公开(公告)号：US11079686B2

公开(公告)日：2021-08-03

申请号：US16871758

申请日：2020-05-11

Applicant: Gigaphoton Inc.

Inventor： Keisuke Ishida ,  Masato Moriya ,  Natsuhiko Kouno ,  Takeshi Asayama ,  Takashi Kusama

IPC: G03F7/20 ,  G01J3/26 ,  H01S3/036 ,  H01S3/104 ,  H01S3/225

Abstract: An excimer laser apparatus according to the present disclosure includes an etalon spectrometer configured to measure a fringe waveform of a laser beam; and a controller configured to obtain area of a first ratio in a spectral space obtained based on a result of the measurement by the etalon spectrometer, calculate a first spectral line width of the laser beam based on the obtained area of the first ratio, and calibrate a first spectral line width based on a correlation function representing correlation between the first spectral line width and a second spectral line width of the laser beam measured by a reference meter.

公开(公告)号：US09894743B2

公开(公告)日：2018-02-13

申请号：US14984458

申请日：2015-12-30

Applicant: GIGAPHOTON INC.

Inventor： Yukio Watanabe ,  Miwa Igarashi ,  Masato Moriya ,  Hiroaki Nakarai

IPC: H05G2/00 ,  G03F7/20

CPC classification number: H05G2/008 ,  G03F7/70033 ,  H05G2/003

Abstract: An apparatus for generating extreme ultraviolet light may include: a chamber having an opening through which a laser beam is introduced into the chamber; a reference member on which the chamber is mounted; a target supply unit for supplying a target material to be irradiated by the laser beam to a predetermined region inside the chamber; a laser beam focusing optical system for focusing the laser beam in the predetermined region inside the chamber to turn the target material into plasma; and a collector mirror for collecting the extreme ultraviolet light emitted from the plasma.

公开(公告)号：US08698114B2

公开(公告)日：2014-04-15

申请号：US13759970

申请日：2013-02-05

Applicant: Gigaphoton Inc.

Inventor： Masato Moriya ,  Hideo Hoshino ,  Hakaru Mizoguchi ,  Osamu Wakabayashi

IPC: G21K5/00

CPC classification number: H01S3/10 ,  H01S3/005 ,  H01S3/0064 ,  H01S3/034 ,  H01S3/1061 ,  H01S3/1307 ,  H01S3/136 ,  H01S3/2232 ,  H01S3/2316 ,  H05G2/003 ,  H05G2/005 ,  H05G2/008

Abstract: An EUV light source device properly compensates the wave front of laser beam which is changed by heat. A wave front compensator and a sensor are provided in an amplification system which amplifies laser beam. The sensor detects and outputs changes in the angle (direction) of laser beam and the curvature of the wave front thereof. A wave front compensation controller outputs a signal to the wave front compensator based on the measurement results from the sensor. The wave front compensator corrects the wave front of the laser beam to a predetermined wave front according to an instruction from the wave front compensation controller.

Abstract translation: EUV光源装置适当地补偿由热量改变的激光束的波前。 在放大激光束的放大系统中提供波前补偿器和传感器。 传感器检测并输出激光束的角度（方向）和其波前的曲率的变化。 波前补偿控制器根据传感器的测量结果向波前补偿器输出信号。 波前补偿器根据波前补偿控制器的指令将激光束的波前校正到预定的波前。

公开(公告)号：US10890484B2

公开(公告)日：2021-01-12

申请号：US16150298

申请日：2018-10-03

Applicant: Gigaphoton Inc.

Inventor： Masato Moriya

IPC: G01J3/26 ,  H01S3/139 ,  G01J3/02 ,  G01J1/42 ,  H01S3/137 ,  G03F7/20 ,  H01S3/0971 ,  H01S3/08 ,  H01S3/225 ,  H01S3/00

Abstract: A wavelength measuring device configured to detect a wavelength of ultraviolet laser light outputted from a laser resonator with at least one etalon, the wavelength measuring device includes: a first housing having an interior space being sealed and accommodating the etalon, an input window through which the ultraviolet laser light enters to the first housing, the input window being provided at a first opening of the first housing, a first sealing member configured to seal a gap between a rim part of the input window and a circumferential portion of the first opening, a shielding film provided between the rim part of the input window and the first sealing member and configured to shield the first sealing member from the ultraviolet laser light coming from the input window, and a diffusing element provided outside of the first housing and configured to diffuse the ultraviolet laser light before being incident on the input window.

公开(公告)号：US10151640B2

公开(公告)日：2018-12-11

申请号：US15800329

申请日：2017-11-01

Applicant: Gigaphoton Inc.

Inventor： Masato Moriya ,  Osamu Wakabayashi ,  Yoshinobu Watabe

IPC: G01J11/00 ,  H01S3/134 ,  G02B27/14 ,  G02B5/30 ,  G01J4/04 ,  H01S3/00 ,  G01J1/04 ,  G01J1/42 ,  H01S3/23

Abstract: A light beam measurement device includes: a polarization measurement unit including a first measurement beam splitter provided on an optical path of a laser beam and configured to measure a polarization state of the laser beam having been partially reflected by the first measurement beam splitter; a beam profile measurement unit including a second measurement beam splitter provided on the optical path of the laser beam and configured to measure a beam profile of the laser beam having been partially reflected by the second measurement beam splitter; and a laser beam-directional stability measurement unit configured to measure a stability in a traveling direction of the laser beam, while the first measurement beam splitter and the second measurement beam splitter are made of a material containing CaF2.

公开(公告)号：US09277635B2

公开(公告)日：2016-03-01

申请号：US14643782

申请日：2015-03-10

Applicant: GIGAPHOTON INC.

Inventor： Masato Moriya ,  Hideyuki Hayashi ,  Osamu Wakabayashi

IPC: H01G2/00 ,  H05G2/00 ,  H01J37/22 ,  H01J37/304

CPC classification number: H05G2/008 ,  H01J37/228 ,  H01J37/3045 ,  H01J2237/20292 ,  H05G2/005 ,  H05G2/006

Abstract: An extreme ultraviolet light generation device may comprise: a chamber provided with a through-hole; an introduction optical system configured to introduce the pulse laser beam into a first predetermined region inside the chamber through the through-hole; a target supply device configured to output the target toward the first predetermined region; a light source configured to irradiate a second predetermined region with light whose optical path in the second predetermined region has a transverse section that is longer along a direction perpendicular to a direction of movement of the target than along the direction of movement of the target, the second predetermined region including part of a trajectory of the target between the target supply device and the first predetermined region; and an optical sensor configured to detect light incident on the optical sensor from the second predetermined region to detect the target passing through the second predetermined region.

Abstract translation: 极紫外线发生装置可以包括：设置有通孔的室; 导入光学系统，被配置为通过所述通孔将所述脉冲激光束引入所述腔室内的第一预定区域; 目标供给装置，被配置为朝向所述第一预定区域输出所述目标; 光源，被配置为用第二预定区域的光线照射第二预定区域中的光路，沿着与目标的移动方向垂直的方向的垂直于目标的移动方向的横向部分具有横向部分， 所述第二预定区域包括所述目标供给装置和所述第一预定区域之间的所述目标的轨迹的一部分; 以及光学传感器，被配置为从所述第二预定区域检测入射在所述光学传感器上的光，以检测通过所述第二预定区域的目标。

公开(公告)号：US09099836B2

公开(公告)日：2015-08-04

申请号：US13895242

申请日：2013-05-15

Applicant: GIGAPHOTON INC.

Inventor： Krzysztof Nowak ,  Masato Moriya ,  Osamu Wakabayashi

IPC: H01S3/00 ,  H01S3/23 ,  H01S3/067 ,  G03F7/20 ,  H01S3/032 ,  H01S3/036 ,  H01S3/038 ,  H01S3/041 ,  H01S3/0971 ,  H01S3/223

CPC classification number: H01S3/06758 ,  G03F7/70025 ,  G03F7/70033 ,  H01S3/005 ,  H01S3/0064 ,  H01S3/032 ,  H01S3/036 ,  H01S3/0387 ,  H01S3/041 ,  H01S3/0971 ,  H01S3/2232 ,  H01S3/2308 ,  H01S3/2325 ,  H01S3/2341

Abstract: A laser beam amplifier with high optical axis stability is provided. The laser beam amplifier includes: a container for accommodating a laser medium; a pair of electrodes for performing discharge in the laser medium to form an amplification region for a laser beam in the laser medium; and an optical system for forming an optical path between a first point, upon which the laser beam is incident, and a second point, from which the laser beam is outputted, such that the amplification region is located in the optical path between the first point and the second point, wherein the first point and the second point are conjugate to each other, and the laser beam incident upon the first point is amplified while passing through the amplification region at least twice and then transferred to the second point.

Abstract translation: 提供了具有高光轴稳定性的激光束放大器。 激光束放大器包括：用于容纳激光介质的容器; 一对电极，用于在激光介质中进行放电，以在激光介质中形成用于激光束的放大区域; 以及光学系统，用于在激光束入射的第一点和从其输出激光束的第二点之间形成光路，使得放大区域位于第一点之间的光路中 以及第二点，其中第一点和第二点彼此共轭，并且入射在第一点上的激光束在通过放大区域至少两次时被放大，然后被传送到第二点。

公开(公告)号：US08698116B2

公开(公告)日：2014-04-15

申请号：US13873001

申请日：2013-04-29

Applicant: Gigaphoton Inc.

Inventor： Masato Moriya ,  Osamu Wakabayashi ,  Tamotsu Abe ,  Takashi Suganuma ,  Akira Endo ,  Akira Sumitani

IPC: G21K5/04

CPC classification number: G21K5/04 ,  G03F7/70191 ,  G03F7/70575 ,  G03F7/70858 ,  G03F7/70941 ,  G21K1/10 ,  H05G2/005 ,  H05G2/008

Abstract: An extreme ultraviolet light source apparatus using a spectrum purity filter capable of obtaining EUV light with high spectrum purity. The apparatus includes a chamber; a target supply unit for supplying a target material; a driver laser using a laser gas containing a carbon dioxide gas as a laser medium, for applying a laser beam to the target material to generate plasma; a collector mirror for collecting and outputting the extreme ultraviolet light radiated from the plasma; and a spectrum purity filter provided in an optical path of the extreme ultraviolet light, for transmitting the extreme ultraviolet light and reflecting the laser beam, the spectrum purity filter including a mesh having electrical conductivity and formed with an arrangement of apertures having a pitch not larger than a half of a shortest wavelength of the laser beam applied by the driver laser.

Abstract translation: 一种使用能够获得高光谱纯度的EUV光的光谱纯度滤光片的极紫外光源装置。 该装置包括一个室; 用于提供目标材料的目标供应单元; 使用包含二氧化碳气体的激光气体作为激光介质的激光激光器，用于向目标材料施加激光以产生等离子体; 用于收集和输出从等离子体辐射的极紫外光的收集器反射镜; 以及设置在极紫外光的光路中的光谱纯度滤光片，用于透射极紫外光并反射激光束，光谱纯度滤光器包括具有导电性的网格，并且形成为具有间距不大的孔 超过由驱动器激光器施加的激光束的最短波长的一半。

公开(公告)号：US10027084B2

公开(公告)日：2018-07-17

申请号：US15076977

申请日：2016-03-22

Applicant: GIGAPHOTON INC.

Inventor： Masato Moriya ,  Osamu Wakabayashi

IPC: B23K26/04 ,  H01S3/101 ,  H05G2/00 ,  H01S3/23 ,  H01S3/00

Abstract: An alignment system for a laser apparatus includes a guide laser device outputting a guide laser beam, an adjusting mechanism adjusting travel directions of the guide laser beam and a laser beam from the laser apparatus, a beam path combiner controlling travel directions of the laser beam and the guide laser beam to substantially coincide with each other, a first optical detection unit provided from the beam path combiner detecting the laser and guide laser beams, a first controller controlling the adjusting mechanism based on a first optical detection unit detection result, a beam steering unit downstream from the beam path combiner controlling travel directions of the laser and guide laser beams, a second optical detection unit downstream from the beam steering unit detecting the guide laser beam, and a second controller controlling the beam steering unit based on a second optical detection unit detection result.

公开(公告)号：US09835495B2

公开(公告)日：2017-12-05

申请号：US14947335

申请日：2015-11-20

Applicant: Gigaphoton Inc.

Inventor： Masato Moriya ,  Osamu Wakabayashi ,  Yoshinobu Watabe

IPC: G01J11/00 ,  H01S3/134 ,  H01S3/00 ,  G01J1/42 ,  G01J1/04 ,  G01J4/04 ,  G02B5/30 ,  G02B27/14 ,  H01S3/23

CPC classification number: G01J11/00 ,  G01J1/0414 ,  G01J1/0429 ,  G01J1/0477 ,  G01J1/4257 ,  G01J4/04 ,  G01J2001/4261 ,  G02B5/3066 ,  G02B27/148 ,  H01S3/0014 ,  H01S3/134 ,  H01S3/2366

Abstract: A light beam measurement device includes: a polarization measurement unit including a first measurement beam splitter provided on an optical path of a laser beam and configured to measure a polarization state of the laser beam having been partially reflected by the first measurement beam splitter; a beam profile measurement unit including a second measurement beam splitter provided on the optical path of the laser beam and configured to measure a beam profile of the laser beam having been partially reflected by the second measurement beam splitter; and a laser beam-directional stability measurement unit configured to measure a stability in a traveling direction of the laser beam, while the first measurement beam splitter and the second measurement beam splitter are made of a material containing CaF2.