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    Beam delivery system, focal length selecting method, and electronic device manufacturing method
    1.
    发明授权
    Beam delivery system, focal length selecting method, and electronic device manufacturing method 有权

    公开(公告)号：US11500194B2

    公开(公告)日：2022-11-15

    申请号：US17036412

    申请日：2020-09-29

    Applicant: Gigaphoton Inc.

    Inventor： Takashi Suganuma ,  Takahiro Tatsumi

    IPC: H05G2/00 ,  G02B26/08 ,  G02B5/10 ,  G02B19/00

    Abstract: A beam delivery system according to an aspect of the present disclosure is used for an extreme ultraviolet light generation apparatus and includes a propagation mirror disposed on an optical path between a laser apparatus and a condensation optical system and configured to change the propagation direction of a pulse laser beam, and a curvature mirror disposed on an optical path between the propagation mirror and the condensation optical system and having a concave reflective surface configured to convert the pulse laser beam to be incident on the condensation optical system into a convergent beam. The curvature mirror has a focal length selected so that the beam spread angle of the pulse laser beam from the curvature mirror is constant irrespective of thermal deformation of the propagation mirror or constant with change in a predetermined allowable range irrespective of thermal deformation of the propagation mirror.

    Extreme ultra violet light source apparatus
    5.
    发明授权
    Extreme ultra violet light source apparatus 有权
    极紫外光源装置

    公开(公告)号：US08698116B2

    公开(公告)日：2014-04-15

    申请号：US13873001

    申请日：2013-04-29

    Applicant: Gigaphoton Inc.

    Inventor： Masato Moriya ,  Osamu Wakabayashi ,  Tamotsu Abe ,  Takashi Suganuma ,  Akira Endo ,  Akira Sumitani

    IPC: G21K5/04

    CPC classification number: G21K5/04 ,  G03F7/70191 ,  G03F7/70575 ,  G03F7/70858 ,  G03F7/70941 ,  G21K1/10 ,  H05G2/005 ,  H05G2/008

    Abstract: An extreme ultraviolet light source apparatus using a spectrum purity filter capable of obtaining EUV light with high spectrum purity. The apparatus includes a chamber; a target supply unit for supplying a target material; a driver laser using a laser gas containing a carbon dioxide gas as a laser medium, for applying a laser beam to the target material to generate plasma; a collector mirror for collecting and outputting the extreme ultraviolet light radiated from the plasma; and a spectrum purity filter provided in an optical path of the extreme ultraviolet light, for transmitting the extreme ultraviolet light and reflecting the laser beam, the spectrum purity filter including a mesh having electrical conductivity and formed with an arrangement of apertures having a pitch not larger than a half of a shortest wavelength of the laser beam applied by the driver laser.

    Abstract translation: 一种使用能够获得高光谱纯度的EUV光的光谱纯度滤光片的极紫外光源装置。 该装置包括一个室; 用于提供目标材料的目标供应单元; 使用包含二氧化碳气体的激光气体作为激光介质的激光激光器，用于向目标材料施加激光以产生等离子体; 用于收集和输出从等离子体辐射的极紫外光的收集器反射镜; 以及设置在极紫外光的光路中的光谱纯度滤光片，用于透射极紫外光并反射激光束，光谱纯度滤光器包括具有导电性的网格，并且形成为具有间距不大的孔 超过由驱动器激光器施加的激光束的最短波长的一半。

    Extreme ultraviolet light generating apparatus
    6.
    发明授权
    Extreme ultraviolet light generating apparatus 有权

    公开(公告)号：US10374381B2

    公开(公告)日：2019-08-06

    申请号：US15590238

    申请日：2017-05-09

    Applicant: Gigaphoton Inc.

    Inventor： Toru Suzuki ,  Takashi Suganuma ,  Akihiro Takayama ,  Yoshiaki Kurosawa

    IPC: H01S3/10 ,  H05G2/00 ,  H01L21/30 ,  H01S3/00 ,  H01S5/00

    Abstract: A beam adjusting apparatus of an extreme ultraviolet light generating apparatus may include: a first pair of mirrors constituted by a first concave mirror and a first convex mirror, provided along the optical path of the pulsed laser beam; a second pair of mirrors constituted by a second concave mirror and a second convex mirror, which are arranged in an order reversed from the order of arrangement of the first concave mirror and the first convex mirror, provided along the optical path of the pulsed laser beam downstream from the first pair of mirrors; and a moving apparatus configured to simultaneously increase or simultaneously decrease the distance between the first concave mirror and the first convex mirror and the distance between the second concave mirror and the second convex mirror.

    Beam delivery system and control method therefor
    7.
    发明授权
    Beam delivery system and control method therefor 有权

    公开(公告)号：US10194515B2

    公开(公告)日：2019-01-29

    申请号：US15613789

    申请日：2017-06-05

    Applicant: GIGAPHOTON INC.

    Inventor： Yoshifumi Ueno ,  Takashi Suganuma ,  Yoshiaki Kurosawa

    IPC: G01N21/64 ,  H05G2/00 ,  G01J1/02 ,  G01J1/04 ,  G01J1/42 ,  G02B26/08 ,  H01S3/00

    Abstract: A beam delivery system may include: beam adjusters configured to adjust a divergence angle of a pulse laser beam; a beam sampler configured to separate a part of the pulse laser beam outputted from a first beam adjuster provided at the most downstream among the beam adjusters to acquire a sample beam; a beam monitor configured to receive the sample beam and output a monitored diameter; and a beam delivery controller configured to control the beam adjusters based on the monitored diameter. The beam delivery controller may adjust each of beam adjusters other than the first beam adjuster selected one after another from the most upstream so that the monitored diameter at the beam monitor becomes a predetermined value specific to the beam adjuster, and adjust the first beam adjuster so that the pulse laser beam becomes focused at a position downstream of a target position.

    Laser unit and extreme ultraviolet light generating system
    9.
    发明授权
    Laser unit and extreme ultraviolet light generating system 有权

    公开(公告)号：US09954339B2

    公开(公告)日：2018-04-24

    申请号：US15040645

    申请日：2016-02-10

    Applicant: GIGAPHOTON INC.

    Inventor： Takashi Suganuma ,  Hakaru Mizoguchi ,  Osamu Wakabayashi

    IPC: H01S3/00 ,  H05G2/00 ,  G02B27/28 ,  H01S3/23 ,  H01S3/038 ,  G03F7/20

    CPC classification number: H01S3/005 ,  G02B27/286 ,  G03F7/70033 ,  G03F7/70041 ,  H01S3/038 ,  H01S3/2316 ,  H05G2/008

    Abstract: There is provided a laser unit that may include: a master oscillator configured to output a linear-polarized laser light beam; a first polarization device disposed in a light path of the linear-polarized laser light beam and provided with a polarization axis substantially aligned with a polarization direction of the linearly-polarized incident laser light beam; a second polarization device disposed in the light path of the linear-polarized laser light beam and provided with a polarization axis substantially aligned with a direction of the polarization axis of the first polarization device; and a laser amplifier disposed between the first polarization device and the second polarization device in the light path of the linear-polarized laser light beam and including a pair of discharge electrodes disposed to oppose each other, an opposing direction of the pair of discharge electrodes being substantially aligned with the direction of the polarization axis of the first polarization device.

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