Semiconductor storage device
    3.
    发明授权

    公开(公告)号:US11658155B2

    公开(公告)日:2023-05-23

    申请号:US17007797

    申请日:2020-08-31

    Abstract: A semiconductor storage device includes a substrate, a plurality of conductive layers arranged in a first direction intersecting a surface of the substrate, and a semiconductor layer extending in the first direction and penetrating the plurality of conductive layers. The plurality of conductive layers includes a first conductive layer and a second conductive layer that are adjacent to each other, a third conductive layer and a fourth conductive layer that are adjacent to each other, and a fifth conductive layer and a sixth conductive layer that are adjacent to each other. When a distance between the first conductive layer and the second conductive layer in the first direction is a first distance, a distance between the third conductive layer and the fourth conductive layer in the first direction is a second distance, and a distance between the fifth conductive layer and the sixth conductive layer in the first direction is a third distance, the second distance is smaller than the first distance, and the third distance is smaller than the second distance.

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