurement circuit (PVMC) is configured to measure process variations and ambient temperature in magnetic tunnel junctions (MTJs) that affect MTJ resistance, which can change the write current at a given fixed supply voltage applied to an MRAM bit cell. These measured process variations and ambient temperature are used to dynamically control a supply voltage for access operations to the MRAM to reduce the likelihood of bit errors and reduce power consumption. The MRAM bit cell PVMC may also be configured to measure process variations and/or ambient temperatures in logic circuits that represent the process variations and ambient temperatures in access transistors employed in MRAM bit cells in the MRAM to determine variations in the switching speed (i.e., drive strength) of the access transistors.

    Magnetoresistive (MR) sensors employing dual MR devices for differential MR sensing

    公开(公告)号:US10060880B2

    公开(公告)日:2018-08-28

    申请号:US15266342

    申请日:2016-09-15

    CPC classification number: G01N27/745 B82Y25/00 G01R33/09 G01R33/093 G01R33/098

    Abstract: Magnetoresistive (MR) sensors employing dual MR devices for differential MR sensing are provided. These MR sensors may be used as biosensors to detect the presence of biological materials as an example. An MR sensor includes dual MR sensor devices that may be tunnel magnetoresistive (TMR) devices or giant magnetoresistive (GMR) devices as examples. The MR devices are arranged such that a channel is formed between the MR devices for receiving magnetic nanoparticles. A magnetic stray field generated by the magnetic nanoparticles causes free layers in the MR devices to rotate in opposite directions, thus causing differential resistances between the MR devices for greater sensing sensitivity. Further, as another aspect, by providing the channel between the MR devices, the magnetic stray field generated by the magnetic nanoparticles can more easily rotate the magnetic moment orientation of the free layers in the MR devices, thus further increasing sensitivity.

    Shadow-effect compensated fabrication of magnetic tunnel junction (MTJ) elements

    公开(公告)号:US09666792B2

    公开(公告)日:2017-05-30

    申请号:US14824507

    申请日:2015-08-12

    CPC classification number: H01L43/12 H01L27/222 H01L43/02 H01L43/08

    Abstract: Shadow-effect compensated fabrication of magnetic tunnel junction (MTJ) semiconductor elements is disclosed. Providing shadow-effect compensated fabrication of MTJ elements can provide reduced free layer sizing for enhanced MTJ operational margin. In certain aspects, to reduce size of a free layer during fabrication of an MTJ to provide enhanced write and retention symmetry, ion beam etching (IBE) fabrication process is employed to fabricate a free layer smaller than the pinned layer. To avoid asymmetrical footing being fabricated in free layer due to shadow-effect of neighboring MTJs, an ion beam directed at the MTJ is shadow-effect compensated. The angle of incidence of the ion beam directed at the MTJ is varied as the MTJ is rotated to be less steep when another MTJ is in directional line of the ion beam and the MTJ being fabricated. Thus, the free layer is etched more uniformly in the MTJ while avoiding increased etching damage.

    PROCESS AND APPARATUS FOR TRANSFORMING NITRIDATION/OXIDATION AT EDGES, AND PROTECTING EDGES OF MAGNETORESISTIVE TUNNEL JUNCTION (MTJ) LAYERS
    5.
    发明申请
    PROCESS AND APPARATUS FOR TRANSFORMING NITRIDATION/OXIDATION AT EDGES, AND PROTECTING EDGES OF MAGNETORESISTIVE TUNNEL JUNCTION (MTJ) LAYERS 审中-公开
    用于改变边缘处的氧化/氧化的过程和装置,以及保护磁性隧道结(MTJ)层的边缘

    公开(公告)号:US20140203381A1

    公开(公告)日:2014-07-24

    申请号:US13748979

    申请日:2013-01-24

    CPC classification number: H01L43/12 H01L43/08

    Abstract: Material surrounding a magnetic tunnel junction (MTJ) device region of a multi-layer starting structure is etched, forming an MTJ device pillar having an MTJ layer with a chemically damaged peripheral edge region. De-nitridation or de-oxidation, or both, restore the chemically damaged peripheral region to form an edge-restored MTJ layer. An MTJ edge restoration assist layer is formed on the edge-restored MTJ layer. An MTJ-edge-protect layer is formed on the insulating MTJ-edge-restoration-assist layer.

    Abstract translation: 蚀刻围绕多层起始结构的磁性隧道结(MTJ)器件区域的材料,形成具有化学损伤的外围边缘区域的MTJ层的MTJ器件柱。 脱氮或脱氧,或两者恢复化学损伤的外围区域,形成边缘恢复的MTJ层。 在边缘恢复的MTJ层上形成MTJ边缘恢复辅助层。 在绝缘MTJ边缘恢复辅助层上形成MTJ边缘保护层。

    AMORPHOUS ALLOY SPACER FOR PERPENDICULAR MTJs
    6.
    发明申请
    AMORPHOUS ALLOY SPACER FOR PERPENDICULAR MTJs 有权
    不规则MTJs的非晶合金间隔件

    公开(公告)号:US20140027869A1

    公开(公告)日:2014-01-30

    申请号:US13770526

    申请日:2013-02-19

    Abstract: A perpendicular magnetic tunnel junction (MTJ) apparatus includes a tunnel magnetoresistance (TMR) enhancement buffer layer deposited between the tunnel barrier layer and the reference layers An amorphous alloy spacer is deposited between the TMR enhancement buffer layer and the reference layers to enhance TMR The amorphous alloy spacer blocks template effects of face centered cubic (fcc) oriented pinned layers and provides strong coupling between the pinned layers and the TMR enhancement buffer layer to ensure full perpendicular magnetization.

    Abstract translation: 垂直磁隧道结(MTJ)装置包括沉积在隧道势垒层和参考层之间的隧道磁阻(TMR)增强缓冲层。在TMR增强缓冲层和参考层之间沉积非晶合金间隔物以增强TMR非晶态 合金间隔块阻挡面心立方(fcc)取向钉扎层的模板效应,并且在钉扎层和TMR增强缓冲层之间提供强耦合,以确保完全垂直磁化。

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