Invention Grant
- Patent Title: Charged particle beam device and pattern measurement device
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Application No.: US15759408Application Date: 2016-08-15
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Publication No.: US10290464B2Publication Date: 2019-05-14
- Inventor: Toshiyuki Yokosuka , Chahn Lee , Hideyuki Kazumi , Manabu Hasegawa
- Applicant: Hitachi High-Technologies Corporation
- Applicant Address: JP Tokyo
- Assignee: Hitachi High-Technologies Corporation
- Current Assignee: Hitachi High-Technologies Corporation
- Current Assignee Address: JP Tokyo
- Agency: Crowell & Moring LLP
- Priority: JP2015-187591 20150925
- International Application: PCT/JP2016/073035 WO 20160815
- International Announcement: WO2017/051621 WO 20170330
- Main IPC: H01J37/28
- IPC: H01J37/28 ; H01J37/22 ; H01J37/244 ; G01N23/22 ; G03F7/20 ; G01B15/00 ; G01B15/04 ; G01N23/2251

Abstract:
The present invention provides a charged particle beam device capable of predicting the three-dimensional structure of a sample, without affecting the charge of the sample. The present invention provides a charged particle beam device characterized in that a first distance between the peak and the bottom of a first signal waveform obtained on the basis of irradiation with a charged particle beam having a first landing energy, and a second distance between the peak and the bottom of a second signal waveform obtained on the basis of irradiation with a charged particle beam having a second landing energy different from the first landing energy are obtained, and the distance between the peak and the bottom at a landing energy (zero, for instance) different from the first and second landing energies is obtained on the basis of the extrapolation of the first distance and the second distance.
Public/Granted literature
- US20180182595A1 Charged Particle Beam Device and Pattern Measurement Device Public/Granted day:2018-06-28
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