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    Extreme ultra violet light source apparatus
    1.
    发明授权
    Extreme ultra violet light source apparatus 有权
    极紫外光源装置

    公开(公告)号：US08698116B2

    公开(公告)日：2014-04-15

    申请号：US13873001

    申请日：2013-04-29

    Applicant: Gigaphoton Inc.

    Inventor： Masato Moriya ,  Osamu Wakabayashi ,  Tamotsu Abe ,  Takashi Suganuma ,  Akira Endo ,  Akira Sumitani

    IPC: G21K5/04

    CPC classification number: G21K5/04 ,  G03F7/70191 ,  G03F7/70575 ,  G03F7/70858 ,  G03F7/70941 ,  G21K1/10 ,  H05G2/005 ,  H05G2/008

    Abstract: An extreme ultraviolet light source apparatus using a spectrum purity filter capable of obtaining EUV light with high spectrum purity. The apparatus includes a chamber; a target supply unit for supplying a target material; a driver laser using a laser gas containing a carbon dioxide gas as a laser medium, for applying a laser beam to the target material to generate plasma; a collector mirror for collecting and outputting the extreme ultraviolet light radiated from the plasma; and a spectrum purity filter provided in an optical path of the extreme ultraviolet light, for transmitting the extreme ultraviolet light and reflecting the laser beam, the spectrum purity filter including a mesh having electrical conductivity and formed with an arrangement of apertures having a pitch not larger than a half of a shortest wavelength of the laser beam applied by the driver laser.

    Abstract translation: 一种使用能够获得高光谱纯度的EUV光的光谱纯度滤光片的极紫外光源装置。 该装置包括一个室; 用于提供目标材料的目标供应单元; 使用包含二氧化碳气体的激光气体作为激光介质的激光激光器，用于向目标材料施加激光以产生等离子体; 用于收集和输出从等离子体辐射的极紫外光的收集器反射镜; 以及设置在极紫外光的光路中的光谱纯度滤光片，用于透射极紫外光并反射激光束，光谱纯度滤光器包括具有导电性的网格，并且形成为具有间距不大的孔 超过由驱动器激光器施加的激光束的最短波长的一半。

    Extreme ultraviolet light generation apparatus
    3.
    发明授权
    Extreme ultraviolet light generation apparatus 有权

    公开(公告)号：US10314152B2

    公开(公告)日：2019-06-04

    申请号：US15347241

    申请日：2016-11-09

    Applicant: GIGAPHOTON INC.

    Inventor： Shinji Nagai ,  Tamotsu Abe ,  Hitoshi Nagano ,  Osamu Wakabayashi

    IPC: H05G2/00 ,  G03F7/20 ,  G21K1/06 ,  G21K5/02 ,  G21K5/00 ,  B23K10/00 ,  G03B27/32 ,  B23K26/36 ,  B23K26/12

    Abstract: An apparatus for generating extreme ultraviolet light used with a laser apparatus and connected to an external device so as to supply the extreme ultraviolet light thereto includes a chamber provided with at least one inlet through which a laser beam is introduced into the chamber; a target supply unit provided on the chamber configured to supply a target material to a predetermined region inside the chamber; a discharge pump connected to the chamber; at least one optical element provided inside the chamber; an etching gas introduction unit provided on the chamber through which an etching gas passes; and at least one temperature control mechanism for controlling a temperature of the at least one optical element.

    Extreme ultraviolet light generation apparatus
    4.
    发明授权
    Extreme ultraviolet light generation apparatus 有权
    极紫外光发生装置

    公开(公告)号：US09510433B2

    公开(公告)日：2016-11-29

    申请号：US14481620

    申请日：2014-09-09

    Applicant: GIGAPHOTON INC.

    Inventor： Shinji Nagai ,  Tamotsu Abe ,  Hitoshi Nagano ,  Osamu Wakabayashi

    IPC: G03B27/32 ,  B23K26/10 ,  B23K26/12 ,  B23K26/36 ,  H05G2/00 ,  G21K5/02 ,  G21K5/00 ,  B23K10/00 ,  G03F7/20 ,  G21K1/06

    CPC classification number: H05G2/008 ,  B23K10/00 ,  B23K26/12 ,  B23K26/36 ,  G03B27/32 ,  G03F7/70025 ,  G03F7/70033 ,  G21K1/067 ,  G21K5/00 ,  G21K5/02 ,  G21K2201/064 ,  H05G2/005

    Abstract: An apparatus for generating extreme ultraviolet light used with a laser apparatus and connected to an external device so as to supply the extreme ultraviolet light thereto includes a chamber provided with at least one inlet through which a laser beam is introduced into the chamber; a target supply unit provided on the chamber configured to supply a target material to a predetermined region inside the chamber; a discharge pump connected to the chamber; at least one optical element provided inside the chamber; an etching gas introduction unit provided on the chamber through which an etching gas passes; and at least one temperature control mechanism for controlling a temperature of the at least one optical element.

    Abstract translation: 一种用于产生与激光装置并且连接到外部装置以便提供极紫外光的极紫外光的装置，包括设置有至少一个入口的腔室，激光束通过该入口引入腔室; 设置在所述室上的目标供给单元，其构造成将目标材料供应到所述室内的预定区域; 连接到所述室的排出泵; 设置在所述室内的至少一个光学元件; 蚀刻气体导入单元，设置在所述室上，蚀刻气体通过所述蚀刻气体导入单元; 以及用于控制所述至少一个光学元件的温度的至少一个温度控制机构。

    Extreme ultraviolet light generating apparatus
    5.
    发明授权
    Extreme ultraviolet light generating apparatus 有权

    公开(公告)号：US10126657B2

    公开(公告)日：2018-11-13

    申请号：US15971073

    申请日：2018-05-04

    Applicant: Gigaphoton Inc.

    Inventor： Hirokazu Hosoda ,  Tamotsu Abe

    IPC: H01J37/00 ,  G03F7/20 ,  H01J37/32 ,  H05G2/00

    Abstract: An extreme ultraviolet light generating apparatus, may include: a chamber, in which extreme ultraviolet light is generated by plasma being generated in the interior thereof; a window provided in a wall of the chamber; a light source provided at the exterior of the chamber, configured to output illuminating light to the interior of the chamber via the window; a light sensor, configured to detect the illuminating light which is output to the interior of the chamber via the window; a shielding member having an opening that the illuminating light may pass through, that shields the window from emissions from the plasma, provided in the interior of the chamber; and a mirror provided along an optical path of the illuminating light in the interior of the chamber between the window and the shielding member, having a reflective surface that reflects the illuminating light, constituted by a surface of a metal layer.

    Extreme ultraviolet light generation apparatus
    6.
    发明授权
    Extreme ultraviolet light generation apparatus 有权

    公开(公告)号：US09986629B2

    公开(公告)日：2018-05-29

    申请号：US15017000

    申请日：2016-02-05

    Applicant: Gigaphoton Inc.

    Inventor： Toru Suzuki ,  Tamotsu Abe ,  Osamu Wakabayashi ,  Tatsuya Yanagida

    IPC: H05G2/00 ,  G03F7/20

    CPC classification number: H05G2/008 ,  G03F7/70033 ,  H05G2/003 ,  H05G2/005

    Abstract: An extreme ultraviolet light generation apparatus may include: a chamber including a plasma generation region to which a target is supplied, the target being turned into plasma so that extreme ultraviolet light is generated in the chamber; a target supply part configured to supply the target to the plasma generation region by outputting the target as a droplet into the chamber; a droplet detector configured to detect the droplet traveling from the target supply part to the plasma generation region; an imaging part configured to capture an image of an imaging region containing the plasma generation region in the chamber; and a controller configured to control an imaging timing at which the imaging part captures the image of the imaging region, based on a detection timing at which the droplet detector detects the droplet.

    METHOD AND APPARATUS FOR CLEANING COLLECTOR MIRROR IN EUV LIGHT GENERATOR
    7.
    发明申请
    METHOD AND APPARATUS FOR CLEANING COLLECTOR MIRROR IN EUV LIGHT GENERATOR 审中-公开
    EUV光发生器清洗收集器镜的方法和装置

    公开(公告)号：US20140166046A1

    公开(公告)日：2014-06-19

    申请号：US13964816

    申请日：2013-08-12

    Applicant: GIGAPHOTON INC.

    Inventor： Takeshi Asayama ,  Hiroshi Someya ,  Masato Moriya ,  Hideo Hoshino ,  Tamotsu Abe

    IPC: B08B7/00 ,  B08B13/00

    CPC classification number: B08B7/00 ,  B08B7/0035 ,  B08B13/00

    Abstract: A method for cleaning collector mirrors in an EUV light generator in which a target is made into a plasma state and EUV light generated is collected by a collector mirror, the method being adopted to the EUV light generator for cleaning contaminants adhering thereto, the method comprising: preparing at least two collector mirrors; locating one of the mirrors at an EUV light condensing position while locating the other mirror at a cleaning position; determining whether the mirror at the cleaning position is cleaned while determining whether the mirror at the light condensing position requires cleaning; and once determined that the mirror at the cleaning position is cleaned and the mirror at the light condensing position requires cleaning, conveying the mirror at the light condensing position and requiring cleaning to the cleaning position while conveying the mirror at the cleaning position and having been cleaned to the light condensing position.

    Abstract translation: 一种在EUV光发生器中清洁收集反射镜的方法，其中靶产生等离子体状态，并且通过集光镜收集产生的EUV光，该方法被用于EUV发光器，用于清除附着在其上的污染物，该方法包括 ：准备至少两个收集镜; 将其中一个反射镜定位在EUV聚光位置，同时将另一个反射镜定位在清洁位置; 确定在清洁位置处的反射镜是否被清洁，同时确定在聚光位置的反射镜是否需要清洁; 并且一旦确定在清洁位置处的反射镜被清洁并且聚光位置处的反射镜需要清洁，则在反射镜处于聚光位置并且在将反射镜输送到清洁位置并且被清洁时需要清洁到清洁位置 到聚光位置。

    Extreme ultraviolet light generation apparatus
    10.
    发明授权
    Extreme ultraviolet light generation apparatus 有权

    公开(公告)号：US10172225B2

    公开(公告)日：2019-01-01

    申请号：US15860137

    申请日：2018-01-02

    Applicant: Gigaphoton Inc.

    Inventor： Toru Suzuki ,  Tamotsu Abe ,  Osamu Wakabayashi ,  Tatsuya Yanagida

    IPC: H05G2/00 ,  G03F7/20

    Abstract: An extreme ultraviolet light generation apparatus may include: a chamber including a plasma generation region to which a target is supplied, the target being turned into plasma so that extreme ultraviolet light is generated in the chamber; a target supply part configured to supply the target to the plasma generation region by outputting the target as a droplet into the chamber; a droplet detector configured to detect the droplet traveling from the target supply part to the plasma generation region; an imaging part configured to capture an image of an imaging region containing the plasma generation region in the chamber; and a controller configured to control an imaging timing at which the imaging part captures the image of the imaging region, based on a detection timing at which the droplet detector detects the droplet.

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