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    Excimer laser apparatus and excimer laser system
    1.
    发明授权
    Excimer laser apparatus and excimer laser system 有权
    准分子激光装置和准分子激光系统

    公开(公告)号：US08867583B2

    公开(公告)日：2014-10-21

    申请号：US13656917

    申请日：2012-10-22

    Applicant: Gigaphoton Inc.

    Inventor： Tooru Abe ,  Takeshi Ohta ,  Hiroaki Tsushima ,  Osamu Wakabayashi

    IPC: H01S3/22 ,  H01S3/036 ,  H01S3/08 ,  H01S3/23 ,  H01S3/225 ,  H01S3/134

    CPC classification number: H01S3/036 ,  H01S3/08009 ,  H01S3/09702 ,  H01S3/10046 ,  H01S3/1305 ,  H01S3/134 ,  H01S3/225 ,  H01S3/2251 ,  H01S3/2256 ,  H01S3/2258 ,  H01S3/2366

    Abstract: An excimer laser apparatus includes a gas supply unit, connected to a first receptacle that holds a first laser gas containing halogen gas and a second receptacle that holds a second laser gas having a lower halogen gas concentration than the first laser gas, that supplies the first laser gas and the second laser gas to the interior of the laser chamber. Gas pressure control in which the gas supply unit supplies the second laser gas to the interior of the laser chamber or a gas exhaust unit partially exhausts gas from within the laser chamber, and partial gas replacement control in which the gas supply unit supplies the first laser gas and the second laser gas to the interior of the laser chamber and the gas exhaust unit partially exhausts gas from within the laser chamber sequentially, may be selectively performed.

    Abstract translation: 准分子激光装置包括气体供给单元，其连接到保持含有卤素气体的第一激光气体的第一容器和保持具有比第一激光气体低的卤素气体浓度的第二激光气体的第二容器， 激光气体和第二激光气体到激光室的内部。 气体供给单元将第二激光气体供给到激光室的内部的气体压力控制或者气体排出单元部分地从激光室内排出气体，以及气体供给单元提供第一激光器的部分气体置换控制 可以选择性地执行气体和第二激光气体到激光室的内部和排气单元部分地从激光室内部排出气体。

    Excimer laser apparatus and excimer laser system
    6.
    发明授权
    Excimer laser apparatus and excimer laser system 有权
    准分子激光装置和准分子激光系统

    公开(公告)号：US09425576B2

    公开(公告)日：2016-08-23

    申请号：US14487796

    申请日：2014-09-16

    Applicant: GIGAPHOTON INC.

    Inventor： Tooru Abe ,  Takeshi Ohta ,  Hiroaki Tsushima ,  Osamu Wakabayashi

    IPC: H01S3/22 ,  H01S3/036 ,  H01S3/225 ,  H01S3/097 ,  H01S3/08 ,  H01S3/134 ,  H01S3/23

    CPC classification number: H01S3/036 ,  H01S3/08009 ,  H01S3/09702 ,  H01S3/10046 ,  H01S3/1305 ,  H01S3/134 ,  H01S3/225 ,  H01S3/2251 ,  H01S3/2256 ,  H01S3/2258 ,  H01S3/2366

    Abstract: An excimer laser apparatus includes a gas supply unit, connected to a first receptacle that holds a first laser gas containing halogen gas and a second receptacle that holds a second laser gas having a lower halogen gas concentration than the first laser gas, that supplies the first laser gas and the second laser gas to the interior of the laser chamber. Gas pressure control in which the gas supply unit supplies the second laser gas to the interior of the laser chamber or a gas exhaust unit partially exhausts gas from within the laser chamber, and partial gas replacement control in which the gas supply unit supplies the first laser gas and the second laser gas to the interior of the laser chamber and the gas exhaust unit partially exhausts gas from within the laser chamber sequentially, may be selectively performed.

    Abstract translation: 准分子激光装置包括气体供给单元，其连接到保持含有卤素气体的第一激光气体的第一容器和保持具有比第一激光气体低的卤素气体浓度的第二激光气体的第二容器， 激光气体和第二激光气体到激光室的内部。 气体供给单元将第二激光气体供给到激光室的内部的气体压力控制或者气体排出单元部分地从激光室内排出气体，以及气体供给单元提供第一激光器的部分气体置换控制 可以选择性地执行气体和第二激光气体到激光室的内部和排气单元部分地从激光室内部排出气体。

    Laser unit management system
    8.
    发明授权
    Laser unit management system 有权

    公开(公告)号：US10394133B2

    公开(公告)日：2019-08-27

    申请号：US15914299

    申请日：2018-03-07

    Applicant: GIGAPHOTON INC.

    Inventor： Yuji Minegishi ,  Yutaka Igarashi ,  Takeshi Ohta

    IPC: G03B27/54 ,  G03F7/20 ,  G06F21/62 ,  H01S3/08 ,  H01S3/137 ,  H01S3/225 ,  H01S3/036

    Abstract: A laser unit management system may include a server configured to hold first information provided with access limitation that allows an access with a first access authorization, second information provided with access limitation that allows an access with a second access authorization, and third information provided with access limitation that allows both an access with the first access authorization and an access with the second access authorization; and a laser unit including a laser output section and a controller, the laser output section being configured to output pulsed laser light toward an exposure unit that is configured to perform wafer exposure, the controller being configured to store the first information, the second information, and the third information in the server. The second information may include wafer-exposure-related information on the exposure unit and laser-control-related information on the laser unit that are in association with each other.

    Line narrowed laser apparatus
    9.
    发明授权
    Line narrowed laser apparatus 有权

    公开(公告)号：US10283927B2

    公开(公告)日：2019-05-07

    申请号：US16033030

    申请日：2018-07-11

    Applicant: Gigaphoton Inc.

    Inventor： Hiroshi Furusato ,  Takeshi Ohta ,  Natsuhiko Kouno ,  Osamu Wakabayashi ,  Takahito Kumazaki

    IPC: H01S3/134 ,  H01S3/08 ,  H01S3/11 ,  H01S3/034 ,  H01S3/038 ,  H01S3/137 ,  H01S3/22

    Abstract: The line narrowed laser apparatus configured to perform a plurality of burst oscillations including a first burst oscillation and a second burst oscillation next to the first burst oscillation to output a pulse laser beam. The line narrowed laser apparatus comprises a laser resonator, a chamber provided in the laser resonator, a pair of electrodes provided in the chamber, an electric power source configured to apply a pulsed voltage to the pair of electrodes, a wavelength-selecting element provided in the laser resonator, a spectral width varying unit provided in the laser resonator, a wavelength variable unit configured to change a selected wavelength selected by the wavelength-selecting element, and a controller. The controller is configured to control the wavelength variable unit based on an amount of control of the spectral width varying unit in a period from a time of ending the first burst oscillation to a time of starting the second burst oscillation.

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