Extreme ultraviolet light generation device

    公开(公告)号:US10111312B2

    公开(公告)日:2018-10-23

    申请号:US15807067

    申请日:2017-11-08

    Abstract: Output timing of laser light is controlled with high accuracy. An extreme ultraviolet light generation device may include a chamber in which plasma is generated to generate extreme ultraviolet light, a window provided in the chamber, an optical path pipe connected to the chamber, a light source disposed in the optical path pipe and configured to output light into the chamber via the window, a gas supply unit configured to supply gas into the optical path pipe, and an exhaust port configured to discharge the gas in the optical path pipe to an outside of the optical path pipe.

    Extreme ultraviolet light generation device

    公开(公告)号:US10712666B2

    公开(公告)日:2020-07-14

    申请号:US16028896

    申请日:2018-07-06

    Inventor: Toru Suzuki

    Abstract: An extreme ultraviolet light generation device includes: a target supply unit outputting a plurality of targets along a trajectory toward a plasma generation region; a laser device emitting laser light toward the plasma generation region; an image capturing unit having an image capturing direction non-orthogonal and non-parallel to the trajectory, capturing an image of a region including the plasma generation region, and outputting image data; an illumination unit outputting illumination light to the region including the plasma generation region; an image capturing position change unit changing an image capturing position of the image capturing unit along the image capturing direction; a movement amount determination unit determining an movement amount of the image capturing position based on the image data; and a control unit controlling the image capturing position change unit based on the movement amount determined by the movement amount determination unit.

    Extreme ultraviolet light generation apparatus

    公开(公告)号:US09622332B2

    公开(公告)日:2017-04-11

    申请号:US14061295

    申请日:2013-10-23

    Abstract: In an extreme ultraviolet light generation apparatus, a target detection section may include a light source, a transfer optical system, an image sensor configured to output image data of an image that has been formed by irradiating a target outputted from a target supply device with light outputted from the light source on a light-receiving unit of the image sensor by the transfer optical system, and a processing unit, connected to the image sensor, configured to receive the image data, obtain a first optical intensity distribution along a first line that intersects with a trajectory of the target and a second optical intensity distribution along a second line that intersects with the trajectory, calculate a center of gravity position in the first optical intensity distribution and a center of gravity position in the second optical intensity distribution, and calculate an actual path of the target based on the calculated positions.

    Extreme ultraviolet light generation apparatus

    公开(公告)号:US09986629B2

    公开(公告)日:2018-05-29

    申请号:US15017000

    申请日:2016-02-05

    CPC classification number: H05G2/008 G03F7/70033 H05G2/003 H05G2/005

    Abstract: An extreme ultraviolet light generation apparatus may include: a chamber including a plasma generation region to which a target is supplied, the target being turned into plasma so that extreme ultraviolet light is generated in the chamber; a target supply part configured to supply the target to the plasma generation region by outputting the target as a droplet into the chamber; a droplet detector configured to detect the droplet traveling from the target supply part to the plasma generation region; an imaging part configured to capture an image of an imaging region containing the plasma generation region in the chamber; and a controller configured to control an imaging timing at which the imaging part captures the image of the imaging region, based on a detection timing at which the droplet detector detects the droplet.

    Extreme ultraviolet light generation apparatus

    公开(公告)号:US09686845B2

    公开(公告)日:2017-06-20

    申请号:US15361120

    申请日:2016-11-25

    CPC classification number: H05G2/006 H05G2/005 H05G2/008

    Abstract: A target sensor may include: a plurality of sensor elements, each of the plurality of sensor elements being configured to output a sensor signal that varies in accordance with an amount of light received on a light-receiving surface; and a signal generator configured to process the sensor signals from the plurality of sensor elements. The light-receiving surfaces of the plurality of sensor elements may be disposed at different positions in a second direction different from a first direction along which an image of the target illuminated by the illumination light may move. The signal generator may be configured to compare each of the sensor signals from the plurality of sensor elements with a threshold and output the signal indicating detection of a target to the controller in a case where at least one of the sensor signals from the plurality of sensor elements may exceed the threshold.

    Laser beam controlling device and extreme ultraviolet light generating apparatus
    7.
    发明授权
    Laser beam controlling device and extreme ultraviolet light generating apparatus 有权
    激光束控制装置和极紫外光发生装置

    公开(公告)号:US09386675B2

    公开(公告)日:2016-07-05

    申请号:US14724636

    申请日:2015-05-28

    Abstract: A laser beam controlling device may include: a guide laser device; a guide laser beam wavefront adjuster provided in a beam path of the guide laser beam outputted from the guide laser device; a beam combiner configured to adjust travel directions of a laser beam outputted from a laser system and the guide laser beam outputted from the guide laser beam wavefront adjuster to coincide with each other, a both beam wavefront adjuster provided in a beam path of both the laser beam and the guide laser beam outputted from the beam combiner, a beam monitor provided in a beam path of both the laser beam and the guide laser beam outputted from the both beam wavefront adjuster, and a controller configured to control the guide laser beam wavefront adjuster and the both beam wavefront adjuster based on detection results at the beam monitor with respect to both the laser beam and the guide laser beam.

    Abstract translation: 激光束控制装置可以包括:导向激光装置; 引导激光束波前调整器,设置在从引导激光装置输出的引导激光束的光束路径中; 配置为调整从激光系统输出的激光束的行进方向和从引导激光束波前调整器输出的引导激光束彼此重合的光束组合器,设置在两个激光束的光束路径中的两个光束波前调整器 从束组合器输出的光束和引导激光束,设置在从两光束波前调整器输出的激光束和引导激光束的光束路径中的光束监视器,以及控制器,被配置为控制引导激光束波前调整器 以及基于在激光束和引导激光束两者的光束监视器处的检测结果的两个光束波前调整器。

    Extreme ultraviolet light generating apparatus

    公开(公告)号:US10420198B2

    公开(公告)日:2019-09-17

    申请号:US15895521

    申请日:2018-02-13

    Abstract: The extreme ultraviolet light generating apparatus may include a chamber having a window through which a pulse laser beam enters, a target supply unit configured to output at least one target toward a predetermined region in the chamber, a target image capturing device configured to capture an image of the at least one target, a first actuator configured to move a focused area focused by the target image capturing device, and a controller configured to control the first actuator based on a signal from an external device.

    Extreme ultraviolet light generating apparatus

    公开(公告)号:US10374381B2

    公开(公告)日:2019-08-06

    申请号:US15590238

    申请日:2017-05-09

    Abstract: A beam adjusting apparatus of an extreme ultraviolet light generating apparatus may include: a first pair of mirrors constituted by a first concave mirror and a first convex mirror, provided along the optical path of the pulsed laser beam; a second pair of mirrors constituted by a second concave mirror and a second convex mirror, which are arranged in an order reversed from the order of arrangement of the first concave mirror and the first convex mirror, provided along the optical path of the pulsed laser beam downstream from the first pair of mirrors; and a moving apparatus configured to simultaneously increase or simultaneously decrease the distance between the first concave mirror and the first convex mirror and the distance between the second concave mirror and the second convex mirror.

    Extreme ultraviolet light generation apparatus

    公开(公告)号:US10172225B2

    公开(公告)日:2019-01-01

    申请号:US15860137

    申请日:2018-01-02

    Abstract: An extreme ultraviolet light generation apparatus may include: a chamber including a plasma generation region to which a target is supplied, the target being turned into plasma so that extreme ultraviolet light is generated in the chamber; a target supply part configured to supply the target to the plasma generation region by outputting the target as a droplet into the chamber; a droplet detector configured to detect the droplet traveling from the target supply part to the plasma generation region; an imaging part configured to capture an image of an imaging region containing the plasma generation region in the chamber; and a controller configured to control an imaging timing at which the imaging part captures the image of the imaging region, based on a detection timing at which the droplet detector detects the droplet.

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