公开(公告)号：US06552803B1

公开(公告)日：2003-04-22

申请号：US09375664

申请日：1999-08-17

申请人： Haiming Wang ,  Shing Lee ,  Mehrdad Nikoonahad

发明人： Haiming Wang ,  Shing Lee ,  Mehrdad Nikoonahad

IPC分类号： G01B902

CPC分类号： G01B17/025 ,  G01B11/0675 ,  G01N29/2418 ,  G01N29/348 ,  G01N2291/014 ,  G01N2291/02854 ,  G01N2291/0427

摘要： Thickness of a film in a sample may be detected by directing pump laser pulses to the surface of a sample to generate an acoustic pulse in a sample. The acoustic pulse propagates downwards until it reaches an interface between the bottom of the film and a substrate and is reflected back to the top surface of the film as a first echo. A reflection of the first echo propagates downwards and is again reflected back towards the surface as a second echo. Heterodyne interferometry is used to measure the lapse of time between the first and second echos from which the thickness of the film may be determined.

摘要翻译： 可以通过将泵浦激光脉冲引导到样品的表面以在样品中产生声脉冲来检测样品中的膜的厚度。 声脉冲向下传播直到其到达膜的底部和基底之间的界面并且作为第一回波被反射回到膜的顶表面。 第一个回波的反射向下传播并再次反射回到表面作为第二回波。 使用异步干涉测量来测量第一和第二回波之间的时间流逝，从该距离可以确定膜的厚度。

公开(公告)号：US06184984B2

公开(公告)日：2001-02-06

申请号：US09246922

申请日：1999-02-09

申请人： Shing Lee ,  Haiming Wang ,  Adam Norton ,  Mehrdad Nikoonahad

发明人： Shing Lee ,  Haiming Wang ,  Adam Norton ,  Mehrdad Nikoonahad

IPC分类号： G01N2121

CPC分类号： G01J4/02 ,  G01J3/447 ,  G01N21/21

摘要： A polarized sample beam of broadband radiation is focused onto the surface of a sample and the radiation modified by the sample is collected by means of a mirror system in different planes of incidence. The sample beam focused to the sample has a multitude of polarization states. The modified radiation is analyzed with respect to a polarization plane to provide a polarimetric spectrum. Thickness and refractive information may then be derived from the spectrum. Preferably the polarization of the sample beam is altered only by the focusing and the sample, and the analyzing is done with respect to a fixed polarization plane. In the preferred embodiment, the focusing of the sample beam and the collection of the modified radiation are repeated employing two different apertures to detect the presence or absence of a birefringence axis in the sample. In another preferred embodiment, the above-described technique may be combined with ellipsometry for determining the thicknesses and refractive indices of thin films.

摘要翻译： 将宽带辐射的极化样品束聚焦到样品的表面上，并且通过不同入射平面的反射镜系统收集由样品改性的辐射。 聚焦到样品的样品束具有许多极化状态。 相对于偏振平面分析修改的辐射以提供偏振光谱。 然后可以从光谱导出厚度和折射信息。 优选地，样品光束的偏振仅由聚焦和样品改变，并且相对于固定的偏振平面进行分析。 在优选实施例中，使用两个不同的孔来重复样品束的聚焦和修改的辐射的收集，以检测样品中双折射轴的存在或不存在。 在另一个优选实施例中，上述技术可以与用于确定薄膜的厚度和折射率的椭偏仪组合。

公开(公告)号：US06611330B2

公开(公告)日：2003-08-26

申请号：US09778245

申请日：2001-02-06

申请人： Shing Lee ,  Haiming Wang ,  Adam Norton ,  Mehrdad Nikoonahad

发明人： Shing Lee ,  Haiming Wang ,  Adam Norton ,  Mehrdad Nikoonahad

IPC分类号： G01N2121

CPC分类号： G01J4/02 ,  G01J3/447 ,  G01N21/21

摘要： A polarized sample beam of broadband radiation is focused onto the surface of a sample and the radiation modified by the sample is collected by means of a mirror system in different planes of incidence. The sample beam focused to the sample has a multitude of polarization states. The modified radiation is analyzed with respect to a polarization plane to provide a polarimetric spectrum. Thickness and refractive information may then be derived from the spectrum. Preferably the polarization of the sample beam is altered only by the focusing and the sample, and the analyzing is done with respect to a fixed polarization plane. In the preferred embodiment, the focusing of the sample beam and the collection of the modified radiation are repeated employing two different apertures to detect the presence or absence of a birefringence axis in the sample. In another preferred embodiment, the above-described technique may be combined with ellipsometry for determining the thicknesses and refractive indices of thin films.

公开(公告)号：US06108087A

公开(公告)日：2000-08-22

申请号：US28417

申请日：1998-02-24

申请人： Mehrdad Nikoonahad ,  Shing Lee ,  Haiming Wang

发明人： Mehrdad Nikoonahad ,  Shing Lee ,  Haiming Wang

IPC分类号： G01B21/08 ,  G01B17/02 ,  G01N29/00 ,  G01N29/24 ,  G01N29/34 ,  G01B9/02

CPC分类号： G01B17/025 ,  G01N29/2418 ,  G01N29/348 ,  G01N2291/014 ,  G01N2291/02854 ,  G01N2291/0427

摘要： Thickness of a film in a sample may be detected by directing pump laser pulses to the surface of a sample to generate an acoustic pulse in a sample. The acoustic pulse propagates downwards until it reaches an interface between the bottom of the film and a substrate and is reflected back to the top surface of the film as a first echo. A reflection of the first echo propagates downwards and is again reflected back towards the surface as a second echo. Interferometry is used to measure the lapse of time between the first and second echos from which the thickness of the film may be determined.

摘要翻译： 可以通过将泵浦激光脉冲引导到样品的表面以在样品中产生声脉冲来检测样品中的膜的厚度。 声脉冲向下传播直到其到达膜的底部和基底之间的界面并且作为第一回波被反射回到膜的顶表面。 第一个回波的反射向下传播并再次反射回到表面作为第二回波。 使用干涉测量来测量第一和第二回波之间的时间流逝，从该厚度可以确定膜的厚度。

公开(公告)号：US07369233B2

公开(公告)日：2008-05-06

申请号：US10718126

申请日：2003-11-19

申请人： Mehrdad Nikoonahad ,  Shing Lee ,  Hidong Kwak ,  Sergio Edelstein ,  Guoheng Zhao ,  Gary Janik

发明人： Mehrdad Nikoonahad ,  Shing Lee ,  Hidong Kwak ,  Sergio Edelstein ,  Guoheng Zhao ,  Gary Janik

IPC分类号： G01N21/17

CPC分类号： G01N21/9501 ,  G01N21/8806

摘要： In an optical system measuring sample characteristics, by reducing the amount of ambient absorbing gas or gases and moisture present in at least a portion of the illumination and detection paths experienced by vacuum ultraviolet (VUV) radiation used in the measurement process, the attenuation of such wavelength components can be reduced. Such reduction can be accomplished by a process without requiring the evacuation of all gases and moisture from the measurement system. In one embodiment, the reduction can be accomplished by displacing at least some of the absorbing gas(es) and moisture present in at least a portion of the measuring paths so as to reduce the attenuation of VUV radiation. In this manner, the sample does not need to be placed in a vacuum, thereby enhancing system throughput.

摘要翻译： 在测量样品特性的光学系统中，通过减少在测量过程中使用的真空紫外线（VUV）辐射所经历的照明和检测路径的至少一部分中存在的环境吸收气体或气体和水分的量， 可以减少波长分量。 这种还原可以通过一种方法来实现，而不需要从测量系统排出所有的气体和水分。 在一个实施例中，可以通过置换至少部分测量路径中的至少一些吸收气体和水分来实现还原，以便减少VUV辐射的衰减。 以这种方式，样品不需要放置在真空中，从而提高系统产量。

公开(公告)号：US06268916B1

公开(公告)日：2001-07-31

申请号：US09310017

申请日：1999-05-11

申请人： Shing Lee ,  Mehrdad Nikoonahad ,  Xing Chen

发明人： Shing Lee ,  Mehrdad Nikoonahad ,  Xing Chen

IPC分类号： G01J400

CPC分类号： G01N21/211 ,  G01B11/065 ,  G01J4/00

摘要： The surface of a doped semiconductor wafer is heated locally by means of a pump beam whose intensity is modulated at a first frequency. The heated area is sampled by a probe beam whose intensity is modulated at a second frequency. After the probe beam has been modulated (reflected or transmitted) at the first frequency by the wafer, the modulated probe beam is detected at a frequency equal to the difference between the harmonics of the first and second frequencies to determine dose of the dopants in the wafer. Such or similar type of instrument for measuring dose may be combined with an ellipsometer, reflectometer or polarimeter for measuring dose as well as thickness(es) and/or indices of refraction in a combined instrument for measuring the same sample.

摘要翻译： 掺杂半导体晶片的表面通过其强度以第一频率调制的泵浦光束被局部加热。 加热区域由其强度以第二频率调制的探测光束进行采样。 在探测光束已经被晶片以第一频率调制（反射或传输）之后，以等于第一和第二频率的谐波之间的差异的频率来检测调制的探测光束，以确定在 晶圆。 用于测量剂量的这种或类似类型的仪器可以与用于测量相同样品的组合仪器中的用于测量剂量以及厚度和/或折射率的椭偏仪，反射计或偏振计组合。

公开(公告)号：US07764376B2

公开(公告)日：2010-07-27

申请号：US12506019

申请日：2009-07-20

申请人： John Fielden ,  Gary Janik ,  Shing Lee

发明人： John Fielden ,  Gary Janik ,  Shing Lee

IPC分类号： G01J4/00

CPC分类号： G03F7/70933 ,  G03F7/70916

摘要： Various systems for measurement of a specimen are provided. One system includes a first optical subsystem, which is disposed within a purged environment. The purged environment may be provided by a differential purging subsystem. The first optical subsystem performs measurements using vacuum ultraviolet light. This system also includes a second optical subsystem, which is disposed within a non-purged environment. The second optical subsystem performs measurements using non-vacuum ultraviolet light. Another system includes two or more optical subsystems configured to perform measurements of a specimen using vacuum ultraviolet light. The system also includes a purging subsystem configured to maintain a purged environment around the two or more optical subsystems. The purging subsystem is also configured to maintain the same level of purging in both optical subsystems. Some systems also include a cleaning subsystem configured to remove contaminants from a portion of a specimen prior to measurements at vacuum ultraviolet wavelengths.

摘要翻译： 提供了用于测量样本的各种系统。 一个系统包括设置在净化环境中的第一光学子系统。 净化的环境可以由差动清洗子系统提供。 第一个光学子系统使用真空紫外线进行测量。 该系统还包括第二光学子系统，其被布置在非净化环境中。 第二光学子系统使用非真空紫外光进行测量。 另一系统包括两个或更多个配置成使用真空紫外光进行样本测量的光学子系统。 该系统还包括净化子系统，该净化子系统配置为保持围绕两个或更多个光学子系统的净化环境。 清洗子系统还被配置为在两个光学子系统中保持相同的清洗水平。 一些系统还包括清洁子系统，被配置为在真空紫外线波长测量之前从试样的一部分去除污染物。

公开(公告)号：US07623239B2

公开(公告)日：2009-11-24

申请号：US12103320

申请日：2008-04-15

申请人： John Fielden ,  Gary Janik ,  Shing Lee

发明人： John Fielden ,  Gary Janik ,  Shing Lee

IPC分类号： G01J4/00

CPC分类号： G01J3/10 ,  G01J3/0286 ,  G01J3/36 ,  G01N21/211 ,  G01N2021/213

摘要： Various systems for measurement of a specimen are provided. One system includes an optical subsystem configured to perform measurements of a specimen using vacuum ultraviolet light and non-vacuum ultraviolet light. This system also includes a purging subsystem that is configured to maintain a purged environment around the optical subsystem during the measurements. Another system includes a cleaning subsystem configured to remove contaminants from a specimen prior to measurement. In one embodiment, the cleaning subsystem may be a laser-based cleaning subsystem that is configured to remove contaminants from a localized area on the specimen. The system also includes an optical subsystem that is configured to perform measurements of the specimen using vacuum ultraviolet light. The optical subsystem is disposed within a purged environment. In some embodiments, the system may include a differential purging subsystem that is configured to provide the purged environment for the optical subsystem.

摘要翻译： 提供了用于测量样本的各种系统。 一个系统包括被配置为使用真空紫外光和非真空紫外光进行样本的测量的光学子系统。 该系统还包括清洗子系统，其被配置为在测量期间保持围绕光学子系统的净化环境。 另一种系统包括清洁子系统，其构造成在测量之前从试样中去除污染物。 在一个实施例中，清洁子系统可以是被配置为从样本上的局部区域去除污染物的基于激光的清洁子系统。 该系统还包括被配置为使用真空紫外光进行样本的测量的光学子系统。 光学子系统设置在净化的环境中。 在一些实施例中，系统可以包括差分清洗子系统，其被配置为提供用于光学子系统的净化环境。

公开(公告)号：US07489399B1

公开(公告)日：2009-02-10

申请号：US10923325

申请日：2004-08-20

申请人： Shing Lee

发明人： Shing Lee

IPC分类号： G01J4/00

CPC分类号： G01N21/211 ,  G01B11/0641 ,  G01N2021/213

摘要： An ellipsometer having a light source for generating a probe beam along a probe beam path. A polarizing beam splitter passes the probe beam along the probe beam path, at least in part, as the probe beam passes through the beam splitter in a first direction, and diverts the probe beam along a detection path, at least in part, as the probe beam passes through the beam splitter in a second direction that is substantially opposite of the first direction. A compensator variably retards at least portions of the probe beam along at least one axis of the compensator, thereby changing an orientation of the light passing through the compensator. Optics focus the probe beam on a spot on a substrate. A concave mirror receives the probe beam from the spot on the substrate as it travels along the probe beam path in the first direction, and sends the probe beam back along the probe beam path in the second direction. A detector receives the probe beam along the detection path. Preferably, all of the elements of the ellipsometer that are disposed along the probe beam path are fixed and do not rotate relative to the probe beam during measurement operations.

摘要翻译： 具有用于沿探测光束路径产生探测光束的光源的椭偏仪。 至少部分地，当探测光束沿着第一方向通过分束器时，偏振分束器沿着探测光束路径传递探测光束，并且至少部分地沿着检测路径转移探测光束，如 探测光束在与第一方向基本相反的第二方向上穿过分束器。 补偿器沿着补偿器的至少一个轴可变地延伸探测光束的至少一部分，从而改变通过补偿器的光的取向。 光学元件将探头光束聚焦在基板上的一个点上。 当在第一方向上沿着探测光束路径行进时，凹面镜从基底上的斑点接收探测光束，并沿第二方向沿着探测光束路径发送探测光束。 检测器沿检测路径接收探测光束。 优选地，沿着探测光束路径设置的椭偏仪的所有元件在测量操作期间是固定的并且不相对于探测光束旋转。

公开(公告)号：US06514775B2

公开(公告)日：2003-02-04

申请号：US10008935

申请日：2001-11-09

申请人： Haiguang Chen ,  Shing Lee

发明人： Haiguang Chen ,  Shing Lee

IPC分类号： H01L2100

CPC分类号： B24B37/013 ,  B24B49/12

摘要： The present invention relates to in-situ techniques for determining process end points in semiconductor wafer polishing processes. Generally, the technique involves utilizing a scanning inspection machine having multiple pair of lasers and sensors located at different angles for detecting signals caused to emanate from an inspected specimen. The detection techniques determine the end points by differentiating between various material properties within a wafer. An accompanying algorithm is used to obtain an end point detection curve that represents a composite representation of the signals obtained from each of the detectors of the inspection machine. This end point detection curve is then used to determine the process end point. Note that computation of the algorithm is performed during the polishing process so that the process end point can be determined without interruptions that diminish process throughputs.

摘要翻译： 本发明涉及用于确定半导体晶片抛光工艺中的工艺终点的现场技术。 通常，该技术涉及利用具有多对激光器和位于不同角度的传感器的扫描检查机，以检测从检查样品发出的信号。 检测技术通过区分晶片内的各种材料特性来确定端点。 使用伴随的算法来获得终点检测曲线，其表示从检查机的每个检测器获得的信号的复合表示。 然后使用该终点检测曲线来确定过程终点。 请注意，在抛光过程中执行算法的计算，以便可以确定过程终点而不会导致过程吞吐量降低的中断。