Memory transistor and memory unit with asymmetrical pocket doping region
    1.
    发明申请
    Memory transistor and memory unit with asymmetrical pocket doping region 有权
    存储晶体管和具有不对称口袋掺杂区域的存储单元

    公开(公告)号:US20070080390A1

    公开(公告)日:2007-04-12

    申请号:US11431265

    申请日:2006-05-10

    IPC分类号: H01L29/788

    CPC分类号: G11C16/0416

    摘要: An integrated memory transistor and a memory unit including a plurality of integrated memory transistors is disclosed. Generally, the integrated memory transistor includes an electron source, a channel region, a control region, a charge storage region, a source-side pocket doping region, and a drain-side pocket doping region. The electron source is operable to transport electrons to the channel region when the integrated memory transistor operates in a read mode. Further, the electron source includes a drain terminal region and a source terminal region. The channel region is arranged between the drain terminal region and source terminal region. The charge storage region is arranged between the control region and the channel region. The source-side doping region is arranged nearer to the source terminal region than to the drain terminal region. The drain-side pocket doping region is arranged asymmetrical to the source-side pocket doping region.

    摘要翻译: 公开了一种集成存储晶体管和包括多个集成存储晶体管的存储单元。 通常,集成存储晶体管包括电子源,沟道区,控制区,电荷存储区,源极侧掺杂区和漏极侧杂质掺杂区。 当集成存储晶体管以读取模式工作时,电子源可操作以将电子传输到沟道区域。 此外,电子源包括漏极端子区域和源极端子区域。 沟道区域布置在漏极端子区域和源极端子区域之间。 电荷存储区域设置在控制区域和沟道区域之间。 源极侧掺杂区域比漏极端子区域更靠近源极端子区域。 漏极侧杂质掺杂区域与源极侧掺杂区域不对称地布置。

    Memory transistor and memory unit with asymmetrical pocket doping region
    2.
    发明授权
    Memory transistor and memory unit with asymmetrical pocket doping region 有权
    存储晶体管和具有不对称口袋掺杂区域的存储单元

    公开(公告)号:US07433232B2

    公开(公告)日:2008-10-07

    申请号:US11431265

    申请日:2006-05-10

    IPC分类号: G11C16/04

    CPC分类号: G11C16/0416

    摘要: An integrated memory transistor and a memory unit including a plurality of integrated memory transistors is disclosed. Generally, the integrated memory transistor includes an electron source, a channel region, a control region, a charge storage region, a source-side pocket doping region, and a drain-side pocket doping region. The electron source is operable to transport electrons to the channel region when the integrated memory transistor operates in a read mode. Further, the electron source includes a drain terminal region and a source terminal region. The channel region is arranged between the drain terminal region and source terminal region. The charge storage region is arranged between the control region and the channel region. The source-side doping region is arranged nearer to the source terminal region than to the drain terminal region. The drain-side pocket doping region is arranged asymmetrical to the source-side pocket doping region.

    摘要翻译: 公开了一种集成存储晶体管和包括多个集成存储晶体管的存储单元。 通常,集成存储晶体管包括电子源,沟道区,控制区,电荷存储区,源极侧掺杂区和漏极侧杂质掺杂区。 当集成存储晶体管以读取模式工作时,电子源可操作以将电子传输到沟道区域。 此外,电子源包括漏极端子区域和源极端子区域。 沟道区域设置在漏极端子区域和源极端子区域之间。 电荷存储区域设置在控制区域和沟道区域之间。 源极侧掺杂区域比漏极端子区域更靠近源极端子区域。 漏极侧杂质掺杂区域与源极侧掺杂区域不对称地布置。