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    Scanning electron microscope
    3.
    发明授权
    Scanning electron microscope 有权
    扫描电子显微镜

    公开(公告)号：US09472376B2

    公开(公告)日：2016-10-18

    申请号：US14379715

    申请日：2013-02-18

    Applicant: HITACHI HIGH-TECHNOLOGIES CORPORATION

    Inventor： Toshiyuki Yokosuka ,  Chahn Lee ,  Hideyuki Kazumi ,  Hiroshi Makino ,  Yuzuru Mizuhara ,  Miki Isawa ,  Michio Hatano ,  Yoshinori Momonoi

    IPC: H01J37/28 ,  G01B15/00 ,  G01B15/04

    CPC classification number: H01J37/28 ,  G01B15/00 ,  G01B15/04 ,  H01J2237/0048 ,  H01J2237/0492 ,  H01J2237/24495 ,  H01J2237/281 ,  H01J2237/2815 ,  H01J2237/2817

    Abstract: An object of the invention is to provide a scanning electron microscope which forms an electric field to lift up, highly efficiently, electrons discharged from a hole bottom or the like even if a sample surface is an electrically conductive material. To achieve the above object, according to the invention, a scanning electron microscope including a deflector which deflects a scanning position of an electron beam, and a sample stage for loading a sample thereon, is proposed. The scanning electron microscope includes a control device which controls the deflector or the sample stage in such a way that before scanning a beam on a measurement target pattern, a lower layer pattern situated in a lower layer of the measurement target pattern undergoes beam irradiation on another pattern situated in the lower layer.

    Abstract translation: 本发明的目的是提供一种形成电场的扫描电子显微镜，即使样品表面是导电材料，也能高效地提高从孔底等排出的电子。 为了实现上述目的，根据本发明，提出了一种扫描电子显微镜，其包括使电子束的扫描位置偏转的偏转器和用于在其上装载样品的样品台。 扫描电子显微镜包括控制装置，其以这样的方式控制偏转器或样品台，即在测量目标图案上扫描光束之前，位于测量对象图案的下层中的下层图案在另一个上进行光束照射 图案位于下层。

    Charged particle beam device
    4.
    发明授权
    Charged particle beam device 有权

    公开(公告)号：US09786468B2

    公开(公告)日：2017-10-10

    申请号：US14762621

    申请日：2014-02-05

    Applicant: Hitachi High-Technologies Corporation

    Inventor： Toshiyuki Yokosuka ,  Chahn Lee ,  Hideyuki Kazumi

    IPC: H01J37/147 ,  H01J37/22 ,  H01J37/244 ,  H01J37/28

    CPC classification number: H01J37/1474 ,  H01J37/147 ,  H01J37/22 ,  H01J37/222 ,  H01J37/244 ,  H01J37/28 ,  H01J2237/15 ,  H01J2237/2448 ,  H01J2237/24495 ,  H01J2237/24592 ,  H01J2237/2806 ,  H01J2237/2817

    Abstract: An object of the invention is to provide a charged particle beam apparatus capable of performing high-precision measurement even on a pattern in which a width of edges is narrow and inherent peaks of the edges cannot be easily detected. In order to achieve the above object, there is proposed a charged particle beam apparatus including an opening portion forming member having a passage opening of a charged particle beam and a detector for detecting charged particles emitted from a sample or charged particles generated by causing the charged particles to collide with the opening portion forming member, the charged particle beam apparatus including: a deflector for deflecting the charged particles emitted from the sample; and a control device for controlling the deflector, the control device performing pattern measurement with the use of a first detected signal in which a signal of one edge is emphasized relatively more than a signal of another edge among a plurality of edges on the sample and a second detected signal in which the signal of the another edge is emphasized relatively more than the signal of the one edge among the plurality of edges.

    Charged particle beam device and pattern measurement device
    7.
    发明授权
    Charged particle beam device and pattern measurement device 有权

    公开(公告)号：US10290464B2

    公开(公告)日：2019-05-14

    申请号：US15759408

    申请日：2016-08-15

    Applicant: Hitachi High-Technologies Corporation

    Inventor： Toshiyuki Yokosuka ,  Chahn Lee ,  Hideyuki Kazumi ,  Manabu Hasegawa

    IPC: H01J37/28 ,  H01J37/22 ,  H01J37/244 ,  G01N23/22 ,  G03F7/20 ,  G01B15/00 ,  G01B15/04 ,  G01N23/2251

    Abstract: The present invention provides a charged particle beam device capable of predicting the three-dimensional structure of a sample, without affecting the charge of the sample. The present invention provides a charged particle beam device characterized in that a first distance between the peak and the bottom of a first signal waveform obtained on the basis of irradiation with a charged particle beam having a first landing energy, and a second distance between the peak and the bottom of a second signal waveform obtained on the basis of irradiation with a charged particle beam having a second landing energy different from the first landing energy are obtained, and the distance between the peak and the bottom at a landing energy (zero, for instance) different from the first and second landing energies is obtained on the basis of the extrapolation of the first distance and the second distance.

    SCANNING ELECTRON MICROSCOPE
    9.
    发明申请
    SCANNING ELECTRON MICROSCOPE 有权
    扫描电子显微镜

    公开(公告)号：US20150008322A1

    公开(公告)日：2015-01-08

    申请号：US14379715

    申请日：2013-02-18

    Applicant: HITACHI HIGH-TECHNOLOGIES CORPORATION

    Inventor： Toshiyuki Yokosuka ,  Chahn Lee ,  Hideyuki Kazumi ,  Hiroshi Makino ,  Yuzuru Mizuhara ,  Miki Isawa ,  Michio Hatano ,  Yoshinori Momonoi

    IPC: H01J37/28 ,  G01B15/04

    CPC classification number: H01J37/28 ,  G01B15/00 ,  G01B15/04 ,  H01J2237/0048 ,  H01J2237/0492 ,  H01J2237/24495 ,  H01J2237/281 ,  H01J2237/2815 ,  H01J2237/2817

    Abstract: An object of the invention is to provide a scanning electron microscope which forms an electric field to lift up, highly efficiently, electrons discharged from a hole bottom or the like even if a sample surface is an electrically conductive material. To achieve the above object, according to the invention, a scanning electron microscope including a deflector which deflects a scanning position of an electron beam, and a sample stage for loading a sample thereon, is proposed. The scanning electron microscope includes a control device which controls the deflector or the sample stage in such a way that before scanning a beam on a measurement target pattern, a lower layer pattern situated in a lower layer of the measurement target pattern undergoes beam irradiation on another pattern situated in the lower layer.

    Abstract translation: 本发明的目的是提供一种形成电场的扫描电子显微镜，即使样品表面是导电材料，也能高效地提高从孔底等排出的电子。 为了实现上述目的，根据本发明，提出了一种扫描电子显微镜，其包括使电子束的扫描位置偏转的偏转器和用于在其上装载样品的样品台。 扫描电子显微镜包括控制装置，其以这样的方式控制偏转器或样品台，即在测量目标图案上扫描光束之前，位于测量对象图案的下层中的下层图案在另一个上进行光束照射 图案位于下层。

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