公开(公告)号：US09046474B2

公开(公告)日：2015-06-02

申请号：US13541176

申请日：2012-07-03

申请人： Hidong Kwak ,  Ward Dixon ,  Leonid Poslavsky ,  Torsten R. Kaack

发明人： Hidong Kwak ,  Ward Dixon ,  Leonid Poslavsky ,  Torsten R. Kaack

IPC分类号： G01J4/00 ,  G01N21/21

CPC分类号： G01N21/211 ,  G01N2021/213 ,  G01N2021/214

摘要： Ellipsometry systems and ellipsometry data collection methods with improved stabilities are disclosed. In accordance with the present disclosure, multiple predetermined, discrete analyzer angles are utilized to collect ellipsometry data for a single measurement, and data regression is performed based on the ellipsometry data collected at these predetermined, discrete analyzer angles. Utilizing multiple discrete analyzer angles for a single measurement improves the stability of the ellipsometry system.

摘要翻译： 公开了具有改进的稳定性的椭偏仪系统和椭偏仪数据采集方法。 根据本公开，使用多个预定的离散分析器角度来收集用于单个测量的椭圆测量数据，并且基于在这些预定的离散分析器角度收集的椭偏仪数据执行数据回归。 使用多个离散分析仪角度进行单次测量可提高椭偏仪系统的稳定性。

公开(公告)号：US07869040B1

公开(公告)日：2011-01-11

申请号：US12184419

申请日：2008-08-01

申请人： Hidong Kwak ,  Shankar Krishnan ,  Shing Lee ,  Haixing Zou

发明人： Hidong Kwak ,  Shankar Krishnan ,  Shing Lee ,  Haixing Zou

IPC分类号： G01J4/00

CPC分类号： G01J3/10 ,  G01B11/0641 ,  G01J3/02 ,  G01J3/0208 ,  G01J3/021 ,  G01J3/0224 ,  G01J3/0237 ,  G01J3/14 ,  G01J3/1809 ,  G01N21/211 ,  G01N21/9501 ,  G01N21/956 ,  G01N2021/212 ,  G01N2021/213 ,  G01N2021/95676

摘要： An illumination subsystem configured to provide illumination for a measurement system includes first and second light sources configured to generate light for measurements in different wavelength regimes. The illumination subsystem also includes a TIR prism configured to be moved into and out of an optical path from the first and second light sources to the measurement system. If the TIR prism is positioned out of the optical path, light from only the first light source is directed along the optical path. If the TIR prism is positioned in the optical path, light from only the second light source is directed along the optical path. Various measurement systems are also provided. One measurement system includes an optical subsystem configured to perform measurements of a specimen using light in different wavelength regimes directed along a common optical path. The different wavelength regimes include vacuum ultraviolet, ultraviolet, visible, and near infrared wavelength regimes.

摘要翻译： 被配置为为测量系统提供照明的照明子系统包括被配置为产生用于不同波长方案中的测量的光的第一和第二光源。 照明子系统还包括被配置为移入和移出从第一和第二光源到测量系统的光路的TIR棱镜。 如果TIR棱镜位于光路外，则仅沿着光路引导来自第一光源的光。 如果TIR棱镜位于光路中，则仅沿着光路引导来自第二光源的光。 还提供了各种测量系统。 一个测量系统包括光学子系统，该光学子系统被配置为使用沿着公共光路引导的不同波长方式的光来对样本进行测量。 不同的波长方案包括真空紫外线，紫外线，可见光和近红外波长方案。

公开(公告)号：US08830486B2

公开(公告)日：2014-09-09

申请号：US13536410

申请日：2012-06-28

申请人： Hidong Kwak ,  Ward Dixon ,  Torsten Kaack ,  Ning-Yi Neil Wang ,  Jagjit Sandhu

发明人： Hidong Kwak ,  Ward Dixon ,  Torsten Kaack ,  Ning-Yi Neil Wang ,  Jagjit Sandhu

IPC分类号： G01B11/28 ,  G01N21/55 ,  G01B11/06 ,  B08B5/02 ,  H01L21/67 ,  H01L21/66

CPC分类号： G01N21/55 ,  B08B5/02 ,  G01B11/06 ,  G01B11/0641 ,  G01B2210/56 ,  G01N21/21 ,  H01L21/67017 ,  H01L22/12 ,  H01L2924/0002 ,  H01L2924/00

摘要： A local purging tool for purging a portion of a surface of a wafer with purging gas is disclosed. The purging tool includes a purging chamber configured to contain purging gas within a cavity of the purging chamber, a permeable portion of a surface of the purging chamber configured to diffuse purging gas from the cavity of the chamber to a portion of a surface of a wafer, and an aperture configured to transmit illumination received from an illumination source to a measurement location of the portion of the surface of the wafer and further configured to transmit illumination reflected from the measurement location to a detector.

摘要翻译： 公开了一种用清洗气体清洗晶片表面的一部分的局部清洗工具。 清洗工具包括净化室，其构造成在清洗室的空腔内容纳清洗气体，清洗室的表面的可渗透部分构造成将清洗气体从腔的腔扩散到晶片表面的一部分 以及被配置为将从照明源接收的照明传送到晶片表面的该部分的测量位置并且还被配置为将从测量位置反射的照射传输到检测器的孔。

公开(公告)号：US07295325B2

公开(公告)日：2007-11-13

申请号：US10672725

申请日：2003-09-26

申请人： Hidong Kwak ,  Gary Janik ,  Mehrdad Nikoonahad

发明人： Hidong Kwak ,  Gary Janik ,  Mehrdad Nikoonahad

IPC分类号： G01B9/02

CPC分类号： G01N21/636

摘要： In one embodiment, a probe pulse is first stretched into a pulse of longer duration. The probe pulse comprises a plurality of wavelength components in a bandwidth, so that each temporal portion of the converted pulse corresponds to and comprises one of the wavelength components. This converted pulse is supplied to the sample at the time when it is affected by the disturbance of the sample caused by a pump pulse. Changes in characteristics of the sample at the wavelength components of the temporal portions of the converted pulse are then detected after the converted pulse has been modified by the sample. Such changes are then analyzed to derive characteristics of the sample. In another embodiment, a converter passes to a detector radiation from a probe beam that has been modified by the sample during a temporal sequence of time intervals, where the time intervals correspond to displacement in a spatial record. The radiation passed comprises radiation from the probe beam when it is affected by the disturbance in the sample caused by a pump pulse. The output of the detector is then analyzed to determine the characteristics of the sample.

摘要翻译： 在一个实施例中，探针脉冲首先被拉伸成更长持续时间的脉冲。 探测脉冲包括带宽中的多个波长分量，使得转换的脉冲的每个时间部分对应于并包括波长分量之一。 该转换的脉冲在受泵脉冲引起的样品干扰的影响时被提供给样品。 转换脉冲的时间部分的波长分量之后的样本特性的变化在被样品修改后被检测。 然后分析这些变化以导出样品的特征。 在另一个实施例中，转换器在时间间隔对应于空间记录中的位移的时间序列期间，从已经被样本修改的探测光束传递到检测器辐射。 当受到泵脉冲引起的样品干扰影响时，通过的辐射包括来自探针光束的辐射。 然后分析检测器的输出以确定样品的特性。

公开(公告)号：US07755764B2

公开(公告)日：2010-07-13

申请号：US12019592

申请日：2008-01-24

申请人： Hidong Kwak ,  Shankar Krishnan

发明人： Hidong Kwak ,  Shankar Krishnan

IPC分类号： G01N21/55

CPC分类号： G01B11/0625 ,  G01B11/0633 ,  G01B11/0641 ,  G01J3/02 ,  G01J3/0224 ,  G01J3/0294 ,  G01J3/447 ,  G01N21/211 ,  G01N21/33 ,  G01N2021/213 ,  G01N2201/0233

摘要： An optical method and system for measuring characteristics of a sample using a broadband metrology tool in a purge gas flow environment are disclosed. In the method a beam path for the metrology tool is purged with purge gas at a first flow rate. A surface of the sample is illuminated by a beam of source radiation having at least one wavelength component in a vacuum ultraviolet (VUV) range and/or at least one wavelength component in an ultraviolet-visible (UV-Vis) range. A flow rate of a purge gas is adjusted between the first flow rate for metrology measurements made when the source radiation is in the VUV spectral region and a second flow rate for metrology measurements made when the source radiation is in the UV-Vis spectral region. The system includes a light source, illumination optics, collection optics, detector, a purge gas source and a controller. The purge gas source is configured to supply a flow of purge gas to a beam path in the light source and/or illumination optics and/or sample and/or collection optics and/or detector. The controller is configured to control a flow rate of the purged gas flow in response to an output signal from the detector.

摘要翻译： 公开了一种用于在吹扫气体流动环境中使用宽带测量工具测量样品的特性的光学方法和系统。 在该方法中，用第一流量的吹扫气体吹扫计量工具的光束路径。 通过在紫外 - 可见（UV-Vis）范围内具有真空紫外（VUV）范围和/或至少一个波长分量的至少一个波长分量的源辐射束照射样品的表面。 当源辐射处于VUV光谱区域时进行的度量测量的第一流量和当源辐射处于UV-Vis光谱区域时进行度量测量的第二流量时，净化气体的流量被调节。 该系统包括光源，照明光学器件，收集光学器件，检测器，吹扫气体源和控制器。 吹扫气体源被配置为向光源和/或照明光学器件和/或样品和/或收集光学元件和/或检测器中的光束路径提供净化气体流。 控制器被配置为响应于来自检测器的输出信号来控制净化气体流量的流量。

公开(公告)号：US09007583B2

公开(公告)日：2015-04-14

申请号：US13541176

申请日：2012-07-03

申请人： Hidong Kwak ,  Ward Dixon ,  Leonid Poslavsky ,  Torsten R. Kaack

发明人： Hidong Kwak ,  Ward Dixon ,  Leonid Poslavsky ,  Torsten R. Kaack

IPC分类号： G01J4/00 ,  G01N21/21

摘要： Ellipsometry systems and ellipsometry data collection methods with improved stabilities are disclosed. In accordance with the present disclosure, multiple predetermined, discrete analyzer angles are utilized to collect ellipsometry data for a single measurement, and data regression is performed based on the ellipsometry data collected at these predetermined, discrete analyzer angles. Utilizing multiple discrete analyzer angles for a single measurement improves the stability of the ellipsometry system.

公开(公告)号：US20130010311A1

公开(公告)日：2013-01-10

申请号：US13536410

申请日：2012-06-28

申请人： Hidong Kwak ,  Ward Dixon ,  Torsten Kaack ,  Ning-Yi Neil Wang ,  Jagjit Sandhu

发明人： Hidong Kwak ,  Ward Dixon ,  Torsten Kaack ,  Ning-Yi Neil Wang ,  Jagjit Sandhu

IPC分类号： B08B5/02 ,  G01B11/06 ,  G01B11/00

CPC分类号： G01N21/55 ,  B08B5/02 ,  G01B11/06 ,  G01B11/0641 ,  G01B2210/56 ,  G01N21/21 ,  H01L21/67017 ,  H01L22/12 ,  H01L2924/0002 ,  H01L2924/00

摘要： A local purging tool for purging a portion of a surface of a wafer with purging gas is disclosed. The purging tool includes a purging chamber configured to contain purging gas within a cavity of the purging chamber, a permeable portion of a surface of the purging chamber configured to diffuse purging gas from the cavity of the chamber to a portion of a surface of a wafer, and an aperture configured to transmit illumination received from an illumination source to a measurement location of the portion of the surface of the wafer and further configured to transmit illumination reflected from the measurement location to a detector.

摘要翻译： 公开了一种用清洗气体清洗晶片表面的一部分的局部清洗工具。 清洗工具包括净化室，其构造成在清洗室的空腔内容纳清洗气体，清洗室的表面的可渗透部分构造成将清洗气体从腔的腔扩散到晶片表面的一部分 以及被配置为将从照明源接收的照明传送到晶片表面的该部分的测量位置并且还被配置为将从测量位置反射的照射传输到检测器的孔。

公开(公告)号：US07408641B1

公开(公告)日：2008-08-05

申请号：US11058153

申请日：2005-02-14

申请人： Hidong Kwak ,  Shankar Krishnan ,  Shing Lee ,  Haixing Zou

发明人： Hidong Kwak ,  Shankar Krishnan ,  Shing Lee ,  Haixing Zou

IPC分类号： G01J4/00

CPC分类号： G01J3/10 ,  G01B11/0641 ,  G01J3/02 ,  G01J3/0208 ,  G01J3/021 ,  G01J3/0224 ,  G01J3/0237 ,  G01J3/14 ,  G01J3/1809 ,  G01N21/211 ,  G01N21/9501 ,  G01N21/956 ,  G01N2021/212 ,  G01N2021/213 ,  G01N2021/95676

摘要： An illumination subsystem configured to provide illumination for a measurement system includes first and second light sources configured to generate light for measurements in different wavelength regimes. The illumination subsystem also includes a TIR prism configured to be moved into and out of an optical path from the first and second light sources to the measurement system. If the TIR prism is positioned out of the optical path, light from only the first light source is directed along the optical path. If the TIR prism is positioned in the optical path, light from only the second light source is directed along the optical path. Various measurement systems are also provided. One measurement system includes an optical subsystem configured to perform measurements of a specimen using light in different wavelength regimes directed along a common optical path. The different wavelength regimes include vacuum ultraviolet, ultraviolet, visible, and near infrared wavelength regimes.

摘要翻译： 被配置为为测量系统提供照明的照明子系统包括被配置为产生用于不同波长方案中的测量的光的第一和第二光源。 照明子系统还包括被配置为移入和移出从第一和第二光源到测量系统的光路的TIR棱镜。 如果TIR棱镜位于光路外，则仅沿着光路引导来自第一光源的光。 如果TIR棱镜位于光路中，则仅沿着光路引导来自第二光源的光。 还提供了各种测量系统。 一个测量系统包括光学子系统，该光学子系统被配置为使用沿着公共光路引导的不同波长方式的光来对样本进行测量。 不同的波长方案包括真空紫外线，紫外线，可见光和近红外波长方案。

公开(公告)号：US07190441B1

公开(公告)日：2007-03-13

申请号：US11021555

申请日：2004-12-22

申请人： James T. McWhirter ,  Liang-Guo Wang ,  Hidong Kwak ,  Haixing Zou ,  Dan Georgesco ,  Bernard Lautee ,  Jennming James Chen ,  Gary R. Janik ,  Patrick M. Maxton

发明人： James T. McWhirter ,  Liang-Guo Wang ,  Hidong Kwak ,  Haixing Zou ,  Dan Georgesco ,  Bernard Lautee ,  Jennming James Chen ,  Gary R. Janik ,  Patrick M. Maxton

IPC分类号： G01N1/00

CPC分类号： G01N1/32 ,  G01N1/2813 ,  H01L21/67028

摘要： Methods and systems for preparing a sample for thin film analysis are provided. One system includes an energy beam source configured to generate an energy beam. The system also includes an energy beam delivery subsystem configured to direct the energy beam to a sample and to modify the energy beam such that the energy beam has a substantially flat-top profile on the sample. The energy beam removes a portion of a contaminant layer on the sample to expose an analysis area of a thin film on the sample. One method includes generating an energy beam and modifying the energy beam such that the energy beam has a substantially flat-top profile. The method also includes directing the energy beam to a sample. The energy beam removes a portion of a contaminant layer on the sample to expose an analysis area of a thin film on the sample.

摘要翻译： 提供了制备用于薄膜分析的样品的方法和系统。 一个系统包括被配置为产生能量束的能量束源。 该系统还包括能量束传送子系统，其配置成将能量束引导到样品并修改能量束，使得能量束在样品上具有基本上平顶的轮廓。 能量束去除样品上的污染物层的一部分以暴露样品上薄膜的分析区域。 一种方法包括产生能量束并修改能量束，使得能量束具有基本平坦的轮廓。 该方法还包括将能量束引导到样品。 能量束去除样品上的污染物层的一部分以暴露样品上薄膜的分析区域。

公开(公告)号：US06999180B1

公开(公告)日：2006-02-14

申请号：US10405528

申请日：2003-04-02

申请人： Gary R. Janik ,  Hidong Kwak ,  Ying Gao ,  Johannes D. De Veer

发明人： Gary R. Janik ,  Hidong Kwak ,  Ying Gao ,  Johannes D. De Veer

IPC分类号： G01B9/02 ,  G01B11/28

CPC分类号： G01B11/0675 ,  G01B11/2441

摘要： An apparatus capable of measuring topography and transparent film thickness of a patterned metal-dielectric layer on a substrate without contact with the layer. A broadband interferometer measures an absolute phase of reflection at a plurality of wavelengths from a plurality of locations within a field of view on the metal-dielectric patterned layer on the substrate, and produces reflection phase data. An analyzer receives the reflection phase data and regresses the transparent film thickness and the topography at each of the plurality of locations from the reflection phase data. In this manner, the apparatus is not confused by the phase changes produced in the reflected light by the transparent layers, because the thickness of the transparent layers are determined by using the reflection phase data from multiple wavelengths. Further, the surface topography of the layer, whether it be opaque or transparent is also determinable. Thus, the present invention provides a means by which both transparent layer thickness and topography can be determined on an array surface of transparent and opaque layers, without contacting the surface of the layers.

摘要翻译： 一种能够测量衬底上图案化的金属 - 电介质层的形貌和透明膜厚度而不与该层接触的装置。 宽带干涉仪测量在基板上的金属 - 电介质图案层上的视场内的多个位置处的多个波长的绝对相位反射，并产生反射相位数据。 分析仪从反射相位数据接收反射相位数据并且在多个位置的每一个处回归透明膜厚度和形貌。 以这种方式，由于通过使用来自多个波长的反射相位数据来确定透明层的厚度，所以该装置不会被由透明层产生的反射光产生的相位变化所困惑。 此外，层的表面形貌，无论是不透明还是透明，也是可以确定的。 因此，本发明提供了一种在透明层和不透明层的阵列表面上可以确定透明层厚度和形貌的手段，而不与层的表面接触。