公开(公告)号：US09046474B2

公开(公告)日：2015-06-02

申请号：US13541176

申请日：2012-07-03

申请人： Hidong Kwak ,  Ward Dixon ,  Leonid Poslavsky ,  Torsten R. Kaack

发明人： Hidong Kwak ,  Ward Dixon ,  Leonid Poslavsky ,  Torsten R. Kaack

IPC分类号： G01J4/00 ,  G01N21/21

CPC分类号： G01N21/211 ,  G01N2021/213 ,  G01N2021/214

摘要： Ellipsometry systems and ellipsometry data collection methods with improved stabilities are disclosed. In accordance with the present disclosure, multiple predetermined, discrete analyzer angles are utilized to collect ellipsometry data for a single measurement, and data regression is performed based on the ellipsometry data collected at these predetermined, discrete analyzer angles. Utilizing multiple discrete analyzer angles for a single measurement improves the stability of the ellipsometry system.

摘要翻译： 公开了具有改进的稳定性的椭偏仪系统和椭偏仪数据采集方法。 根据本公开，使用多个预定的离散分析器角度来收集用于单个测量的椭圆测量数据，并且基于在这些预定的离散分析器角度收集的椭偏仪数据执行数据回归。 使用多个离散分析仪角度进行单次测量可提高椭偏仪系统的稳定性。

公开(公告)号：US20130010296A1

公开(公告)日：2013-01-10

申请号：US13541176

申请日：2012-07-03

申请人： Hidong Kwak ,  Ward Dixon ,  Leonid Poslavsky ,  Torsten R. Kaack

发明人： Hidong Kwak ,  Ward Dixon ,  Leonid Poslavsky ,  Torsten R. Kaack

IPC分类号： G01J4/00

CPC分类号： G01N21/211 ,  G01N2021/213 ,  G01N2021/214

摘要： Ellipsometry systems and ellipsometry data collection methods with improved stabilities are disclosed. In accordance with the present disclosure, multiple predetermined, discrete analyzer angles are utilized to collect ellipsometry data for a single measurement, and data regression is performed based on the ellipsometry data collected at these predetermined, discrete analyzer angles. Utilizing multiple discrete analyzer angles for a single measurement improves the stability of the ellipsometry system.

摘要翻译： 公开了具有改进的稳定性的椭偏仪系统和椭偏仪数据采集方法。 根据本公开，使用多个预定的离散分析器角度来收集用于单个测量的椭圆测量数据，并且基于在这些预定的离散分析器角度收集的椭偏仪数据执行数据回归。 使用多个离散分析仪角度进行单次测量可提高椭偏仪系统的稳定性。

公开(公告)号：US09007583B2

公开(公告)日：2015-04-14

申请号：US13541176

申请日：2012-07-03

申请人： Hidong Kwak ,  Ward Dixon ,  Leonid Poslavsky ,  Torsten R. Kaack

发明人： Hidong Kwak ,  Ward Dixon ,  Leonid Poslavsky ,  Torsten R. Kaack

IPC分类号： G01J4/00 ,  G01N21/21

摘要： Ellipsometry systems and ellipsometry data collection methods with improved stabilities are disclosed. In accordance with the present disclosure, multiple predetermined, discrete analyzer angles are utilized to collect ellipsometry data for a single measurement, and data regression is performed based on the ellipsometry data collected at these predetermined, discrete analyzer angles. Utilizing multiple discrete analyzer angles for a single measurement improves the stability of the ellipsometry system.

公开(公告)号：US08830486B2

公开(公告)日：2014-09-09

申请号：US13536410

申请日：2012-06-28

申请人： Hidong Kwak ,  Ward Dixon ,  Torsten Kaack ,  Ning-Yi Neil Wang ,  Jagjit Sandhu

发明人： Hidong Kwak ,  Ward Dixon ,  Torsten Kaack ,  Ning-Yi Neil Wang ,  Jagjit Sandhu

IPC分类号： G01B11/28 ,  G01N21/55 ,  G01B11/06 ,  B08B5/02 ,  H01L21/67 ,  H01L21/66

CPC分类号： G01N21/55 ,  B08B5/02 ,  G01B11/06 ,  G01B11/0641 ,  G01B2210/56 ,  G01N21/21 ,  H01L21/67017 ,  H01L22/12 ,  H01L2924/0002 ,  H01L2924/00

摘要： A local purging tool for purging a portion of a surface of a wafer with purging gas is disclosed. The purging tool includes a purging chamber configured to contain purging gas within a cavity of the purging chamber, a permeable portion of a surface of the purging chamber configured to diffuse purging gas from the cavity of the chamber to a portion of a surface of a wafer, and an aperture configured to transmit illumination received from an illumination source to a measurement location of the portion of the surface of the wafer and further configured to transmit illumination reflected from the measurement location to a detector.

摘要翻译： 公开了一种用清洗气体清洗晶片表面的一部分的局部清洗工具。 清洗工具包括净化室，其构造成在清洗室的空腔内容纳清洗气体，清洗室的表面的可渗透部分构造成将清洗气体从腔的腔扩散到晶片表面的一部分 以及被配置为将从照明源接收的照明传送到晶片表面的该部分的测量位置并且还被配置为将从测量位置反射的照射传输到检测器的孔。

公开(公告)号：US20130010311A1

公开(公告)日：2013-01-10

申请号：US13536410

申请日：2012-06-28

申请人： Hidong Kwak ,  Ward Dixon ,  Torsten Kaack ,  Ning-Yi Neil Wang ,  Jagjit Sandhu

发明人： Hidong Kwak ,  Ward Dixon ,  Torsten Kaack ,  Ning-Yi Neil Wang ,  Jagjit Sandhu

IPC分类号： B08B5/02 ,  G01B11/06 ,  G01B11/00

CPC分类号： G01N21/55 ,  B08B5/02 ,  G01B11/06 ,  G01B11/0641 ,  G01B2210/56 ,  G01N21/21 ,  H01L21/67017 ,  H01L22/12 ,  H01L2924/0002 ,  H01L2924/00

摘要： A local purging tool for purging a portion of a surface of a wafer with purging gas is disclosed. The purging tool includes a purging chamber configured to contain purging gas within a cavity of the purging chamber, a permeable portion of a surface of the purging chamber configured to diffuse purging gas from the cavity of the chamber to a portion of a surface of a wafer, and an aperture configured to transmit illumination received from an illumination source to a measurement location of the portion of the surface of the wafer and further configured to transmit illumination reflected from the measurement location to a detector.

摘要翻译： 公开了一种用清洗气体清洗晶片表面的一部分的局部清洗工具。 清洗工具包括净化室，其构造成在清洗室的空腔内容纳清洗气体，清洗室的表面的可渗透部分构造成将清洗气体从腔的腔扩散到晶片表面的一部分 以及被配置为将从照明源接收的照明传送到晶片表面的该部分的测量位置并且还被配置为将从测量位置反射的照射传输到检测器的孔。