公开(公告)号：US11894211B2

公开(公告)日：2024-02-06

申请号：US17621503

申请日：2019-07-02

Applicant: Hitachi High-Tech Corporation

Inventor： Erina Kawamoto ,  Soichiro Matsunaga ,  Souichi Katagiri ,  Keigo Kasuya ,  Takashi Doi ,  Tetsuya Sawahata ,  Minoru Yamazaki

IPC: H01J37/077 ,  H01J37/075 ,  H01J37/18

CPC classification number: H01J37/077 ,  H01J37/075 ,  H01J37/18 ,  H01J2237/006

Abstract: The invention provides an electron beam apparatus that reduces a time required for an electron gun chamber to which a sputter ion pump and a non-evaporable getter pump are connected to reach an extreme high vacuum state. The electron beam apparatus includes an electron gun configured to emit an electron beam and the electron gun chamber to which the sputter ion pump and the non-evaporable getter pump are connected. The electron beam apparatus further includes a gas supply unit configured to supply at least one of hydrogen, oxygen, carbon monoxide, and carbon dioxide to the electron gun chamber.

公开(公告)号：US11456150B2

公开(公告)日：2022-09-27

申请号：US17210805

申请日：2021-03-24

Applicant: Hitachi High-Tech Corporation

Inventor： Kaori Bizen ,  Yuzuru Mizuhara ,  Minoru Yamazaki ,  Daisuke Bizen ,  Noritsugu Takahashi

IPC: H01J37/244 ,  H01J37/28 ,  H01J37/22

Abstract: A charged particle beam device capable of generating an image having uniform image quality in a field of view is provided. The charged particle beam device includes: a beam source configured to irradiate a sample with a charged particle beam; a diaphragm including an opening used for angle discrimination of secondary charged particles emitted from the sample; a first detector provided closer to the sample than the diaphragm, and configured to detect a part of the secondary charged particles; a second detector provided closer to the beam source than the diaphragm, and configured to detect secondary charged particles passing through the opening; an image generation unit configured to generate an image based on a first signal output from the first detector or a second signal output from the second detector; and a composite ratio calculation unit configured to calculate a composite ratio for each position in a field of view based on the first signal or the second signal with respect to a calibration sample that is a sample having a flat surface. The image generation unit generates a composite image by synthesizing the first signal and the second signal with respect to an observation sample using the composite ratio.

公开(公告)号：US10991543B2

公开(公告)日：2021-04-27

申请号：US16509694

申请日：2019-07-12

Applicant: Hitachi High-Tech Corporation

Inventor： Shunsuke Mizutani ,  Yuuji Kasai ,  Minoru Yamazaki ,  Makoto Suzuki

IPC: H01J37/28 ,  H01J37/06 ,  H01J37/244 ,  H01J37/145

Abstract: The present disclosure is to provide a charged particle beam device capable of achieving both high resolution by setting of a short WD and improvement of detection efficiency when setting a long WD. According to an aspect for achieving the above-described object, there is suggested a charged particle beam device including: an objective lens for converging a charged particle beam emitted from a charged particle source; a sample stage having a first driving mechanism for moving a sample to be irradiated with the charged particle beam between a first position and a second position more separated from the objective lens than the first position; a detection surface for detecting charged particles emitted from the sample; and a second driving mechanism for moving the detection surface between within a movable range of the sample between the first position and the second position and out of the movable range of the sample.

公开(公告)号：US11257658B2

公开(公告)日：2022-02-22

申请号：US16572873

申请日：2019-09-17

Applicant: HITACHI HIGH-TECH CORPORATION

Inventor： Noritsugu Takahashi ,  Makoto Sakakibara ,  Makoto Suzuki ,  Minoru Yamazaki

IPC: H01J37/28 ,  H01J37/12

Abstract: An object of the invention is to correct an aberration or a defocus of an electron beam for irradiation, and control an influence on a deflector by a fluctuation in an electric field of an electrostatic lens. The invention provides a charged particle beam apparatus including a deflector that deflects a charged particle beam with which a specimen is irradiated, an objective lens that focuses the charged particle beam on the specimen, an electrostatic lens that includes a part of the objective lens and to which a voltage for correcting the aberration or the defocus of the charged particle beam is applied, and an constant electric field applying electrode that is provided between the deflector and the electrostatic lens and to which a constant voltage having a same sign with the voltage applied to the electrostatic lens is applied.

公开(公告)号：US10770266B2

公开(公告)日：2020-09-08

申请号：US16436297

申请日：2019-06-10

Applicant: Hitachi High-Tech Corporation

Inventor： Tomohito Nakano ,  Toshiyuki Yokosuka ,  Yuko Sasaki ,  Minoru Yamazaki ,  Yuzuru Mochizuki

IPC: H01J37/28 ,  H01J37/147 ,  G01N23/225

Abstract: A charged particle beam device includes an electron source which generates an electron beam, an objective lens which is applied with a coil current to converge the electron beam on a sample, a control unit which controls the current to be applied to the objective lens, a hysteresis characteristic storage unit which stores hysteresis characteristic information of the objective lens, a history information storage unit which stores history information related to the coil current, and an estimation unit which estimates a magnetic field generated by the objective lens on the basis of the coil current, the history information, and the hysteresis characteristic information.