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    Charged particle beam device
    3.
    发明授权
    Charged particle beam device 有权

    公开(公告)号：US10991543B2

    公开(公告)日：2021-04-27

    申请号：US16509694

    申请日：2019-07-12

    申请人： Hitachi High-Tech Corporation

    发明人： Shunsuke Mizutani ,  Yuuji Kasai ,  Minoru Yamazaki ,  Makoto Suzuki

    IPC分类号： H01J37/28 ,  H01J37/06 ,  H01J37/244 ,  H01J37/145

    摘要： The present disclosure is to provide a charged particle beam device capable of achieving both high resolution by setting of a short WD and improvement of detection efficiency when setting a long WD. According to an aspect for achieving the above-described object, there is suggested a charged particle beam device including: an objective lens for converging a charged particle beam emitted from a charged particle source; a sample stage having a first driving mechanism for moving a sample to be irradiated with the charged particle beam between a first position and a second position more separated from the objective lens than the first position; a detection surface for detecting charged particles emitted from the sample; and a second driving mechanism for moving the detection surface between within a movable range of the sample between the first position and the second position and out of the movable range of the sample.

    Charged particle beam apparatus
    5.
    发明授权
    Charged particle beam apparatus 有权

    公开(公告)号：US11749497B2

    公开(公告)日：2023-09-05

    申请号：US17394925

    申请日：2021-08-05

    申请人： Hitachi High-Tech Corporation

    发明人： Shunsuke Mizutani ,  Shahedul Hoque ,  Uki Ikeda ,  Makoto Suzuki

    IPC分类号： H01J37/28 ,  H01J37/147 ,  H01J37/244

    CPC分类号： H01J37/28 ,  H01J37/1474 ,  H01J37/244 ,  H01J2237/2443 ,  H01J2237/24475

    摘要： A charged particle beam apparatus covering a wide range of detection angles of charged particles emitted from a sample includes an objective lens for converging charged particle beams emitted from a charged particle source and a detector for detecting charged particles emitted from a sample. The objective lens includes inner and outer magnetic paths which are formed so as to enclose a coil. A first inner magnetic path is disposed at a position opposite to an optical axis of the charged particle beams. A second inner magnetic path, formed at a slant with respect to the optical axis of the charged particle beams, includes a leading end. A detection surface of the detector is disposed at the outer side from a virtual straight line that passes through the leading end and that is parallel to the optical axis of the charged particle beams.

    Charged particle beam apparatus
    6.
    发明授权
    Charged particle beam apparatus 有权

    公开(公告)号：US11139144B2

    公开(公告)日：2021-10-05

    申请号：US16482765

    申请日：2017-03-24

    申请人： Hitachi High-Tech Corporation

    发明人： Shunsuke Mizutani ,  Shahedul Hoque ,  Uki Ikeda ,  Makoto Suzuki

    IPC分类号： H01J37/244 ,  H01J37/28 ,  H01J37/147

    摘要： The present invention provides a charged particle beam apparatus that covers a wide range of detection angles of charged particles emitted from a sample. Accordingly, the present invention proposes a charged particle beam apparatus that is provided with an objective lens for converging charged particle beams emitted from a charged particle source, and a detector for detecting charged particles emitted from a sample, wherein: the objective lens includes an inner magnetic path and an outer magnetic path which are formed so as to enclose a coil; the inner magnetic path comprises a first inner magnetic path disposed at a position opposite to an optical axis of the charged particle beams and a second inner magnetic path which is formed at a slant with respect to the optical axis of the charged particle beams and which includes a leading end of the magnetic path; and a detection surface of the detector is disposed at the outer side from a virtual straight line that passes through the leading end of the magnetic path and that is parallel to the optical axis of the charged particle beams.

    Charged particle beam control device
    8.
    发明授权
    Charged particle beam control device 有权

    公开(公告)号：US11211225B2

    公开(公告)日：2021-12-28

    申请号：US16996123

    申请日：2020-08-18

    申请人： Hitachi High-Tech Corporation

    发明人： Shinichi Murakami ,  Makoto Suzuki ,  Shunsuke Mizutani ,  Akio Yamamoto ,  Wen Li

    IPC分类号： H01J37/26 ,  H01J37/244 ,  H01J37/28

    摘要： Provided is a charged particle beam control device having improved signal detection accuracy. The charged particle beam control device (detection block) includes: a detector provided in a charged particle beam device, and configured to detect secondary electrons emitted from a sample by irradiating the sample with a charged particle beam and output an electric signal based on the detected secondary electrons; a signal wiring configured to transmit the electric signal; a noise detection wiring configured to detect a noise signal generated in the charged particle beam device; and an arithmetic circuit configured to generate a signal obtained by subtracting the noise signal from the electric signal.

    Pattern measuring method, pattern measuring tool and computer readable medium
    9.
    发明授权
    Pattern measuring method, pattern measuring tool and computer readable medium 有权

    公开(公告)号：US10903041B2

    公开(公告)日：2021-01-26

    申请号：US16424803

    申请日：2019-05-29

    申请人： Hitachi High-Tech Corporation

    发明人： Uki Ikeda ,  Shunsuke Mizutani ,  Makoto Suzuki

    IPC分类号： H01J37/22 ,  H01J37/20 ,  H01J37/28

    摘要： The present disclosure relates to a pattern measuring method to appropriately measure a height and a depth of a pattern having a high aspect ratio. The method includes measuring a width between a first pattern and another pattern formed on a wafer; calculating a value regarding an azimuth angle of a signal emitted from the wafer; and calculating height information from a portion between the first pattern and the other pattern to an upper portion of a pattern based on the measured width between the first pattern and the other pattern, the value regarding the azimuth angle, the value regarding an elevation angle, and relationship information thereof.

    Charged particle beam apparatus
    10.
    发明授权
    Charged particle beam apparatus 有权

    公开(公告)号：US11694873B2

    公开(公告)日：2023-07-04

    申请号：US17962915

    申请日：2022-10-10

    申请人： HITACHI HIGH-TECH CORPORATION

    发明人： Yoshifumi Sekiguchi ,  Shin Imamura ,  Shunsuke Mizutani ,  Shahedul Hoque ,  Uki Ikeda

    IPC分类号： H01J37/244 ,  G01N23/2251 ,  G02B6/42

    CPC分类号： H01J37/244 ,  G01N23/2251 ,  G02B6/4214 ,  G01N2223/07 ,  G01N2223/418 ,  G01N2223/505 ,  G01N2223/507

    摘要： A charged particle beam apparatus using a light guide that improves light utilization efficiency includes a detector including a scintillator for emitting light when a charged particle is incident, a light receiving element, and a light guide for guiding the light from the scintillator to the light receiving element. The light guide includes: an incident surface that faces a light emitting surface of the scintillator and to which the light emitted by the scintillator is incident; an emitting surface that is configured to emit light; and a reflecting surface that is inclined with respect to the incident surface so that the light from the incident surface is reflected toward the emitting surface. The emitting surface is smaller than the incident surface. A slope surface is provided between the incident surface and the emitting surface, faces the reflecting surface, and is inclined with respect to the incident surface.