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    Extreme ultra violet light source apparatus
    2.
    发明授权
    Extreme ultra violet light source apparatus 有权
    极紫外光源装置

    公开(公告)号：US08698116B2

    公开(公告)日：2014-04-15

    申请号：US13873001

    申请日：2013-04-29

    Applicant: Gigaphoton Inc.

    Inventor： Masato Moriya ,  Osamu Wakabayashi ,  Tamotsu Abe ,  Takashi Suganuma ,  Akira Endo ,  Akira Sumitani

    IPC: G21K5/04

    CPC classification number: G21K5/04 ,  G03F7/70191 ,  G03F7/70575 ,  G03F7/70858 ,  G03F7/70941 ,  G21K1/10 ,  H05G2/005 ,  H05G2/008

    Abstract: An extreme ultraviolet light source apparatus using a spectrum purity filter capable of obtaining EUV light with high spectrum purity. The apparatus includes a chamber; a target supply unit for supplying a target material; a driver laser using a laser gas containing a carbon dioxide gas as a laser medium, for applying a laser beam to the target material to generate plasma; a collector mirror for collecting and outputting the extreme ultraviolet light radiated from the plasma; and a spectrum purity filter provided in an optical path of the extreme ultraviolet light, for transmitting the extreme ultraviolet light and reflecting the laser beam, the spectrum purity filter including a mesh having electrical conductivity and formed with an arrangement of apertures having a pitch not larger than a half of a shortest wavelength of the laser beam applied by the driver laser.

    Abstract translation: 一种使用能够获得高光谱纯度的EUV光的光谱纯度滤光片的极紫外光源装置。 该装置包括一个室; 用于提供目标材料的目标供应单元; 使用包含二氧化碳气体的激光气体作为激光介质的激光激光器，用于向目标材料施加激光以产生等离子体; 用于收集和输出从等离子体辐射的极紫外光的收集器反射镜; 以及设置在极紫外光的光路中的光谱纯度滤光片，用于透射极紫外光并反射激光束，光谱纯度滤光器包括具有导电性的网格，并且形成为具有间距不大的孔 超过由驱动器激光器施加的激光束的最短波长的一半。

    Extreme ultraviolet light source device and method for generating extreme ultraviolet light
    3.
    发明授权
    Extreme ultraviolet light source device and method for generating extreme ultraviolet light 有权
    极紫外光源装置及产生极紫外光的方法

    公开(公告)号：US08710475B2

    公开(公告)日：2014-04-29

    申请号：US13846852

    申请日：2013-03-18

    Applicant: Gigaphoton Inc.

    Inventor： Hiroshi Komori ,  Tatsuya Yanagida ,  Yoshifumi Ueno ,  Akira Sumitani ,  Akira Endo ,  Tsukasa Hori

    IPC: A61N5/06

    CPC classification number: G21K5/00 ,  G03F7/70033 ,  G03F7/70916 ,  H05G2/003 ,  H05G2/005 ,  H05G2/008

    Abstract: An EUV (Extreme Ultra Violet) light source device ionizes a target material in an ionizer, and supplies the ionized target material to a point of generating a plasma. This reduces the generation of debris. The ionizer simultaneously irradiates laser beams of plural wavelengths corresponding to the excited level of tin on a target material to ionize the target material. The ionized target material is extracted from the ionizer with a high voltage applied from an ion beam extractor, and accelerated and supplied to a plasma generation chamber. When driver laser beam is irradiated on the ionized target material, a plasma is generated, thereby emitting EUV radiation.

    Abstract translation: EUV（Extreme Ultra Violet）光源装置将离子发生器中的目标材料离子化，并将电离靶材材料提供到产生等离子体的点。 这减少了碎片的产生。 离子发生器同时将与激发的锡水平相对应的多个波长的激光束照射在目标材料上以电离目标材料。 电离目标材料从离子束提取器施加的高电压从电离器中提取，并被加速并提供给等离子体产生室。 当驱动激光束照射在电离靶材上时，产生等离子体，从而发射EUV辐射。

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