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公开(公告)号：US09822330B2
公开(公告)日：2017-11-21
申请号：US14435342
申请日：2013-10-11
发明人： Takahiro Kishioka , Shigeo Kimura , Yoshiomi Hiroi , Yuki Usui , Hiromi Kitano , Tadashi Nakaji , Makoto Gemmei
IPC分类号： C12M1/00 , G03F7/075 , C08F230/08 , C12M1/12
CPC分类号： C12M23/20 , C08F230/08 , C12M23/30 , C12M25/02 , C12M31/00 , G03F7/0757 , Y10T428/24479 , Y10T428/24802 , Y10T428/31612 , Y10T428/31663
摘要： There is provided a new material that can form a finer pattern and can be applied to adsorption/adhesion control of various cell species, proteins, viruses, and the like without the limitation of the light source. A light-degradable material comprising: a moiety that is capable of bonding to a surface of a substrate through a siloxane bond; and a structural unit of Formula (2-a) and/or Formula (2-b): (where R2 to R4 are saturated linear alkyl groups; X is a hydrogen atom or an alkyl group; Z is a carbanion or a sulfo anion; Q is an ester bond group, a phosphodiester bond group, an amido bond group, an alkylene group, or an phenylene group or a combination of these divalent groups; m1 is an integer of 1 to 200, and n is an integer of 1 to 10).
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2.发明申请公开(公告)号：US20150267159A1
公开(公告)日：2015-09-24
申请号：US14435342
申请日：2013-10-11
发明人： Takahiro Kishioka , Shigeo Kimura , Yoshiomi Hiroi , Yuki Usui , Hiromi Kitano , Tadashi Nakaji , Makoto Gemmei
IPC分类号： C12M1/00 , G03F7/075 , C08F230/08
CPC分类号： C12M23/20 , C08F230/08 , C12M23/30 , C12M25/02 , C12M31/00 , G03F7/0757 , Y10T428/24479 , Y10T428/24802 , Y10T428/31612 , Y10T428/31663
摘要： There is provided a new material that can form a finer pattern and can be applied to adsorption/adhesion control of various cell species, proteins, viruses, and the like without the limitation of the light source. A light-degradable material comprising: a moiety that is capable of bonding to a surface of a substrate through a siloxane bond; and a structural unit of Formula (2-a) and/or Formula (2-b): (where R2 to R4 are saturated linear alkyl groups; X is a hydrogen atom or an alkyl group; Z is a carbanionor a sulfo anion; Q is an ester bond group, a phosphodiester bond group, an amido bond group, an alkylene group, or an phenylene group or a combination of these divalent groups; m1 is an integer of 1 to 200, and n is an integer of 1 to 10).
摘要翻译： 提供了可以形成更精细图案的新材料，并且可以应用于各种细胞种类，蛋白质，病毒等的吸附/粘附控制，而不受光源的限制。 一种光降解材料，包括：能够通过硅氧烷键与基材表面结合的部分; （2-a）和/或式（2-b）的结构单元：（其中R 2至R 4为饱和直链烷基; X为氢原子或烷基; Z为碳阴离子，磺基阴离子; Q是酯键基，磷酸二酯键基，酰胺键，亚烷基或亚苯基或这些二价基的组合; m1是1〜200的整数，n是1〜 10）。
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3.发明授权公开(公告)号：US11542366B2
公开(公告)日：2023-01-03
申请号：US17070645
申请日：2020-10-14
发明人： Hiroto Ogata , Yuki Usui , Mamoru Tamura , Takahiro Kishioka
IPC分类号： C08G63/688 , G03F7/20 , G03F7/09 , H01L21/027 , C08G63/42 , C08G63/58 , G03F7/16
摘要： A method includes applying a composition for forming a resist underlayer film to a substrate having a recess in a surface, and baking the composition for forming a resist underlayer film to form a resist underlayer film for filling at least the recess. The composition for forming a resist underlayer film has a copolymer having a structural unit of following formula (1), a cross-linkable compound, a cross-linking catalyst, and a solvent: wherein R1 and R2 are each independently a C1-3 alkylene group or a single bond, Z is an —O— group, a —S— group, or a —S—S— group, and Ar is an arylene group.
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公开(公告)号：US10804111B2
公开(公告)日：2020-10-13
申请号：US15760597
申请日：2016-09-15
IPC分类号： H01L21/306 , H01L21/033 , H01L21/308 , H01L33/22 , H01L31/0236 , H01L51/52 , C09D161/34 , C03C17/34 , C09K13/06 , C08F212/32 , C09K13/08 , C03C17/00 , C08G14/06 , C03C15/00 , C09D7/40 , C09D125/02 , C09D161/18 , C08K3/22 , H01L31/0216
摘要： A method for roughening a surface of a substrate, including: applying a composition containing inorganic particles and organic resin to the surface of the substrate and drying and curing the composition to form an organic resin layer; and etching the substrate by a solution containing hydrogen fluoride, hydrogen peroxide, or an acid, to roughen the surface. Preferably, the solution contains hydrogen fluoride and ammonium fluoride or hydrogen peroxide and ammonia, the resin layer contains a ratio of the particles to the resin of 5 to 50 parts by mass to 100 parts by mass, and the composition is a mixture of silica sol wherein silica is dispersed as the inorganic particles in organic solvent or titanium oxide sol wherein titanium oxide is dispersed, with a solution of the organic resin.
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公开(公告)号：US10437151B2
公开(公告)日：2019-10-08
申请号：US15563834
申请日：2016-03-18
发明人： Hiroto Ogata , Shigeo Kimura , Yuki Usui , Tomoya Ohashi , Takahiro Kishioka
IPC分类号： G03F7/11 , C08G59/20 , C09D163/00 , G03F7/09
摘要： There is provided a composition for forming a resist underlayer film for lithography that can be used as an underlayer anti-reflective coating that decreases the reflection of irradiated light during exposure from a semiconductor substrate toward the photoresist layer that is formed on the semiconductor substrate and in particular, can be suitably used as a flattening film for flattening a semiconductor substrate having a recess and a project by embedding, in a lithography process for production of a semiconductor device. A resist underlayer film-forming composition for lithography comprising (A) an alicyclic epoxy compound having an alicyclic skeleton and one or more epoxy groups, and a light absorption moiety, in the molecule, (B) a thermal acid generator, and (C) a solvent.
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公开(公告)号：US10724028B2
公开(公告)日：2020-07-28
申请号：US15523157
申请日：2015-10-30
发明人： Makiko Umezaki , Takahiro Kishioka , Taito Nishino , Ayako Aihara , Shunsuke Iwamoto , Daisuke Sakuma
摘要： The invention provides a ligand-bonded fiber in which a ligand having affinity for a cell membrane receptor is immobilized on a fiber precursor, and a cell culture substrate capable of repeating ex vivo amplification of a cell expressing a cell membrane receptor by using the ligand-bonded fiber.
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公开(公告)号：US09957644B2
公开(公告)日：2018-05-01
申请号：US14915219
申请日：2014-08-29
发明人： Makiko Umezaki , Takahiro Kishioka , Taito Nishino , Ayako Otani
IPC分类号： D01F6/16 , C08F220/00 , C08L33/14 , D01F6/02 , D01D5/00 , C08F220/20 , D01D10/02 , D04H1/728 , C08L33/26
CPC分类号： D01F6/16 , C08F220/20 , C08L33/14 , C08L33/26 , C08L2203/12 , C08L2312/00 , D01D5/0007 , D01D5/003 , D01D10/02 , D01F6/02 , D01F6/36 , D04H1/728
摘要： The invention provides a composition for the production of a fiber having organic solvent resistance, a fiber obtained by spinning the composition, and a biocompatible material containing the fiber. The composition contains (A) a polymer compound containing a unit structure represented by the formula (1) wherein each symbol is as described herein, (B) a crosslinking agent, (C) an acid compound, and (D) a solvent.
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公开(公告)号：US20150017791A1
公开(公告)日：2015-01-15
申请号：US14374992
申请日：2013-02-08
发明人： Tomoya Ohashi , Takahiro Kishioka
IPC分类号： H01L21/266 , G03F7/40 , C07F5/04
CPC分类号： H01L21/265 , C07F5/04 , C08L101/00 , C09D201/02 , G03F7/11 , G03F7/40 , H01J37/3171 , H01L21/26526 , H01L21/266 , H01L21/31155
摘要： There is provided an ion implantation method, a composition for forming an ion implantation film and a resist underlayer film-forming composition. An ion implantation method including the steps of: forming a film by applying a film-forming composition containing a compound including an element in group 13, group 14, group 15, or group 16 and an organic solvent onto a substrate and baking the film-forming composition; and implanting impurity ions into the substrate from above through the film and introducing the element in group 13, group 14, group 15, or group 16 in the film into the substrate. The film-forming composition is a film-forming composition for ion implantation containing a compound including an element in group 13, group 14, group 15, or group 16, and an organic solvent. In addition, the underlayer film-forming composition contains a compound having at least two borate ester groups.
摘要翻译： 提供了离子注入方法，用于形成离子注入膜的组合物和抗蚀剂下层膜形成组合物。 一种离子注入方法，包括以下步骤：通过将含有第13族，第14族，第15族或第16族元素的化合物和有机溶剂的成膜组合物涂布在基材上， 成型组成; 并通过膜从上面将杂质离子注入到衬底中，并将膜中的第13族，第14族，第15族或第16族中的元素引入衬底中。 成膜组合物是用于离子注入的成膜组合物，其含有包含第13族，第14族，第15族或第16族中的元素的化合物和有机溶剂。 此外，下层膜形成组合物含有具有至少两个硼酸酯基的化合物。
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公开(公告)号：US10774234B2
公开(公告)日：2020-09-15
申请号：US14896639
申请日：2014-06-09
IPC分类号： C09D133/14 , C09D143/02 , C12M1/00 , C08L101/02 , C09D201/02 , C08L43/02 , C09D5/16 , C08F230/02
摘要： The present invention is to provide a cell culture vessel comprising a copolymer which contains a recurring unit containing an organic group of the following formula (a) and a recurring unit containing an organic group of the following formula (b) being coated onto a surface thereof, a method for manufacturing the same and a method for manufacturing a cell aggregate using the same (wherein Ua1, Ua2, Ub1, Ub2 and Ub3, and An− are as defined in the present specification and the claims).
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公开(公告)号：US10240122B2
公开(公告)日：2019-03-26
申请号：US15118481
申请日：2015-02-13
发明人： Makiko Umezaki , Takahiro Kishioka , Taito Nishino , Ayako Otani , Kenichiro Kamei , Li Liu , Yong Chen
IPC分类号： C12N5/00 , D04H1/728 , D01D5/00 , D01F1/10 , D01F6/52 , C08L33/12 , C08L33/14 , D01F6/36 , D04H1/4291 , C08L33/06
摘要： A composition for producing a fiber, containing (A) a polymer compound containing a unit structure represented by the formula (1) and a unit structure represented by the formula (2), (B) a crosslinking agent, (C) an acid compound, and (D) a solvent wherein each symbol in the formulas (1) and (2) is as described in the DESCRIPTION.
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