公开(公告)号：US08368015B2

公开(公告)日：2013-02-05

申请号：US11990067

申请日：2006-08-08

Applicant: Elmar Platzgummer ,  Gerhard Stengl ,  Helmut Falkner

Inventor： Elmar Platzgummer ,  Gerhard Stengl ,  Helmut Falkner

IPC: G01N23/00 ,  G21K7/00

CPC classification number: H01J37/12 ,  B82Y10/00 ,  B82Y40/00 ,  H01J37/3177

Abstract: The present invention relates to a multi-beamlet multi-column particle-optical system comprising a plurality of columns which are disposed in an array for simultaneously exposing a substrate, each column having an optical axis and comprising: a beamlet generating arrangement comprising at least one multi-aperture plate for generating a pattern of multiple beamlets of charged particles, and an electrostatic lens arrangement comprising at least one electrode element; the at least one electrode element having an aperture defined by an inner peripheral edge facing the optical axis, the aperture having a center and a predetermined shape in a plane orthogonal to the optical axis; wherein in at least one of the plurality of columns, the predetermined shape of the aperture is a non-circular shape with at least one of a protrusion and an indentation from an ideal circle about the center of the aperture.

Abstract translation: 多子束多列粒子光学系统技术领域本发明涉及一种多子束多列粒子光学系统，该多子束多列粒子光学系统包括多个列，其被布置成阵列以同时暴露衬底，每个列具有光轴，并且包括：子束产生装置，其包括至少一个 用于产生多个带电粒子束的图案的多孔板，以及包括至少一个电极元件的静电透镜装置; 所述至少一个电极元件具有由面向光轴的内周边缘限定的孔，所述孔在与所述光轴正交的平面中具有中心和预定形状; 其中在所述多个列中的至少一个列中，所述孔的预定形状是非圆形形状，其具有围绕所述孔的中心的来自理想圆的突起和凹陷中的至少一个。

公开(公告)号：US20050201246A1

公开(公告)日：2005-09-15

申请号：US11080578

申请日：2005-03-15

Applicant: Herbert Buschbeck ,  Gertraud Lammer ,  Alfred Chalupka ,  Robert Nowak ,  Elmar Platzgummer ,  Gerhard Stengl

Inventor： Herbert Buschbeck ,  Gertraud Lammer ,  Alfred Chalupka ,  Robert Nowak ,  Elmar Platzgummer ,  Gerhard Stengl

IPC: H01L21/027 ,  G03F7/20 ,  G11B7/09 ,  H01J37/02 ,  H01J37/147 ,  H01J37/15 ,  H01J37/20 ,  H01J37/21 ,  H01J37/304 ,  H01J37/317

CPC classification number: H01J37/3177 ,  B82Y10/00 ,  B82Y40/00 ,  H01J37/21 ,  H01J37/304 ,  H01J2237/024 ,  H01J2237/10 ,  H01J2237/216 ,  H01J2237/30455

Abstract: In a particle-optical projection system (32) a pattern (B) is imaged onto a target (tp) by means of energetic electrically charged particles. The pattern is represented in a patterned beam (pb) of said charged particles emerging from the object plane through at least one cross-over (c); it is imaged into an image (S) with a given size and distortion. To compensate for the Z-deviation of the image (S) position from the actual positioning of the target (tp) (Z denotes an axial coordinate substantially parallel to the optical axis cx), without changing the size of the image (S), the system comprises a position detection means (ZD) for measuring the Z-position of several locations of the target (tp), a control means (33) for calculating modifications (cr) of selected lens parameters of the final particle-optical lens (L2) and controlling said lens parameters according to said modifications.

Abstract translation: 在粒子光学投影系统（32）中，通过能量带电粒子将图案（B）成像到目标（tp）上。 所述图案通过至少一个交叉（c）从所述物体平面出射的所述带电粒子的图案化束（pb）中表示; 它被成像为具有给定大小和失真的图像（S）。 为了补偿图像（S）位置与目标的实际定位（tp）（Z表示基本上平行于光轴cx的轴向坐标）的Z偏差，而不改变图像（S）的尺寸， 该系统包括用于测量目标（tp）的若干位置的Z位置的位置检测装置（ZD），用于计算最终粒子光学透镜的选定透镜参数的修改（cr）的控制装置（33） L 2），并根据所述修改来控制所述透镜参数。

公开(公告)号：US20090140160A1

公开(公告)日：2009-06-04

申请号：US11988922

申请日：2006-07-20

Applicant: Elmar Platzgummer ,  Gerhard Stengl

Inventor： Elmar Platzgummer ,  Gerhard Stengl

IPC: H01J3/14

CPC classification number: B82Y10/00 ,  B82Y40/00 ,  H01J37/3174 ,  H01J2237/0435

Abstract: A beam manipulating arrangement for a multi beam application using charged particles comprises a multi-aperture plate having plural apertures traversed by beams of charged particles. A frame portion of the multi-aperture plate is heated to reduce temperature gradients within the multi-aperture plate. Further, a heat emissivity of a surface of the multi-aperture plate may be higher in some regions as compared to other regions in view of also reducing temperature gradients.

Abstract translation: 用于使用带电粒子的多光束施加的光束操纵装置包括具有由带电粒子束穿过的多个孔的多孔板。 加热多孔板的框架部分以降低多孔板内的温度梯度。 此外，考虑到降低温度梯度，与其他区域相比，多孔板的表面的发热率在一些区域可能更高。

公开(公告)号：US07388217B2

公开(公告)日：2008-06-17

申请号：US11700468

申请日：2007-01-31

Applicant: Herbert Buschbeck ,  Gertraud Lammer ,  Alfred Chalupka ,  Robert Nowak ,  Elmar Platzgummer ,  Gerhard Stengl

Inventor： Herbert Buschbeck ,  Gertraud Lammer ,  Alfred Chalupka ,  Robert Nowak ,  Elmar Platzgummer ,  Gerhard Stengl

IPC: H01J37/302 ,  H01L21/027

CPC classification number: H01J37/3177 ,  B82Y10/00 ,  B82Y40/00 ,  H01J37/21 ,  H01J37/304 ,  H01J2237/024 ,  H01J2237/10 ,  H01J2237/216 ,  H01J2237/30455

Abstract: In a particle-optical projection system a pattern is imaged onto a target by means of energetic electrically charged particles. The pattern is represented in a patterned beam of said charged particles emerging from the object plane through at least one cross-over; it is imaged into an image with a given size and distortion. To compensate for the Z-deviation of the image position from the actual positioning of the target (Z denotes an axial coordinate substantially parallel to the optical axis), without changing the size of the image, the system includes a position detector for measuring the Z-position of several locations of the target, and a controller for calculating modifications of selected lens parameters of the final particle-optical lens and controlling said lens parameters according to said modifications.

Abstract translation: 在粒子光学投影系统中，通过能量带电粒子将图案成像到靶上。 所述图案表示在所述带电粒子的图案化束中，所述带电粒子通过至少一个交叉从对象平面出射; 它被成像为具有给定尺寸和失真的图像。 为了补偿图像位置的Z偏差与目标的实际定位（Z表示基本上平行于光轴的轴向坐标），而不改变图像的尺寸，系统包括用于测量Z的位置检测器 - 位置，以及用于计算最终粒子 - 光学透镜的所选透镜参数的修改并根据所述修改来控制所述透镜参数的控制器。

公开(公告)号：US06909103B2

公开(公告)日：2005-06-21

申请号：US10886463

申请日：2004-07-07

Applicant: Elmar Platzgummer ,  Gerhard Stengl ,  Hans Loeschner

Inventor： Elmar Platzgummer ,  Gerhard Stengl ,  Hans Loeschner

IPC: G03F7/20 ,  H01J37/305 ,  H01J37/317 ,  H01L21/027 ,  H01J37/145

CPC classification number: H01J37/3174 ,  B82Y10/00 ,  B82Y40/00 ,  H01J2237/0453 ,  H01J2237/047 ,  H01J2237/0473 ,  H01J2237/04735

Abstract: A particle-beam exposure apparatus (1) for irradiating a target (41) by means of a beam (2) of energetic electrically charged particles comprises: an illumination system (101) for generating and forming said particles into a directed beam (21); a pattern definition means (102) located after the illumination system for positioning a pattern of apertures transparent to the particles in the path of the directed beam, thus forming a patterned beam (22) emerging from the pattern definition means through the apertures; and a projection system (103) positioned after the pattern definition means (102) for projecting the patterned beam (22) onto a target (41) positioned after the projection system. The apparatus further comprises an acceleration/deceleration means (32) containing an electric potential gradient which is oriented substantially parallel to the path of the structured beam and constant over at least a cross-section of the beam.

Abstract translation: 一种用于通过能量带电粒子的光束（2）照射目标物体的粒子束曝光装置（1）包括：用于将所述粒子产生并形成为定向光束（21）的照明系统（101） ; 位于照明系统之后的图案定义装置（102），用于定位在定向光束的路径中对颗粒透明的孔的图案，从而形成从图案定义装置通过孔排出的图案化的束（22）; 以及位于图案定义装置（102）之后的投影系统（103），用于将图案化的光束（22）投影到位于投影系统之后的目标（41）上。 该装置还包括加速/减速装置（32），该加速/减速装置（32）包含电位梯度，该电位梯度基本上平行于结构化波束的路径定向并且在至少横截面上恒定。

公开(公告)号：US06858118B2

公开(公告)日：2005-02-22

申请号：US10395572

申请日：2003-03-24

Applicant: Elmar Platzgummer ,  Hans Löschner ,  Gerhard Stengl

Inventor： Elmar Platzgummer ,  Hans Löschner ,  Gerhard Stengl

IPC: C23C14/04 ,  C23C14/32 ,  C23C14/34 ,  C23C14/46 ,  C23C14/54 ,  G03F1/00 ,  H01J37/317 ,  H01L21/027

CPC classification number: C23C14/547 ,  B82Y10/00 ,  B82Y40/00 ,  G03F1/20 ,  G03F1/82 ,  H01J37/3174 ,  H01J2237/31755 ,  H01J2237/31788 ,  H01J2237/31794

Abstract: An apparatus for masked ion-beam lithography comprises a mask maintenance module for prolongation of the lifetime of the stencil mask. The module comprises a deposition means for depositing material to the side of the mask irradiated by the lithography beam, with at least one deposition source being positioned in front of the mask, and further comprises a sputter means in which at least one sputter source, positioned in front of the mask holder means and outside the path of the lithography beam, produces a sputter ion beam directed to the mask in order to sputter off material from said mask in a scanning procedure and compensate for inhomogeneity of deposition.

Abstract translation: 用于掩模离子束光刻的装置包括用于延长模板掩模寿命的掩模维护模块。 该模块包括用于将材料沉积到由光刻光束照射的掩模侧面的沉积装置，其中至少一个沉积源位于掩模的前面，并且还包括溅射装置，其中定位至少一个溅射源 在掩模保持器装置的前面并且在光刻光束的路径之外，产生指向掩模的溅射离子束，以便在扫描过程中从所述掩模溅射材料并补偿沉积的不均匀性。

公开(公告)号：US20050012052A1

公开(公告)日：2005-01-20

申请号：US10886463

申请日：2004-07-07

Applicant: Elmar Platzgummer ,  Gerhard Stengl ,  Hans Loeschner

Inventor： Elmar Platzgummer ,  Gerhard Stengl ,  Hans Loeschner

IPC: G03F7/20 ,  H01J37/305 ,  H01J37/317 ,  H01L21/027

CPC classification number: H01J37/3174 ,  B82Y10/00 ,  B82Y40/00 ,  H01J2237/0453 ,  H01J2237/047 ,  H01J2237/0473 ,  H01J2237/04735

Abstract: A particle-beam exposure apparatus (1) for irradiating a target (41) by means of a beam (2) of energetic electrically charged particles comprises: an illumination system (101) for generating and forming said particles into a directed beam (21); a pattern definition means (102) located after the illumination system for positioning a pattern of apertures transparent to the particles in the path of the directed beam, thus forming a patterned beam (22) emerging from the pattern definition means through the apertures; and a projection system (103) positioned after the pattern definition means (102) for projecting the patterned beam (22) onto a target (41) positioned after the projection system. The apparatus further comprises an acceleration/ deceleration means (32) containing an electric potential gradient which is oriented substantially parallel to the path of the structured beam and constant over at least a cross-section of the beam.

Abstract translation: 一种用于通过能量带电粒子的光束（2）照射目标物体的粒子束曝光装置（1）包括：用于将所述粒子产生并形成为定向光束（21）的照明系统（101） ; 位于照明系统之后的图案定义装置（102），用于定位在定向光束的路径中对颗粒透明的孔的图案，从而形成从图案定义装置通过孔排出的图案化的束（22）; 以及位于图案定义装置（102）之后的投影系统（103），用于将图案化的光束（22）投影到位于投影系统之后的目标（41）上。 该装置还包括加速/减速装置（32），该加速/减速装置（32）包含电位梯度，该电位梯度基本上平行于结构化波束的路径定向并且在至少横截面上恒定。

公开(公告)号：US06768125B2

公开(公告)日：2004-07-27

申请号：US10337903

申请日：2003-01-08

Applicant: Elmar Platzgummer ,  Hans Loeschner ,  Gerhard Stengl ,  Herbert Vonach ,  Alfred Chalupka ,  Gertraud Lammer ,  Herbert Buschbeck ,  Robert Nowak ,  Till Windischbauer

Inventor： Elmar Platzgummer ,  Hans Loeschner ,  Gerhard Stengl ,  Herbert Vonach ,  Alfred Chalupka ,  Gertraud Lammer ,  Herbert Buschbeck ,  Robert Nowak ,  Till Windischbauer

IPC: H01J3706

CPC classification number: B82Y10/00 ,  B82Y40/00 ,  H01J37/045 ,  H01J37/3174

Abstract: A device (102) for defining a pattern, for use in a particle-beam exposure apparatus (100), said device adapted to be irradiated with a beam (lb,pb) of electrically charged particles and let pass the beam only through a plurality of apertures, comprises an aperture array means (203) and a blanking means (202). The aperture array means (203) has a plurality of apertures (21,230) of identical shape defining the shape of beamlets (bm). The blanking means (202) serves to switch off the passage of selected beamlets; it has a plurality of openings (220), each corresponding to a respective aperture (230) of the aperture array means (203) and being provided with a deflection means (221) controllable to deflect particles radiated through the opening off their path (p1) to an absorbing surface within said exposure apparatus (100). The apertures (21) are arranged on the blanking and aperture array means (202,203) within a pattern definition field (pf) being composed of a plurality of staggered lines (p1) of apertures. Each of the lines (p1) comprises alternately first segments (sf) which are free of apertures and second segments (af) which each comprise a number of apertures spaced apart by a row offset (pm), said row offset being a multiple of the width (w) of apertures, the length (A) of said first segments (sf) being greater than the row offset. In front of the blanking means (202) as seen in the direction of the particle beam, a cover means (201) is provided having a plurality of openings (210), each corresponding to a respective opening (230) of the blanking means and having a width (w1) which is smaller than the width (w2) of the openings (220) of the blanking array means.

Abstract translation: 一种用于限定用于粒子束曝光设备（100）的图案的设备（102），所述设备适于用带电粒子的光束（lb，pb）照射，并且仅使光束通过多个 的孔径包括孔径阵列装置（203）和消隐装置（202）。 孔径阵列装置（203）具有限定子束（bm）形状的相同形状的多个孔（21,230）。 消隐装置（202）用于切断所选子束的通过; 它具有多个开口（220），每个开口对应于孔阵列装置（203）的相应孔径（230），并且设置有偏转装置（221），该偏转装置可控制，以使通过开口辐射的颗粒偏离其路径（p1 ）到所述曝光装置（100）内的吸收表面。 孔（21）布置在由多个交错的孔（p1）组成的图案定义区域（pf）内的消隐和孔径阵列装置（202,203）上。 线（p1）中的每一个交替地包括没有孔的第一段（sf）和第二段（af），每个段包括通过行偏移（pm）间隔开的多个孔，所述行偏移是 孔的宽度（w），所述第一段（sf）的长度（A）大于行偏移。 在沿着该粒子束的方向观察的消隐装置（202）的前面，提供具有多个开口（210）的盖装置（201），每个开口对应于消隐装置的相应开口（230） 具有比消隐阵列装置的开口（220）的宽度（w2）小的宽度（w1）。

公开(公告)号：US08049189B2

公开(公告)日：2011-11-01

申请号：US12090636

申请日：2006-10-20

Applicant: Herbert Buschbeck ,  Elmar Platzgummer ,  Gerhard Stengl ,  Herbert Vonach

Inventor： Herbert Buschbeck ,  Elmar Platzgummer ,  Gerhard Stengl ,  Herbert Vonach

IPC: G21K1/00

CPC classification number: H01J37/3174 ,  B82Y10/00 ,  B82Y40/00 ,  H01J37/147 ,  H01J37/21 ,  H01J2237/0492 ,  H01J2237/24578

Abstract: A charged particle system comprises a particle source for generating a beam of charged particles and a particle-optical projection system. The particle-optical projection system comprises a focusing first magnetic lens (403) comprising an outer pole piece (411) having a radial inner end (411′), and an inner pole piece (412) having a lowermost end (412′) disposed closest to the radial inner end of the outer pole piece, a gap being formed by those; a focusing electrostatic lens (450) having at least a first electrode (451) and a second electrode (450) disposed in a region of the gap; and a controller (C) configured to control a focusing power of the first electrostatic lens based on a signal indicative of a distance of a surface of a substrate from a portion of the first magnetic lens disposed closest to the substrate.

Abstract translation: 带电粒子系统包括用于产生带电粒子束的粒子源和粒子光学投影系统。 粒子光学投影系统包括聚焦第一磁性透镜（403），其包括具有径向内端（411'）的外极片（411）和设置有最下端（412'）的内极片（412） 最靠近外极片的径向内端的间隙由它们形成; 具有至少设置在所述间隙的区域中的第一电极（451）和第二电极（450）的聚焦静电透镜（450） 以及控制器（C），被配置为基于表示基板的表面距离最靠近基板设置的第一磁性透镜的部分的距离的信号来控制第一静电透镜的聚焦能力。

公开(公告)号：US20100270474A1

公开(公告)日：2010-10-28

申请号：US11990067

申请日：2006-08-08

Applicant: Elmar Platzgummer ,  Gerhard Stengl ,  Helmut Falkner

Inventor： Elmar Platzgummer ,  Gerhard Stengl ,  Helmut Falkner

IPC: H01J37/12 ,  H01J3/18

CPC classification number: H01J37/12 ,  B82Y10/00 ,  B82Y40/00 ,  H01J37/3177

Abstract: The present invention relates to a multi-beamlet multi-column particle-optical system comprising a plurality of columns which are disposed in an array for simultaneously exposing a substrate, each column having an optical axis and comprising: a beamlet generating arrangement comprising at least one multi-aperture plate for generating a pattern of multiple beamlets of charged particles, and an electrostatic lens arrangement comprising at least one electrode element; the at least one electrode element having an aperture defined by an inner peripheral edge facing the optical axis, the aperture having a center and a predetermined shape in a plane orthogonal to the optical axis; wherein in at least one of the plurality of columns, the predetermined shape of the aperture is a non-circular shape with at least one of a protrusion and an indentation from an ideal circle about the center of the aperture.

Abstract translation: 多子束多列粒子光学系统技术领域本发明涉及一种多子束多列粒子光学系统，该多子束多列粒子光学系统包括多个列，其被布置成阵列以同时暴露衬底，每个列具有光轴，并且包括：子束产生装置，其包括至少一个 用于产生多个带电粒子束的图案的多孔板，以及包括至少一个电极元件的静电透镜装置; 所述至少一个电极元件具有由面向光轴的内周边缘限定的孔，所述孔在与所述光轴正交的平面中具有中心和预定形状; 其中在所述多个列中的至少一个列中，所述孔的预定形状是非圆形形状，其具有围绕所述孔的中心的来自理想圆的突起和凹陷中的至少一个。