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Patent Agency Ranking
公开(公告)号：US09425576B2
公开(公告)日：2016-08-23
申请号：US14487796
申请日：2014-09-16
Applicant: GIGAPHOTON INC.
Inventor： Tooru Abe , Takeshi Ohta , Hiroaki Tsushima , Osamu Wakabayashi
CPC classification number: H01S3/036 , H01S3/08009 , H01S3/09702 , H01S3/10046 , H01S3/1305 , H01S3/134 , H01S3/225 , H01S3/2251 , H01S3/2256 , H01S3/2258 , H01S3/2366
Abstract: An excimer laser apparatus includes a gas supply unit, connected to a first receptacle that holds a first laser gas containing halogen gas and a second receptacle that holds a second laser gas having a lower halogen gas concentration than the first laser gas, that supplies the first laser gas and the second laser gas to the interior of the laser chamber. Gas pressure control in which the gas supply unit supplies the second laser gas to the interior of the laser chamber or a gas exhaust unit partially exhausts gas from within the laser chamber, and partial gas replacement control in which the gas supply unit supplies the first laser gas and the second laser gas to the interior of the laser chamber and the gas exhaust unit partially exhausts gas from within the laser chamber sequentially, may be selectively performed.
Abstract translation: 准分子激光装置包括气体供给单元，其连接到保持含有卤素气体的第一激光气体的第一容器和保持具有比第一激光气体低的卤素气体浓度的第二激光气体的第二容器， 激光气体和第二激光气体到激光室的内部。 气体供给单元将第二激光气体供给到激光室的内部的气体压力控制或者气体排出单元部分地从激光室内排出气体，以及气体供给单元提供第一激光器的部分气体置换控制 可以选择性地执行气体和第二激光气体到激光室的内部和排气单元部分地从激光室内部排出气体。
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公开(公告)号：US10971887B2
公开(公告)日：2021-04-06
申请号：US16101061
申请日：2018-08-10
Applicant: Gigaphoton Inc.
Inventor： Tooru Abe
Abstract: A laser device may include a light source configured to emit a laser beam in burst operation, an optical sensor configured to acquire a cross sectional image of the laser beam during a certain period for every certain cycle, an image processor configured to receive an input of an image signal of the cross sectional image outputted from the optical sensor and output beam relating information about the laser beam, a beam traveling direction adjuster configured to adjust a traveling direction of the laser beam, and a controller configured to control the beam traveling direction adjuster based on the beam relating information when at least a part of a period in which the optical sensor acquires the cross sectional image is overlapped with a period in which the light source emits a laser beam.
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公开(公告)号：US09954340B2
公开(公告)日：2018-04-24
申请号：US15208637
申请日：2016-07-13
Applicant: Gigaphoton Inc.
Inventor： Tooru Abe , Takeshi Ohta , Hiroaki Tsushima , Osamu Wakabayashi
IPC: H01S3/22 , H01S3/036 , H01S3/225 , H01S3/10 , H01S3/134 , H01S3/23 , H01S3/097 , H01S3/13 , H01S3/08
CPC classification number: H01S3/036 , H01S3/08009 , H01S3/09702 , H01S3/10046 , H01S3/1305 , H01S3/134 , H01S3/225 , H01S3/2251 , H01S3/2256 , H01S3/2258 , H01S3/2366
Abstract: Problem: to suppress the number of times complete gas replacement in a laser chamber.Solution: this excimer laser apparatus may include a gas supply unit, connected to a first receptacle that holds a first laser gas containing halogen gas and a second receptacle that holds a second laser gas having a lower halogen gas concentration than the first laser gas, that supplies the first laser gas and the second laser gas to the interior of the laser chamber. Then, gas pressure control in which the gas supply unit supplies the second laser gas to the interior of the laser chamber or a gas exhaust unit partially exhausts gas from within the laser chamber, and partial gas replacement control in which the gas supply unit supplies the first laser gas and the second laser gas to the interior of the laser chamber and the gas exhaust unit partially exhausts gas from within the laser chamber sequentially, may be selectively performed.
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公开(公告)号：US10102938B2
公开(公告)日：2018-10-16
申请号：US15953774
申请日：2018-04-16
Applicant: Gigaphoton Inc.
Inventor： Takayuki Yabu , Tamotsu Abe , Kenichi Miyao , Tooru Abe
Abstract: An extreme ultraviolet light generating apparatus may include a chamber including a window to allow first and second pulse laser beams to enter, a mirror to reflect the first pulse laser beam, a first actuator to control a position or a posture of the mirror, a beam combiner to cause optical paths of the first and second pulse laser beams to substantially coincide with each other, a reflective optical system to reflect the first and second pulse laser beams from the beam combiner, a second actuator to control a position or a posture of the reflective optical system, sensors each configured to output data for detecting a position of an optical path of the first pulse laser beam, and a controller to control the first actuator based on the data and control the second actuator based on a value related to control of the first actuator.
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公开(公告)号：US08867583B2
公开(公告)日：2014-10-21
申请号：US13656917
申请日：2012-10-22
Applicant: Gigaphoton Inc.
Inventor： Tooru Abe , Takeshi Ohta , Hiroaki Tsushima , Osamu Wakabayashi
CPC classification number: H01S3/036 , H01S3/08009 , H01S3/09702 , H01S3/10046 , H01S3/1305 , H01S3/134 , H01S3/225 , H01S3/2251 , H01S3/2256 , H01S3/2258 , H01S3/2366
Abstract: An excimer laser apparatus includes a gas supply unit, connected to a first receptacle that holds a first laser gas containing halogen gas and a second receptacle that holds a second laser gas having a lower halogen gas concentration than the first laser gas, that supplies the first laser gas and the second laser gas to the interior of the laser chamber. Gas pressure control in which the gas supply unit supplies the second laser gas to the interior of the laser chamber or a gas exhaust unit partially exhausts gas from within the laser chamber, and partial gas replacement control in which the gas supply unit supplies the first laser gas and the second laser gas to the interior of the laser chamber and the gas exhaust unit partially exhausts gas from within the laser chamber sequentially, may be selectively performed.
Abstract translation: 准分子激光装置包括气体供给单元，其连接到保持含有卤素气体的第一激光气体的第一容器和保持具有比第一激光气体低的卤素气体浓度的第二激光气体的第二容器， 激光气体和第二激光气体到激光室的内部。 气体供给单元将第二激光气体供给到激光室的内部的气体压力控制或者气体排出单元部分地从激光室内排出气体，以及气体供给单元提供第一激光器的部分气体置换控制 可以选择性地执行气体和第二激光气体到激光室的内部和排气单元部分地从激光室内部排出气体。
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