公开(公告)号：US09468082B2

公开(公告)日：2016-10-11

申请号：US14814983

申请日：2015-07-31

Applicant: GIGAPHOTON INC.

Inventor： Hideyuki Hayashi ,  Kazuhiro Suzuki ,  Osamu Wakabayashi

IPC: H05G2/00 ,  H01S3/10 ,  H01S3/00 ,  H01S3/23

CPC classification number: H05G2/008 ,  H01S3/005 ,  H01S3/10015 ,  H01S3/10038 ,  H01S3/2316 ,  H05G2/006

Abstract: An extreme ultraviolet light generation apparatus may include a chamber containing a plasma generation region irradiated by a pulse laser beam from a laser apparatus, a target supply device configured to supply a plurality of targets consecutively to the plasma generation region in the chamber, a target detection unit configured to detect a target outputted from the target supply device, and a laser controller configured to control the laser apparatus; the laser controller generating a light emission trigger instructing a laser device included in the laser apparatus to emit a pulse laser beam, and outputting the generated light emission trigger to the laser apparatus, in accordance with a detection signal from the target detection unit; and the laser controller adjusting generation of the light emission trigger outputted consecutively to the laser apparatus so that a time interval of the light emission trigger is within a predetermined range.

公开(公告)号：US09277635B2

公开(公告)日：2016-03-01

申请号：US14643782

申请日：2015-03-10

Applicant: GIGAPHOTON INC.

Inventor： Masato Moriya ,  Hideyuki Hayashi ,  Osamu Wakabayashi

IPC: H01G2/00 ,  H05G2/00 ,  H01J37/22 ,  H01J37/304

CPC classification number: H05G2/008 ,  H01J37/228 ,  H01J37/3045 ,  H01J2237/20292 ,  H05G2/005 ,  H05G2/006

Abstract: An extreme ultraviolet light generation device may comprise: a chamber provided with a through-hole; an introduction optical system configured to introduce the pulse laser beam into a first predetermined region inside the chamber through the through-hole; a target supply device configured to output the target toward the first predetermined region; a light source configured to irradiate a second predetermined region with light whose optical path in the second predetermined region has a transverse section that is longer along a direction perpendicular to a direction of movement of the target than along the direction of movement of the target, the second predetermined region including part of a trajectory of the target between the target supply device and the first predetermined region; and an optical sensor configured to detect light incident on the optical sensor from the second predetermined region to detect the target passing through the second predetermined region.

Abstract translation: 极紫外线发生装置可以包括：设置有通孔的室; 导入光学系统，被配置为通过所述通孔将所述脉冲激光束引入所述腔室内的第一预定区域; 目标供给装置，被配置为朝向所述第一预定区域输出所述目标; 光源，被配置为用第二预定区域的光线照射第二预定区域中的光路，沿着与目标的移动方向垂直的方向的垂直于目标的移动方向的横向部分具有横向部分， 所述第二预定区域包括所述目标供给装置和所述第一预定区域之间的所述目标的轨迹的一部分; 以及光学传感器，被配置为从所述第二预定区域检测入射在所述光学传感器上的光，以检测通过所述第二预定区域的目标。

公开(公告)号：US09131589B2

公开(公告)日：2015-09-08

申请号：US14290483

申请日：2014-05-29

Applicant: GIGAPHOTON INC.

Inventor： Hideyuki Hayashi ,  Kazuhiro Suzuki ,  Osamu Wakabayashi

IPC: H05G2/00 ,  H01S3/10 ,  H01S3/23 ,  H01S3/00

CPC classification number: H05G2/008 ,  H01S3/005 ,  H01S3/10015 ,  H01S3/10038 ,  H01S3/2316 ,  H05G2/006

Abstract: An extreme ultraviolet light generation apparatus may include a chamber containing a plasma generation region irradiated by a pulse laser beam from a laser apparatus, a target supply device configured to supply a plurality of targets consecutively to the plasma generation region in the chamber, a target detection unit configured to detect a target outputted from the target supply device, and a laser controller configured to control the laser apparatus; the laser controller generating a light emission trigger instructing a laser device included in the laser apparatus to emit a pulse laser beam, and outputting the generated light emission trigger to the laser apparatus, in accordance with a detection signal from the target detection unit; and the laser controller adjusting generation of the light emission trigger outputted consecutively to the laser apparatus so that a time interval of the light emission trigger is within a predetermined range.

Abstract translation: 极紫外线发生装置可以包括：包含由来自激光装置的脉冲激光束照射的等离子体产生区域的室，被配置为连续地向室内的等离子体产生区域供给多个目标的目标供给装置，目标检测 被配置为检测从目标供给装置输出的目标的单元，以及被配置为控制所述激光装置的激光控制器; 所述激光控制器生成指示所述激光装置所具备的激光装置发射脉冲激光束的发光触发器，并且根据来自所述目标检测部的检测信号将所生成的发光触发信号输出到所述激光装置; 并且所述激光控制器调整所述发光触发器的产生，连续输出到所述激光装置，使得所述发光触发的时间间隔在预定范围内。

公开(公告)号：US09622332B2

公开(公告)日：2017-04-11

申请号：US14061295

申请日：2013-10-23

Applicant: GIGAPHOTON INC.

Inventor： Toru Suzuki ,  Hiroshi Tanaka ,  Hideyuki Hayashi ,  Osamu Wakabayashi

IPC: H05G2/00 ,  G06T7/20

CPC classification number: H05G2/008 ,  G06T7/20 ,  G06T7/246 ,  G06T2207/30241 ,  H05G2/003 ,  H05G2/006

Abstract: In an extreme ultraviolet light generation apparatus, a target detection section may include a light source, a transfer optical system, an image sensor configured to output image data of an image that has been formed by irradiating a target outputted from a target supply device with light outputted from the light source on a light-receiving unit of the image sensor by the transfer optical system, and a processing unit, connected to the image sensor, configured to receive the image data, obtain a first optical intensity distribution along a first line that intersects with a trajectory of the target and a second optical intensity distribution along a second line that intersects with the trajectory, calculate a center of gravity position in the first optical intensity distribution and a center of gravity position in the second optical intensity distribution, and calculate an actual path of the target based on the calculated positions.

公开(公告)号：US08811438B2

公开(公告)日：2014-08-19

申请号：US13936734

申请日：2013-07-08

Applicant: Gigaphoton Inc.

Inventor： Yukio Watanabe ,  Hideyuki Hayashi ,  Kouji Kakizaki ,  Michio Shinozaki ,  Hideo Hoshino

IPC: H01S3/04 ,  H01S3/22 ,  H01S3/223 ,  H01S3/03 ,  F25D17/02 ,  H01S3/041

CPC classification number: H01S3/0407 ,  F25B2400/06 ,  F25D17/02 ,  H01S3/03 ,  H01S3/041 ,  H01S3/22

Abstract: A temperature controller for a gas laser which controls temperatures of a plurality of temperature-controlled apparatuses including a first temperature-controlled portion requiring a high-precision temperature-control and a second temperature-controlled portion requiring a low-precision temperature-control as compared with the first temperature-controlled portion and allowing a temperature-control with a low or high temperature as compared with the first temperature-controlled portion, comprises a first temperature control portion generating a cooling agent or a heating agent for adjusting a temperature of each first temperature-controlled portion, a second temperature control portion generating a cooling agent or a heating agent for adjusting a temperature of each second temperature-controlled portion, a first piping system connecting the first temperature control portion and each first temperature-controlled portion in parallel, and a second piping system connecting the second temperature control portion and each second temperature-controlled portion in parallel.

公开(公告)号：US08787413B2

公开(公告)日：2014-07-22

申请号：US13936819

申请日：2013-07-08

Applicant: Gigaphoton Inc.

Inventor： Yukio Watanabe ,  Hideyuki Hayashi ,  Kouji Kakizaki ,  Michio Shinozaki ,  Hideo Hoshino

IPC: H01S3/04

CPC classification number: H01S3/0407 ,  F25B2400/06 ,  F25D17/02 ,  H01S3/03 ,  H01S3/041 ,  H01S3/22

Abstract: A temperature controller for a gas laser which controls temperatures of a plurality of temperature-controlled apparatuses including a first temperature-controlled portion requiring a high-precision temperature-control and a second temperature-controlled portion requiring a low-precision temperature-control as compared with the first temperature-controlled portion and allowing a temperature-control with a low or high temperature as compared with the first temperature-controlled portion, comprises a first temperature control portion generating a cooling agent or a heating agent for adjusting a temperature of each first temperature-controlled portion, a second temperature control portion generating a cooling agent or a heating agent for adjusting a temperature of each second temperature-controlled portion, a first piping system connecting the first temperature control portion and each first temperature-controlled portion in parallel, and a second piping system connecting the second temperature control portion and each second temperature-controlled portion in parallel.

Abstract translation: 一种用于气体激光器的温度控制器，其控制多个温度控制装置的温度，包括需要高精度温度控制的第一温度控制部分和需要低精度温度控制的第二温度控制部分 与第一温度控制部分相比，第一温度控制部分与低温或高温的温度控制相比，包括产生冷却剂的第一温度控制部分或用于调节每个第一温度控制部分的温度的加热剂 温度控制部分，产生冷却剂的第二温度控制部分或用于调节每个第二温度控制部分的温度的加热剂，将第一温度控制部分和第一温度控制部分并联连接的第一管道系统， 以及连接第二回火的第二管道系统 所述控制部分和每个第二温度控制部分并联。