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    Electron beam irradiation apparatus
    1.
    发明授权
    Electron beam irradiation apparatus 有权
    电子束照射装置

    公开(公告)号：US09053905B2

    公开(公告)日：2015-06-09

    申请号：US14090065

    申请日：2013-11-26

    Applicant: Hitachi High-Technologies Corporation

    Inventor： Shahedul Hoque ,  Hajime Kawano

    IPC: H01J37/256 ,  H01J37/244 ,  G01N23/203 ,  H01J37/29 ,  H01J37/28

    CPC classification number: H01J37/29 ,  G01N23/203 ,  H01J37/244 ,  H01J37/28 ,  H01J2237/24475

    Abstract: The present invention has for its object to provide an electron beam irradiation apparatus which can suppress influences the electric fields generated by a plurality of backscattered electron detectors have. To attain the above object, an electron beam irradiation apparatus equipped with a scanning deflector comprises a plurality of backscattered electron detectors, a power source for detectors which applies voltages to the plural backscattered electron detectors, respectively, and a controller device which adjusts application voltages the power source for detectors delivers, on the basis of an image shift when the voltages are applied to the plural backscattered electron detectors.

    Abstract translation: 本发明的目的是提供一种能够抑制由多个背散射电子检测器产生的电场的影响的电子束照射装置。 为了实现上述目的，配备有扫描偏转器的电子束照射装置包括多个背散射电子检测器，分别向多个背散射电子检测器施加电压的检测器的电源以及调节施加电压的控制装置 用于检测器的电源基于当将电压施加到多个后向散射电子检测器时的图像移位来传递。

    ELECTRON BEAM IRRADIATION APPARATUS
    2.
    发明申请
    ELECTRON BEAM IRRADIATION APPARATUS 审中-公开
    电子束辐照装置

    公开(公告)号：US20140077079A1

    公开(公告)日：2014-03-20

    申请号：US14090065

    申请日：2013-11-26

    Applicant: Hitachi High-Technologies Corporation

    Inventor： Shahedul Hoque ,  Hajime Kawano

    IPC: H01J37/29

    CPC classification number: H01J37/29 ,  G01N23/203 ,  H01J37/244 ,  H01J37/28 ,  H01J2237/24475

    Abstract: The present invention has for its object to provide an electron beam irradiation apparatus which can suppress influences the electric fields generated by a plurality of backscattered electron detectors have. To attain the above object, an electron beam irradiation apparatus equipped with, a scanning deflector comprises a plurality of backscattered electron detectors, a power source for detectors which applies voltages to the plural backscattered electron detectors, respectively, and a controller device which adjusts application voltages the power source for detectors delivers, on the basis of an image shift when the voltages are applied to the plural backscattered electron detectors.

    Abstract translation: 本发明的目的是提供一种能够抑制由多个背散射电子检测器产生的电场的影响的电子束照射装置。 为了实现上述目的，具有扫描偏转器的电子束照射装置包括多个背散射电子检测器，分别向多个背散射电子检测器施加电压的检测器的电源和调整施加电压的控制器装置 当电压施加到多个背散射电子检测器时，用于检测器的电源基于图像偏移来传递。

    Electron beam irradiation apparatus
    5.
    发明授权
    Electron beam irradiation apparatus 有权

    公开(公告)号：US08618499B1

    公开(公告)日：2013-12-31

    申请号：US13788035

    申请日：2013-03-07

    Applicant: Hitachi High-Technologies Corporation

    Inventor： Shahedul Hoque ,  Hajime Kawano

    IPC: H01J37/244 ,  H01J37/256 ,  G01N23/203

    CPC classification number: H01J37/29 ,  G01N23/203 ,  H01J37/244 ,  H01J37/28 ,  H01J2237/24475

    Abstract: The present invention has for its object to provide an electron beam irradiation apparatus which can suppress influences the electric fields generated by a plurality of backscattered electron detectors have. To attain the above object, an electron beam irradiation apparatus equipped with a scanning deflector comprises a plurality of backscattered electron detectors, a power source for detectors which applies voltages to the plural backscattered electron detectors, respectively, and a controller device which adjusts application voltages the power source for detectors delivers, on the basis of an image shift when the voltages are applied to the plural backscattered electron detectors.

    Light guide, detector having light guide, and charged particle beam device
    6.
    发明授权
    Light guide, detector having light guide, and charged particle beam device 有权

    公开(公告)号：US10593512B2

    公开(公告)日：2020-03-17

    申请号：US16082745

    申请日：2017-02-03

    Applicant: Hitachi High-Technologies Corporation

    Inventor： Yoshifumi Sekiguchi ,  Shin Imamura ,  Hajime Kawano ,  Shahedul Hoque

    IPC: H01J37/20 ,  H01J37/26 ,  H01J37/244 ,  H01J37/28

    Abstract: The present invention provides a light guide capable of guiding light generated by a scintillator at high efficiency to a photoreceiving element, a detector, and a charged particle beam device. For attaining the purpose, the present invention proposes a light guide that guides light generated by a scintillator to a photoreceiving element, provided with a scintillator containment portion formed of a first surface facing a surface opposite to a charged particle incident surface of the scintillator and a second surface facing a surface different from the surface opposite to the charged particle incident surface of the scintillator, and a tilted surface reflecting light incident from the second surface to the inside of the light guide.

    Charged particle beam device
    7.
    发明授权
    Charged particle beam device 有权

    公开(公告)号：US10546715B2

    公开(公告)日：2020-01-28

    申请号：US15761294

    申请日：2015-09-29

    Applicant: Hitachi High-Technologies Corporation

    Inventor： Shahedul Hoque ,  Hajime Kawano ,  Yoshinori Momonoi ,  Hideki Itai ,  Minoru Yamazaki ,  Hiroshi Nishihama

    IPC: H01J37/147 ,  H01J37/28 ,  H01J37/26 ,  G02B21/00

    Abstract: The objective of the present invention is to provide a charged particle beam device wherein scanning is performed through a scanning pattern that may suppress the influence from charge accumulation without having to perform blanking. In order to achieve this objective, a charged particle beam device is proposed wherein a first scan line is scanned by deflecting a charged particle beam in a first direction. The charged particle beam is deflected in a manner where the ending point of the first scan line is connected to the scan starting point of a second scan line which is arranged to be parallel to the first scan line so as to draw a scanning trajectory, thereby modifying the scan line position. The second scan line is scanned by scanning the charged particle beam from the scan starting point of the second scan line toward a second direction that is opposite to the first direction. After scanning the second scan line, the charged particle beam device scans the interior of a first frame by repeating the scan line position modification and the scanning of the charged particle beam toward the opposite direction. After scanning the first frame, the charged particle beam device starts the scanning of a second frame with the scan ending point contained within the first frame serving as the scan starting point.

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