公开(公告)号：US09472376B2

公开(公告)日：2016-10-18

申请号：US14379715

申请日：2013-02-18

Applicant: HITACHI HIGH-TECHNOLOGIES CORPORATION

Inventor： Toshiyuki Yokosuka ,  Chahn Lee ,  Hideyuki Kazumi ,  Hiroshi Makino ,  Yuzuru Mizuhara ,  Miki Isawa ,  Michio Hatano ,  Yoshinori Momonoi

IPC: H01J37/28 ,  G01B15/00 ,  G01B15/04

CPC classification number: H01J37/28 ,  G01B15/00 ,  G01B15/04 ,  H01J2237/0048 ,  H01J2237/0492 ,  H01J2237/24495 ,  H01J2237/281 ,  H01J2237/2815 ,  H01J2237/2817

Abstract: An object of the invention is to provide a scanning electron microscope which forms an electric field to lift up, highly efficiently, electrons discharged from a hole bottom or the like even if a sample surface is an electrically conductive material. To achieve the above object, according to the invention, a scanning electron microscope including a deflector which deflects a scanning position of an electron beam, and a sample stage for loading a sample thereon, is proposed. The scanning electron microscope includes a control device which controls the deflector or the sample stage in such a way that before scanning a beam on a measurement target pattern, a lower layer pattern situated in a lower layer of the measurement target pattern undergoes beam irradiation on another pattern situated in the lower layer.

Abstract translation: 本发明的目的是提供一种形成电场的扫描电子显微镜，即使样品表面是导电材料，也能高效地提高从孔底等排出的电子。 为了实现上述目的，根据本发明，提出了一种扫描电子显微镜，其包括使电子束的扫描位置偏转的偏转器和用于在其上装载样品的样品台。 扫描电子显微镜包括控制装置，其以这样的方式控制偏转器或样品台，即在测量目标图案上扫描光束之前，位于测量对象图案的下层中的下层图案在另一个上进行光束照射 图案位于下层。

公开(公告)号：US20150008322A1

公开(公告)日：2015-01-08

申请号：US14379715

申请日：2013-02-18

Applicant: HITACHI HIGH-TECHNOLOGIES CORPORATION

Inventor： Toshiyuki Yokosuka ,  Chahn Lee ,  Hideyuki Kazumi ,  Hiroshi Makino ,  Yuzuru Mizuhara ,  Miki Isawa ,  Michio Hatano ,  Yoshinori Momonoi

IPC: H01J37/28 ,  G01B15/04

CPC classification number: H01J37/28 ,  G01B15/00 ,  G01B15/04 ,  H01J2237/0048 ,  H01J2237/0492 ,  H01J2237/24495 ,  H01J2237/281 ,  H01J2237/2815 ,  H01J2237/2817

Abstract: An object of the invention is to provide a scanning electron microscope which forms an electric field to lift up, highly efficiently, electrons discharged from a hole bottom or the like even if a sample surface is an electrically conductive material. To achieve the above object, according to the invention, a scanning electron microscope including a deflector which deflects a scanning position of an electron beam, and a sample stage for loading a sample thereon, is proposed. The scanning electron microscope includes a control device which controls the deflector or the sample stage in such a way that before scanning a beam on a measurement target pattern, a lower layer pattern situated in a lower layer of the measurement target pattern undergoes beam irradiation on another pattern situated in the lower layer.

Abstract translation: 本发明的目的是提供一种形成电场的扫描电子显微镜，即使样品表面是导电材料，也能高效地提高从孔底等排出的电子。 为了实现上述目的，根据本发明，提出了一种扫描电子显微镜，其包括使电子束的扫描位置偏转的偏转器和用于在其上装载样品的样品台。 扫描电子显微镜包括控制装置，其以这样的方式控制偏转器或样品台，即在测量目标图案上扫描光束之前，位于测量对象图案的下层中的下层图案在另一个上进行光束照射 图案位于下层。

公开(公告)号：US10438771B2

公开(公告)日：2019-10-08

申请号：US15273523

申请日：2016-09-22

Applicant: HITACHI HIGH-TECHNOLOGIES CORPORATION

Inventor： Michio Hatano ,  Yoshinori Nakayama ,  Masaru Matsuzaki ,  Hiroki Kawada ,  Yoshinori Momonoi ,  Zhigang Wang

IPC: H01J37/26 ,  H01J37/28

Abstract: Provided is a measurement device including: an irradiation optical system which emits a primary charged quantum beam to a sample for scanning; a detector which detects secondary charged particles generated from the sample; and a signal processing unit which processes an output signal from the secondary charged particle detector which has detected the secondary charged particles, in which the signal processing unit includes a measurement unit which measures widths of a first pattern group calibrated with a well-known first dimension and a second pattern group calibrated with a well-known second dimension, and an operation unit which defines a relationship between the well-known dimensions of the first and second pattern groups and length measurement values of the first and second pattern groups as a function. Accordingly, it is possible to control device performance with high accuracy, by controlling a device state so that the measured value described above is within an acceptable range by comparing to a predetermined value provided in advance.

公开(公告)号：US20130321610A1

公开(公告)日：2013-12-05

申请号：US13898620

申请日：2013-05-21

Applicant: Hitachi High-Technologies Corporation

Inventor： Yoshinori Momonoi ,  Koichi Hamada ,  Yuji Takagi ,  Michio Hatano ,  Hideyuki Kazumi

IPC: H04N7/18

CPC classification number: H04N7/18 ,  G06T7/0006 ,  G06T2207/10016 ,  G06T2207/10061 ,  G06T2207/30148

Abstract: There is provided a technique to correctly select and measure a pattern to be measured even when contours of the pattern are close to each other in a sample including a plurality of patterns on a substantially same plane.A pattern measuring apparatus that scans a sample with charged particles, forms a detected image by detecting secondary charged particles or backscattered charged particles generated from the sample, and measures a pattern imaged on the detected image includes: an image acquiring section acquiring a plurality of detected images taken at a substantially same location on the sample under different imaging conditions; a contour extracting section extracting a plurality of pattern contours from the plurality of detected images; a contour reconstructing section reconstructing a contour to be measured by combining the plurality of pattern contours; and a contour measuring section making a measurement using the reconstructed contour to be measured.

Abstract translation: 提供了一种技术，即使在图案的轮廓在基本上相同的平面上的包括多个图案的样本中彼此接近的情况下，也能正确地选择和测量待测量的图案。 一种用带电粒子扫描样品的图形测量装置，通过检测从样品产生的二次带电粒子或反向散射带电粒子形成检测图像，并测量在检测图像上成像的图案，包括：图像获取部分，获取多个检测到的 在不同成像条件下在样品上基本相同位置拍摄的图像; 轮廓提取部，从所述多个检测图像中提取多个图案轮廓; 轮廓重建部，通过组合多个图案轮廓来重建要测量的轮廓; 以及轮廓测量部，其使用要测量的重构轮廓进行测量。

公开(公告)号：US09521372B2

公开(公告)日：2016-12-13

申请号：US13898620

申请日：2013-05-21

Applicant: Hitachi High-Technologies Corporation

Inventor： Yoshinori Momonoi ,  Koichi Hamada ,  Yuji Takagi ,  Michio Hatano ,  Hideyuki Kazumi

IPC: H04N7/18 ,  G06T7/00

CPC classification number: H04N7/18 ,  G06T7/0006 ,  G06T2207/10016 ,  G06T2207/10061 ,  G06T2207/30148

Abstract: There is provided a technique to correctly select and measure a pattern to be measured even when contours of the pattern are close to each other in a sample including a plurality of patterns on a substantially same plane.A pattern measuring apparatus that scans a sample with charged particles, forms a detected image by detecting secondary charged particles or backscattered charged particles generated from the sample, and measures a pattern imaged on the detected image includes: an image acquiring section acquiring a plurality of detected images taken at a substantially same location on the sample under different imaging conditions; a contour extracting section extracting a plurality of pattern contours from the plurality of detected images; a contour reconstructing section reconstructing a contour to be measured by combining the plurality of pattern contours; and a contour measuring section making a measurement using the reconstructed contour to be measured.

Abstract translation: 一种用带电粒子扫描样品的图形测量装置，通过检测从样品产生的二次带电粒子或反向散射带电粒子形成检测图像，并测量在检测图像上成像的图案，包括：图像获取部分，获取多个检测到的 在不同成像条件下在样品上基本相同位置拍摄的图像; 轮廓提取部，从所述多个检测图像中提取多个图案轮廓; 轮廓重建部，通过组合多个图案轮廓来重建要测量的轮廓; 以及轮廓测量部，其使用要测量的重构轮廓进行测量。

公开(公告)号：US09245711B2

公开(公告)日：2016-01-26

申请号：US14613538

申请日：2015-02-04

Applicant: Hitachi High-Technologies Corporation

Inventor： Michio Hatano ,  Yusuke Abe ,  Zhigang Wang

IPC: G01N15/14 ,  H01J37/28 ,  H01J37/22

CPC classification number: H01J37/222 ,  H01J37/28 ,  H01J2237/2448 ,  H01J2237/24495

Abstract: In observation of a sample having a structure in its depth direction, a charged particle beam apparatus that can form an SEM image reflecting a sample shape at a desired depth by a single image acquisition while avoiding enlargement of the apparatus is provided. The apparatus has: an irradiation optical system for irradiating and scanning a charged particle beam generated from a charged particle source on the sample; a detection optical system having a detector that detects charged particles generated from the sample by the irradiation of the charged particle beam, and converts them into an electric signal at a predetermined sampling period; and an image processing unit for forming an image based on the electric signal from the detector, in which the image processing unit detects a peak of wave height values for each pixel from the electric signal at each sampling time, and forms the image based on the peak of the detected wave height values.

Abstract translation: 在观察具有其深度方向结构的样品时，提供了一种带电粒子束装置，其能够通过单次图像获取反映所需深度的样品形状，同时避免该装置的放大。 该装置具有：照射光学系统，用于对从样品上的带电粒子源产生的带电粒子束进行照射和扫描; 检测光学系统，具有检测器，其通过照射带电粒子束来检测从样品产生的带电粒子，并以预定的采样周期将其转换为电信号; 以及图像处理单元，用于基于来自检测器的电信号形成图像，其中图像处理单元在每个采样时间从电信号检测每个像素的波高值的峰值，并且基于 检测到的波高值的峰值。