Invention Grant
- Patent Title: Particle-optical projection system
- Patent Title (中): 粒子投影系统
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Application No.: US11700468Application Date: 2007-01-31
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Publication No.: US07388217B2Publication Date: 2008-06-17
- Inventor: Herbert Buschbeck , Gertraud Lammer , Alfred Chalupka , Robert Nowak , Elmar Platzgummer , Gerhard Stengl
- Applicant: Herbert Buschbeck , Gertraud Lammer , Alfred Chalupka , Robert Nowak , Elmar Platzgummer , Gerhard Stengl
- Applicant Address: AT Vienna
- Assignee: IMS Nanofabrication GmbH
- Current Assignee: IMS Nanofabrication GmbH
- Current Assignee Address: AT Vienna
- Agency: RatnerPrestia
- Priority: ATA457/2004 20040315
- Main IPC: H01J37/302
- IPC: H01J37/302 ; H01L21/027

Abstract:
In a particle-optical projection system a pattern is imaged onto a target by means of energetic electrically charged particles. The pattern is represented in a patterned beam of said charged particles emerging from the object plane through at least one cross-over; it is imaged into an image with a given size and distortion. To compensate for the Z-deviation of the image position from the actual positioning of the target (Z denotes an axial coordinate substantially parallel to the optical axis), without changing the size of the image, the system includes a position detector for measuring the Z-position of several locations of the target, and a controller for calculating modifications of selected lens parameters of the final particle-optical lens and controlling said lens parameters according to said modifications.
Public/Granted literature
- US20070125956A1 Particle-optical projection system Public/Granted day:2007-06-07
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